JP2003188357A5 - - Google Patents

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Publication number
JP2003188357A5
JP2003188357A5 JP2002273428A JP2002273428A JP2003188357A5 JP 2003188357 A5 JP2003188357 A5 JP 2003188357A5 JP 2002273428 A JP2002273428 A JP 2002273428A JP 2002273428 A JP2002273428 A JP 2002273428A JP 2003188357 A5 JP2003188357 A5 JP 2003188357A5
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JP
Japan
Prior art keywords
conductor
magnetic memory
memory element
cap
layer
Prior art date
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JP2002273428A
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English (en)
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JP4128418B2 (ja
JP2003188357A (ja
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Publication date
Priority claimed from US09/963,932 external-priority patent/US6504221B1/en
Application filed filed Critical
Publication of JP2003188357A publication Critical patent/JP2003188357A/ja
Publication of JP2003188357A5 publication Critical patent/JP2003188357A5/ja
Application granted granted Critical
Publication of JP4128418B2 publication Critical patent/JP4128418B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Claims (9)

  1. 磁気メモリ素子であって、
    2つの方向のいずれかに向けられることができる磁化を有するデータ強磁性層(12)と、
    誘電体層(914)と、その誘電体層(914)によって分離される第1および第2の導体(20、22)と、その第1および第2の導体(20、22)上の強磁性被覆(912a、912b、912a’、912b’)とを含む基準層(912、912’)と、及び
    前記データ層と前記基準層(12と912、912’)との間のスペーサ層(16)とを含む、磁気メモリ素子。
  2. 前記基準層(912、912’)の前記被覆(912a、912b、912a’、912b’)が磁気的に非常に軟らかい、請求項1に記載の磁気メモリ素子。
  3. 前記スペーサ層(16)が絶縁性トンネル障壁である、請求項1に記載の磁気メモリ素子。
  4. 前記第1の導体(20)が前記スペーサ層(16)と前記第2の導体(22)との間に形成され、前記第2の導体(22)が、前記第1の導体(20)よりも非常に大きな断面積を有する、請求項1に記載の磁気メモリ素子。
  5. 前記第2の導体(22)が読出し導体であり、前記第1の導体(20)が読出し/書込み導体である、請求項4に記載の磁気メモリ素子。
  6. 前記第2の導体(22)が読出し/書込み導体であり、前記第1の導体(20)が読出し導体である、請求項4に記載の磁気メモリ素子。
  7. 前記被覆(912a、912b、912a’、912b’)が、前記第1の導体(20)上の第1の部分(912b、912b’)と、前記第2の導体(22)および前記誘電体層(914)上の第2の部分(912a、912a’)とを含み、前記第1の部分と前記第2の部分(912a、912b、912a’、912b’)との間に隙間が存在する、請求項4に記載の磁気メモリ素子。
  8. 前記第2の部分(912a)が側壁を含み、前記第1の部分(912b)がキャップ(912c)を含み、そのキャップ(912c)が前記側壁上に延在し、前記隙間が前記キャップ(912c)と前記側壁との間に存在する、請求項7に記載の磁気メモリ素子。
  9. 前記第2の部分(912a’)が側壁を含み、前記第1の部分(912b’)がキャップ(912c’)を含み、そのキャップ(912c’)が前記側壁上には延在せず、前記隙間が前記キャップ(912c’)と前記側壁との間に存在する、請求項7に記載の磁気メモリ素子。
JP2002273428A 2001-09-25 2002-09-19 導体を埋め込まれた磁気的に軟らかい基準層を含む磁気抵抗素子 Expired - Fee Related JP4128418B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/963,932 US6504221B1 (en) 2001-09-25 2001-09-25 Magneto-resistive device including soft reference layer having embedded conductors
US09/963932 2001-09-25

Publications (3)

Publication Number Publication Date
JP2003188357A JP2003188357A (ja) 2003-07-04
JP2003188357A5 true JP2003188357A5 (ja) 2005-04-28
JP4128418B2 JP4128418B2 (ja) 2008-07-30

Family

ID=25507914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002273428A Expired - Fee Related JP4128418B2 (ja) 2001-09-25 2002-09-19 導体を埋め込まれた磁気的に軟らかい基準層を含む磁気抵抗素子

Country Status (6)

Country Link
US (1) US6504221B1 (ja)
EP (1) EP1296332B1 (ja)
JP (1) JP4128418B2 (ja)
KR (1) KR100896457B1 (ja)
CN (1) CN100492528C (ja)
DE (1) DE60203675T2 (ja)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6548849B1 (en) * 2002-01-31 2003-04-15 Sharp Laboratories Of America, Inc. Magnetic yoke structures in MRAM devices to reduce programming power consumption and a method to make the same
US6597049B1 (en) * 2002-04-25 2003-07-22 Hewlett-Packard Development Company, L.P. Conductor structure for a magnetic memory
US6780653B2 (en) 2002-06-06 2004-08-24 Micron Technology, Inc. Methods of forming magnetoresistive memory device assemblies
US6850429B2 (en) * 2002-08-02 2005-02-01 Unity Semiconductor Corporation Cross point memory array with memory plugs exhibiting a characteristic hysteresis
US6577529B1 (en) * 2002-09-03 2003-06-10 Hewlett-Packard Development Company, L.P. Multi-bit magnetic memory device
JP3788964B2 (ja) 2002-09-10 2006-06-21 株式会社東芝 磁気ランダムアクセスメモリ
US6950919B2 (en) * 2003-03-26 2005-09-27 Hewlett-Packard Development Company, L.P. Computer system with operating system to dynamically adjust the main memory
US6865107B2 (en) * 2003-06-23 2005-03-08 Hewlett-Packard Development Company, L.P. Magnetic memory device
US6865105B1 (en) * 2003-09-22 2005-03-08 Hewlett-Packard Development Company, L.P. Thermal-assisted switching array configuration for MRAM
US6925000B2 (en) * 2003-12-12 2005-08-02 Maglabs, Inc. Method and apparatus for a high density magnetic random access memory (MRAM) with stackable architecture
KR100634501B1 (ko) * 2004-01-29 2006-10-13 삼성전자주식회사 자기 메모리 소자 및 그 제조방법
US7193889B2 (en) * 2004-02-11 2007-03-20 Hewlett-Packard Development Company, Lp. Switching of MRAM devices having soft magnetic reference layers
US7324369B2 (en) * 2005-06-30 2008-01-29 Freescale Semiconductor, Inc. MRAM embedded smart power integrated circuits
US7444738B2 (en) * 2005-07-29 2008-11-04 Everspin Technologies, Inc. Method for tunnel junction sensor with magnetic cladding
JP2007329222A (ja) * 2006-06-07 2007-12-20 Tdk Corp 磁気記憶装置、磁気記憶装置の製造方法
US7372753B1 (en) * 2006-10-19 2008-05-13 Unity Semiconductor Corporation Two-cycle sensing in a two-terminal memory array having leakage current
US7379364B2 (en) * 2006-10-19 2008-05-27 Unity Semiconductor Corporation Sensing a signal in a two-terminal memory array having leakage current
US7719876B2 (en) 2008-07-31 2010-05-18 Unity Semiconductor Corporation Preservation circuit and methods to maintain values representing data in one or more layers of memory
US7830701B2 (en) * 2008-09-19 2010-11-09 Unity Semiconductor Corporation Contemporaneous margin verification and memory access for memory cells in cross point memory arrays
EP2276034B1 (en) * 2009-07-13 2016-04-27 Crocus Technology S.A. Self-referenced magnetic random access memory cell
US8625336B2 (en) * 2011-02-08 2014-01-07 Crocus Technology Inc. Memory devices with series-interconnected magnetic random access memory cells
KR102354680B1 (ko) * 2018-02-23 2022-01-25 에스케이하이닉스 주식회사 메모리 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3891511B2 (ja) * 1997-06-12 2007-03-14 キヤノン株式会社 磁性薄膜メモリ及びその記録再生方法
US6040961A (en) * 1997-10-27 2000-03-21 International Business Machines Corporation Current-pinned, current resettable soft AP-pinned spin valve sensor
US6169686B1 (en) * 1997-11-20 2001-01-02 Hewlett-Packard Company Solid-state memory with magnetic storage cells
US6211559B1 (en) * 1998-02-27 2001-04-03 Motorola, Inc. Symmetric magnetic tunnel device
US6872993B1 (en) * 1999-05-25 2005-03-29 Micron Technology, Inc. Thin film memory device having local and external magnetic shielding
US6555858B1 (en) * 2000-11-15 2003-04-29 Motorola, Inc. Self-aligned magnetic clad write line and its method of formation
US6538920B2 (en) * 2001-04-02 2003-03-25 Manish Sharma Cladded read conductor for a pinned-on-the-fly soft reference layer
US6404674B1 (en) * 2001-04-02 2002-06-11 Hewlett Packard Company Intellectual Property Administrator Cladded read-write conductor for a pinned-on-the-fly soft reference layer

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