JP2003177525A - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物

Info

Publication number
JP2003177525A
JP2003177525A JP2001379808A JP2001379808A JP2003177525A JP 2003177525 A JP2003177525 A JP 2003177525A JP 2001379808 A JP2001379808 A JP 2001379808A JP 2001379808 A JP2001379808 A JP 2001379808A JP 2003177525 A JP2003177525 A JP 2003177525A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
colored photosensitive
pigment
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001379808A
Other languages
English (en)
Japanese (ja)
Inventor
Koji Ichikawa
幸司 市川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2001379808A priority Critical patent/JP2003177525A/ja
Priority to TW091135642A priority patent/TWI313789B/zh
Priority to CNB021560218A priority patent/CN1254702C/zh
Priority to KR1020020078731A priority patent/KR20030076193A/ko
Priority to CNA2005100763704A priority patent/CN1696830A/zh
Publication of JP2003177525A publication Critical patent/JP2003177525A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
JP2001379808A 2001-12-13 2001-12-13 着色感光性樹脂組成物 Pending JP2003177525A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001379808A JP2003177525A (ja) 2001-12-13 2001-12-13 着色感光性樹脂組成物
TW091135642A TWI313789B (en) 2001-12-13 2002-12-10 Coloured photosensitive resin composition
CNB021560218A CN1254702C (zh) 2001-12-13 2002-12-11 着色感光性树脂组合物
KR1020020078731A KR20030076193A (ko) 2001-12-13 2002-12-11 착색 감광성 수지 조성물
CNA2005100763704A CN1696830A (zh) 2001-12-13 2002-12-11 着色感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001379808A JP2003177525A (ja) 2001-12-13 2001-12-13 着色感光性樹脂組成物

Publications (1)

Publication Number Publication Date
JP2003177525A true JP2003177525A (ja) 2003-06-27

Family

ID=19186987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001379808A Pending JP2003177525A (ja) 2001-12-13 2001-12-13 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP2003177525A (zh)
KR (1) KR20030076193A (zh)
CN (2) CN1254702C (zh)
TW (1) TWI313789B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005165307A (ja) * 2003-11-14 2005-06-23 Fujifilm Electronic Materials Co Ltd 光硬化性組成物、カラーフィルター、及び、光硬化性組成物の評価方法
JP2013049864A (ja) * 2005-08-03 2013-03-14 Dnp Fine Chemicals Co Ltd 重合体組成物の製造方法および重合体組成物

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100448377C (zh) * 2004-05-25 2009-01-07 卢立新 一种水晶玻璃烟灰缸、及其粘合剂组合物以及该粘合剂组合物的用途
TWI401533B (zh) * 2004-06-28 2013-07-11 Sumitomo Chemical Co 彩色感光樹脂化合物
CN100354663C (zh) * 2004-07-02 2007-12-12 华生科技股份有限公司 彩色滤光片的制作方法
US8263313B2 (en) * 2004-08-11 2012-09-11 Hitachi Chemical Company, Ltd. Photosensitive resin composition and photosensitive film made with the same
CN101218017B (zh) * 2005-07-08 2012-10-03 东洋油墨制造株式会社 分散剂、其制备方法以及含有该分散剂的颜料分散体和油墨
TWI406062B (zh) * 2005-07-29 2013-08-21 Sumitomo Chemical Co A photosensitive resin composition for optical spacers, an optical spacers, and a liquid crystal display device
CN101154043B (zh) * 2006-09-26 2011-04-20 新应材股份有限公司 高解析度负型光阻剂
KR101422071B1 (ko) * 2007-09-21 2014-08-13 주식회사 동진쎄미켐 플라즈마 디스플레이 패널 전극 형성용 슬러리 조성물
CN101162364B (zh) * 2007-11-30 2011-04-20 京东方科技集团股份有限公司 感光树脂组合物及其制备方法和成膜方法
CN108720080A (zh) * 2011-04-18 2018-11-02 卢立新 水晶玻璃烟灰缸
CN103988127B (zh) * 2011-12-09 2019-04-19 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法、半导体装置及显示体装置
CN109100916A (zh) * 2018-07-19 2018-12-28 江苏博砚电子科技有限公司 一种高性能彩色感光性树脂组合物及其制备方法
CN115023466A (zh) * 2020-02-21 2022-09-06 引能仕株式会社 复合物、浆料组合物、膜以及金属箔层叠板

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005165307A (ja) * 2003-11-14 2005-06-23 Fujifilm Electronic Materials Co Ltd 光硬化性組成物、カラーフィルター、及び、光硬化性組成物の評価方法
JP4597638B2 (ja) * 2003-11-14 2010-12-15 富士フイルム株式会社 光硬化性組成物の製造方法、カラーフィルター、及び、光硬化性組成物の評価方法
JP2013049864A (ja) * 2005-08-03 2013-03-14 Dnp Fine Chemicals Co Ltd 重合体組成物の製造方法および重合体組成物

Also Published As

Publication number Publication date
TWI313789B (en) 2009-08-21
TW200301401A (en) 2003-07-01
CN1254702C (zh) 2006-05-03
CN1425928A (zh) 2003-06-25
CN1696830A (zh) 2005-11-16
KR20030076193A (ko) 2003-09-26

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