JP2003174007A5 - - Google Patents

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Publication number
JP2003174007A5
JP2003174007A5 JP2001369775A JP2001369775A JP2003174007A5 JP 2003174007 A5 JP2003174007 A5 JP 2003174007A5 JP 2001369775 A JP2001369775 A JP 2001369775A JP 2001369775 A JP2001369775 A JP 2001369775A JP 2003174007 A5 JP2003174007 A5 JP 2003174007A5
Authority
JP
Japan
Prior art keywords
semiconductor device
vacuum
semiconductor substrate
moisture
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001369775A
Other languages
English (en)
Japanese (ja)
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JP2003174007A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001369775A priority Critical patent/JP2003174007A/ja
Priority claimed from JP2001369775A external-priority patent/JP2003174007A/ja
Priority to US10/307,809 priority patent/US6725565B2/en
Publication of JP2003174007A publication Critical patent/JP2003174007A/ja
Publication of JP2003174007A5 publication Critical patent/JP2003174007A5/ja
Pending legal-status Critical Current

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JP2001369775A 2001-12-04 2001-12-04 基板の真空乾燥方法 Pending JP2003174007A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001369775A JP2003174007A (ja) 2001-12-04 2001-12-04 基板の真空乾燥方法
US10/307,809 US6725565B2 (en) 2001-12-04 2002-12-02 Method for vacuum drying of substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001369775A JP2003174007A (ja) 2001-12-04 2001-12-04 基板の真空乾燥方法

Publications (2)

Publication Number Publication Date
JP2003174007A JP2003174007A (ja) 2003-06-20
JP2003174007A5 true JP2003174007A5 (enExample) 2005-07-21

Family

ID=19179112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001369775A Pending JP2003174007A (ja) 2001-12-04 2001-12-04 基板の真空乾燥方法

Country Status (2)

Country Link
US (1) US6725565B2 (enExample)
JP (1) JP2003174007A (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100454241B1 (ko) * 2001-12-28 2004-10-26 한국디엔에스 주식회사 웨이퍼 건조 장비
EP1511072A3 (en) * 2003-08-26 2006-02-22 Texas Instruments Incorporated Post-etch clean process for porous low dielectric constant materials
US20050285313A1 (en) * 2004-06-24 2005-12-29 Ward Phillip D Gel/cure unit
JP4254720B2 (ja) * 2005-02-04 2009-04-15 セイコーエプソン株式会社 絶縁化処理前基板、および基板の製造方法
JP4527670B2 (ja) * 2006-01-25 2010-08-18 東京エレクトロン株式会社 加熱処理装置、加熱処理方法、制御プログラムおよびコンピュータ読取可能な記憶媒体
JP5101141B2 (ja) * 2007-03-22 2012-12-19 アクトファイブ株式会社 減圧乾燥方法及び減圧乾燥装置
FR2920046A1 (fr) * 2007-08-13 2009-02-20 Alcatel Lucent Sas Procede de post-traitement d'un support de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs, et station de post-traitement pour la mise en oeuvre d'un tel procede
US7976372B2 (en) * 2007-11-09 2011-07-12 Igt Gaming system having multiple player simultaneous display/input device
KR100859975B1 (ko) 2008-02-20 2008-09-25 씨디에스(주) 다단 진공 건조 장치
US8226343B2 (en) * 2008-10-31 2012-07-24 Brian Weeks Apparatus and methods for loading and transporting containers
TWI450324B (zh) * 2010-01-25 2014-08-21 Gudeng Prec Ind Co Ltd 微影設備之光罩清潔方法及微影設備之光罩清潔系統
JP5702957B2 (ja) * 2010-06-25 2015-04-15 株式会社ミヤコシ ドラム式乾燥装置
JP2012174819A (ja) * 2011-02-21 2012-09-10 Sokudo Co Ltd 熱処理装置および熱処理方法
US9673037B2 (en) * 2011-05-31 2017-06-06 Law Research Corporation Substrate freeze dry apparatus and method
US8967935B2 (en) * 2011-07-06 2015-03-03 Tel Nexx, Inc. Substrate loader and unloader
GB2509022B (en) * 2011-09-07 2018-01-31 Parker Hannifin Corp Analytical system and method for detecting volatile organic compounds in water
JP5320481B2 (ja) * 2012-04-06 2013-10-23 アクトファイブ株式会社 減圧乾燥装置
US9450115B2 (en) * 2013-03-15 2016-09-20 First Solar, Inc. Method of manufacturing a photovoltaic device
GB2556476B (en) 2015-06-05 2021-08-04 Parker Hannifin Corp Analysis system and method for detecting volatile organic compounds in liquid
US20180198095A1 (en) * 2015-06-22 2018-07-12 Sumitomo Chemical Company, Limited Method for manufacturing organic electronic element, and method for drying substrate
JP7396207B2 (ja) 2020-06-03 2023-12-12 トヨタ自動車株式会社 電極板乾燥装置
CN114777427B (zh) * 2022-05-10 2023-11-17 星恒电源股份有限公司 一种方形叠片锂离子电池电芯的干燥方法
CN115194640B (zh) * 2022-08-15 2024-10-18 华海清科股份有限公司 一种化学机械抛光系统及抛光方法
CN117209167A (zh) * 2023-08-04 2023-12-12 安徽蓝润正华电子有限公司 一种仪表用真空玻璃基板的干燥装置
CN117647068A (zh) * 2023-11-22 2024-03-05 航天科工防御技术研究试验中心 电子器件去湿装置及方法
CN118640649B (zh) * 2024-08-14 2025-02-25 常州苏兴电气有限责任公司 一种防泄露的油浸式变压器真空干燥装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6276072B1 (en) * 1997-07-10 2001-08-21 Applied Materials, Inc. Method and apparatus for heating and cooling substrates
JP3396431B2 (ja) * 1998-08-10 2003-04-14 東京エレクトロン株式会社 酸化処理方法および酸化処理装置

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