JP2003158099A5 - - Google Patents

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Publication number
JP2003158099A5
JP2003158099A5 JP2001353809A JP2001353809A JP2003158099A5 JP 2003158099 A5 JP2003158099 A5 JP 2003158099A5 JP 2001353809 A JP2001353809 A JP 2001353809A JP 2001353809 A JP2001353809 A JP 2001353809A JP 2003158099 A5 JP2003158099 A5 JP 2003158099A5
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JP
Japan
Prior art keywords
particle beam
neutral particle
layer
treated
side wall
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Application number
JP2001353809A
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English (en)
Japanese (ja)
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JP4073204B2 (ja
JP2003158099A (ja
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Application filed filed Critical
Priority to JP2001353809A priority Critical patent/JP4073204B2/ja
Priority claimed from JP2001353809A external-priority patent/JP4073204B2/ja
Priority to PCT/JP2002/011658 priority patent/WO2003044842A1/en
Priority to US10/493,414 priority patent/US7144520B2/en
Priority to TW091133466A priority patent/TW589681B/zh
Publication of JP2003158099A publication Critical patent/JP2003158099A/ja
Publication of JP2003158099A5 publication Critical patent/JP2003158099A5/ja
Application granted granted Critical
Publication of JP4073204B2 publication Critical patent/JP4073204B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2001353809A 2001-11-19 2001-11-19 エッチング方法 Expired - Lifetime JP4073204B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001353809A JP4073204B2 (ja) 2001-11-19 2001-11-19 エッチング方法
PCT/JP2002/011658 WO2003044842A1 (en) 2001-11-19 2002-11-08 Etching method and apparatus
US10/493,414 US7144520B2 (en) 2001-11-19 2002-11-08 Etching method and apparatus
TW091133466A TW589681B (en) 2001-11-19 2002-11-15 Etching method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001353809A JP4073204B2 (ja) 2001-11-19 2001-11-19 エッチング方法

Publications (3)

Publication Number Publication Date
JP2003158099A JP2003158099A (ja) 2003-05-30
JP2003158099A5 true JP2003158099A5 (enExample) 2005-04-07
JP4073204B2 JP4073204B2 (ja) 2008-04-09

Family

ID=19165758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001353809A Expired - Lifetime JP4073204B2 (ja) 2001-11-19 2001-11-19 エッチング方法

Country Status (4)

Country Link
US (1) US7144520B2 (enExample)
JP (1) JP4073204B2 (enExample)
TW (1) TW589681B (enExample)
WO (1) WO2003044842A1 (enExample)

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DE10317027A1 (de) * 2003-04-11 2004-11-11 Leybold Optics Gmbh Hochfrequenz-Plasmastrahlquelle und Verfahren zum Bestrahlen einer Oberfläche
JP2006049817A (ja) * 2004-07-07 2006-02-16 Showa Denko Kk プラズマ処理方法およびプラズマエッチング方法
EP1630849B1 (en) * 2004-08-27 2011-11-02 Fei Company Localized plasma processing
KR100851901B1 (ko) * 2005-01-07 2008-08-13 삼성전자주식회사 이온 빔 추출장치
KR100714898B1 (ko) * 2005-01-21 2007-05-04 삼성전자주식회사 중성빔을 이용한 기판 처리장치 및 처리방법
KR100610665B1 (ko) 2005-02-03 2006-08-09 삼성전자주식회사 중성빔을 이용한 식각장치
US7358484B2 (en) * 2005-09-29 2008-04-15 Tokyo Electron Limited Hyperthermal neutral beam source and method of operating
US7335602B2 (en) * 2006-01-18 2008-02-26 Freescale Semiconductor, Inc. Charge-free layer by layer etching of dielectrics
US20080169064A1 (en) * 2007-01-11 2008-07-17 Ushio Denki Kabushiki Kaisha Surface-treating apparatus
KR20080096771A (ko) 2007-02-09 2008-11-03 캐논 아네르바 가부시키가이샤 산화 처리 방법 및 산화 처리 장치
US20090013527A1 (en) * 2007-07-11 2009-01-15 International Business Machines Corporation Collapsable connection mold repair method utilizing femtosecond laser pulse lengths
KR100898589B1 (ko) * 2007-08-13 2009-05-20 주식회사 하이닉스반도체 반도체 소자 제조 방법
US8614151B2 (en) * 2008-01-04 2013-12-24 Micron Technology, Inc. Method of etching a high aspect ratio contact
JP2010228066A (ja) * 2009-03-27 2010-10-14 Kyushu Univ ナノドットの作製方法
US20110177694A1 (en) * 2010-01-15 2011-07-21 Tokyo Electron Limited Switchable Neutral Beam Source
US8828883B2 (en) 2010-08-24 2014-09-09 Micron Technology, Inc. Methods and apparatuses for energetic neutral flux generation for processing a substrate
FR2965697B1 (fr) * 2010-09-30 2014-01-03 Astrium Sas Procede et dispositif pour la formation d'un faisceau plasma.
US9105705B2 (en) * 2011-03-14 2015-08-11 Plasma-Therm Llc Method and apparatus for plasma dicing a semi-conductor wafer
CN102332384A (zh) * 2011-09-26 2012-01-25 中国科学院微电子研究所 产生中性粒子束装置及方法
US9048190B2 (en) * 2012-10-09 2015-06-02 Applied Materials, Inc. Methods and apparatus for processing substrates using an ion shield
KR101661638B1 (ko) * 2012-11-02 2016-09-30 캐논 아네르바 가부시키가이샤 반도체 장치의 제조 방법, 이온빔 에칭 장치 및 제어 장치
US9978568B2 (en) 2013-08-12 2018-05-22 Tokyo Electron Limited Self-sustained non-ambipolar direct current (DC) plasma at low power
KR101579506B1 (ko) * 2014-07-08 2015-12-23 피에스케이 주식회사 기판 처리 장치 및 그 파티클 취급 방법
US20160013020A1 (en) * 2014-07-14 2016-01-14 Lam Research Corporation Systems and methods for producing energetic neutrals
US10475626B2 (en) * 2015-03-17 2019-11-12 Applied Materials, Inc. Ion-ion plasma atomic layer etch process and reactor
US9960089B2 (en) * 2015-04-03 2018-05-01 Varian Semiconductor Equipment Associates, Inc. Apparatus and method for endpoint detection
DE102016220248A1 (de) * 2016-10-17 2018-04-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zum anisotropen drie-ätzen mit fluorgasmischung
JP6790731B2 (ja) * 2016-11-01 2020-11-25 東洋製罐グループホールディングス株式会社 ダイヤモンド膜表面に微細周期構造溝を形成する方法
CN107331593B (zh) * 2017-08-11 2018-10-12 大连理工大学 一种基于射频放电的正负离子源
JP7323476B2 (ja) * 2020-02-19 2023-08-08 住友電気工業株式会社 半導体装置の製造方法

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US4523971A (en) * 1984-06-28 1985-06-18 International Business Machines Corporation Programmable ion beam patterning system
DE4039930A1 (de) * 1990-12-14 1992-06-17 Leybold Ag Vorrichtung fuer plasmabehandlung
JPH0775230B2 (ja) 1991-09-24 1995-08-09 株式会社小電力高速通信研究所 プラズマエッチング終点モニタリング方法
US5462629A (en) * 1992-08-28 1995-10-31 Kawasaki Steel Corp. Surface processing apparatus using neutral beam
DE4241045C1 (de) * 1992-12-05 1994-05-26 Bosch Gmbh Robert Verfahren zum anisotropen Ätzen von Silicium
US6054395A (en) * 1997-10-24 2000-04-25 Micron Technology, Inc. Method of patterning a semiconductor device
US6641747B1 (en) * 2001-02-15 2003-11-04 Advanced Micro Devices, Inc. Method and apparatus for determining an etch endpoint
JP4039834B2 (ja) * 2001-09-28 2008-01-30 株式会社荏原製作所 エッチング方法及びエッチング装置

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