JP2003140314A5 - - Google Patents
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- Publication number
- JP2003140314A5 JP2003140314A5 JP2001336828A JP2001336828A JP2003140314A5 JP 2003140314 A5 JP2003140314 A5 JP 2003140314A5 JP 2001336828 A JP2001336828 A JP 2001336828A JP 2001336828 A JP2001336828 A JP 2001336828A JP 2003140314 A5 JP2003140314 A5 JP 2003140314A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- halftone film
- impurity
- photomask blank
- predetermined depth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 17
- 239000012535 impurity Substances 0.000 claims 16
- 238000004519 manufacturing process Methods 0.000 claims 6
- 239000000463 material Substances 0.000 claims 4
- 238000005530 etching Methods 0.000 claims 3
- 238000005468 ion implantation Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 238000002834 transmittance Methods 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 230000003213 activating effect Effects 0.000 claims 1
- 239000013543 active substance Substances 0.000 claims 1
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 229910001413 alkali metal ion Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- -1 halogen ions Chemical class 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001336828A JP2003140314A (ja) | 2001-11-01 | 2001-11-01 | フォトマスクブランク及びその製造方法並びにこのフォトマスクブランクを用いたフォトマスクの製造方法 |
| US10/162,082 US6841314B2 (en) | 2001-11-01 | 2002-06-05 | Method of manufacturing a photomask |
| TW091112567A TW528927B (en) | 2001-11-01 | 2002-06-10 | Method of manufacturing a photomask |
| KR10-2002-0038566A KR100514238B1 (ko) | 2001-11-01 | 2002-07-04 | 포토마스크의 제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001336828A JP2003140314A (ja) | 2001-11-01 | 2001-11-01 | フォトマスクブランク及びその製造方法並びにこのフォトマスクブランクを用いたフォトマスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003140314A JP2003140314A (ja) | 2003-05-14 |
| JP2003140314A5 true JP2003140314A5 (enExample) | 2005-07-07 |
Family
ID=19151587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001336828A Pending JP2003140314A (ja) | 2001-11-01 | 2001-11-01 | フォトマスクブランク及びその製造方法並びにこのフォトマスクブランクを用いたフォトマスクの製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6841314B2 (enExample) |
| JP (1) | JP2003140314A (enExample) |
| KR (1) | KR100514238B1 (enExample) |
| TW (1) | TW528927B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060251971A1 (en) * | 2005-05-03 | 2006-11-09 | Richard Schenker | Photo-Mask with variable transmission by ion implantation |
| US20090137106A1 (en) * | 2007-11-27 | 2009-05-28 | Nunan Peter D | Using ion implantation to control trench depth and alter optical properties of a substrate |
| JP5573306B2 (ja) * | 2010-03-31 | 2014-08-20 | 凸版印刷株式会社 | フォトマスクブランクの製造方法 |
| KR100986370B1 (ko) * | 2010-04-09 | 2010-10-08 | 백광플라텍 주식회사 | 조립식 물탱크용 부식방지형 스테이볼트 조립체 |
| JP5672887B2 (ja) * | 2010-09-16 | 2015-02-18 | 凸版印刷株式会社 | フォトマスクブランクの製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03144452A (ja) | 1989-10-30 | 1991-06-19 | Oki Electric Ind Co Ltd | 位相差マスク |
| JPH0862822A (ja) * | 1994-08-26 | 1996-03-08 | Nec Corp | 半透明位相シフトマスクの製造方法 |
| KR0167249B1 (ko) * | 1995-07-31 | 1999-01-15 | 문정환 | 위상반전마스크 제조방법 |
| JPH09211838A (ja) * | 1996-02-05 | 1997-08-15 | Toshiba Corp | 位相シフトマスク及びその製造方法、並びに当該位相シフトマスクを用いた光リソグラフィ方法 |
| JPH1083063A (ja) * | 1996-09-06 | 1998-03-31 | Nec Corp | ハーフトーン型位相シフトマスク及びその作成方法 |
| KR19980029376A (ko) * | 1996-10-25 | 1998-07-25 | 김광호 | 위상반전마스크 제조방법 |
-
2001
- 2001-11-01 JP JP2001336828A patent/JP2003140314A/ja active Pending
-
2002
- 2002-06-05 US US10/162,082 patent/US6841314B2/en not_active Expired - Fee Related
- 2002-06-10 TW TW091112567A patent/TW528927B/zh not_active IP Right Cessation
- 2002-07-04 KR KR10-2002-0038566A patent/KR100514238B1/ko not_active Expired - Fee Related
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