JP2003092241A5 - - Google Patents
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- Publication number
- JP2003092241A5 JP2003092241A5 JP2001280937A JP2001280937A JP2003092241A5 JP 2003092241 A5 JP2003092241 A5 JP 2003092241A5 JP 2001280937 A JP2001280937 A JP 2001280937A JP 2001280937 A JP2001280937 A JP 2001280937A JP 2003092241 A5 JP2003092241 A5 JP 2003092241A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- lcd substrate
- liquid
- lcd
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 description 419
- 239000007788 liquid Substances 0.000 description 147
- 230000007246 mechanism Effects 0.000 description 94
- 230000032258 transport Effects 0.000 description 40
- 230000007723 transport mechanism Effects 0.000 description 32
- 238000001035 drying Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- 238000001816 cooling Methods 0.000 description 15
- 238000003672 processing method Methods 0.000 description 15
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 13
- 238000004140 cleaning Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 230000002093 peripheral effect Effects 0.000 description 9
- 238000005452 bending Methods 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 230000003028 elevating effect Effects 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001280937A JP3935333B2 (ja) | 2001-09-17 | 2001-09-17 | 液処理装置および液処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001280937A JP3935333B2 (ja) | 2001-09-17 | 2001-09-17 | 液処理装置および液処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003092241A JP2003092241A (ja) | 2003-03-28 |
| JP2003092241A5 true JP2003092241A5 (enExample) | 2004-10-28 |
| JP3935333B2 JP3935333B2 (ja) | 2007-06-20 |
Family
ID=19104850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001280937A Expired - Fee Related JP3935333B2 (ja) | 2001-09-17 | 2001-09-17 | 液処理装置および液処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3935333B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3788789B2 (ja) * | 2003-01-22 | 2006-06-21 | 東京応化工業株式会社 | 基板の現像方法及び現像装置 |
| TWI407270B (zh) * | 2009-12-30 | 2013-09-01 | Au Optronics Corp | 顯影設備 |
| CN101718963B (zh) * | 2010-01-14 | 2011-10-05 | 友达光电股份有限公司 | 显影设备 |
| JP6227373B2 (ja) * | 2013-10-23 | 2017-11-08 | 住友ゴム工業株式会社 | ゴムシートへの離型剤塗布装置 |
| CN118831776B (zh) * | 2024-09-23 | 2024-11-19 | 珠海中信达科技有限公司 | 一种显影辊辊涂装置 |
-
2001
- 2001-09-17 JP JP2001280937A patent/JP3935333B2/ja not_active Expired - Fee Related
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