JP2003077904A5 - - Google Patents
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- Publication number
- JP2003077904A5 JP2003077904A5 JP2002155500A JP2002155500A JP2003077904A5 JP 2003077904 A5 JP2003077904 A5 JP 2003077904A5 JP 2002155500 A JP2002155500 A JP 2002155500A JP 2002155500 A JP2002155500 A JP 2002155500A JP 2003077904 A5 JP2003077904 A5 JP 2003077904A5
- Authority
- JP
- Japan
- Prior art keywords
- parallel plate
- pair
- plate electrodes
- processing chamber
- vacuum processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 6
- 238000001020 plasma etching Methods 0.000 claims 5
- 239000010703 silicon Substances 0.000 claims 2
- 150000002500 ions Chemical class 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 230000020169 heat generation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002155500A JP3663392B2 (ja) | 1996-03-01 | 2002-05-29 | プラズマエッチング処理装置 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8-44391 | 1996-03-01 | ||
| JP4439196 | 1996-03-01 | ||
| JP9-7938 | 1997-01-20 | ||
| JP793897 | 1997-01-20 | ||
| JP2002155500A JP3663392B2 (ja) | 1996-03-01 | 2002-05-29 | プラズマエッチング処理装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04527597A Division JP3499104B2 (ja) | 1996-03-01 | 1997-02-28 | プラズマ処理装置及びプラズマ処理方法 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004206943A Division JP4084335B2 (ja) | 1996-03-01 | 2004-07-14 | プラズマエッチング処理装置 |
| JP2004315515A Division JP4388455B2 (ja) | 1996-03-01 | 2004-10-29 | プラズマエッチング処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003077904A JP2003077904A (ja) | 2003-03-14 |
| JP2003077904A5 true JP2003077904A5 (enrdf_load_stackoverflow) | 2005-06-02 |
| JP3663392B2 JP3663392B2 (ja) | 2005-06-22 |
Family
ID=27277808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002155500A Expired - Lifetime JP3663392B2 (ja) | 1996-03-01 | 2002-05-29 | プラズマエッチング処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3663392B2 (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7976673B2 (en) | 2003-05-06 | 2011-07-12 | Lam Research Corporation | RF pulsing of a narrow gap capacitively coupled reactor |
| JP2005079416A (ja) * | 2003-09-02 | 2005-03-24 | Hitachi Ltd | プラズマ処理装置 |
| JP2005260011A (ja) * | 2004-03-12 | 2005-09-22 | Hitachi High-Technologies Corp | ウエハ処理装置およびウエハ処理方法 |
| JP4550710B2 (ja) * | 2005-10-04 | 2010-09-22 | 株式会社日立ハイテクノロジーズ | プラズマ処理方法および装置 |
| JP2008166844A (ja) * | 2008-03-17 | 2008-07-17 | Hitachi High-Technologies Corp | プラズマ処理装置 |
| TWI390582B (zh) * | 2008-07-16 | 2013-03-21 | Sumitomo Heavy Industries | Plasma processing device and plasma processing method |
| JP6564802B2 (ja) * | 2017-03-22 | 2019-08-21 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置、半導体装置の製造方法およびプログラム |
| US20220130641A1 (en) * | 2019-02-06 | 2022-04-28 | Evatec Ag | Method of producing ions and apparatus |
-
2002
- 2002-05-29 JP JP2002155500A patent/JP3663392B2/ja not_active Expired - Lifetime
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