JP2003046203A5 - - Google Patents
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- Publication number
- JP2003046203A5 JP2003046203A5 JP2002156016A JP2002156016A JP2003046203A5 JP 2003046203 A5 JP2003046203 A5 JP 2003046203A5 JP 2002156016 A JP2002156016 A JP 2002156016A JP 2002156016 A JP2002156016 A JP 2002156016A JP 2003046203 A5 JP2003046203 A5 JP 2003046203A5
- Authority
- JP
- Japan
- Prior art keywords
- nitride semiconductor
- growing
- type nitride
- layer
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000004065 semiconductor Substances 0.000 claims 34
- 150000004767 nitrides Chemical class 0.000 claims 33
- 238000000034 method Methods 0.000 claims 5
- 229910052738 indium Inorganic materials 0.000 claims 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 4
- 230000001788 irregular Effects 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002156016A JP2003046203A (ja) | 2002-05-29 | 2002-05-29 | 窒化物半導体の成長方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002156016A JP2003046203A (ja) | 2002-05-29 | 2002-05-29 | 窒化物半導体の成長方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30425996A Division JP3424465B2 (ja) | 1996-11-15 | 1996-11-15 | 窒化物半導体素子及び窒化物半導体の成長方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003046203A JP2003046203A (ja) | 2003-02-14 |
| JP2003046203A5 true JP2003046203A5 (enExample) | 2004-11-11 |
Family
ID=19194851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002156016A Pending JP2003046203A (ja) | 2002-05-29 | 2002-05-29 | 窒化物半導体の成長方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003046203A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4762202B2 (ja) * | 2007-06-28 | 2011-08-31 | 株式会社東芝 | 半導体量子ドット素子、その製造方法、光スイッチ、半導体レーザ、および光検出器 |
| GB2456756A (en) * | 2008-01-16 | 2009-07-29 | Sharp Kk | AlInGaN Light-Emitting devices |
| KR100931483B1 (ko) * | 2009-03-06 | 2009-12-11 | 이정훈 | 발광소자 |
-
2002
- 2002-05-29 JP JP2002156016A patent/JP2003046203A/ja active Pending
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