JP2002544205A5 - - Google Patents

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Publication number
JP2002544205A5
JP2002544205A5 JP2000617198A JP2000617198A JP2002544205A5 JP 2002544205 A5 JP2002544205 A5 JP 2002544205A5 JP 2000617198 A JP2000617198 A JP 2000617198A JP 2000617198 A JP2000617198 A JP 2000617198A JP 2002544205 A5 JP2002544205 A5 JP 2002544205A5
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JP
Japan
Prior art keywords
alkyl
phenyl
substituted
coo
alkoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000617198A
Other languages
English (en)
Japanese (ja)
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JP2002544205A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2000/003812 external-priority patent/WO2000068218A1/en
Publication of JP2002544205A publication Critical patent/JP2002544205A/ja
Publication of JP2002544205A5 publication Critical patent/JP2002544205A5/ja
Withdrawn legal-status Critical Current

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JP2000617198A 1999-05-10 2000-04-27 新規な光開始剤及びその応用 Withdrawn JP2002544205A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP99810413 1999-05-10
EP99810413.7 1999-05-10
PCT/EP2000/003812 WO2000068218A1 (en) 1999-05-10 2000-04-27 Novel photoinitiators and their applications

Publications (2)

Publication Number Publication Date
JP2002544205A JP2002544205A (ja) 2002-12-24
JP2002544205A5 true JP2002544205A5 (https=) 2007-08-23

Family

ID=8242821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000617198A Withdrawn JP2002544205A (ja) 1999-05-10 2000-04-27 新規な光開始剤及びその応用

Country Status (8)

Country Link
US (1) US6673850B1 (https=)
EP (1) EP1177182B1 (https=)
JP (1) JP2002544205A (https=)
KR (1) KR100698799B1 (https=)
AT (1) ATE346847T1 (https=)
AU (1) AU4752200A (https=)
DE (1) DE60032131T2 (https=)
WO (1) WO2000068218A1 (https=)

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EP1241196A3 (en) * 2001-03-12 2002-11-20 Ciba SC Holding AG ROMP with alkoxy ether groups
MXPA02002378A (es) 2001-03-12 2002-09-24 Ciba Sc Holding Ag "romp con grupos alcoxi eter".
US7237893B2 (en) 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
AU2004262823A1 (en) * 2003-08-08 2005-02-17 Calhoun Vision Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
US7141354B2 (en) 2003-09-30 2006-11-28 Dai Nippon Printing Co., Ltd. Photo radical generator, photo sensitive resin composition and article
JP4504142B2 (ja) * 2003-09-30 2010-07-14 大日本印刷株式会社 光ラジカル発生剤、感光性樹脂組成物及び、物品
US7713628B2 (en) * 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
EP2824653B1 (en) 2006-07-14 2016-06-29 Dexerials Corporation Resin composition and display apparatus
FR2909093B1 (fr) * 2006-11-28 2012-07-13 Arkema France Memoire optique 3d comprenant un copolymere a blocs contenant un monomere photoactif porteur d'un groupement photoisomerisable.
JP2009186958A (ja) * 2007-04-09 2009-08-20 Sony Chemical & Information Device Corp 画像表示装置
JP5401824B2 (ja) 2007-04-09 2014-01-29 デクセリアルズ株式会社 画像表示装置
JP2009186957A (ja) * 2007-04-09 2009-08-20 Sony Chemical & Information Device Corp 樹脂組成物及び表示装置
JP5470735B2 (ja) * 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
GB0708531D0 (en) * 2007-05-03 2007-06-13 Fujifilm Imaging Colorants Ltd Process, compound, ink and use
KR100825420B1 (ko) * 2007-10-24 2008-04-29 주식회사 코오롱 자외선 및 열 경화형 액정디스플레이 패널용 접착제의제조방법
CN101320208B (zh) * 2008-07-21 2011-06-01 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
JP4816814B2 (ja) * 2009-06-29 2011-11-16 Dic株式会社 マイケル付加反応物及び活性エネルギー線硬化性組成物
WO2011024557A1 (ja) * 2009-08-26 2011-03-03 Jsr株式会社 新規化合物、その製造方法、この新規化合物を含有する感放射線性組成物及び硬化膜
WO2011119272A2 (en) * 2010-03-22 2011-09-29 Henkel Corporation Macro-photoinitiators and curable compositions thereof
US8022243B1 (en) * 2010-05-24 2011-09-20 Chitec Technology Co. Ltd. Low odour oligomeric photoinitiator and method of making the same
ES2587585T3 (es) * 2014-03-20 2016-10-25 F.I.S.- Fabbrica Italiana Sintetici S.P.A. Procedimiento para la preparación de intermedios clave de omarigliptina
KR102435111B1 (ko) 2014-10-27 2022-08-22 씨테크 어드히시브스 엘엘씨 Uv 경화성 감압 접착제(psa) 또는 단계화 가능한 psa 시스템을 이용한 조립 방법
EP3601213B1 (en) 2017-03-31 2022-05-11 Coloplast A/S Acrylamide photoinitiators
CN107569403B (zh) * 2017-08-02 2020-05-22 珠海市傲博化妆品有限公司 一种可酒精卸除的甲油胶及其制备方法
BR112020002377A2 (pt) * 2017-08-17 2020-09-01 Coloplast A/S revestimento polimérico, métodos para sintetizar um revestimento polimérico e para revestir um cateter urinário, uso do revestimento polimérico, cateter urinário intermitente, e, kit.
CN107793503A (zh) * 2017-09-28 2018-03-13 大连天源基化学有限公司 一种紫外光引发剂及其合成方法
US11325304B2 (en) * 2018-10-26 2022-05-10 Continuous Composites Inc. System and method for additive manufacturing
KR102446362B1 (ko) 2019-10-15 2022-09-21 삼성에스디아이 주식회사 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법
CN114591452B (zh) * 2022-03-14 2023-10-17 内蒙古扬帆新材料有限公司 一种含有α-氨基酮多官能化大分子光引发剂及其制造方法和应用
CN114591241B (zh) * 2022-03-14 2024-02-13 内蒙古扬帆新材料有限公司 一种含有吡唑啉和α-氨基酮的分子内敏化大分子光引发剂及其制备方法和应用

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DE3738567A1 (de) * 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
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FR2697840B1 (fr) * 1992-11-10 1994-12-02 Rhone Poulenc Chimie Utilisation de diènes comme agent de transfert lors de la préparation de polymères.
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TW328535B (en) * 1993-07-02 1998-03-21 Novartis Ag Functional photoinitiators and their manufacture
US5506279A (en) 1993-10-13 1996-04-09 Minnesota Mining And Manufacturing Company Acrylamido functional disubstituted acetyl aryl ketone photoinitiators
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TW353086B (en) * 1994-12-30 1999-02-21 Novartis Ag Method for multistep coating of a surface
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
TW452575B (en) * 1996-12-06 2001-09-01 Ciba Sc Holding Ag New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
FR2770219A1 (fr) 1997-10-24 1999-04-30 Atochem Elf Sa Procede de fabrication de copolymeres a architecture controlee a l'aide d'amorceurs radicalaires fonctionnels en polymerisation radicalaire vivante, et composes amorceurs et copolymeres correspondants
AU4363999A (en) 1998-05-29 1999-12-20 Ciba Specialty Chemicals Holding Inc. Novel photoinitiators and their applications

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