KR100698799B1 - 신규한 광개시제 및 블록 공중합체 - Google Patents

신규한 광개시제 및 블록 공중합체 Download PDF

Info

Publication number
KR100698799B1
KR100698799B1 KR1020017014326A KR20017014326A KR100698799B1 KR 100698799 B1 KR100698799 B1 KR 100698799B1 KR 1020017014326 A KR1020017014326 A KR 1020017014326A KR 20017014326 A KR20017014326 A KR 20017014326A KR 100698799 B1 KR100698799 B1 KR 100698799B1
Authority
KR
South Korea
Prior art keywords
alkyl
phenyl
substituted
formula
coo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020017014326A
Other languages
English (en)
Korean (ko)
Other versions
KR20010113921A (ko
Inventor
히토시 야마토
마사키 오와
도시카게 아사쿠라
아키라 마쓰모토
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 시바 스페셜티 케미칼스 홀딩 인크.
Publication of KR20010113921A publication Critical patent/KR20010113921A/ko
Application granted granted Critical
Publication of KR100698799B1 publication Critical patent/KR100698799B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/54—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and unsaturated
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F295/00—Macromolecular compounds obtained by polymerisation using successively different catalyst types without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D153/02—Vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C09J153/02—Vinyl aromatic monomers and conjugated dienes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR1020017014326A 1999-05-10 2000-04-27 신규한 광개시제 및 블록 공중합체 Expired - Fee Related KR100698799B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99810413 1999-05-10
EP99810413.7 1999-05-10

Publications (2)

Publication Number Publication Date
KR20010113921A KR20010113921A (ko) 2001-12-28
KR100698799B1 true KR100698799B1 (ko) 2007-03-26

Family

ID=8242821

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017014326A Expired - Fee Related KR100698799B1 (ko) 1999-05-10 2000-04-27 신규한 광개시제 및 블록 공중합체

Country Status (8)

Country Link
US (1) US6673850B1 (https=)
EP (1) EP1177182B1 (https=)
JP (1) JP2002544205A (https=)
KR (1) KR100698799B1 (https=)
AT (1) ATE346847T1 (https=)
AU (1) AU4752200A (https=)
DE (1) DE60032131T2 (https=)
WO (1) WO2000068218A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011119272A3 (en) * 2010-03-22 2012-01-05 Henkel Corporation Macro-photoinitiators and curable compositions thereof

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1241196A3 (en) * 2001-03-12 2002-11-20 Ciba SC Holding AG ROMP with alkoxy ether groups
MXPA02002378A (es) 2001-03-12 2002-09-24 Ciba Sc Holding Ag "romp con grupos alcoxi eter".
US7237893B2 (en) 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
AU2004262823A1 (en) * 2003-08-08 2005-02-17 Calhoun Vision Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
US7141354B2 (en) 2003-09-30 2006-11-28 Dai Nippon Printing Co., Ltd. Photo radical generator, photo sensitive resin composition and article
JP4504142B2 (ja) * 2003-09-30 2010-07-14 大日本印刷株式会社 光ラジカル発生剤、感光性樹脂組成物及び、物品
US7713628B2 (en) * 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
EP2824653B1 (en) 2006-07-14 2016-06-29 Dexerials Corporation Resin composition and display apparatus
FR2909093B1 (fr) * 2006-11-28 2012-07-13 Arkema France Memoire optique 3d comprenant un copolymere a blocs contenant un monomere photoactif porteur d'un groupement photoisomerisable.
JP2009186958A (ja) * 2007-04-09 2009-08-20 Sony Chemical & Information Device Corp 画像表示装置
JP5401824B2 (ja) 2007-04-09 2014-01-29 デクセリアルズ株式会社 画像表示装置
JP2009186957A (ja) * 2007-04-09 2009-08-20 Sony Chemical & Information Device Corp 樹脂組成物及び表示装置
JP5470735B2 (ja) * 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
GB0708531D0 (en) * 2007-05-03 2007-06-13 Fujifilm Imaging Colorants Ltd Process, compound, ink and use
KR100825420B1 (ko) * 2007-10-24 2008-04-29 주식회사 코오롱 자외선 및 열 경화형 액정디스플레이 패널용 접착제의제조방법
CN101320208B (zh) * 2008-07-21 2011-06-01 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
JP4816814B2 (ja) * 2009-06-29 2011-11-16 Ｄｉｃ株式会社 マイケル付加反応物及び活性エネルギー線硬化性組成物
WO2011024557A1 (ja) * 2009-08-26 2011-03-03 Jsr株式会社 新規化合物、その製造方法、この新規化合物を含有する感放射線性組成物及び硬化膜
US8022243B1 (en) * 2010-05-24 2011-09-20 Chitec Technology Co. Ltd. Low odour oligomeric photoinitiator and method of making the same
ES2587585T3 (es) * 2014-03-20 2016-10-25 F.I.S.- Fabbrica Italiana Sintetici S.P.A. Procedimiento para la preparación de intermedios clave de omarigliptina
KR102435111B1 (ko) 2014-10-27 2022-08-22 씨테크 어드히시브스 엘엘씨 Uv 경화성 감압 접착제(psa) 또는 단계화 가능한 psa 시스템을 이용한 조립 방법
EP3601213B1 (en) 2017-03-31 2022-05-11 Coloplast A/S Acrylamide photoinitiators
CN107569403B (zh) * 2017-08-02 2020-05-22 珠海市傲博化妆品有限公司 一种可酒精卸除的甲油胶及其制备方法
BR112020002377A2 (pt) * 2017-08-17 2020-09-01 Coloplast A/S revestimento polimérico, métodos para sintetizar um revestimento polimérico e para revestir um cateter urinário, uso do revestimento polimérico, cateter urinário intermitente, e, kit.
CN107793503A (zh) * 2017-09-28 2018-03-13 大连天源基化学有限公司 一种紫外光引发剂及其合成方法
US11325304B2 (en) * 2018-10-26 2022-05-10 Continuous Composites Inc. System and method for additive manufacturing
KR102446362B1 (ko) 2019-10-15 2022-09-21 삼성에스디아이 주식회사 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법
CN114591452B (zh) * 2022-03-14 2023-10-17 内蒙古扬帆新材料有限公司 一种含有α-氨基酮多官能化大分子光引发剂及其制造方法和应用
CN114591241B (zh) * 2022-03-14 2024-02-13 内蒙古扬帆新材料有限公司 一种含有吡唑啉和α-氨基酮的分子内敏化大分子光引发剂及其制备方法和应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0088050B1 (de) 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
US4559371A (en) * 1983-02-18 1985-12-17 Ciba Geigy Corporation Photocurable colored compositions employing alpha-amino phenone initiator
GB8312721D0 (en) * 1983-05-09 1983-06-15 Vickers Plc Photoinitiators
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3738567A1 (de) * 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
EP0284561B1 (de) * 1987-03-26 1993-05-12 Ciba-Geigy Ag Neue alpha-Aminoacetophenone als Photoinitiatoren
EP0302831B1 (en) * 1987-08-05 1993-05-12 Ciba-Geigy Ag Compounds
US5264533A (en) * 1988-06-16 1993-11-23 Basf Aktiengesellschaft Benzophenone derivatives and their preparation
FR2697840B1 (fr) * 1992-11-10 1994-12-02 Rhone Poulenc Chimie Utilisation de diènes comme agent de transfert lors de la préparation de polymères.
WO1994029355A1 (en) * 1993-06-04 1994-12-22 Henkel Corporation Citral acetal ethers of alpha-hydroxy phenyl ketones and polymerizable compositions
TW328535B (en) * 1993-07-02 1998-03-21 Novartis Ag Functional photoinitiators and their manufacture
US5506279A (en) 1993-10-13 1996-04-09 Minnesota Mining And Manufacturing Company Acrylamido functional disubstituted acetyl aryl ketone photoinitiators
FI972737A7 (fi) * 1994-12-30 1997-08-27 Novartis Ag Möhkälepolymeereihin perustavat polymeerit
TW353086B (en) * 1994-12-30 1999-02-21 Novartis Ag Method for multistep coating of a surface
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
TW452575B (en) * 1996-12-06 2001-09-01 Ciba Sc Holding Ag New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
FR2770219A1 (fr) 1997-10-24 1999-04-30 Atochem Elf Sa Procede de fabrication de copolymeres a architecture controlee a l'aide d'amorceurs radicalaires fonctionnels en polymerisation radicalaire vivante, et composes amorceurs et copolymeres correspondants
AU4363999A (en) 1998-05-29 1999-12-20 Ciba Specialty Chemicals Holding Inc. Novel photoinitiators and their applications

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011119272A3 (en) * 2010-03-22 2012-01-05 Henkel Corporation Macro-photoinitiators and curable compositions thereof
US8748503B2 (en) 2010-03-22 2014-06-10 Henkel US IP LLC Macro-photoinitiators and curable compositions thereof
KR101437751B1 (ko) 2010-03-22 2014-09-03 헨켈 유에스 아이피 엘엘씨 거대-광개시제 및 그의 경화성 조성물

Also Published As

Publication number Publication date
EP1177182B1 (en) 2006-11-29
US6673850B1 (en) 2004-01-06
DE60032131T2 (de) 2007-10-25
ATE346847T1 (de) 2006-12-15
EP1177182A1 (en) 2002-02-06
KR20010113921A (ko) 2001-12-28
AU4752200A (en) 2000-11-21
WO2000068218A1 (en) 2000-11-16
DE60032131D1 (de) 2007-01-11
JP2002544205A (ja) 2002-12-24

Similar Documents

Publication Publication Date Title
KR100698799B1 (ko) 신규한 광개시제 및 블록 공중합체
BE1012647A5 (fr) Compose photo-initiateur, compositions le contenant et leurs utilisations.
EP0956280B1 (en) Non-volatile phenylglyoxalic esters
ES2798135T3 (es) Fotoiniciadores policíclicos
KR100591030B1 (ko) 옥심 유도체를 포함하는 광중합성 조성물
AU720186B2 (en) Molecular complex compounds as photoinitiators
BE1012721A5 (fr) Compose photo-initiateur, composition le contenant, et leurs utilisations.
EP1086145B1 (en) Photoinitiators and their applications
NO309571B1 (no) Alkylfenylbisacyl-fosfinoksyder, fotoinitiatorblandinger og fotopolymeriserbare sammensetninger samt anvendelse herav
JP2001270894A (ja) 有機金属モノアシルアリールホスフィン類
CN113518805B (zh) 光引发剂
US6361925B1 (en) Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides
EP0896587A1 (en) Polymerisable composition
EP1108723B1 (en) Organosilyl radical generators and their applications
JP2001220396A (ja) 新規なオルガノシリル遊離基生成剤及びそれらの適用
DE60000476T2 (de) Organosilylradikalbildner und deren Anwendung
KR19980063821A (ko) 신규 α-아미노아세토페논 광개시제

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R15-X000 Change to inventor requested

St.27 status event code: A-3-3-R10-R15-oth-X000

R16-X000 Change to inventor recorded

St.27 status event code: A-3-3-R10-R16-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20100317

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20100317

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000