JP2002539003A5 - - Google Patents
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- Publication number
- JP2002539003A5 JP2002539003A5 JP2000605231A JP2000605231A JP2002539003A5 JP 2002539003 A5 JP2002539003 A5 JP 2002539003A5 JP 2000605231 A JP2000605231 A JP 2000605231A JP 2000605231 A JP2000605231 A JP 2000605231A JP 2002539003 A5 JP2002539003 A5 JP 2002539003A5
- Authority
- JP
- Japan
- Prior art keywords
- zinc oxide
- doped zinc
- oxide layer
- target
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 22
- 238000000034 method Methods 0.000 description 15
- 239000011787 zinc oxide Substances 0.000 description 11
- 238000004544 sputter deposition Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/271,656 | 1999-03-17 | ||
| US09/271,656 US6517687B1 (en) | 1999-03-17 | 1999-03-17 | Ultraviolet filters with enhanced weatherability and method of making |
| PCT/US2000/003076 WO2000055654A1 (en) | 1999-03-17 | 2000-02-07 | Ultraviolet filters with enhanced weatherability and method of making |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002539003A JP2002539003A (ja) | 2002-11-19 |
| JP2002539003A5 true JP2002539003A5 (enExample) | 2007-03-29 |
| JP4571315B2 JP4571315B2 (ja) | 2010-10-27 |
Family
ID=23036500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000605231A Expired - Fee Related JP4571315B2 (ja) | 1999-03-17 | 2000-02-07 | 耐候性の向上した紫外フィルター及びその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6517687B1 (enExample) |
| EP (1) | EP1163544B1 (enExample) |
| JP (1) | JP4571315B2 (enExample) |
| AT (1) | ATE493681T1 (enExample) |
| DE (1) | DE60045443D1 (enExample) |
| WO (1) | WO2000055654A1 (enExample) |
Families Citing this family (29)
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| US7018057B2 (en) | 2000-08-23 | 2006-03-28 | Vtec Technologies, Llc | Transparent plastic optical components and abrasion resistant polymer substrates and methods for making the same |
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| US7163749B2 (en) * | 2002-12-20 | 2007-01-16 | General Electric Company | Process for depositing finely dispersed organic-inorganic films and articles made therefrom |
| US6890656B2 (en) * | 2002-12-20 | 2005-05-10 | General Electric Company | High rate deposition of titanium dioxide |
| US6969953B2 (en) * | 2003-06-30 | 2005-11-29 | General Electric Company | System and method for inductive coupling of an expanding thermal plasma |
| GB0315656D0 (en) * | 2003-07-03 | 2003-08-13 | Oxonica Ltd | Metal oxide formulations |
| CA2548573C (en) * | 2003-12-26 | 2012-07-17 | Sekisui Chemical Co., Ltd. | Interlayer film for laminate glass and laminate glass |
| CN104746050B (zh) * | 2004-03-09 | 2017-05-03 | 埃克阿泰克有限责任公司 | 用于非平面基材的等离子体涂覆体系 |
| CN1965104A (zh) * | 2004-03-09 | 2007-05-16 | 埃克阿泰克有限责任公司 | 膨胀式热等离子沉积系统 |
| US7504156B2 (en) * | 2004-04-15 | 2009-03-17 | Avery Dennison Corporation | Dew resistant coatings |
| DE102004037603B3 (de) * | 2004-08-03 | 2005-10-27 | Atlas Material Testing Technology Gmbh | Regelung der UV-Strahlungsquellen einer Bewitterungsvorrichtung auf der Basis der gemittelten Strahlungsintensität |
| ATE544878T1 (de) * | 2004-08-06 | 2012-02-15 | Applied Materials Gmbh & Co Kg | Vorrichtung und verfahren für die herstellung von gasundurchlässigen schichten |
| KR20070012224A (ko) * | 2005-07-22 | 2007-01-25 | 도시바 라이텍쿠 가부시키가이샤 | 자외선 차단 재료, 자외선 차단 가시 선택 투과 필터, 가시선택 투과 수지 재료, 광원 및 조명 장치 |
| US8216679B2 (en) | 2005-07-27 | 2012-07-10 | Exatec Llc | Glazing system for vehicle tops and windows |
| US7883632B2 (en) * | 2006-03-22 | 2011-02-08 | Tokyo Electron Limited | Plasma processing method |
| JP2008105313A (ja) * | 2006-10-26 | 2008-05-08 | Stanley Electric Co Ltd | ハードコート構造を備えた透明体、およびハードコート構造 |
| US7772749B2 (en) * | 2007-05-01 | 2010-08-10 | General Electric Company | Wavelength filtering coating for high temperature lamps |
| TWI362530B (en) * | 2008-02-26 | 2012-04-21 | Au Optronics Corp | Pixel unit, liquid crystal display panel, electro-optical apparatus, and methods of manufacturing the same |
| ES2360777B1 (es) * | 2009-01-30 | 2012-05-03 | Nematia Ingenieria Integral, S.L. | Reflector solar y procedimiento de fabricación. |
| AU2010211053A1 (en) * | 2009-02-04 | 2010-08-12 | Heliovolt Corporation | Method of forming an indium-containing transparent conductive oxide film, metal targets used in the method and photovoltaic devices utilizing said films |
| JP5286143B2 (ja) * | 2009-04-15 | 2013-09-11 | 株式会社アルバック | 硬質化樹脂基板、窓ガラス代替物 |
| US8043954B1 (en) | 2010-03-30 | 2011-10-25 | Primestar Solar, Inc. | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device |
| US8525019B2 (en) | 2010-07-01 | 2013-09-03 | Primestar Solar, Inc. | Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules |
| JP5709707B2 (ja) * | 2011-03-25 | 2015-04-30 | 富士フイルム株式会社 | 熱線遮蔽材 |
| JP5788236B2 (ja) * | 2011-06-15 | 2015-09-30 | 株式会社アルバック | 封止膜形成方法、リチウム二次電池の製造方法 |
| EP2747921B1 (en) * | 2011-08-26 | 2017-11-01 | Exatec, LLC. | Organic resin laminate, methods of making and using the same, and articles comprising the same |
| JP2016087841A (ja) * | 2014-10-31 | 2016-05-23 | 正尚 曹 | 複合混合物の製造方法 |
| TWI634221B (zh) * | 2017-09-01 | 2018-09-01 | 行政院原子能委員會核能硏究所 | 電化學元件之製造方法 |
| US10429673B2 (en) * | 2017-09-11 | 2019-10-01 | Quantum Innovations, Inc. | High energy visible light absorbing material for ophthalmic substrate and application method |
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| US3313777A (en) | 1959-12-18 | 1967-04-11 | Eastman Kodak Co | Linear polyesters and polyester-amides from 2, 2, 4, 4-tetraalkyl-1, 3-cyclobutanediols |
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| US6136161A (en) * | 1993-11-12 | 2000-10-24 | Ppg Industries Ohio, Inc. | Fabrication of electrochromic device with plastic substrates |
| DE69528460T2 (de) * | 1994-06-06 | 2003-01-23 | Nippon Shokubai Co. Ltd., Osaka | Feine zinkoxid-teilchen, verfahren zu ihrer herstellung und ihre verwendung |
| JP3398829B2 (ja) * | 1994-12-13 | 2003-04-21 | 株式会社日本触媒 | 酸化亜鉛系微粒子の製造方法 |
| JPH08249929A (ja) * | 1995-03-10 | 1996-09-27 | Idemitsu Kosan Co Ltd | 座標データ入力装置の入力パネル用透明電極膜 |
| JPH0949922A (ja) * | 1995-08-10 | 1997-02-18 | Toshiba Lighting & Technol Corp | 紫外線カットフィルタおよびランプならびに照明装置 |
| JPH11513713A (ja) | 1995-10-13 | 1999-11-24 | ザ ダウ ケミカル カンパニー | コートされたプラスチック基材 |
| JPH09156022A (ja) * | 1995-12-05 | 1997-06-17 | Mitsui Toatsu Chem Inc | 透明導電性積層体 |
| US5916668A (en) * | 1995-12-22 | 1999-06-29 | Hughes Electronics Corporation | Sunshield film transparent to radio frequency energy and shielded articles |
| US6208404B1 (en) * | 1996-05-16 | 2001-03-27 | Tryonics Corporation | Black matrix |
| DE19631728A1 (de) * | 1996-08-06 | 1998-02-12 | Bayer Ag | Elektrochrome Anzeigevorrichtung |
| US6110544A (en) * | 1997-06-26 | 2000-08-29 | General Electric Company | Protective coating by high rate arc plasma deposition |
-
1999
- 1999-03-17 US US09/271,656 patent/US6517687B1/en not_active Expired - Lifetime
-
2000
- 2000-02-07 EP EP00910092A patent/EP1163544B1/en not_active Expired - Lifetime
- 2000-02-07 AT AT00910092T patent/ATE493681T1/de not_active IP Right Cessation
- 2000-02-07 JP JP2000605231A patent/JP4571315B2/ja not_active Expired - Fee Related
- 2000-02-07 WO PCT/US2000/003076 patent/WO2000055654A1/en not_active Ceased
- 2000-02-07 DE DE60045443T patent/DE60045443D1/de not_active Expired - Lifetime
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