JP2002539003A5 - - Google Patents

Download PDF

Info

Publication number
JP2002539003A5
JP2002539003A5 JP2000605231A JP2000605231A JP2002539003A5 JP 2002539003 A5 JP2002539003 A5 JP 2002539003A5 JP 2000605231 A JP2000605231 A JP 2000605231A JP 2000605231 A JP2000605231 A JP 2000605231A JP 2002539003 A5 JP2002539003 A5 JP 2002539003A5
Authority
JP
Japan
Prior art keywords
zinc oxide
doped zinc
oxide layer
target
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000605231A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002539003A (ja
JP4571315B2 (ja
Filing date
Publication date
Priority claimed from US09/271,656 external-priority patent/US6517687B1/en
Application filed filed Critical
Publication of JP2002539003A publication Critical patent/JP2002539003A/ja
Publication of JP2002539003A5 publication Critical patent/JP2002539003A5/ja
Application granted granted Critical
Publication of JP4571315B2 publication Critical patent/JP4571315B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000605231A 1999-03-17 2000-02-07 耐候性の向上した紫外フィルター及びその製造方法 Expired - Fee Related JP4571315B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/271,656 1999-03-17
US09/271,656 US6517687B1 (en) 1999-03-17 1999-03-17 Ultraviolet filters with enhanced weatherability and method of making
PCT/US2000/003076 WO2000055654A1 (en) 1999-03-17 2000-02-07 Ultraviolet filters with enhanced weatherability and method of making

Publications (3)

Publication Number Publication Date
JP2002539003A JP2002539003A (ja) 2002-11-19
JP2002539003A5 true JP2002539003A5 (enExample) 2007-03-29
JP4571315B2 JP4571315B2 (ja) 2010-10-27

Family

ID=23036500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000605231A Expired - Fee Related JP4571315B2 (ja) 1999-03-17 2000-02-07 耐候性の向上した紫外フィルター及びその製造方法

Country Status (6)

Country Link
US (1) US6517687B1 (enExample)
EP (1) EP1163544B1 (enExample)
JP (1) JP4571315B2 (enExample)
AT (1) ATE493681T1 (enExample)
DE (1) DE60045443D1 (enExample)
WO (1) WO2000055654A1 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7018057B2 (en) 2000-08-23 2006-03-28 Vtec Technologies, Llc Transparent plastic optical components and abrasion resistant polymer substrates and methods for making the same
US20040040833A1 (en) * 2002-08-27 2004-03-04 General Electric Company Apparatus and method for plasma treating an article
US7163749B2 (en) * 2002-12-20 2007-01-16 General Electric Company Process for depositing finely dispersed organic-inorganic films and articles made therefrom
US6890656B2 (en) * 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US6969953B2 (en) * 2003-06-30 2005-11-29 General Electric Company System and method for inductive coupling of an expanding thermal plasma
GB0315656D0 (en) * 2003-07-03 2003-08-13 Oxonica Ltd Metal oxide formulations
CA2548573C (en) * 2003-12-26 2012-07-17 Sekisui Chemical Co., Ltd. Interlayer film for laminate glass and laminate glass
CN104746050B (zh) * 2004-03-09 2017-05-03 埃克阿泰克有限责任公司 用于非平面基材的等离子体涂覆体系
CN1965104A (zh) * 2004-03-09 2007-05-16 埃克阿泰克有限责任公司 膨胀式热等离子沉积系统
US7504156B2 (en) * 2004-04-15 2009-03-17 Avery Dennison Corporation Dew resistant coatings
DE102004037603B3 (de) * 2004-08-03 2005-10-27 Atlas Material Testing Technology Gmbh Regelung der UV-Strahlungsquellen einer Bewitterungsvorrichtung auf der Basis der gemittelten Strahlungsintensität
ATE544878T1 (de) * 2004-08-06 2012-02-15 Applied Materials Gmbh & Co Kg Vorrichtung und verfahren für die herstellung von gasundurchlässigen schichten
KR20070012224A (ko) * 2005-07-22 2007-01-25 도시바 라이텍쿠 가부시키가이샤 자외선 차단 재료, 자외선 차단 가시 선택 투과 필터, 가시선택 투과 수지 재료, 광원 및 조명 장치
US8216679B2 (en) 2005-07-27 2012-07-10 Exatec Llc Glazing system for vehicle tops and windows
US7883632B2 (en) * 2006-03-22 2011-02-08 Tokyo Electron Limited Plasma processing method
JP2008105313A (ja) * 2006-10-26 2008-05-08 Stanley Electric Co Ltd ハードコート構造を備えた透明体、およびハードコート構造
US7772749B2 (en) * 2007-05-01 2010-08-10 General Electric Company Wavelength filtering coating for high temperature lamps
TWI362530B (en) * 2008-02-26 2012-04-21 Au Optronics Corp Pixel unit, liquid crystal display panel, electro-optical apparatus, and methods of manufacturing the same
ES2360777B1 (es) * 2009-01-30 2012-05-03 Nematia Ingenieria Integral, S.L. Reflector solar y procedimiento de fabricación.
AU2010211053A1 (en) * 2009-02-04 2010-08-12 Heliovolt Corporation Method of forming an indium-containing transparent conductive oxide film, metal targets used in the method and photovoltaic devices utilizing said films
JP5286143B2 (ja) * 2009-04-15 2013-09-11 株式会社アルバック 硬質化樹脂基板、窓ガラス代替物
US8043954B1 (en) 2010-03-30 2011-10-25 Primestar Solar, Inc. Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device
US8525019B2 (en) 2010-07-01 2013-09-03 Primestar Solar, Inc. Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules
JP5709707B2 (ja) * 2011-03-25 2015-04-30 富士フイルム株式会社 熱線遮蔽材
JP5788236B2 (ja) * 2011-06-15 2015-09-30 株式会社アルバック 封止膜形成方法、リチウム二次電池の製造方法
EP2747921B1 (en) * 2011-08-26 2017-11-01 Exatec, LLC. Organic resin laminate, methods of making and using the same, and articles comprising the same
JP2016087841A (ja) * 2014-10-31 2016-05-23 正尚 曹 複合混合物の製造方法
TWI634221B (zh) * 2017-09-01 2018-09-01 行政院原子能委員會核能硏究所 電化學元件之製造方法
US10429673B2 (en) * 2017-09-11 2019-10-01 Quantum Innovations, Inc. High energy visible light absorbing material for ophthalmic substrate and application method

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3220973A (en) 1965-11-30 Cross-linked polycarbonate resinous compositions
US3312659A (en) 1967-04-04 Catalytic preparation of polycarbon- ates from bisphenol and a carbonate precursor
US3161615A (en) 1957-02-05 1964-12-15 Gen Electric Resinous copolymeric polycarbonate of a mixture of dihydric phenols
US3313777A (en) 1959-12-18 1967-04-11 Eastman Kodak Co Linear polyesters and polyester-amides from 2, 2, 4, 4-tetraalkyl-1, 3-cyclobutanediols
US3312660A (en) 1962-07-03 1967-04-04 Union Carbide Corp Process for preparing polycarbonates by self-condensation of bisphenol dichloroformate
US3576656A (en) 1968-03-11 1971-04-27 Nasa Stabilized zinc oxide coating compositions
US3666614A (en) 1969-06-24 1972-05-30 Union Carbide Corp Glass-polycarbonate resin laminates
US3989672A (en) 1972-10-30 1976-11-02 General Electric Company Process for preparing aromatic carbonate polymers
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
US4210699A (en) 1978-11-01 1980-07-01 General Electric Company Abrasion resistant silicone coated polycarbonate article
US4224378A (en) 1978-11-01 1980-09-23 General Electric Company Abrasion resistant organopolysiloxane coated polycarbonate article
US4200681A (en) 1978-11-13 1980-04-29 General Electric Company Glass coated polycarbonate articles
US4194038A (en) 1979-01-25 1980-03-18 Allied Chemical Corporation Poly(ester-carbonates) from dicarboxylic acid chlorides
US4242381A (en) 1979-04-18 1980-12-30 General Electric Company Method of providing a polycarbonate article with a uniform and durable silica filled organopolysiloxane coating
US4454275A (en) 1981-02-20 1984-06-12 General Electric Company Flame retardant copolyester-carbonate compositions
US4560577A (en) * 1984-09-14 1985-12-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Oxidation protection coatings for polymers
JPH0734332B2 (ja) * 1986-03-12 1995-04-12 株式会社ト−ビ 透明導電性フイルムの製造方法
US4799745A (en) * 1986-06-30 1989-01-24 Southwall Technologies, Inc. Heat reflecting composite films and glazing products containing the same
US4842941A (en) 1987-04-06 1989-06-27 General Electric Company Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby
NL8701530A (nl) 1987-06-30 1989-01-16 Stichting Fund Ond Material Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze.
EP0299687B1 (en) * 1987-07-17 1993-06-23 LUCAS INDUSTRIES public limited company Transparencies
WO1989001957A1 (en) 1987-08-24 1989-03-09 General Electric Company Abrasion-resistant plastic articles and method for making them
US5051308A (en) 1987-08-24 1991-09-24 General Electric Company Abrasion-resistant plastic articles
US4927704A (en) 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US4815962A (en) * 1987-12-11 1989-03-28 Polaroid Corporation Process for coating synthetic optical substrates
US5355245A (en) * 1988-02-12 1994-10-11 Donnelly Corporation Ultraviolet protected electrochemichromic rearview mirror
DE3821131A1 (de) 1988-06-23 1989-12-28 Bayer Ag Verfahren zur herstellung von kunststofformkoerpern mit verbesserter witterungsbestaendigkeit
JPH0266518A (ja) * 1988-09-01 1990-03-06 Sumitomo Bakelite Co Ltd 位相膜一体型透明導電性フィルム
US4948485A (en) 1988-11-23 1990-08-14 Plasmacarb Inc. Cascade arc plasma torch and a process for plasma polymerization
AU5437790A (en) * 1989-04-11 1990-11-05 Andus Corporation Transparent conductive coatings
BR9007196A (pt) 1989-12-22 1991-12-10 Gen Electric Composicao
US5094693A (en) * 1990-02-20 1992-03-10 International Lead Zinc Research Organization, Inc. Doped zinc oxide-based pigment
US5270858A (en) * 1990-10-11 1993-12-14 Viratec Thin Films Inc D.C. reactively sputtered antireflection coatings
EP0585239B1 (en) 1991-02-05 1998-09-23 Sun Smart, Inc. Visibly transparent uv sunblock agents and methods of making same
JP3203437B2 (ja) * 1991-09-13 2001-08-27 電気化学工業株式会社 耐摩耗性プラスチック成形物及びその製造方法
US5352725A (en) * 1991-09-27 1994-10-04 Kerr-Mcgee Chemical Corporation Attenuation of polymer substrate degradation due to ultraviolet radiation
US5156882A (en) 1991-12-30 1992-10-20 General Electric Company Method of preparing UV absorbant and abrasion-resistant transparent plastic articles
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5480722A (en) 1992-07-03 1996-01-02 Asahi Glass Company Ltd. Ultraviolet ray absorbent glass and method for preparing the same
DE4235199C1 (enExample) 1992-10-19 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4236264C1 (enExample) 1992-10-27 1993-09-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De
US5298587A (en) 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method
US5463013A (en) 1993-04-27 1995-10-31 Teijin Chemicals, Ltd. Modified aromatic polycarbonate resin, modified aromatic polyester carbonate resin, modified polyarylate, and molded articles therefrom
US5510173A (en) * 1993-08-20 1996-04-23 Southwall Technologies Inc. Multiple layer thin films with improved corrosion resistance
US5433786A (en) 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
US6136161A (en) * 1993-11-12 2000-10-24 Ppg Industries Ohio, Inc. Fabrication of electrochromic device with plastic substrates
DE69528460T2 (de) * 1994-06-06 2003-01-23 Nippon Shokubai Co. Ltd., Osaka Feine zinkoxid-teilchen, verfahren zu ihrer herstellung und ihre verwendung
JP3398829B2 (ja) * 1994-12-13 2003-04-21 株式会社日本触媒 酸化亜鉛系微粒子の製造方法
JPH08249929A (ja) * 1995-03-10 1996-09-27 Idemitsu Kosan Co Ltd 座標データ入力装置の入力パネル用透明電極膜
JPH0949922A (ja) * 1995-08-10 1997-02-18 Toshiba Lighting & Technol Corp 紫外線カットフィルタおよびランプならびに照明装置
JPH11513713A (ja) 1995-10-13 1999-11-24 ザ ダウ ケミカル カンパニー コートされたプラスチック基材
JPH09156022A (ja) * 1995-12-05 1997-06-17 Mitsui Toatsu Chem Inc 透明導電性積層体
US5916668A (en) * 1995-12-22 1999-06-29 Hughes Electronics Corporation Sunshield film transparent to radio frequency energy and shielded articles
US6208404B1 (en) * 1996-05-16 2001-03-27 Tryonics Corporation Black matrix
DE19631728A1 (de) * 1996-08-06 1998-02-12 Bayer Ag Elektrochrome Anzeigevorrichtung
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition

Similar Documents

Publication Publication Date Title
JP2002539003A5 (enExample)
KR100691168B1 (ko) 유전 장벽층 필름
TW573298B (en) Method to produce a hybrid-disk and said hybrid-disk
KR970003544A (ko) 개선된 티타늄 함유 방지층을 형성하기 위한 공정
TW200507118A (en) Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
JPH02296784A (ja) 機械的及び熱的劣化に対するセラミック体の保護方法
JP2003215309A (ja) 反射防止フィルム及び反射防止層付きプラスチック基板
WO2004097063A3 (en) Method for producing silicon oxide film and method for producing optical multilayer film
JP2004351832A (ja) 透明ガスバリア積層フィルム
JP2006297868A (ja) 金属積層体
JPWO2016190284A6 (ja) ガスバリア性フィルムおよびその製造方法
JPWO2016190284A1 (ja) ガスバリア性フィルムおよびその製造方法
JP4580636B2 (ja) 成膜装置および成膜方法
CN115505882B (zh) 氮化物结合氧化物双涂层的制备方法及涂层刀具
Tay et al. Growth conditions and properties of tetrahedral amorphous carbon films
JPH02194944A (ja) レトルト耐性を有する透明バリアー複合フィルム
Taga Recent progress of nanotechnologies of thin films for industrial applications
WO2005059197A3 (de) Verfahren und vorrichtung zum magnetronsputtern
JP4092958B2 (ja) Ito膜、ito膜材料及びito膜の形成方法
JP2004084027A (ja) 機能体及びその形成方法
FR2843130A1 (fr) Procede de revetement de la surface d'un materiau metallique, dispositif pour sa mise en oeuvre et produit ainsi obtenu
JP3506782B2 (ja) 光学薄膜の製造方法
Usami et al. Preparation of flexible and heat-resisting conductive transparent film by the pyrosol process
KR100974171B1 (ko) 투명산화물박막과 실리콘계화합물을 포함하는 투습방지막이구비된 기판 및 이의 제조방법
Kok et al. Properties of pulsed magnetron sputtered TiO2 coatings grown under different magnetron configurations and power deliver modes