JP2002528905A - 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減 - Google Patents
光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減Info
- Publication number
- JP2002528905A JP2002528905A JP2000578676A JP2000578676A JP2002528905A JP 2002528905 A JP2002528905 A JP 2002528905A JP 2000578676 A JP2000578676 A JP 2000578676A JP 2000578676 A JP2000578676 A JP 2000578676A JP 2002528905 A JP2002528905 A JP 2002528905A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- rotation
- optical device
- axis
- sleeve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 1212
- 230000007547 defect Effects 0.000 title claims abstract description 101
- 230000000694 effects Effects 0.000 title claims description 70
- 230000007246 mechanism Effects 0.000 claims abstract description 101
- 238000000034 method Methods 0.000 claims description 147
- 230000002093 peripheral effect Effects 0.000 claims description 37
- 230000009955 peripheral mechanism Effects 0.000 claims description 20
- 230000005540 biological transmission Effects 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 11
- 238000012935 Averaging Methods 0.000 claims description 9
- 238000004458 analytical method Methods 0.000 claims description 9
- 230000036316 preload Effects 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 9
- 238000010191 image analysis Methods 0.000 claims description 8
- 238000005452 bending Methods 0.000 claims description 6
- 230000001360 synchronised effect Effects 0.000 claims description 6
- 239000013013 elastic material Substances 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 230000003213 activating effect Effects 0.000 claims description 4
- 238000009987 spinning Methods 0.000 claims 1
- 210000003644 lens cell Anatomy 0.000 description 27
- 238000004519 manufacturing process Methods 0.000 description 26
- 238000010586 diagram Methods 0.000 description 24
- 238000005259 measurement Methods 0.000 description 24
- 238000013461 design Methods 0.000 description 14
- 239000011521 glass Substances 0.000 description 14
- 230000000712 assembly Effects 0.000 description 12
- 238000000429 assembly Methods 0.000 description 12
- 230000010354 integration Effects 0.000 description 12
- 230000004075 alteration Effects 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 230000008901 benefit Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000013598 vector Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 238000003908 quality control method Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 210000004027 cell Anatomy 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000012937 correction Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 206010010071 Coma Diseases 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001454 recorded image Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
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- 238000013519 translation Methods 0.000 description 2
- 241000226585 Antennaria plantaginifolia Species 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
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- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
- G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Optical Integrated Circuits (AREA)
- Lens Barrels (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IL12677198A IL126771A0 (en) | 1998-10-26 | 1998-10-26 | Improved optical systems |
| IL126771 | 1998-10-26 | ||
| PCT/IL1999/000565 WO2000025153A2 (en) | 1998-10-26 | 1999-10-26 | Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002528905A true JP2002528905A (ja) | 2002-09-03 |
| JP2002528905A5 JP2002528905A5 (enExample) | 2006-01-05 |
Family
ID=11072073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000578676A Pending JP2002528905A (ja) | 1998-10-26 | 1999-10-26 | 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6807022B1 (enExample) |
| EP (1) | EP1208399A4 (enExample) |
| JP (1) | JP2002528905A (enExample) |
| KR (1) | KR100475658B1 (enExample) |
| AU (1) | AU6365399A (enExample) |
| HK (1) | HK1044821A1 (enExample) |
| IL (1) | IL126771A0 (enExample) |
| WO (1) | WO2000025153A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101669214B1 (ko) | 2010-12-31 | 2016-10-25 | 삼성전자주식회사 | 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치 |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL126771A0 (en) * | 1998-10-26 | 1999-08-17 | Yanowitz Shimon | Improved optical systems |
| KR100574963B1 (ko) * | 2003-12-29 | 2006-04-28 | 삼성전자주식회사 | 파장가변 레이저 장치를 구비한 광학적 임계치수 측정장치및 그 측정장치를 이용한 임계치수 측정방법 |
| US7133225B1 (en) * | 2004-10-18 | 2006-11-07 | Carl Zeiss Smt Ag | Method of manufacturing an optical system |
| JP2007199406A (ja) * | 2006-01-26 | 2007-08-09 | Fujinon Corp | 屈曲光学ユニット |
| KR20120026102A (ko) * | 2009-05-22 | 2012-03-16 | 씨8 메디센서스, 인크. | 두 쌍의 동일한 요소를 구비한, 대형 시계, 고 개구수 복합 대물 렌즈 및 이러한 복합 렌즈를 포함하는 적외선 분광기 |
| TWI432871B (zh) * | 2011-03-01 | 2014-04-01 | Altek Corp | 自動對焦鏡頭模組及其校準的方法 |
| WO2012157546A1 (ja) * | 2011-05-13 | 2012-11-22 | ローム株式会社 | プロジェクタ |
| US9760012B2 (en) * | 2011-08-04 | 2017-09-12 | Nikon Corporation | Illumination device |
| DE102011054087B4 (de) * | 2011-09-30 | 2018-08-30 | Carl Zeiss Microscopy Gmbh | Optische Bildstabilisierungsvorrichtung und optisches Beobachtungsgerät |
| US9219890B1 (en) * | 2012-08-22 | 2015-12-22 | The United States Of America As Represented By The Secretary Of The Navy | Optical surface analysis system and method |
| US10725287B2 (en) * | 2013-06-11 | 2020-07-28 | Nlight, Inc. | Image rotation compensation for multiple beam material processing |
| US10121236B2 (en) * | 2016-10-26 | 2018-11-06 | Himax Technologies Limited | Automatic alignment apparatus and associated method |
| JP6959073B2 (ja) * | 2017-08-30 | 2021-11-02 | 株式会社ディスコ | レーザー加工装置 |
| CN113544830A (zh) * | 2019-03-08 | 2021-10-22 | 科磊股份有限公司 | 偏移测量的动态改善 |
| US11551980B2 (en) * | 2019-03-08 | 2023-01-10 | Kla-Tencor Corporation | Dynamic amelioration of misregistration measurement |
| US12320629B2 (en) * | 2020-06-01 | 2025-06-03 | Lg Electronics Inc. | Thin film characteristic measuring apparatus |
| KR102524991B1 (ko) * | 2021-04-19 | 2023-04-28 | (주)이즈미디어 | 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체 |
| US12406891B2 (en) * | 2021-09-30 | 2025-09-02 | International Business Machines Corporation | Characterization of asymmetric material deposition for metrology |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US2352179A (en) | 1944-06-27 | Lens centering device | ||
| GB1147521A (en) * | 1966-07-11 | 1969-04-02 | British Scient Instr Res Ass | Lens centring apparatus |
| US3432218A (en) * | 1966-09-30 | 1969-03-11 | Goodyear Aerospace Corp | High speed mechanical variable amplitude nutating mechanism |
| US3482102A (en) * | 1967-02-20 | 1969-12-02 | Conductron Corp | Coherent optical noise suppression by optical alignment of spatial filter |
| US3533700A (en) | 1968-03-12 | 1970-10-13 | Technidyne Inc | Optical alignment methods and means utilizing coordinated laser beams and laser beam coordinating means for same |
| US3620591A (en) * | 1969-07-22 | 1971-11-16 | Atlantic Richfield Co | Optical processing of data |
| US3762821A (en) | 1971-01-25 | 1973-10-02 | Bell Telephone Labor Inc | Lens assembly |
| US3782829A (en) * | 1972-06-28 | 1974-01-01 | Bell Telephone Labor Inc | Lens alignment apparatus and method |
| US4525041A (en) * | 1982-02-24 | 1985-06-25 | Precision Grinding Limited | Arrangement for use in positioning an optical image |
| US4504110A (en) * | 1983-05-19 | 1985-03-12 | Rockwell International Corporation | Converging beam linear optical scanner |
| US4695975A (en) * | 1984-10-23 | 1987-09-22 | Profit Technology, Inc. | Multi-image communications system |
| JPH0421830A (ja) * | 1990-05-16 | 1992-01-24 | Canon Inc | カメラ用画像振れ防止アダプタ装置 |
| US5233197A (en) | 1991-07-15 | 1993-08-03 | University Of Massachusetts Medical Center | High speed digital imaging microscope |
| EP0602732A3 (en) * | 1992-12-17 | 1995-09-27 | Philips Electronics Nv | Optical system with astigmatism compensation. |
| JP3208902B2 (ja) | 1993-03-11 | 2001-09-17 | ミノルタ株式会社 | レンズ系光軸調整装置及びレンズ系光軸調整方法 |
| JP3067966B2 (ja) * | 1993-12-06 | 2000-07-24 | 松下電器産業株式会社 | 画像部品を検索する装置及びその方法 |
| US5400133A (en) | 1994-03-04 | 1995-03-21 | Xerox Corporation | Alignment method and apparatus for optical imaging systems |
| US5610771A (en) * | 1994-08-01 | 1997-03-11 | Lockheed Missiles & Space Company, Inc. | Non-deviating prism with continuously variable dispersion |
| JPH08160484A (ja) * | 1994-12-05 | 1996-06-21 | Nikon Corp | 像振れ補正装置 |
| JPH08327895A (ja) | 1995-05-26 | 1996-12-13 | Nikon Corp | 投影光学装置 |
| JPH09105973A (ja) * | 1995-10-12 | 1997-04-22 | Sony Corp | 手振れ補正光学装置 |
| US5835208A (en) | 1997-05-27 | 1998-11-10 | Raytheon Company | Apparatus to measure wedge and centering error in optical elements |
| WO1999004686A1 (en) * | 1997-07-22 | 1999-02-04 | Milner John A | Apparatus and method for language translation between patient and caregiver, and for communication with speech deficient patients |
| US6091548A (en) * | 1997-10-01 | 2000-07-18 | Raytheon Company | Optical system with two-stage aberration correction |
| US6320705B1 (en) * | 1998-01-15 | 2001-11-20 | George Dube' | Adjustable optical wedge |
| US6129435A (en) * | 1998-04-09 | 2000-10-10 | Nike, Inc. | Decentered protective eyewear |
| US6975399B2 (en) * | 1998-08-28 | 2005-12-13 | Nikon Corporation | mark position detecting apparatus |
| IL126771A0 (en) * | 1998-10-26 | 1999-08-17 | Yanowitz Shimon | Improved optical systems |
| AU2001252882A1 (en) * | 2000-02-01 | 2001-08-14 | Soquel Technology, Inc. | Single channel m x n optical fiber switch |
| US20040042094A1 (en) * | 2000-12-28 | 2004-03-04 | Tomoyuki Matsuyama | Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
| DE10209938A1 (de) * | 2002-03-06 | 2003-09-25 | Leica Microsystems | Axial verschiebbare Justierfassung für optische Bauteile sowie Verfahren zu ihrer Herstellung |
-
1998
- 1998-10-26 IL IL12677198A patent/IL126771A0/xx unknown
-
1999
- 1999-10-26 KR KR10-2001-7005174A patent/KR100475658B1/ko not_active Expired - Fee Related
- 1999-10-26 JP JP2000578676A patent/JP2002528905A/ja active Pending
- 1999-10-26 HK HK02106404.5A patent/HK1044821A1/zh unknown
- 1999-10-26 US US09/830,076 patent/US6807022B1/en not_active Expired - Fee Related
- 1999-10-26 AU AU63653/99A patent/AU6365399A/en not_active Abandoned
- 1999-10-26 WO PCT/IL1999/000565 patent/WO2000025153A2/en not_active Ceased
- 1999-10-26 EP EP99951082A patent/EP1208399A4/en not_active Withdrawn
-
2004
- 2004-07-12 US US10/888,013 patent/US20050018289A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101669214B1 (ko) | 2010-12-31 | 2016-10-25 | 삼성전자주식회사 | 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100475658B1 (ko) | 2005-03-10 |
| AU6365399A (en) | 2000-05-15 |
| WO2000025153A3 (en) | 2000-07-20 |
| WO2000025153A2 (en) | 2000-05-04 |
| KR20010089345A (ko) | 2001-10-06 |
| US6807022B1 (en) | 2004-10-19 |
| EP1208399A4 (en) | 2006-09-13 |
| US20050018289A1 (en) | 2005-01-27 |
| IL126771A0 (en) | 1999-08-17 |
| EP1208399A2 (en) | 2002-05-29 |
| HK1044821A1 (zh) | 2002-11-01 |
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