JP2002528905A - 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減 - Google Patents

光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減

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Publication number
JP2002528905A
JP2002528905A JP2000578676A JP2000578676A JP2002528905A JP 2002528905 A JP2002528905 A JP 2002528905A JP 2000578676 A JP2000578676 A JP 2000578676A JP 2000578676 A JP2000578676 A JP 2000578676A JP 2002528905 A JP2002528905 A JP 2002528905A
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JP
Japan
Prior art keywords
optical
rotation
optical device
axis
sleeve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000578676A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002528905A5 (enExample
Inventor
ヤノヴィッツ シモン
Original Assignee
シンメトリテック リミテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シンメトリテック リミテッド filed Critical シンメトリテック リミテッド
Publication of JP2002528905A publication Critical patent/JP2002528905A/ja
Publication of JP2002528905A5 publication Critical patent/JP2002528905A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Optical Integrated Circuits (AREA)
JP2000578676A 1998-10-26 1999-10-26 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減 Pending JP2002528905A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
IL126771 1998-10-26
PCT/IL1999/000565 WO2000025153A2 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Publications (2)

Publication Number Publication Date
JP2002528905A true JP2002528905A (ja) 2002-09-03
JP2002528905A5 JP2002528905A5 (enExample) 2006-01-05

Family

ID=11072073

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000578676A Pending JP2002528905A (ja) 1998-10-26 1999-10-26 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減

Country Status (8)

Country Link
US (2) US6807022B1 (enExample)
EP (1) EP1208399A4 (enExample)
JP (1) JP2002528905A (enExample)
KR (1) KR100475658B1 (enExample)
AU (1) AU6365399A (enExample)
HK (1) HK1044821A1 (enExample)
IL (1) IL126771A0 (enExample)
WO (1) WO2000025153A2 (enExample)

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KR101669214B1 (ko) 2010-12-31 2016-10-25 삼성전자주식회사 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치

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IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
KR100574963B1 (ko) * 2003-12-29 2006-04-28 삼성전자주식회사 파장가변 레이저 장치를 구비한 광학적 임계치수 측정장치및 그 측정장치를 이용한 임계치수 측정방법
US7133225B1 (en) * 2004-10-18 2006-11-07 Carl Zeiss Smt Ag Method of manufacturing an optical system
JP2007199406A (ja) * 2006-01-26 2007-08-09 Fujinon Corp 屈曲光学ユニット
WO2010135700A1 (en) * 2009-05-22 2010-11-25 C8 Medisensors Inc. Large field of view, high numerical aperture compound objective lens with two pairs of identical elements and near ir spectrometer containing two such compound lenses
TWI432871B (zh) * 2011-03-01 2014-04-01 Altek Corp 自動對焦鏡頭模組及其校準的方法
US9686388B2 (en) * 2011-05-13 2017-06-20 Rohm Co., Ltd. Projector
WO2013018799A1 (ja) 2011-08-04 2013-02-07 株式会社ニコン 照明装置
DE102011054087B4 (de) * 2011-09-30 2018-08-30 Carl Zeiss Microscopy Gmbh Optische Bildstabilisierungsvorrichtung und optisches Beobachtungsgerät
US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
US10725287B2 (en) * 2013-06-11 2020-07-28 Nlight, Inc. Image rotation compensation for multiple beam material processing
US10121236B2 (en) * 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
JP6959073B2 (ja) * 2017-08-30 2021-11-02 株式会社ディスコ レーザー加工装置
US11551980B2 (en) * 2019-03-08 2023-01-10 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
KR102950027B1 (ko) * 2020-06-01 2026-04-07 엘지전자 주식회사 박막 특성 측정장치
KR102524991B1 (ko) * 2021-04-19 2023-04-28 (주)이즈미디어 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체
US12406891B2 (en) * 2021-09-30 2025-09-02 International Business Machines Corporation Characterization of asymmetric material deposition for metrology

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101669214B1 (ko) 2010-12-31 2016-10-25 삼성전자주식회사 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치

Also Published As

Publication number Publication date
HK1044821A1 (zh) 2002-11-01
EP1208399A2 (en) 2002-05-29
WO2000025153A3 (en) 2000-07-20
US20050018289A1 (en) 2005-01-27
IL126771A0 (en) 1999-08-17
EP1208399A4 (en) 2006-09-13
WO2000025153A2 (en) 2000-05-04
KR20010089345A (ko) 2001-10-06
AU6365399A (en) 2000-05-15
KR100475658B1 (ko) 2005-03-10
US6807022B1 (en) 2004-10-19

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