IL126771A0 - Improved optical systems - Google Patents

Improved optical systems

Info

Publication number
IL126771A0
IL126771A0 IL12677198A IL12677198A IL126771A0 IL 126771 A0 IL126771 A0 IL 126771A0 IL 12677198 A IL12677198 A IL 12677198A IL 12677198 A IL12677198 A IL 12677198A IL 126771 A0 IL126771 A0 IL 126771A0
Authority
IL
Israel
Prior art keywords
optical systems
improved optical
improved
systems
optical
Prior art date
Application number
IL12677198A
Original Assignee
Yanowitz Shimon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yanowitz Shimon filed Critical Yanowitz Shimon
Priority to IL12677198A priority Critical patent/IL126771A0/en
Publication of IL126771A0 publication Critical patent/IL126771A0/en
Priority to EP99951082A priority patent/EP1208399A4/en
Priority to KR10-2001-7005174A priority patent/KR100475658B1/en
Priority to IL14252699A priority patent/IL142526A/en
Priority to US09/830,076 priority patent/US6807022B1/en
Priority to PCT/IL1999/000565 priority patent/WO2000025153A2/en
Priority to AU63653/99A priority patent/AU6365399A/en
Priority to JP2000578676A priority patent/JP2002528905A/en
Priority to HK02106404.5A priority patent/HK1044821A1/en
Priority to US10/888,013 priority patent/US20050018289A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Optical Integrated Circuits (AREA)
IL12677198A 1998-10-26 1998-10-26 Improved optical systems IL126771A0 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
EP99951082A EP1208399A4 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
KR10-2001-7005174A KR100475658B1 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
IL14252699A IL142526A (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviationsduring real time use of optical devices
US09/830,076 US6807022B1 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
PCT/IL1999/000565 WO2000025153A2 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
AU63653/99A AU6365399A (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
JP2000578676A JP2002528905A (en) 1998-10-26 1999-10-26 Realization of circular symmetry and reduction of the effects of optical defects and deviations during real-time use of optical devices
HK02106404.5A HK1044821A1 (en) 1998-10-26 2002-08-29 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
US10/888,013 US20050018289A1 (en) 1998-10-26 2004-07-12 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems

Publications (1)

Publication Number Publication Date
IL126771A0 true IL126771A0 (en) 1999-08-17

Family

ID=11072073

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems

Country Status (8)

Country Link
US (2) US6807022B1 (en)
EP (1) EP1208399A4 (en)
JP (1) JP2002528905A (en)
KR (1) KR100475658B1 (en)
AU (1) AU6365399A (en)
HK (1) HK1044821A1 (en)
IL (1) IL126771A0 (en)
WO (1) WO2000025153A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
KR100574963B1 (en) * 2003-12-29 2006-04-28 삼성전자주식회사 Optical measurement equipment for critical dimension of patterns comprising a tunable laser system and measuring method for critical dimension of patterns using the optical measurement equipment
US7133225B1 (en) * 2004-10-18 2006-11-07 Carl Zeiss Smt Ag Method of manufacturing an optical system
JP2007199406A (en) * 2006-01-26 2007-08-09 Fujinon Corp Inflection optical unit
US8358410B2 (en) * 2009-05-22 2013-01-22 C8 Medisensors Inc. Large field of view, high numerical aperture compound objective lens with two pairs of identical elements and near IR spectrometer containing two such compound lenses
KR101669214B1 (en) 2010-12-31 2016-10-25 삼성전자주식회사 Scanning lens apparatus adopting bimorph actuator
TWI432871B (en) * 2011-03-01 2014-04-01 Altek Corp Auto focusing lens module and calibrating method thereof
WO2012157546A1 (en) * 2011-05-13 2012-11-22 ローム株式会社 Projector
JPWO2013018799A1 (en) 2011-08-04 2015-03-05 株式会社ニコン Lighting device
DE102011054087B4 (en) * 2011-09-30 2018-08-30 Carl Zeiss Microscopy Gmbh Optical image stabilization device and optical observation device
US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
US10725287B2 (en) * 2013-06-11 2020-07-28 Nlight, Inc. Image rotation compensation for multiple beam material processing
US10121236B2 (en) 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
JP6959073B2 (en) * 2017-08-30 2021-11-02 株式会社ディスコ Laser processing equipment
US11551980B2 (en) * 2019-03-08 2023-01-10 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
KR102524991B1 (en) * 2021-04-19 2023-04-28 (주)이즈미디어 Frame grabber configured to store status information of peripheral device with image frame, camera module inspecting method using the same, computer program and computer-readable recording medium

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US2352179A (en) 1944-06-27 Lens centering device
GB1147521A (en) * 1966-07-11 1969-04-02 British Scient Instr Res Ass Lens centring apparatus
US3432218A (en) * 1966-09-30 1969-03-11 Goodyear Aerospace Corp High speed mechanical variable amplitude nutating mechanism
US3482102A (en) * 1967-02-20 1969-12-02 Conductron Corp Coherent optical noise suppression by optical alignment of spatial filter
US3533700A (en) 1968-03-12 1970-10-13 Technidyne Inc Optical alignment methods and means utilizing coordinated laser beams and laser beam coordinating means for same
US3620591A (en) 1969-07-22 1971-11-16 Atlantic Richfield Co Optical processing of data
US3762821A (en) 1971-01-25 1973-10-02 Bell Telephone Labor Inc Lens assembly
US3782829A (en) * 1972-06-28 1974-01-01 Bell Telephone Labor Inc Lens alignment apparatus and method
US4525041A (en) * 1982-02-24 1985-06-25 Precision Grinding Limited Arrangement for use in positioning an optical image
US4504110A (en) * 1983-05-19 1985-03-12 Rockwell International Corporation Converging beam linear optical scanner
US4695975A (en) * 1984-10-23 1987-09-22 Profit Technology, Inc. Multi-image communications system
JPH0421830A (en) * 1990-05-16 1992-01-24 Canon Inc Image blurring preventing adaptor device for camera
US5233197A (en) 1991-07-15 1993-08-03 University Of Massachusetts Medical Center High speed digital imaging microscope
EP0602732A3 (en) * 1992-12-17 1995-09-27 Philips Electronics Nv Optical system with astigmatism compensation.
JP3208902B2 (en) 1993-03-11 2001-09-17 ミノルタ株式会社 Lens system optical axis adjusting device and lens system optical axis adjusting method
JP3067966B2 (en) * 1993-12-06 2000-07-24 松下電器産業株式会社 Apparatus and method for retrieving image parts
US5400133A (en) 1994-03-04 1995-03-21 Xerox Corporation Alignment method and apparatus for optical imaging systems
US5610771A (en) * 1994-08-01 1997-03-11 Lockheed Missiles & Space Company, Inc. Non-deviating prism with continuously variable dispersion
JPH08160484A (en) * 1994-12-05 1996-06-21 Nikon Corp Image blurring correcting device
JPH08327895A (en) 1995-05-26 1996-12-13 Nikon Corp Projection optical device
JPH09105973A (en) * 1995-10-12 1997-04-22 Sony Corp Hand shake correcting optical device
US5835208A (en) 1997-05-27 1998-11-10 Raytheon Company Apparatus to measure wedge and centering error in optical elements
AU8660398A (en) * 1997-07-22 1999-02-16 Addis E. Mayfield Apparatus and method for language translation between patient and caregiv er, andfor communication with speech deficient patients
US6091548A (en) * 1997-10-01 2000-07-18 Raytheon Company Optical system with two-stage aberration correction
US6320705B1 (en) * 1998-01-15 2001-11-20 George Dube' Adjustable optical wedge
US6129435A (en) * 1998-04-09 2000-10-10 Nike, Inc. Decentered protective eyewear
US6975399B2 (en) * 1998-08-28 2005-12-13 Nikon Corporation mark position detecting apparatus
IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
EP1259841A4 (en) * 2000-02-01 2005-09-07 Soquel Technology Inc SINGLE CHANNEL M x N OPTICAL FIBER SWITCH
US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
DE10209938A1 (en) * 2002-03-06 2003-09-25 Leica Microsystems Axially displaceable adjustment frame for optical components and process for their manufacture

Also Published As

Publication number Publication date
WO2000025153A3 (en) 2000-07-20
US6807022B1 (en) 2004-10-19
EP1208399A4 (en) 2006-09-13
JP2002528905A (en) 2002-09-03
WO2000025153A2 (en) 2000-05-04
HK1044821A1 (en) 2002-11-01
US20050018289A1 (en) 2005-01-27
EP1208399A2 (en) 2002-05-29
KR100475658B1 (en) 2005-03-10
AU6365399A (en) 2000-05-15
KR20010089345A (en) 2001-10-06

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