IL126771A0 - Improved optical systems - Google Patents

Improved optical systems

Info

Publication number
IL126771A0
IL126771A0 IL12677198A IL12677198A IL126771A0 IL 126771 A0 IL126771 A0 IL 126771A0 IL 12677198 A IL12677198 A IL 12677198A IL 12677198 A IL12677198 A IL 12677198A IL 126771 A0 IL126771 A0 IL 126771A0
Authority
IL
Israel
Prior art keywords
optical systems
improved optical
improved
systems
optical
Prior art date
Application number
IL12677198A
Other languages
English (en)
Original Assignee
Yanowitz Shimon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yanowitz Shimon filed Critical Yanowitz Shimon
Priority to IL12677198A priority Critical patent/IL126771A0/xx
Publication of IL126771A0 publication Critical patent/IL126771A0/xx
Priority to EP99951082A priority patent/EP1208399A4/en
Priority to AU63653/99A priority patent/AU6365399A/en
Priority to US09/830,076 priority patent/US6807022B1/en
Priority to JP2000578676A priority patent/JP2002528905A/ja
Priority to IL14252699A priority patent/IL142526A/xx
Priority to HK02106404.5A priority patent/HK1044821A1/zh
Priority to KR10-2001-7005174A priority patent/KR100475658B1/ko
Priority to PCT/IL1999/000565 priority patent/WO2000025153A2/en
Priority to US10/888,013 priority patent/US20050018289A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Lens Barrels (AREA)
IL12677198A 1998-10-26 1998-10-26 Improved optical systems IL126771A0 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
EP99951082A EP1208399A4 (en) 1998-10-26 1999-10-26 SIMULTANEOUS OBJECTIVES OF CIRCULAR SYMMETRIES AND DIVERSE INFLUENCES OF OPTICAL DEFECTS AND DIFFERENCES DURING THE REAL-TIME USE OF OPTICAL DEVICES
AU63653/99A AU6365399A (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
US09/830,076 US6807022B1 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
JP2000578676A JP2002528905A (ja) 1998-10-26 1999-10-26 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減
IL14252699A IL142526A (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviationsduring real time use of optical devices
HK02106404.5A HK1044821A1 (zh) 1998-10-26 1999-10-26 在光学装置的实时应用期间同时取得圆对称性及减低光学缺陷和偏差的影响
KR10-2001-7005174A KR100475658B1 (ko) 1998-10-26 1999-10-26 광학장치의 실시간 사용 중에 원 대칭을 달성함과 아울러광학결함 및 일탈의 영향을 감소시키는 방법 및 장치
PCT/IL1999/000565 WO2000025153A2 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices
US10/888,013 US20050018289A1 (en) 1998-10-26 2004-07-12 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems

Publications (1)

Publication Number Publication Date
IL126771A0 true IL126771A0 (en) 1999-08-17

Family

ID=11072073

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems

Country Status (8)

Country Link
US (2) US6807022B1 (enExample)
EP (1) EP1208399A4 (enExample)
JP (1) JP2002528905A (enExample)
KR (1) KR100475658B1 (enExample)
AU (1) AU6365399A (enExample)
HK (1) HK1044821A1 (enExample)
IL (1) IL126771A0 (enExample)
WO (1) WO2000025153A2 (enExample)

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IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
KR100574963B1 (ko) * 2003-12-29 2006-04-28 삼성전자주식회사 파장가변 레이저 장치를 구비한 광학적 임계치수 측정장치및 그 측정장치를 이용한 임계치수 측정방법
US7133225B1 (en) * 2004-10-18 2006-11-07 Carl Zeiss Smt Ag Method of manufacturing an optical system
JP2007199406A (ja) * 2006-01-26 2007-08-09 Fujinon Corp 屈曲光学ユニット
KR20120026102A (ko) * 2009-05-22 2012-03-16 씨8 메디센서스, 인크. 두 쌍의 동일한 요소를 구비한, 대형 시계, 고 개구수 복합 대물 렌즈 및 이러한 복합 렌즈를 포함하는 적외선 분광기
KR101669214B1 (ko) 2010-12-31 2016-10-25 삼성전자주식회사 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치
TWI432871B (zh) * 2011-03-01 2014-04-01 Altek Corp 自動對焦鏡頭模組及其校準的方法
WO2012157546A1 (ja) * 2011-05-13 2012-11-22 ローム株式会社 プロジェクタ
US9760012B2 (en) * 2011-08-04 2017-09-12 Nikon Corporation Illumination device
DE102011054087B4 (de) * 2011-09-30 2018-08-30 Carl Zeiss Microscopy Gmbh Optische Bildstabilisierungsvorrichtung und optisches Beobachtungsgerät
US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
US10725287B2 (en) * 2013-06-11 2020-07-28 Nlight, Inc. Image rotation compensation for multiple beam material processing
US10121236B2 (en) * 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
JP6959073B2 (ja) * 2017-08-30 2021-11-02 株式会社ディスコ レーザー加工装置
CN113544830A (zh) * 2019-03-08 2021-10-22 科磊股份有限公司 偏移测量的动态改善
US11551980B2 (en) * 2019-03-08 2023-01-10 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
US12320629B2 (en) * 2020-06-01 2025-06-03 Lg Electronics Inc. Thin film characteristic measuring apparatus
KR102524991B1 (ko) * 2021-04-19 2023-04-28 (주)이즈미디어 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체
US12406891B2 (en) * 2021-09-30 2025-09-02 International Business Machines Corporation Characterization of asymmetric material deposition for metrology

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US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
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Also Published As

Publication number Publication date
KR100475658B1 (ko) 2005-03-10
AU6365399A (en) 2000-05-15
WO2000025153A3 (en) 2000-07-20
WO2000025153A2 (en) 2000-05-04
KR20010089345A (ko) 2001-10-06
US6807022B1 (en) 2004-10-19
EP1208399A4 (en) 2006-09-13
US20050018289A1 (en) 2005-01-27
JP2002528905A (ja) 2002-09-03
EP1208399A2 (en) 2002-05-29
HK1044821A1 (zh) 2002-11-01

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