HK1044821A1 - 在光学装置的实时应用期间同时取得圆对称性及减低光学缺陷和偏差的影响 - Google Patents

在光学装置的实时应用期间同时取得圆对称性及减低光学缺陷和偏差的影响 Download PDF

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Publication number
HK1044821A1
HK1044821A1 HK02106404.5A HK02106404A HK1044821A1 HK 1044821 A1 HK1044821 A1 HK 1044821A1 HK 02106404 A HK02106404 A HK 02106404A HK 1044821 A1 HK1044821 A1 HK 1044821A1
Authority
HK
Hong Kong
Prior art keywords
optical
real time
optical device
during real
time use
Prior art date
Application number
HK02106404.5A
Other languages
English (en)
Chinese (zh)
Inventor
Yanowitz Shimon
Original Assignee
Symmetritech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Symmetritech Ltd filed Critical Symmetritech Ltd
Publication of HK1044821A1 publication Critical patent/HK1044821A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Optical Integrated Circuits (AREA)
HK02106404.5A 1998-10-26 1999-10-26 在光学装置的实时应用期间同时取得圆对称性及减低光学缺陷和偏差的影响 HK1044821A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL12677198 1998-10-26
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
PCT/IL1999/000565 WO2000025153A2 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Publications (1)

Publication Number Publication Date
HK1044821A1 true HK1044821A1 (zh) 2002-11-01

Family

ID=11072073

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02106404.5A HK1044821A1 (zh) 1998-10-26 1999-10-26 在光学装置的实时应用期间同时取得圆对称性及减低光学缺陷和偏差的影响

Country Status (8)

Country Link
US (2) US6807022B1 (enExample)
EP (1) EP1208399A4 (enExample)
JP (1) JP2002528905A (enExample)
KR (1) KR100475658B1 (enExample)
AU (1) AU6365399A (enExample)
HK (1) HK1044821A1 (enExample)
IL (1) IL126771A0 (enExample)
WO (1) WO2000025153A2 (enExample)

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TWI432871B (zh) * 2011-03-01 2014-04-01 Altek Corp 自動對焦鏡頭模組及其校準的方法
US9686388B2 (en) * 2011-05-13 2017-06-20 Rohm Co., Ltd. Projector
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US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
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US10121236B2 (en) * 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
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WO2020185242A1 (en) * 2019-03-08 2020-09-17 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
WO2021246540A1 (ko) * 2020-06-01 2021-12-09 엘지전자 주식회사 박막 특성 측정장치
KR102524991B1 (ko) * 2021-04-19 2023-04-28 (주)이즈미디어 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체
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Also Published As

Publication number Publication date
KR20010089345A (ko) 2001-10-06
EP1208399A2 (en) 2002-05-29
WO2000025153A2 (en) 2000-05-04
IL126771A0 (en) 1999-08-17
US20050018289A1 (en) 2005-01-27
JP2002528905A (ja) 2002-09-03
WO2000025153A3 (en) 2000-07-20
US6807022B1 (en) 2004-10-19
EP1208399A4 (en) 2006-09-13
AU6365399A (en) 2000-05-15
KR100475658B1 (ko) 2005-03-10

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