AU6365399A - Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices - Google Patents

Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Info

Publication number
AU6365399A
AU6365399A AU63653/99A AU6365399A AU6365399A AU 6365399 A AU6365399 A AU 6365399A AU 63653/99 A AU63653/99 A AU 63653/99A AU 6365399 A AU6365399 A AU 6365399A AU 6365399 A AU6365399 A AU 6365399A
Authority
AU
Australia
Prior art keywords
optical
real time
time use
during real
circular symmetry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU63653/99A
Other languages
English (en)
Inventor
Shimon Yanowitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU6365399A publication Critical patent/AU6365399A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Lens Barrels (AREA)
AU63653/99A 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices Abandoned AU6365399A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
IL126771 1998-10-26
PCT/IL1999/000565 WO2000025153A2 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Publications (1)

Publication Number Publication Date
AU6365399A true AU6365399A (en) 2000-05-15

Family

ID=11072073

Family Applications (1)

Application Number Title Priority Date Filing Date
AU63653/99A Abandoned AU6365399A (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Country Status (8)

Country Link
US (2) US6807022B1 (enExample)
EP (1) EP1208399A4 (enExample)
JP (1) JP2002528905A (enExample)
KR (1) KR100475658B1 (enExample)
AU (1) AU6365399A (enExample)
HK (1) HK1044821A1 (enExample)
IL (1) IL126771A0 (enExample)
WO (1) WO2000025153A2 (enExample)

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IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
KR100574963B1 (ko) * 2003-12-29 2006-04-28 삼성전자주식회사 파장가변 레이저 장치를 구비한 광학적 임계치수 측정장치및 그 측정장치를 이용한 임계치수 측정방법
US7133225B1 (en) * 2004-10-18 2006-11-07 Carl Zeiss Smt Ag Method of manufacturing an optical system
JP2007199406A (ja) * 2006-01-26 2007-08-09 Fujinon Corp 屈曲光学ユニット
KR20120026102A (ko) * 2009-05-22 2012-03-16 씨8 메디센서스, 인크. 두 쌍의 동일한 요소를 구비한, 대형 시계, 고 개구수 복합 대물 렌즈 및 이러한 복합 렌즈를 포함하는 적외선 분광기
KR101669214B1 (ko) 2010-12-31 2016-10-25 삼성전자주식회사 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치
TWI432871B (zh) * 2011-03-01 2014-04-01 Altek Corp 自動對焦鏡頭模組及其校準的方法
WO2012157546A1 (ja) * 2011-05-13 2012-11-22 ローム株式会社 プロジェクタ
US9760012B2 (en) * 2011-08-04 2017-09-12 Nikon Corporation Illumination device
DE102011054087B4 (de) * 2011-09-30 2018-08-30 Carl Zeiss Microscopy Gmbh Optische Bildstabilisierungsvorrichtung und optisches Beobachtungsgerät
US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
US10725287B2 (en) * 2013-06-11 2020-07-28 Nlight, Inc. Image rotation compensation for multiple beam material processing
US10121236B2 (en) * 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
JP6959073B2 (ja) * 2017-08-30 2021-11-02 株式会社ディスコ レーザー加工装置
CN113544830A (zh) * 2019-03-08 2021-10-22 科磊股份有限公司 偏移测量的动态改善
US11551980B2 (en) * 2019-03-08 2023-01-10 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
US12320629B2 (en) * 2020-06-01 2025-06-03 Lg Electronics Inc. Thin film characteristic measuring apparatus
KR102524991B1 (ko) * 2021-04-19 2023-04-28 (주)이즈미디어 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체
US12406891B2 (en) * 2021-09-30 2025-09-02 International Business Machines Corporation Characterization of asymmetric material deposition for metrology

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US3432218A (en) * 1966-09-30 1969-03-11 Goodyear Aerospace Corp High speed mechanical variable amplitude nutating mechanism
US3482102A (en) * 1967-02-20 1969-12-02 Conductron Corp Coherent optical noise suppression by optical alignment of spatial filter
US3533700A (en) 1968-03-12 1970-10-13 Technidyne Inc Optical alignment methods and means utilizing coordinated laser beams and laser beam coordinating means for same
US3620591A (en) * 1969-07-22 1971-11-16 Atlantic Richfield Co Optical processing of data
US3762821A (en) 1971-01-25 1973-10-02 Bell Telephone Labor Inc Lens assembly
US3782829A (en) * 1972-06-28 1974-01-01 Bell Telephone Labor Inc Lens alignment apparatus and method
US4525041A (en) * 1982-02-24 1985-06-25 Precision Grinding Limited Arrangement for use in positioning an optical image
US4504110A (en) * 1983-05-19 1985-03-12 Rockwell International Corporation Converging beam linear optical scanner
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US5233197A (en) 1991-07-15 1993-08-03 University Of Massachusetts Medical Center High speed digital imaging microscope
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JP3208902B2 (ja) 1993-03-11 2001-09-17 ミノルタ株式会社 レンズ系光軸調整装置及びレンズ系光軸調整方法
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JPH08160484A (ja) * 1994-12-05 1996-06-21 Nikon Corp 像振れ補正装置
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US6320705B1 (en) * 1998-01-15 2001-11-20 George Dube' Adjustable optical wedge
US6129435A (en) * 1998-04-09 2000-10-10 Nike, Inc. Decentered protective eyewear
US6975399B2 (en) * 1998-08-28 2005-12-13 Nikon Corporation mark position detecting apparatus
IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
AU2001252882A1 (en) * 2000-02-01 2001-08-14 Soquel Technology, Inc. Single channel m x n optical fiber switch
US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
DE10209938A1 (de) * 2002-03-06 2003-09-25 Leica Microsystems Axial verschiebbare Justierfassung für optische Bauteile sowie Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
KR100475658B1 (ko) 2005-03-10
WO2000025153A3 (en) 2000-07-20
WO2000025153A2 (en) 2000-05-04
KR20010089345A (ko) 2001-10-06
US6807022B1 (en) 2004-10-19
EP1208399A4 (en) 2006-09-13
US20050018289A1 (en) 2005-01-27
JP2002528905A (ja) 2002-09-03
IL126771A0 (en) 1999-08-17
EP1208399A2 (en) 2002-05-29
HK1044821A1 (zh) 2002-11-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 14, NO 31, PAGE(S) 5604-5607 UNDER THE HEADING APPLICATIONS LAPSED, REFUSED OR WITHDRAWN PLEASE DELETE ALL REFERENCE TO APPLICATION NO. 63653/99

MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase