KR100475658B1 - 광학장치의 실시간 사용 중에 원 대칭을 달성함과 아울러광학결함 및 일탈의 영향을 감소시키는 방법 및 장치 - Google Patents

광학장치의 실시간 사용 중에 원 대칭을 달성함과 아울러광학결함 및 일탈의 영향을 감소시키는 방법 및 장치 Download PDF

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Publication number
KR100475658B1
KR100475658B1 KR10-2001-7005174A KR20017005174A KR100475658B1 KR 100475658 B1 KR100475658 B1 KR 100475658B1 KR 20017005174 A KR20017005174 A KR 20017005174A KR 100475658 B1 KR100475658 B1 KR 100475658B1
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South Korea
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optical
rotation
optical device
rotating
axis
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KR10-2001-7005174A
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English (en)
Korean (ko)
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KR20010089345A (ko
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야노비츠 시몬
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씸메트리테크 엘티디
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Lens Barrels (AREA)
KR10-2001-7005174A 1998-10-26 1999-10-26 광학장치의 실시간 사용 중에 원 대칭을 달성함과 아울러광학결함 및 일탈의 영향을 감소시키는 방법 및 장치 Expired - Fee Related KR100475658B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
IL126771 1998-10-26

Publications (2)

Publication Number Publication Date
KR20010089345A KR20010089345A (ko) 2001-10-06
KR100475658B1 true KR100475658B1 (ko) 2005-03-10

Family

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Family Applications (1)

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KR10-2001-7005174A Expired - Fee Related KR100475658B1 (ko) 1998-10-26 1999-10-26 광학장치의 실시간 사용 중에 원 대칭을 달성함과 아울러광학결함 및 일탈의 영향을 감소시키는 방법 및 장치

Country Status (8)

Country Link
US (2) US6807022B1 (enExample)
EP (1) EP1208399A4 (enExample)
JP (1) JP2002528905A (enExample)
KR (1) KR100475658B1 (enExample)
AU (1) AU6365399A (enExample)
HK (1) HK1044821A1 (enExample)
IL (1) IL126771A0 (enExample)
WO (1) WO2000025153A2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
KR100574963B1 (ko) * 2003-12-29 2006-04-28 삼성전자주식회사 파장가변 레이저 장치를 구비한 광학적 임계치수 측정장치및 그 측정장치를 이용한 임계치수 측정방법
US7133225B1 (en) * 2004-10-18 2006-11-07 Carl Zeiss Smt Ag Method of manufacturing an optical system
JP2007199406A (ja) * 2006-01-26 2007-08-09 Fujinon Corp 屈曲光学ユニット
KR20120026102A (ko) * 2009-05-22 2012-03-16 씨8 메디센서스, 인크. 두 쌍의 동일한 요소를 구비한, 대형 시계, 고 개구수 복합 대물 렌즈 및 이러한 복합 렌즈를 포함하는 적외선 분광기
KR101669214B1 (ko) 2010-12-31 2016-10-25 삼성전자주식회사 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치
TWI432871B (zh) * 2011-03-01 2014-04-01 Altek Corp 自動對焦鏡頭模組及其校準的方法
WO2012157546A1 (ja) * 2011-05-13 2012-11-22 ローム株式会社 プロジェクタ
US9760012B2 (en) * 2011-08-04 2017-09-12 Nikon Corporation Illumination device
DE102011054087B4 (de) * 2011-09-30 2018-08-30 Carl Zeiss Microscopy Gmbh Optische Bildstabilisierungsvorrichtung und optisches Beobachtungsgerät
US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
US10725287B2 (en) * 2013-06-11 2020-07-28 Nlight, Inc. Image rotation compensation for multiple beam material processing
US10121236B2 (en) * 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
JP6959073B2 (ja) * 2017-08-30 2021-11-02 株式会社ディスコ レーザー加工装置
CN113544830A (zh) * 2019-03-08 2021-10-22 科磊股份有限公司 偏移测量的动态改善
US11551980B2 (en) * 2019-03-08 2023-01-10 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
US12320629B2 (en) * 2020-06-01 2025-06-03 Lg Electronics Inc. Thin film characteristic measuring apparatus
KR102524991B1 (ko) * 2021-04-19 2023-04-28 (주)이즈미디어 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체
US12406891B2 (en) * 2021-09-30 2025-09-02 International Business Machines Corporation Characterization of asymmetric material deposition for metrology

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2352179A (en) 1944-06-27 Lens centering device
GB1147521A (en) * 1966-07-11 1969-04-02 British Scient Instr Res Ass Lens centring apparatus
US3432218A (en) * 1966-09-30 1969-03-11 Goodyear Aerospace Corp High speed mechanical variable amplitude nutating mechanism
US3482102A (en) * 1967-02-20 1969-12-02 Conductron Corp Coherent optical noise suppression by optical alignment of spatial filter
US3533700A (en) 1968-03-12 1970-10-13 Technidyne Inc Optical alignment methods and means utilizing coordinated laser beams and laser beam coordinating means for same
US3620591A (en) * 1969-07-22 1971-11-16 Atlantic Richfield Co Optical processing of data
US3762821A (en) 1971-01-25 1973-10-02 Bell Telephone Labor Inc Lens assembly
US3782829A (en) * 1972-06-28 1974-01-01 Bell Telephone Labor Inc Lens alignment apparatus and method
US4525041A (en) * 1982-02-24 1985-06-25 Precision Grinding Limited Arrangement for use in positioning an optical image
US4504110A (en) * 1983-05-19 1985-03-12 Rockwell International Corporation Converging beam linear optical scanner
US4695975A (en) * 1984-10-23 1987-09-22 Profit Technology, Inc. Multi-image communications system
JPH0421830A (ja) * 1990-05-16 1992-01-24 Canon Inc カメラ用画像振れ防止アダプタ装置
US5233197A (en) 1991-07-15 1993-08-03 University Of Massachusetts Medical Center High speed digital imaging microscope
EP0602732A3 (en) * 1992-12-17 1995-09-27 Philips Electronics Nv Optical system with astigmatism compensation.
JP3208902B2 (ja) 1993-03-11 2001-09-17 ミノルタ株式会社 レンズ系光軸調整装置及びレンズ系光軸調整方法
JP3067966B2 (ja) * 1993-12-06 2000-07-24 松下電器産業株式会社 画像部品を検索する装置及びその方法
US5400133A (en) 1994-03-04 1995-03-21 Xerox Corporation Alignment method and apparatus for optical imaging systems
US5610771A (en) * 1994-08-01 1997-03-11 Lockheed Missiles & Space Company, Inc. Non-deviating prism with continuously variable dispersion
JPH08160484A (ja) * 1994-12-05 1996-06-21 Nikon Corp 像振れ補正装置
JPH08327895A (ja) 1995-05-26 1996-12-13 Nikon Corp 投影光学装置
JPH09105973A (ja) * 1995-10-12 1997-04-22 Sony Corp 手振れ補正光学装置
US5835208A (en) 1997-05-27 1998-11-10 Raytheon Company Apparatus to measure wedge and centering error in optical elements
WO1999004686A1 (en) * 1997-07-22 1999-02-04 Milner John A Apparatus and method for language translation between patient and caregiver, and for communication with speech deficient patients
US6091548A (en) * 1997-10-01 2000-07-18 Raytheon Company Optical system with two-stage aberration correction
US6320705B1 (en) * 1998-01-15 2001-11-20 George Dube' Adjustable optical wedge
US6129435A (en) * 1998-04-09 2000-10-10 Nike, Inc. Decentered protective eyewear
US6975399B2 (en) * 1998-08-28 2005-12-13 Nikon Corporation mark position detecting apparatus
IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
AU2001252882A1 (en) * 2000-02-01 2001-08-14 Soquel Technology, Inc. Single channel m x n optical fiber switch
US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
DE10209938A1 (de) * 2002-03-06 2003-09-25 Leica Microsystems Axial verschiebbare Justierfassung für optische Bauteile sowie Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
AU6365399A (en) 2000-05-15
WO2000025153A3 (en) 2000-07-20
WO2000025153A2 (en) 2000-05-04
KR20010089345A (ko) 2001-10-06
US6807022B1 (en) 2004-10-19
EP1208399A4 (en) 2006-09-13
US20050018289A1 (en) 2005-01-27
JP2002528905A (ja) 2002-09-03
IL126771A0 (en) 1999-08-17
EP1208399A2 (en) 2002-05-29
HK1044821A1 (zh) 2002-11-01

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