JP2002528905A5 - - Google Patents

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Publication number
JP2002528905A5
JP2002528905A5 JP2000578676A JP2000578676A JP2002528905A5 JP 2002528905 A5 JP2002528905 A5 JP 2002528905A5 JP 2000578676 A JP2000578676 A JP 2000578676A JP 2000578676 A JP2000578676 A JP 2000578676A JP 2002528905 A5 JP2002528905 A5 JP 2002528905A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000578676A
Other languages
Japanese (ja)
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JP2002528905A (ja
Filing date
Publication date
Priority claimed from IL12677198A external-priority patent/IL126771A0/xx
Application filed filed Critical
Publication of JP2002528905A publication Critical patent/JP2002528905A/ja
Publication of JP2002528905A5 publication Critical patent/JP2002528905A5/ja
Pending legal-status Critical Current

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JP2000578676A 1998-10-26 1999-10-26 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減 Pending JP2002528905A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL12677198A IL126771A0 (en) 1998-10-26 1998-10-26 Improved optical systems
IL126771 1998-10-26
PCT/IL1999/000565 WO2000025153A2 (en) 1998-10-26 1999-10-26 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices

Publications (2)

Publication Number Publication Date
JP2002528905A JP2002528905A (ja) 2002-09-03
JP2002528905A5 true JP2002528905A5 (enExample) 2006-01-05

Family

ID=11072073

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000578676A Pending JP2002528905A (ja) 1998-10-26 1999-10-26 光学デバイスの実時間使用中に、円対称の実現と同時に、光学的欠陥および光学的偏差の影響の低減

Country Status (8)

Country Link
US (2) US6807022B1 (enExample)
EP (1) EP1208399A4 (enExample)
JP (1) JP2002528905A (enExample)
KR (1) KR100475658B1 (enExample)
AU (1) AU6365399A (enExample)
HK (1) HK1044821A1 (enExample)
IL (1) IL126771A0 (enExample)
WO (1) WO2000025153A2 (enExample)

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IL126771A0 (en) * 1998-10-26 1999-08-17 Yanowitz Shimon Improved optical systems
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US7133225B1 (en) * 2004-10-18 2006-11-07 Carl Zeiss Smt Ag Method of manufacturing an optical system
JP2007199406A (ja) * 2006-01-26 2007-08-09 Fujinon Corp 屈曲光学ユニット
KR20120026102A (ko) * 2009-05-22 2012-03-16 씨8 메디센서스, 인크. 두 쌍의 동일한 요소를 구비한, 대형 시계, 고 개구수 복합 대물 렌즈 및 이러한 복합 렌즈를 포함하는 적외선 분광기
KR101669214B1 (ko) 2010-12-31 2016-10-25 삼성전자주식회사 바이모르프 액츄에이터를 채용한 렌즈 스캐닝 장치
TWI432871B (zh) * 2011-03-01 2014-04-01 Altek Corp 自動對焦鏡頭模組及其校準的方法
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US9219890B1 (en) * 2012-08-22 2015-12-22 The United States Of America As Represented By The Secretary Of The Navy Optical surface analysis system and method
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US10121236B2 (en) * 2016-10-26 2018-11-06 Himax Technologies Limited Automatic alignment apparatus and associated method
JP6959073B2 (ja) * 2017-08-30 2021-11-02 株式会社ディスコ レーザー加工装置
CN113544830A (zh) * 2019-03-08 2021-10-22 科磊股份有限公司 偏移测量的动态改善
US11551980B2 (en) * 2019-03-08 2023-01-10 Kla-Tencor Corporation Dynamic amelioration of misregistration measurement
US12320629B2 (en) * 2020-06-01 2025-06-03 Lg Electronics Inc. Thin film characteristic measuring apparatus
KR102524991B1 (ko) * 2021-04-19 2023-04-28 (주)이즈미디어 영상 프레임과 함께 주변 장치의 상태 정보를 저장하는 프레임 그래버 시스템 및 이를 이용한 카메라모듈 검사 방법, 컴퓨터 프로그램 및 컴퓨터 판독가능 기록 매체
US12406891B2 (en) * 2021-09-30 2025-09-02 International Business Machines Corporation Characterization of asymmetric material deposition for metrology

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