JP2002505448A - レジストストリッピング法 - Google Patents

レジストストリッピング法

Info

Publication number
JP2002505448A
JP2002505448A JP2000533792A JP2000533792A JP2002505448A JP 2002505448 A JP2002505448 A JP 2002505448A JP 2000533792 A JP2000533792 A JP 2000533792A JP 2000533792 A JP2000533792 A JP 2000533792A JP 2002505448 A JP2002505448 A JP 2002505448A
Authority
JP
Japan
Prior art keywords
ammonium
stripping solution
resist
stripping
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000533792A
Other languages
English (en)
Japanese (ja)
Inventor
ヤコブサン，エリック
Original Assignee
アルファ・メタルズ・インコーポレーテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アルファ・メタルズ・インコーポレーテッド filed Critical アルファ・メタルズ・インコーポレーテッド
Publication of JP2002505448A publication Critical patent/JP2002505448A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP2000533792A 1998-02-26 1999-02-01 レジストストリッピング法 Pending JP2002505448A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3115498A 1998-02-26 1998-02-26
US09/031,154 1998-02-26
PCT/US1999/002160 WO1999044101A1 (en) 1998-02-26 1999-02-01 Resist stripping process

Publications (1)

Publication Number Publication Date
JP2002505448A true JP2002505448A (ja) 2002-02-19

Family

ID=21857911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000533792A Pending JP2002505448A (ja) 1998-02-26 1999-02-01 レジストストリッピング法

Country Status (6)

Country Link
EP (1) EP1057080A1 (zh)
JP (1) JP2002505448A (zh)
KR (1) KR20010041221A (zh)
CN (1) CN1129036C (zh)
TW (1) TW407449B (zh)
WO (1) WO1999044101A1 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007526523A (ja) * 2004-03-03 2007-09-13 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 基板上に付着したフォトレジスト及び／又は犠牲反射防止材料のエッチング後除去のための組成物並びにプロセス
JP2013246441A (ja) * 2012-05-24 2013-12-09 Rohm & Haas Electronic Materials Llc ネガ型フォトレジストを除去する方法
KR20160016479A (ko) * 2014-08-05 2016-02-15 칩본드 테크놀러지 코포레이션 포토레지스트 박리 방법

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3328250B2 (ja) 1998-12-09 2002-09-24 岸本産業株式会社 レジスト残渣除去剤
WO2000044034A1 (en) * 1999-01-25 2000-07-27 Speedfam-Ipec Corporation Methods and cleaning solutions for post-chemical mechanical polishing
KR20030007288A (ko) * 2002-11-29 2003-01-23 (주) 라모스테크놀러지 전자메일 기능을 구비한 디지털 재생장치 및 그 신호 처리방법
KR100582202B1 (ko) * 2003-10-13 2006-05-23 엘지.필립스 엘시디 주식회사 박막트랜지스터 어레이 기판의 제조장치 및 방법
CN102221791B (zh) * 2011-04-29 2014-09-03 西安东旺精细化学有限公司 一种光致抗蚀剂的剥离液组合物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD143920A1 (de) * 1979-05-24 1980-09-17 Uwe Jungstand Ausstreifmittel zum entfernen von positivfotolacken
JPS60203944A (ja) * 1984-03-28 1985-10-15 Mitsubishi Gas Chem Co Inc ポジ型フオトレジストの除去法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007526523A (ja) * 2004-03-03 2007-09-13 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 基板上に付着したフォトレジスト及び／又は犠牲反射防止材料のエッチング後除去のための組成物並びにプロセス
JP4758982B2 (ja) * 2004-03-03 2011-08-31 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 基板上に付着したフォトレジスト及び／又は犠牲反射防止材料のエッチング後除去のための組成物並びにプロセス
JP2013246441A (ja) * 2012-05-24 2013-12-09 Rohm & Haas Electronic Materials Llc ネガ型フォトレジストを除去する方法
KR20160016479A (ko) * 2014-08-05 2016-02-15 칩본드 테크놀러지 코포레이션 포토레지스트 박리 방법

Also Published As

Publication number Publication date
EP1057080A1 (en) 2000-12-06
WO1999044101A1 (en) 1999-09-02
TW407449B (en) 2000-10-01
CN1129036C (zh) 2003-11-26
CN1298496A (zh) 2001-06-06
KR20010041221A (ko) 2001-05-15

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