JP2002160195A5 - - Google Patents

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Publication number
JP2002160195A5
JP2002160195A5 JP2001131490A JP2001131490A JP2002160195A5 JP 2002160195 A5 JP2002160195 A5 JP 2002160195A5 JP 2001131490 A JP2001131490 A JP 2001131490A JP 2001131490 A JP2001131490 A JP 2001131490A JP 2002160195 A5 JP2002160195 A5 JP 2002160195A5
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JP
Japan
Prior art keywords
plate
hole
punch
industrial
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001131490A
Other languages
English (en)
Japanese (ja)
Other versions
JP4067782B2 (ja
JP2002160195A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2001131490A external-priority patent/JP4067782B2/ja
Priority to JP2001131490A priority Critical patent/JP4067782B2/ja
Priority to US09/883,133 priority patent/US6637102B2/en
Priority to DE2001615549 priority patent/DE60115549T2/de
Priority to EP05026190A priority patent/EP1634683B1/en
Priority to DE60134435T priority patent/DE60134435D1/de
Priority to EP20010306147 priority patent/EP1175978B1/en
Priority to CNB011328495A priority patent/CN1144635C/zh
Publication of JP2002160195A publication Critical patent/JP2002160195A/ja
Publication of JP2002160195A5 publication Critical patent/JP2002160195A5/ja
Publication of JP4067782B2 publication Critical patent/JP4067782B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2001131490A 2000-07-19 2001-04-27 高アスペクト比な貫孔部を有する工業用部品の製造方法 Expired - Lifetime JP4067782B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2001131490A JP4067782B2 (ja) 2000-07-19 2001-04-27 高アスペクト比な貫孔部を有する工業用部品の製造方法
US09/883,133 US6637102B2 (en) 2000-07-19 2001-06-15 Process for producing an industrial member having throughholes of high aspect ratio
DE60134435T DE60134435D1 (de) 2000-07-19 2001-07-17 Verfahren zur Herstellung von Werkstücken mit Durchgangslöchern mit hohem Aspektverhältis
EP05026190A EP1634683B1 (en) 2000-07-19 2001-07-17 Method for fabrication of industrial parts having high-aspect-ratio-through-hole section
DE2001615549 DE60115549T2 (de) 2000-07-19 2001-07-17 Verfahren zur Herstellung von Werkstücken mit Durchgangslöchern mit hohem Aspektverhältis
EP20010306147 EP1175978B1 (en) 2000-07-19 2001-07-17 Method for fabrication of industrial parts having high-aspect-ratio through-hole sections
CNB011328495A CN1144635C (zh) 2000-07-19 2001-07-19 加工具有大高宽比通孔的工业部件的方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000-218378 2000-07-19
JP2000218378 2000-07-19
JP2000280573 2000-09-14
JP2000-280573 2000-09-14
JP2001131490A JP4067782B2 (ja) 2000-07-19 2001-04-27 高アスペクト比な貫孔部を有する工業用部品の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005300918A Division JP2006068900A (ja) 2000-07-19 2005-10-14 高アスペクト比な貫孔部を有する工業用部品の製造方法

Publications (3)

Publication Number Publication Date
JP2002160195A JP2002160195A (ja) 2002-06-04
JP2002160195A5 true JP2002160195A5 (enExample) 2005-09-22
JP4067782B2 JP4067782B2 (ja) 2008-03-26

Family

ID=27344109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001131490A Expired - Lifetime JP4067782B2 (ja) 2000-07-19 2001-04-27 高アスペクト比な貫孔部を有する工業用部品の製造方法

Country Status (1)

Country Link
JP (1) JP4067782B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4723199B2 (ja) * 2003-06-19 2011-07-13 日本碍子株式会社 筒形圧電アクチュエータ並びに筒形圧電アクチュエータアレイ及び製造方法
JP4847039B2 (ja) 2004-05-28 2011-12-28 日本碍子株式会社 圧電／電歪構造体及び圧電／電歪構造体の製造方法
JP5123491B2 (ja) 2005-06-10 2013-01-23 日本碍子株式会社 積層型圧電／電歪素子
US7443080B2 (en) 2006-01-23 2008-10-28 Ngk Insulators, Ltd. Laminated piezoelectric/electrostrictive device
JP2007260820A (ja) * 2006-03-28 2007-10-11 Ngk Insulators Ltd 高アスペクト比な貫孔部を有する工業用部品の製造方法
US8865121B2 (en) 2009-06-18 2014-10-21 Basf Se Organotemplate-free synthetic process for the production of a zeolitic material

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