JP2002082440A5 - - Google Patents
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- Publication number
- JP2002082440A5 JP2002082440A5 JP2001200816A JP2001200816A JP2002082440A5 JP 2002082440 A5 JP2002082440 A5 JP 2002082440A5 JP 2001200816 A JP2001200816 A JP 2001200816A JP 2001200816 A JP2001200816 A JP 2001200816A JP 2002082440 A5 JP2002082440 A5 JP 2002082440A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- photoresist composition
- triflate
- hept
- ene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 43
- -1 diphenyliodo Chemical class 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 235000010290 biphenyl Nutrition 0.000 claims description 5
- 239000004305 biphenyl Substances 0.000 claims description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 5
- 125000006267 biphenyl group Chemical group 0.000 claims description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 4
- 150000003254 radicals Chemical class 0.000 claims description 3
- VUBUXALTYMBEQO-UHFFFAOYSA-N 2,2,3,3,3-pentafluoro-1-phenylpropan-1-one Chemical compound FC(F)(F)C(F)(F)C(=O)C1=CC=CC=C1 VUBUXALTYMBEQO-UHFFFAOYSA-N 0.000 claims description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 150000001925 cycloalkenes Chemical class 0.000 claims description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 2
- RUVINXPYWBROJD-UHFFFAOYSA-N para-methoxyphenyl Natural products COC1=CC=C(C=CC)C=C1 RUVINXPYWBROJD-UHFFFAOYSA-N 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims 2
- BZBMBZJUNPMEBD-UHFFFAOYSA-N tert-butyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC(C)(C)C)CC1C=C2 BZBMBZJUNPMEBD-UHFFFAOYSA-N 0.000 claims 2
- PHSXOZKMZYKHLY-UHFFFAOYSA-N 2-hydroxyethyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OCCO)CC1C=C2 PHSXOZKMZYKHLY-UHFFFAOYSA-N 0.000 claims 1
- BSMGLVDZZMBWQB-UHFFFAOYSA-N 2-methyl-1-phenylpropan-1-one Chemical compound CC(C)C(=O)C1=CC=CC=C1 BSMGLVDZZMBWQB-UHFFFAOYSA-N 0.000 claims 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 claims 1
- FYGUSUBEMUKACF-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C(=O)O)CC1C=C2 FYGUSUBEMUKACF-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- ZLZZZUYVKRXMRS-UHFFFAOYSA-N (4-benzhydrylphenyl) trifluoromethanesulfonate Chemical compound O(S(=O)(=O)C(F)(F)F)C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 ZLZZZUYVKRXMRS-UHFFFAOYSA-N 0.000 description 1
- CPNBXOGOMSMGCF-UHFFFAOYSA-N (4-tert-butyl-2,3-diphenylphenyl) trifluoromethanesulfonate Chemical compound C=1C=CC=CC=1C=1C(C(C)(C)C)=CC=C(OS(=O)(=O)C(F)(F)F)C=1C1=CC=CC=C1 CPNBXOGOMSMGCF-UHFFFAOYSA-N 0.000 description 1
- CYJIAJHBQYSDNE-UHFFFAOYSA-N [4-(2-methylpropyl)-2,3-diphenylphenyl] trifluoromethanesulfonate Chemical compound C=1C=CC=CC=1C=1C(CC(C)C)=CC=C(OS(=O)(=O)C(F)(F)F)C=1C1=CC=CC=C1 CYJIAJHBQYSDNE-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020000037228A KR100583095B1 (ko) | 2000-06-30 | 2000-06-30 | 광산 발생제와 함께 광 라디칼 발생제(ｐｒｇ)를 포함하는포토레지스트 조성물 |
| KR2000-37228 | 2000-06-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002082440A JP2002082440A (ja) | 2002-03-22 |
| JP2002082440A5 true JP2002082440A5 (enExample) | 2005-04-07 |
| JP3875519B2 JP3875519B2 (ja) | 2007-01-31 |
Family
ID=19675463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001200816A Expired - Fee Related JP3875519B2 (ja) | 2000-06-30 | 2001-07-02 | フォトレジスト組成物、フォトレジストパターン形成方法、及び、半導体素子の製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6692891B2 (enExample) |
| JP (1) | JP3875519B2 (enExample) |
| KR (1) | KR100583095B1 (enExample) |
| CN (1) | CN1241065C (enExample) |
| DE (1) | DE10131123A1 (enExample) |
| GB (1) | GB2364392B (enExample) |
| TW (1) | TWI225967B (enExample) |
Families Citing this family (50)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101952269B (zh) * | 2007-10-10 | 2014-06-25 | 巴斯夫欧洲公司 | 锍盐引发剂 |
| JP5834630B2 (ja) * | 2011-02-04 | 2015-12-24 | 日立化成株式会社 | 樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP5884961B2 (ja) * | 2011-04-27 | 2016-03-15 | 日産化学工業株式会社 | 光ラジカル重合開始剤を含む感光性レジスト下層膜形成組成物 |
| DE112011105280B4 (de) | 2011-05-23 | 2017-02-02 | Otis Elevator Company | Polygon-Kompensationskopplung für ketten- und zahnradgetriebene Systeme |
| EP2791187A4 (en) * | 2011-12-16 | 2015-07-15 | Univ Akron | SUBSTITUTED PHENACYLMOLECULES AND LIGHT-SENSITIVE POLYMERS |
| JP5772642B2 (ja) * | 2012-02-09 | 2015-09-02 | Jsr株式会社 | 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子 |
| WO2013119134A1 (en) * | 2012-10-16 | 2013-08-15 | Eugen Pavel | Photoresist with rare-earth sensitizers |
| MY201381A (en) | 2013-02-12 | 2024-02-21 | Carbon3D Inc | Continuous liquid interphase printing |
| JP6423801B2 (ja) | 2013-02-12 | 2018-11-14 | カーボン，インコーポレイテッド | ３次元製作のための方法および装置 |
| WO2015142546A1 (en) | 2014-03-21 | 2015-09-24 | Carbon3D, Inc. | Method and apparatus for three-dimensional fabrication with gas injection through carrier |
| US10259171B2 (en) | 2014-04-25 | 2019-04-16 | Carbon, Inc. | Continuous three dimensional fabrication from immiscible liquids |
| WO2015195920A1 (en) | 2014-06-20 | 2015-12-23 | Carbon3D, Inc. | Three-dimensional printing method using increased light intensity and apparatus therefore |
| US10569465B2 (en) | 2014-06-20 | 2020-02-25 | Carbon, Inc. | Three-dimensional printing using tiled light engines |
| AU2015277034B2 (en) | 2014-06-20 | 2019-07-11 | Carbon, Inc. | Three-dimensional printing with reciprocal feeding of polymerizable liquid |
| MX2016016630A (es) | 2014-06-23 | 2017-06-06 | Carbon Inc | Metodos para producir objetos tridimensionales de poliuretano a partir de materiales que tienen multiples mecanismos de endurecimiento. |
| US11390062B2 (en) | 2014-08-12 | 2022-07-19 | Carbon, Inc. | Three-dimensional printing with supported build plates |
| WO2016109550A1 (en) | 2014-12-31 | 2016-07-07 | Carbon3D, Inc. | Three-dimensional printing of objects with breathing orifices |
| US20160193786A1 (en) | 2015-01-06 | 2016-07-07 | Carbon3D, Inc. | Three-dimensional printing with build plates having a rough or patterned surface and related methods |
| WO2016112090A1 (en) | 2015-01-07 | 2016-07-14 | Carbon3D, Inc. | Microfluidic devices and methods of making the same |
| EP3245044B1 (en) | 2015-01-13 | 2021-05-05 | Carbon, Inc. | Three-dimensional printing with build plates having surface topologies for increasing permeability and related methods |
| US11020898B2 (en) | 2015-01-30 | 2021-06-01 | Carbon, Inc. | Build plates for continuous liquid interface printing having permeable base and adhesive for increasing permeability and related methods, systems and devices |
| WO2016123506A1 (en) | 2015-01-30 | 2016-08-04 | Carbon3D, Inc. | Build plates for continuous liquid interface printing having permeable sheets and related methods, systems and devices |
| EP3253558B1 (en) | 2015-02-05 | 2020-04-08 | Carbon, Inc. | Method of additive manufacturing by fabrication through multiple zones |
| WO2016133759A1 (en) | 2015-02-20 | 2016-08-25 | Carbon3D, Inc. | Methods and apparatus for continuous liquid interface printing with electrochemically supported dead zone |
| US20180029292A1 (en) | 2015-03-05 | 2018-02-01 | Carbon, Inc. | Continuous liquid interface production with sequential patterned exposure |
| US10391711B2 (en) | 2015-03-05 | 2019-08-27 | Carbon, Inc. | Fabrication of three dimensional objects with multiple operating modes |
| US20180015662A1 (en) | 2015-03-05 | 2018-01-18 | Carbon, Inc. | Fabrication of three dimensional objects with variable slice thickness |
| WO2016145050A1 (en) | 2015-03-10 | 2016-09-15 | Carbon3D, Inc. | Microfluidic devices having flexible features and methods of making the same |
| WO2016145182A1 (en) | 2015-03-12 | 2016-09-15 | Carbon3D, Inc. | Additive manufacturing using polymerization initiators or inhibitors having controlled migration |
| WO2016149151A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with concurrent delivery of different polymerizable liquids |
| WO2016149097A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with reduced pressure build plate unit |
| WO2016149104A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with flexible build plates |
| WO2017048710A1 (en) | 2015-09-14 | 2017-03-23 | Carbon, Inc. | Light-curable article of manufacture with portions of differing solubility |
| US11220051B2 (en) | 2015-09-25 | 2022-01-11 | Carbon, Inc. | Build plate assemblies for continuous liquid interphase printing having lighting panels and related methods, systems and devices |
| WO2017059082A1 (en) | 2015-09-30 | 2017-04-06 | Carbon, Inc. | Method and apparatus for producing three-dimensional objects |
| US12010287B2 (en) | 2015-10-09 | 2024-06-11 | Southern Methodist University | System and method for a three-dimensional optical switch display device |
| US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
| US10538031B2 (en) | 2015-12-22 | 2020-01-21 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
| WO2017112521A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Production of flexible products by additive manufacturing with dual cure resins |
| WO2017112682A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins |
| CN108139665B (zh) | 2015-12-22 | 2022-07-05 | 卡本有限公司 | 用于用双重固化树脂的增材制造的双重前体树脂系统 |
| WO2017112483A2 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
| EP3463820A4 (en) | 2016-05-31 | 2020-04-08 | Northwestern University | METHOD FOR MANUFACTURING THREE-DIMENSIONAL OBJECTS AND APPARATUS THEREOF |
| CN211105627U (zh) | 2016-07-01 | 2020-07-28 | 卡本有限公司 | 用于三维打印机的构造板、构造板组件和用于由可聚合液体形成三维物体的装置 |
| WO2018094131A1 (en) | 2016-11-21 | 2018-05-24 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
| US10239255B2 (en) | 2017-04-11 | 2019-03-26 | Molecule Corp | Fabrication of solid materials or films from a polymerizable liquid |
| EP3597694B1 (en) * | 2018-07-17 | 2023-10-11 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix |
| NL2022372B1 (en) | 2018-12-17 | 2020-07-03 | What The Future Venture Capital Wtfvc B V | Process for producing a cured 3d product |
| WO2020185692A2 (en) | 2019-03-07 | 2020-09-17 | Northwestern University | Rapid, large volume, dead layer-free 3d printing |
| KR20220016453A (ko) | 2019-04-09 | 2022-02-09 | 아줄 쓰리디, 인크. | 적층 제조에 의해 생성되는 부분들을 신속하게 경화시키고 코팅하는 방법론들 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US245029A (en) * | 1881-08-02 | Sole-fastening staple | ||
| US4245029A (en) * | 1979-08-20 | 1981-01-13 | General Electric Company | Photocurable compositions using triarylsulfonium salts |
| US4968582A (en) * | 1988-06-28 | 1990-11-06 | Mcnc And University Of Nc At Charlotte | Photoresists resistant to oxygen plasmas |
| DE69128274T2 (de) * | 1990-11-05 | 1998-04-23 | Ciba Geigy Ag | Photopolymerisierbare Zusammensetzungen |
| JPH04349463A (ja) * | 1991-05-27 | 1992-12-03 | Nippon Telegr & Teleph Corp <Ntt> | ポジ型レジスト材料 |
| US5393642A (en) * | 1992-12-31 | 1995-02-28 | The University Of North Carolina At Charlotte | Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions |
| WO1997033198A1 (en) * | 1996-03-07 | 1997-09-12 | The B.F. Goodrich Company | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| KR100265597B1 (ko) * | 1996-12-30 | 2000-09-15 | 김영환 | Arf 감광막 수지 및 그 제조방법 |
| JP3802179B2 (ja) * | 1997-02-07 | 2006-07-26 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP3832013B2 (ja) | 1997-03-17 | 2006-10-11 | Ｊｓｒ株式会社 | プラズマディスプレイパネル用螢光面の形成方法 |
| JPH1195435A (ja) * | 1997-09-17 | 1999-04-09 | Fuji Photo Film Co Ltd | ポジ型感光性着色組成物 |
| JPH11305433A (ja) * | 1998-04-21 | 1999-11-05 | Toppan Printing Co Ltd | 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ |
| KR100279497B1 (ko) * | 1998-07-16 | 2001-02-01 | 박찬구 | 술포늄 염의 제조방법 |
| KR20000056355A (ko) * | 1999-02-19 | 2000-09-15 | 김영환 | 고농도의 아민 존재하에서 우수한 특성을 갖는 포토레지스트 조성물 |
| KR100481601B1 (ko) * | 1999-09-21 | 2005-04-08 | 주식회사 하이닉스반도체 | 광산 발생제와 함께 광염기 발생제를 포함하는 포토레지스트 조성물 |
-
2000
- 2000-06-30 KR KR1020000037228A patent/KR100583095B1/ko not_active Expired - Fee Related
-
2001
- 2001-06-12 US US09/879,325 patent/US6692891B2/en not_active Expired - Fee Related
- 2001-06-12 GB GB0114259A patent/GB2364392B/en not_active Expired - Fee Related
- 2001-06-21 TW TW090115057A patent/TWI225967B/zh not_active IP Right Cessation
- 2001-06-28 DE DE10131123A patent/DE10131123A1/de not_active Withdrawn
- 2001-06-29 CN CNB011188952A patent/CN1241065C/zh not_active Expired - Fee Related
- 2001-07-02 JP JP2001200816A patent/JP3875519B2/ja not_active Expired - Fee Related
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