JP2002062489A - 光変調装置、該装置による光スイッチ、移動量検出装置及び該装置による距離測定装置、位置合わせ装置及び該装置による半導体露光装置、並びにこれらの方法 - Google Patents

光変調装置、該装置による光スイッチ、移動量検出装置及び該装置による距離測定装置、位置合わせ装置及び該装置による半導体露光装置、並びにこれらの方法

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Publication number
JP2002062489A
JP2002062489A JP2000251598A JP2000251598A JP2002062489A JP 2002062489 A JP2002062489 A JP 2002062489A JP 2000251598 A JP2000251598 A JP 2000251598A JP 2000251598 A JP2000251598 A JP 2000251598A JP 2002062489 A JP2002062489 A JP 2002062489A
Authority
JP
Japan
Prior art keywords
light
periodic
periodic structure
intensity
periodic structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000251598A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002062489A5 (enExample
Inventor
Akira Kuroda
亮 黒田
Junichi Seki
淳一 関
Yasuhiro Shimada
康弘 島田
Takako Yamaguchi
貴子 山口
Yasuhisa Inao
耕久 稲生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000251598A priority Critical patent/JP2002062489A/ja
Priority to US09/931,720 priority patent/US6628392B2/en
Publication of JP2002062489A publication Critical patent/JP2002062489A/ja
Publication of JP2002062489A5 publication Critical patent/JP2002062489A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000251598A 2000-08-22 2000-08-22 光変調装置、該装置による光スイッチ、移動量検出装置及び該装置による距離測定装置、位置合わせ装置及び該装置による半導体露光装置、並びにこれらの方法 Pending JP2002062489A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000251598A JP2002062489A (ja) 2000-08-22 2000-08-22 光変調装置、該装置による光スイッチ、移動量検出装置及び該装置による距離測定装置、位置合わせ装置及び該装置による半導体露光装置、並びにこれらの方法
US09/931,720 US6628392B2 (en) 2000-08-22 2001-08-20 Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000251598A JP2002062489A (ja) 2000-08-22 2000-08-22 光変調装置、該装置による光スイッチ、移動量検出装置及び該装置による距離測定装置、位置合わせ装置及び該装置による半導体露光装置、並びにこれらの方法

Publications (2)

Publication Number Publication Date
JP2002062489A true JP2002062489A (ja) 2002-02-28
JP2002062489A5 JP2002062489A5 (enExample) 2007-10-11

Family

ID=18740975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000251598A Pending JP2002062489A (ja) 2000-08-22 2000-08-22 光変調装置、該装置による光スイッチ、移動量検出装置及び該装置による距離測定装置、位置合わせ装置及び該装置による半導体露光装置、並びにこれらの方法

Country Status (2)

Country Link
US (1) US6628392B2 (enExample)
JP (1) JP2002062489A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019445A (ja) * 2004-06-30 2006-01-19 Canon Inc フォトマスク及び近接場露光方法
JP2006349606A (ja) * 2005-06-20 2006-12-28 Yaskawa Electric Corp 反射型光ギャップセンサ
JP2008131024A (ja) * 2006-11-27 2008-06-05 Canon Inc 近接場露光によるレジストパターンの形成方法
WO2012004988A1 (ja) * 2010-07-09 2012-01-12 パナソニック株式会社 光路変換素子および撮像装置
JP2012109428A (ja) * 2010-11-18 2012-06-07 Nuflare Technology Inc インプリント・リソグラフィ用マスク
JP2018527630A (ja) * 2015-08-28 2018-09-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィアライメント方法およびデータ処理システム

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308002A (ja) * 2000-02-15 2001-11-02 Canon Inc フォトマスクを用いたパターン作製方法、及びパターン作製装置
WO2004008201A2 (en) 2002-07-11 2004-01-22 Hymite A/S Accurate positioning of components of an optical assembly
JP4261849B2 (ja) * 2002-09-06 2009-04-30 キヤノン株式会社 近接場光を用いた露光方法及び、近接場光を用いる露光装置
GB2395261A (en) * 2002-11-11 2004-05-19 Qinetiq Ltd Ranging apparatus
JP4266661B2 (ja) * 2003-02-20 2009-05-20 キヤノン株式会社 近接場露光用フォトマスク
JP4018591B2 (ja) * 2003-05-12 2007-12-05 キヤノン株式会社 近接場光露光用フォトマスク、該フォトマスクを用いた近接場光強度分布の制御方法、パターン作製方法
JP4183245B2 (ja) * 2003-05-12 2008-11-19 キヤノン株式会社 アライメント方法、該アライメント方法を用いた露光方法
JP4194516B2 (ja) * 2003-06-24 2008-12-10 キヤノン株式会社 露光方法、露光用マスク及びデバイスの製造方法
JP4194514B2 (ja) * 2003-06-26 2008-12-10 キヤノン株式会社 露光用マスクの設計方法及び製造方法
US7134343B2 (en) * 2003-07-25 2006-11-14 Kabushiki Kaisha Toshiba Opto-acoustoelectric device and methods for analyzing mechanical vibration and sound
JP4027286B2 (ja) * 2003-08-08 2007-12-26 キヤノン株式会社 近接場露光方法及び装置
JP2005085922A (ja) * 2003-09-08 2005-03-31 Canon Inc マスク作製方法及び微小開口を有するマスク
US7279253B2 (en) * 2003-09-12 2007-10-09 Canon Kabushiki Kaisha Near-field light generating structure, near-field exposure mask, and near-field generating method
US7030506B2 (en) * 2003-10-15 2006-04-18 Infineon Technologies, Ag Mask and method for using the mask in lithographic processing
EP1526411A1 (en) * 2003-10-24 2005-04-27 Obducat AB Apparatus and method for aligning surface
US7173764B2 (en) * 2004-04-22 2007-02-06 Sandia Corporation Apparatus comprising a tunable nanomechanical near-field grating and method for controlling far-field emission
JP2006013400A (ja) * 2004-06-29 2006-01-12 Canon Inc ２つの対象物間の相対的位置ずれ検出方法及び装置
JP4522166B2 (ja) * 2004-06-29 2010-08-11 キヤノン株式会社 露光方法
JP4250570B2 (ja) * 2004-06-30 2009-04-08 キヤノン株式会社 近接場露光方法及びこれを用いた素子の製造方法
JP2006019447A (ja) * 2004-06-30 2006-01-19 Canon Inc レジストパターンの形成方法、基板の加工方法及びデバイスの作製方法
JP2006049538A (ja) * 2004-08-04 2006-02-16 Canon Inc 近接場露光用マスクの密着制御装置及び方法、近接場露光用マスク
JP2006259143A (ja) * 2005-03-16 2006-09-28 Fuji Xerox Co Ltd 配置装置及び方法
GB2426486A (en) * 2005-05-27 2006-11-29 Microsaic Systems Ltd Self-aligning micro-contact print engine
US7737566B2 (en) * 2005-06-01 2010-06-15 Asml Netherlands B.V. Alignment devices and methods for providing phase depth control
JP4520429B2 (ja) 2005-06-01 2010-08-04 エーエスエムエル ネザーランズ ビー．ブイ． 位置合わせ装置への２次元フォトニック結晶の応用
US7466420B2 (en) * 2006-02-16 2008-12-16 Searete Llc Plasmon tomography
JP4958614B2 (ja) * 2006-04-18 2012-06-20 キヤノン株式会社 パターン転写装置、インプリント装置、パターン転写方法および位置合わせ装置
US8053853B2 (en) * 2006-05-03 2011-11-08 Taiwan Semiconductor Manufacturing Company, Ltd. Color filter-embedded MSM image sensor
US8726730B1 (en) * 2011-12-14 2014-05-20 Sandia Corporation Optically transduced MEMS gyro device
US8054371B2 (en) * 2007-02-19 2011-11-08 Taiwan Semiconductor Manufacturing Company, Ltd. Color filter for image sensor
US8168120B1 (en) 2007-03-06 2012-05-01 The Research Foundation Of State University Of New York Reliable switch that is triggered by the detection of a specific gas or substance
DE102007047010B4 (de) * 2007-10-01 2010-05-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikromechanisches Bauelement zur Modulation von elektromagnetischer Strahlung und optisches System mit demselben
US9494419B2 (en) * 2009-07-31 2016-11-15 Hewlett Packard Enterprise Development Lp Beam direction sensor
US9229138B2 (en) * 2009-10-06 2016-01-05 Sri International Twin sub-wavelength grating optical signal processor
US8783106B1 (en) 2011-12-13 2014-07-22 Sandia Corporation Micromachined force-balance feedback accelerometer with optical displacement detection
US8674689B1 (en) 2011-12-14 2014-03-18 Sandia Corporation Optically transduced MEMS magnetometer
US8938148B2 (en) 2012-02-16 2015-01-20 Cisco Technology, Inc. Variable optical attenuator
NO348955B1 (no) 2014-02-28 2025-07-28 Pgs Geophysical As Optisk bevegelsessensor
KR102133320B1 (ko) * 2015-10-09 2020-07-14 에이에스엠엘 네델란즈 비.브이. 검사 및 계측을 위한 방법 및 장치
US10990023B1 (en) * 2020-02-27 2021-04-27 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for diffraction-based overlay measurement
CN116692768A (zh) * 2023-04-11 2023-09-05 莱斯能特(苏州)科技有限公司 压阻式mems绝对压力传感器及其制造方法
AT527414B1 (de) * 2024-01-16 2025-02-15 Univ Linz Verfahren zur Detektion von Positionsabweichungen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR900004269B1 (ko) * 1986-06-11 1990-06-18 가부시기가이샤 도시바 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
EP0329433A3 (en) * 1988-02-16 1989-10-25 Canon Kabushiki Kaisha Position detecting method and apparatus
JP3074579B2 (ja) 1992-01-31 2000-08-07 キヤノン株式会社 位置ずれ補正方法
US5418771A (en) 1993-02-25 1995-05-23 Canon Kabushiki Kaisha Information processing apparatus provided with surface aligning mechanism between probe head substrate and recording medium substrate
EP0880078A3 (en) * 1997-05-23 2001-02-14 Canon Kabushiki Kaisha Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
JPH117207A (ja) * 1997-06-18 1999-01-12 Ricoh Co Ltd 画像形成装置
US5973316A (en) 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
US6171730B1 (en) * 1997-11-07 2001-01-09 Canon Kabushiki Kaisha Exposure method and exposure apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019445A (ja) * 2004-06-30 2006-01-19 Canon Inc フォトマスク及び近接場露光方法
JP2006349606A (ja) * 2005-06-20 2006-12-28 Yaskawa Electric Corp 反射型光ギャップセンサ
JP2008131024A (ja) * 2006-11-27 2008-06-05 Canon Inc 近接場露光によるレジストパターンの形成方法
WO2012004988A1 (ja) * 2010-07-09 2012-01-12 パナソニック株式会社 光路変換素子および撮像装置
JP2012018355A (ja) * 2010-07-09 2012-01-26 Panasonic Corp 光路変換素子および撮像装置
US8848276B2 (en) 2010-07-09 2014-09-30 Panasonic Corporation Optical-path conversion device and imaging apparatus
JP2012109428A (ja) * 2010-11-18 2012-06-07 Nuflare Technology Inc インプリント・リソグラフィ用マスク
JP2018527630A (ja) * 2015-08-28 2018-09-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィアライメント方法およびデータ処理システム
US10386735B2 (en) 2015-08-28 2019-08-20 Asml Netherlands B.V. Lithographic apparatus alignment sensor and method

Also Published As

Publication number Publication date
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US6628392B2 (en) 2003-09-30

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