JP2002043272A - 基板洗浄装置及び基板処理装置 - Google Patents
基板洗浄装置及び基板処理装置Info
- Publication number
- JP2002043272A JP2002043272A JP2000229104A JP2000229104A JP2002043272A JP 2002043272 A JP2002043272 A JP 2002043272A JP 2000229104 A JP2000229104 A JP 2000229104A JP 2000229104 A JP2000229104 A JP 2000229104A JP 2002043272 A JP2002043272 A JP 2002043272A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning
- tank
- cleaning tank
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 197
- 239000000758 substrate Substances 0.000 title claims abstract description 173
- 238000001035 drying Methods 0.000 claims abstract description 18
- 230000007246 mechanism Effects 0.000 claims description 29
- 238000005406 washing Methods 0.000 claims description 12
- 230000032258 transport Effects 0.000 claims description 6
- 230000007723 transport mechanism Effects 0.000 claims description 3
- 230000005484 gravity Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 40
- 239000003595 mist Substances 0.000 abstract description 14
- 238000009792 diffusion process Methods 0.000 abstract description 10
- 241001125929 Trisopterus luscus Species 0.000 abstract description 4
- 238000010276 construction Methods 0.000 abstract 2
- 238000005498 polishing Methods 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000007788 liquid Substances 0.000 description 15
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
- 238000005192 partition Methods 0.000 description 7
- 229910021642 ultra pure water Inorganic materials 0.000 description 6
- 239000012498 ultrapure water Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000004744 fabric Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000229104A JP2002043272A (ja) | 2000-07-28 | 2000-07-28 | 基板洗浄装置及び基板処理装置 |
| US09/915,289 US6616512B2 (en) | 2000-07-28 | 2001-07-27 | Substrate cleaning apparatus and substrate polishing apparatus with substrate cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000229104A JP2002043272A (ja) | 2000-07-28 | 2000-07-28 | 基板洗浄装置及び基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002043272A true JP2002043272A (ja) | 2002-02-08 |
| JP2002043272A5 JP2002043272A5 (enrdf_load_stackoverflow) | 2005-08-04 |
Family
ID=18722278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000229104A Pending JP2002043272A (ja) | 2000-07-28 | 2000-07-28 | 基板洗浄装置及び基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002043272A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009059795A (ja) * | 2007-08-30 | 2009-03-19 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
| JP2011043584A (ja) * | 2009-08-19 | 2011-03-03 | Shin-Etsu Chemical Co Ltd | 基板の洗浄装置及び洗浄方法 |
| JP5223091B2 (ja) * | 2006-03-20 | 2013-06-26 | 高橋金属株式会社 | 水系洗浄液を用いる洗浄装置 |
| WO2014103523A1 (ja) * | 2012-12-28 | 2014-07-03 | 大日本スクリーン製造株式会社 | 処理装置とその排気切換装置並びに排気切換ユニットと切換弁ボックス |
| JP2015204322A (ja) * | 2014-04-11 | 2015-11-16 | 株式会社ディスコ | 洗浄装置 |
| KR20170108272A (ko) * | 2016-03-17 | 2017-09-27 | 주성엔지니어링(주) | 기판 처리장치 |
-
2000
- 2000-07-28 JP JP2000229104A patent/JP2002043272A/ja active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5223091B2 (ja) * | 2006-03-20 | 2013-06-26 | 高橋金属株式会社 | 水系洗浄液を用いる洗浄装置 |
| JP2009059795A (ja) * | 2007-08-30 | 2009-03-19 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
| JP2011043584A (ja) * | 2009-08-19 | 2011-03-03 | Shin-Etsu Chemical Co Ltd | 基板の洗浄装置及び洗浄方法 |
| WO2014103523A1 (ja) * | 2012-12-28 | 2014-07-03 | 大日本スクリーン製造株式会社 | 処理装置とその排気切換装置並びに排気切換ユニットと切換弁ボックス |
| JPWO2014103523A1 (ja) * | 2012-12-28 | 2017-01-12 | 株式会社Ｓｃｒｅｅｎホールディングス | 処理装置とその排気切換装置並びに排気切換ユニットと切換弁ボックス |
| US10471479B2 (en) | 2012-12-28 | 2019-11-12 | SCREEN Holdings Co., Ltd. | Treatment device and exhaust switching device therefor, and exhaust switching unit and switching valve box |
| JP2015204322A (ja) * | 2014-04-11 | 2015-11-16 | 株式会社ディスコ | 洗浄装置 |
| KR20170108272A (ko) * | 2016-03-17 | 2017-09-27 | 주성엔지니어링(주) | 기판 처리장치 |
| KR102478902B1 (ko) | 2016-03-17 | 2022-12-20 | 주성엔지니어링(주) | 기판 처리장치 |
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