JP2002040656A5 - - Google Patents
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- Publication number
- JP2002040656A5 JP2002040656A5 JP2000219253A JP2000219253A JP2002040656A5 JP 2002040656 A5 JP2002040656 A5 JP 2002040656A5 JP 2000219253 A JP2000219253 A JP 2000219253A JP 2000219253 A JP2000219253 A JP 2000219253A JP 2002040656 A5 JP2002040656 A5 JP 2002040656A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- hydrogen atom
- electron beam
- single bond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000001424 substituent group Chemical group 0.000 description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 11
- 238000010894 electron beam technology Methods 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000003710 aryl alkyl group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 125000002947 alkylene group Chemical group 0.000 description 6
- 125000000732 arylene group Chemical group 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 5
- 125000002993 cycloalkylene group Chemical group 0.000 description 5
- 125000004450 alkenylene group Chemical group 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 125000000547 substituted alkyl group Chemical group 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 125000001188 haloalkyl group Chemical group 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 150000007945 N-acyl ureas Chemical group 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical group 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- -1 iodonium sulfonate compounds Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000219253A JP4149122B2 (ja) | 2000-07-19 | 2000-07-19 | 電子線又はｘ線用ネガ型レジスト組成物 |
| TW090116739A TW567402B (en) | 2000-07-19 | 2001-07-09 | Negative resist composition for electron ray or X-ray |
| KR1020010043328A KR100775453B1 (ko) | 2000-07-19 | 2001-07-19 | 전자선 또는 엑스선용 네가티브 레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000219253A JP4149122B2 (ja) | 2000-07-19 | 2000-07-19 | 電子線又はｘ線用ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002040656A JP2002040656A (ja) | 2002-02-06 |
| JP2002040656A5 true JP2002040656A5 (enExample) | 2006-01-12 |
| JP4149122B2 JP4149122B2 (ja) | 2008-09-10 |
Family
ID=18714064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000219253A Expired - Fee Related JP4149122B2 (ja) | 2000-07-19 | 2000-07-19 | 電子線又はｘ線用ネガ型レジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4149122B2 (enExample) |
| KR (1) | KR100775453B1 (enExample) |
| TW (1) | TW567402B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NO20031736D0 (no) * | 2003-04-15 | 2003-04-15 | Amersham Health As | Forbindelser |
| US9469941B2 (en) | 2011-07-01 | 2016-10-18 | Empire Technology Development Llc | Paraben derivatives for preserving cellulosic materials |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08240911A (ja) * | 1995-03-02 | 1996-09-17 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
| JPH08272099A (ja) * | 1995-03-31 | 1996-10-18 | Oki Electric Ind Co Ltd | 放射線感応性樹脂組成物およびこれを用いたパターン形成方法 |
| JP3633179B2 (ja) * | 1997-01-27 | 2005-03-30 | Ｊｓｒ株式会社 | ポジ型フォトレジスト組成物 |
| JPH1149847A (ja) * | 1997-05-15 | 1999-02-23 | Hitachi Ltd | 感光性樹脂組成物とそれを用いた絶縁フィルム及び多層配線板 |
| JPH1115154A (ja) * | 1997-06-20 | 1999-01-22 | Chisso Corp | 感光性樹脂組成物及びこれを用いた表示素子 |
| TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| JP2000147752A (ja) * | 1998-11-05 | 2000-05-26 | Fuji Photo Film Co Ltd | ネガ型レジスト組成物 |
| JP2000159828A (ja) * | 1998-11-30 | 2000-06-13 | Nippon Shokubai Co Ltd | 感光性樹脂組成物、電子線硬化性樹脂組成物、及びそれらの硬化物 |
-
2000
- 2000-07-19 JP JP2000219253A patent/JP4149122B2/ja not_active Expired - Fee Related
-
2001
- 2001-07-09 TW TW090116739A patent/TW567402B/zh not_active IP Right Cessation
- 2001-07-19 KR KR1020010043328A patent/KR100775453B1/ko not_active Expired - Fee Related