JP2002099085A5 - - Google Patents
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- JP2002099085A5 JP2002099085A5 JP2000290578A JP2000290578A JP2002099085A5 JP 2002099085 A5 JP2002099085 A5 JP 2002099085A5 JP 2000290578 A JP2000290578 A JP 2000290578A JP 2000290578 A JP2000290578 A JP 2000290578A JP 2002099085 A5 JP2002099085 A5 JP 2002099085A5
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- JP
- Japan
- Prior art keywords
- group
- ray
- compound
- electron beam
- resist composition
- Prior art date
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- 238000010894 electron beam technology Methods 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004450 alkenylene group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000002993 cycloalkylene group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- -1 iodonium sulfonate compounds Chemical class 0.000 description 2
- 150000007945 N-acyl ureas Chemical group 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000290578A JP4276773B2 (ja) | 2000-09-25 | 2000-09-25 | 電子線又はｘ線用ネガ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000290578A JP4276773B2 (ja) | 2000-09-25 | 2000-09-25 | 電子線又はｘ線用ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002099085A JP2002099085A (ja) | 2002-04-05 |
| JP2002099085A5 true JP2002099085A5 (enExample) | 2006-01-12 |
| JP4276773B2 JP4276773B2 (ja) | 2009-06-10 |
Family
ID=18773787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000290578A Expired - Lifetime JP4276773B2 (ja) | 2000-09-25 | 2000-09-25 | 電子線又はｘ線用ネガ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4276773B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4645789B2 (ja) * | 2001-06-18 | 2011-03-09 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
| KR100512171B1 (ko) * | 2003-01-24 | 2005-09-02 | 삼성전자주식회사 | 하층 레지스트용 조성물 |
| JP2007056109A (ja) * | 2005-08-23 | 2007-03-08 | Jsr Corp | 感光性絶縁樹脂組成物およびその硬化物 |
| JP2007056108A (ja) * | 2005-08-23 | 2007-03-08 | Jsr Corp | 感光性絶縁樹脂組成物およびその硬化物 |
| JP5380008B2 (ja) * | 2008-06-20 | 2014-01-08 | 本州化学工業株式会社 | テトラキス（ヒドロキシメチルフェノール）類およびそのホルミル化誘導体のテトラキス（ホルミルフェノール）類 |
| JP6267982B2 (ja) | 2014-02-05 | 2018-01-24 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、電子デバイスの製造方法、新規化合物、及び、新規化合物の製造方法 |
| JP6313604B2 (ja) | 2014-02-05 | 2018-04-18 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法 |
| JP6402245B2 (ja) | 2015-04-07 | 2018-10-10 | 富士フイルム株式会社 | ネガ型感活性光線性又は感放射線性樹脂組成物、ネガ型感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法 |
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2000
- 2000-09-25 JP JP2000290578A patent/JP4276773B2/ja not_active Expired - Lifetime