JP4276773B2 - 電子線又はｘ線用ネガ型レジスト組成物 - Google Patents

電子線又はｘ線用ネガ型レジスト組成物 Download PDF

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Publication number
JP4276773B2
JP4276773B2 JP2000290578A JP2000290578A JP4276773B2 JP 4276773 B2 JP4276773 B2 JP 4276773B2 JP 2000290578 A JP2000290578 A JP 2000290578A JP 2000290578 A JP2000290578 A JP 2000290578A JP 4276773 B2 JP4276773 B2 JP 4276773B2
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group
compound
resin
electron beam
ray
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JP2002099085A (ja
JP2002099085A5 (enExample
Inventor
利明 青合
豊 阿出川
一也 上西
浩司 白川
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Fujifilm Corp
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Fujifilm Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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JP2000290578A 2000-09-25 2000-09-25 電子線又はｘ線用ネガ型レジスト組成物 Expired - Lifetime JP4276773B2 (ja)

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JP2000290578A JP4276773B2 (ja) 2000-09-25 2000-09-25 電子線又はｘ線用ネガ型レジスト組成物

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JP2000290578A JP4276773B2 (ja) 2000-09-25 2000-09-25 電子線又はｘ線用ネガ型レジスト組成物

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JP2002099085A JP2002099085A (ja) 2002-04-05
JP2002099085A5 JP2002099085A5 (enExample) 2006-01-12
JP4276773B2 true JP4276773B2 (ja) 2009-06-10

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4645789B2 (ja) * 2001-06-18 2011-03-09 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物
KR100512171B1 (ko) * 2003-01-24 2005-09-02 삼성전자주식회사 하층 레지스트용 조성물
JP2007056109A (ja) * 2005-08-23 2007-03-08 Jsr Corp 感光性絶縁樹脂組成物およびその硬化物
JP2007056108A (ja) * 2005-08-23 2007-03-08 Jsr Corp 感光性絶縁樹脂組成物およびその硬化物
JP5380008B2 (ja) * 2008-06-20 2014-01-08 本州化学工業株式会社 テトラキス（ヒドロキシメチルフェノール）類およびそのホルミル化誘導体のテトラキス（ホルミルフェノール）類
JP6267982B2 (ja) 2014-02-05 2018-01-24 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、電子デバイスの製造方法、新規化合物、及び、新規化合物の製造方法
JP6313604B2 (ja) 2014-02-05 2018-04-18 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法
JP6402245B2 (ja) 2015-04-07 2018-10-10 富士フイルム株式会社 ネガ型感活性光線性又は感放射線性樹脂組成物、ネガ型感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法

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