JP2002033281A5 - - Google Patents

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Publication number
JP2002033281A5
JP2002033281A5 JP2000212767A JP2000212767A JP2002033281A5 JP 2002033281 A5 JP2002033281 A5 JP 2002033281A5 JP 2000212767 A JP2000212767 A JP 2000212767A JP 2000212767 A JP2000212767 A JP 2000212767A JP 2002033281 A5 JP2002033281 A5 JP 2002033281A5
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JP
Japan
Prior art keywords
vacuum pump
container
gas
processing apparatus
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000212767A
Other languages
English (en)
Japanese (ja)
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JP2002033281A (ja
JP3667202B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2000212767A priority Critical patent/JP3667202B2/ja
Priority claimed from JP2000212767A external-priority patent/JP3667202B2/ja
Priority to US09/902,766 priority patent/US6514348B2/en
Publication of JP2002033281A publication Critical patent/JP2002033281A/ja
Publication of JP2002033281A5 publication Critical patent/JP2002033281A5/ja
Application granted granted Critical
Publication of JP3667202B2 publication Critical patent/JP3667202B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000212767A 2000-07-13 2000-07-13 基板処理装置 Expired - Fee Related JP3667202B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000212767A JP3667202B2 (ja) 2000-07-13 2000-07-13 基板処理装置
US09/902,766 US6514348B2 (en) 2000-07-13 2001-07-12 Substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000212767A JP3667202B2 (ja) 2000-07-13 2000-07-13 基板処理装置

Publications (3)

Publication Number Publication Date
JP2002033281A JP2002033281A (ja) 2002-01-31
JP2002033281A5 true JP2002033281A5 (https=) 2004-12-02
JP3667202B2 JP3667202B2 (ja) 2005-07-06

Family

ID=18708638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000212767A Expired - Fee Related JP3667202B2 (ja) 2000-07-13 2000-07-13 基板処理装置

Country Status (2)

Country Link
US (1) US6514348B2 (https=)
JP (1) JP3667202B2 (https=)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537420B2 (en) * 1999-12-17 2003-03-25 Texas Instruments Incorporated Method and apparatus for restricting process fluid flow within a showerhead assembly
JP3667202B2 (ja) * 2000-07-13 2005-07-06 株式会社荏原製作所 基板処理装置
US6852167B2 (en) * 2001-03-01 2005-02-08 Micron Technology, Inc. Methods, systems, and apparatus for uniform chemical-vapor depositions
JP3886424B2 (ja) * 2001-08-28 2007-02-28 鹿児島日本電気株式会社 基板処理装置及び方法
US6953730B2 (en) * 2001-12-20 2005-10-11 Micron Technology, Inc. Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
US7160577B2 (en) * 2002-05-02 2007-01-09 Micron Technology, Inc. Methods for atomic-layer deposition of aluminum oxides in integrated circuits
US7589029B2 (en) 2002-05-02 2009-09-15 Micron Technology, Inc. Atomic layer deposition and conversion
US7135421B2 (en) * 2002-06-05 2006-11-14 Micron Technology, Inc. Atomic layer-deposited hafnium aluminum oxide
US7221586B2 (en) * 2002-07-08 2007-05-22 Micron Technology, Inc. Memory utilizing oxide nanolaminates
TW589396B (en) * 2003-01-07 2004-06-01 Arima Optoelectronics Corp Chemical vapor deposition reactor
US7192892B2 (en) * 2003-03-04 2007-03-20 Micron Technology, Inc. Atomic layer deposited dielectric layers
US7717684B2 (en) * 2003-08-21 2010-05-18 Ebara Corporation Turbo vacuum pump and semiconductor manufacturing apparatus having the same
WO2005112084A1 (en) * 2004-05-18 2005-11-24 Mecharonics Co., Ltd. Method for forming organic light-emitting layer
US7927948B2 (en) 2005-07-20 2011-04-19 Micron Technology, Inc. Devices with nanocrystals and methods of formation
JP4885000B2 (ja) * 2007-02-13 2012-02-29 株式会社ニューフレアテクノロジー 気相成長装置および気相成長方法
US8252114B2 (en) * 2008-03-28 2012-08-28 Tokyo Electron Limited Gas distribution system and method for distributing process gas in a processing system
JP5075793B2 (ja) * 2008-11-06 2012-11-21 東京エレクトロン株式会社 可動ガス導入構造物及び基板処理装置
JP2010174779A (ja) * 2009-01-30 2010-08-12 Hitachi High-Technologies Corp 真空処理装置
JP5567392B2 (ja) * 2010-05-25 2014-08-06 東京エレクトロン株式会社 プラズマ処理装置
JP5902896B2 (ja) * 2011-07-08 2016-04-13 東京エレクトロン株式会社 基板処理装置
JP5944883B2 (ja) * 2013-12-18 2016-07-05 東京エレクトロン株式会社 粒子逆流防止部材及び基板処理装置
JP6738485B2 (ja) * 2016-08-26 2020-08-12 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 低圧リフトピンキャビティハードウェア
US10559451B2 (en) * 2017-02-15 2020-02-11 Applied Materials, Inc. Apparatus with concentric pumping for multiple pressure regimes
GB2575451B (en) * 2018-07-09 2021-01-27 Edwards Ltd Vacuum pump with through channel and vacuum chamber
TWI901580B (zh) * 2019-03-15 2025-10-21 美商蘭姆研究公司 用於蝕刻反應器的渦輪分子泵及陰極組件
GB2584160A (en) * 2019-05-24 2020-11-25 Edwards Ltd Vacuum assembly and vacuum pump with an axial through passage
GB2591814A (en) * 2020-02-10 2021-08-11 Edwards Vacuum Llc Housing for a vacuum pump

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4873833A (en) * 1988-11-23 1989-10-17 American Telephone Telegraph Company, At&T Bell Laboratories Apparatus comprising a high-vacuum chamber
JP2000183037A (ja) * 1998-12-11 2000-06-30 Tokyo Electron Ltd 真空処理装置
US6327863B1 (en) * 2000-05-05 2001-12-11 Helix Technology Corporation Cryopump with gate valve control
JP3667202B2 (ja) * 2000-07-13 2005-07-06 株式会社荏原製作所 基板処理装置
US6852167B2 (en) * 2001-03-01 2005-02-08 Micron Technology, Inc. Methods, systems, and apparatus for uniform chemical-vapor depositions

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