TW200517706A - Processing chamber of flat-panel display manufacturing apparatus having upper cover opening/closing device - Google Patents

Processing chamber of flat-panel display manufacturing apparatus having upper cover opening/closing device

Info

Publication number
TW200517706A
TW200517706A TW093132855A TW93132855A TW200517706A TW 200517706 A TW200517706 A TW 200517706A TW 093132855 A TW093132855 A TW 093132855A TW 93132855 A TW93132855 A TW 93132855A TW 200517706 A TW200517706 A TW 200517706A
Authority
TW
Taiwan
Prior art keywords
upper cover
closing device
chamber body
processing chamber
opening
Prior art date
Application number
TW093132855A
Other languages
Chinese (zh)
Other versions
TWI271571B (en
Inventor
Gwang-Ho Hur
Jun-Young Choi
Cheol-Won Lee
Original Assignee
Advanced Display Proc Eng Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Display Proc Eng Co filed Critical Advanced Display Proc Eng Co
Publication of TW200517706A publication Critical patent/TW200517706A/en
Application granted granted Critical
Publication of TWI271571B publication Critical patent/TWI271571B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Disclosed herein is a processing chamber for a flat-panel display device manufacturing apparatus which comprises an opening/closing device for opening or closing an upper cover of the chamber. The processing chamber comprises a chamber body, and an upper cover disposed on the chamber body so as to be opened away from the chamber body. In a closed state of the upper cover, the interior of the chamber body is isolated from the outside, producing vacuum therein. The chamber body are internally mounted with substrate support means for supporting substrates to be processed, a processor gas supply system, and an exhaust system for evacuating the chamber body, and are externally mounted with a first upper cover opening/closing device. The first upper cover opening/closing device comprises lifters for vertically lifting the upper cover, and rotators for rotating the upper cover lifted by the lifters.
TW093132855A 2003-11-18 2004-10-29 Processing chamber of flat-panel display manufacturing apparatus having upper cover opening/closing device TWI271571B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2003-0081429A KR100515955B1 (en) 2003-11-18 2003-11-18 Processing chamber of FPD manufacturing machine having a device for opening the cover

Publications (2)

Publication Number Publication Date
TW200517706A true TW200517706A (en) 2005-06-01
TWI271571B TWI271571B (en) 2007-01-21

Family

ID=34858582

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093132855A TWI271571B (en) 2003-11-18 2004-10-29 Processing chamber of flat-panel display manufacturing apparatus having upper cover opening/closing device

Country Status (3)

Country Link
KR (1) KR100515955B1 (en)
CN (1) CN100437878C (en)
TW (1) TWI271571B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100622846B1 (en) * 2004-10-06 2006-09-19 주식회사 에이디피엔지니어링 Apparatus for manufacturing fpd
TWI276157B (en) * 2005-01-31 2007-03-11 Dainippon Screen Mfg Substrate processing apparatus
KR100773263B1 (en) * 2005-10-17 2007-11-05 주식회사 에이디피엔지니어링 Apparatus for vacuum processing
KR100757693B1 (en) * 2005-10-17 2007-09-13 주식회사 에이디피엔지니어링 Apparatus for vacuum processing
KR100667598B1 (en) * 2005-02-25 2007-01-12 주식회사 아이피에스 Apparatus for semiconductor process
JP4642608B2 (en) * 2005-08-31 2011-03-02 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing system
CN100383916C (en) * 2005-12-08 2008-04-23 北京圆合电子技术有限责任公司 Platform cover-opening mechanism
KR100790797B1 (en) * 2006-06-08 2008-01-02 주식회사 아이피에스 Vacuum Processing Apparatus
KR101000330B1 (en) * 2008-04-22 2010-12-13 엘아이지에이디피 주식회사 apparatus for processing substrate
KR101036186B1 (en) * 2008-04-22 2011-05-23 엘아이지에이디피 주식회사 apparatus for processing substrate
KR101007711B1 (en) * 2008-05-19 2011-01-13 주식회사 에스에프에이 Plasma processing apparatus
JP5575558B2 (en) * 2010-06-30 2014-08-20 東京エレクトロン株式会社 Processing equipment
CN103811397B (en) * 2012-11-13 2016-06-01 沈阳芯源微电子设备有限公司 A kind of substrate overturn aligning gear
CN103818861A (en) * 2014-03-12 2014-05-28 合肥彩虹蓝光科技有限公司 Upper cover lifting system of reaction chamber cavity body
CN109773155A (en) * 2017-11-10 2019-05-21 重庆科美模具有限公司 A kind of bracket manufacture mold
CN108000776A (en) * 2017-11-30 2018-05-08 无锡市军豪复合材料有限公司 A kind of die for wind pressure moulding process of fiberglass products

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4608172B2 (en) * 2000-03-22 2011-01-05 出光興産株式会社 Organic EL display device manufacturing method and organic EL display device manufacturing method using the same
JP4707271B2 (en) * 2001-06-29 2011-06-22 三洋電機株式会社 Method for manufacturing electroluminescence element
JP2003217855A (en) * 2002-01-28 2003-07-31 Matsushita Electric Ind Co Ltd Electroluminescence display, and manufacturing method therefor
JP2003286563A (en) * 2002-03-28 2003-10-10 Sony Corp Film-forming apparatus and film-forming method

Also Published As

Publication number Publication date
CN100437878C (en) 2008-11-26
KR20050047677A (en) 2005-05-23
KR100515955B1 (en) 2005-09-23
TWI271571B (en) 2007-01-21
CN1630000A (en) 2005-06-22

Similar Documents

Publication Publication Date Title
TW200517706A (en) Processing chamber of flat-panel display manufacturing apparatus having upper cover opening/closing device
TW200744145A (en) Cluster processing apparatus
CN106856664B (en) The atmosphere method of replacing of load port and load port
TW200629395A (en) Supporting plate attaching apparatus
KR101241644B1 (en) Substrate processing apparatus
TW200943468A (en) Plasma processing device
KR100196036B1 (en) Plasma treating apparatus and operating method therefor
KR100629805B1 (en) Vacuum process apparatus
JPH05196150A (en) Gate valve
CN101556911B (en) Substrate processer
WO2008155932A1 (en) Substrate carrying method
JP2004047695A5 (en)
WO2021178049A8 (en) Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring
JP3694388B2 (en) Semiconductor manufacturing equipment
JP2001033357A (en) Sample conveying device
WO2009054064A1 (en) Substrate loading apparatus
JPH10303099A (en) Substrate treatment device
KR101632043B1 (en) Load lock device and vacuum treatment chamber equipped with same
JP2007088337A (en) Substrate processing apparatus
JP2008300552A (en) Transport chamber and vacuum treatment device
JP2000144430A (en) Vacuum treating device and multichamber type vacuum treating device
US20070151669A1 (en) Vacuum processing apparatus
JP5123807B2 (en) Continuous low oxygen concentration atmosphere treatment room
WO2008129617A1 (en) Substrate processing system
KR20090067319A (en) Lid opening/closing apparatus

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees