TWI276157B - Substrate processing apparatus - Google Patents

Abstract

The invention provides a substrate processing apparatus which can support the component of processing chamber firmly by a concise structure at maintenance position. The processing chamber 13 of the substrate processing apparatus 1 is composed of a main body 131 and an upper cover 132 for treating the substrate W. The processing equipment frame 11 supports each component in the inner processing position of the specified processing equipment frame 11. While maintaining, each component in the inner maintenance position of the specified maintenance frame 21 is supported by the maintenance frame 21. Each main body 131 and upper cover 132 in the processing chamber 13 can move independently between the processing position and the maintenance position. The maintenance frame 21 and the processing equipment frame 22 are independent and form the support structure to support the main body 131 and the upper cover 132 from outside of the processing apparatus frame 11.

Description

!276157 ^ 九,#明说明: ‘Technical Field to Which the Invention Is Along The present invention relates to a substrate processing apparatus having a processing chamber for performing specific processing on a substrate. [Prior Art] Conventionally, a substrate processing apparatus having a processing chamber for performing specific processing on a substrate has been used. In the substrate processing apparatus, in order to reduce the area occupied by the body, the plurality of processing chambers are stacked in the vertical direction. For example, Patent Document 1 discloses a multilayer substrate processing apparatus in which a plurality of processing chambers are stacked in a vertical direction and a processing chamber can be pulled out to a maintenance position outside the housing for ease of maintenance. In the substrate processing apparatus of Patent Document 1, the processing chamber pulled out to the position at the time of maintenance is supported by one side of the member extending from the frame to the horizontal direction. In such a substrate processing apparatus, when the substrate is processed, the processing chamber is sealed', and when the maintenance is performed, it is possible to enter the processing chamber, and the processing chamber I is provided with a cover that can be opened and closed with the hinge as the axis. In the substrate processing chamber provided with such a cover, the entire processing chamber is pulled out to the outside of the casing, and the lid is lifted upward to open the inside, and then the inside of the processing chamber is repaired. [Patent Document] JP-A-2000-12448 On the other hand, the substrate processing apparatus tends to increase the size of the substrate to be processed. In recent years, when the weight of the processing chamber exceeds 1 〇〇〇kg, the weight of the cover exceeds 1 〇0. The case of kg. Therefore, in the plate processing apparatus of Patent Document i, the members of the processing chamber that are unilaterally supported to be pulled out to the maintenance position and the members of the opening and closing cover are inevitably required to be increased in strength, which is caused by the large size of the member or The increase in weight causes a problem of an increase in size or weight of the entire substrate processing apparatus. SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object thereof is to provide a substrate processing apparatus capable of reliably supporting a member constituting a processing chamber with a simple structure.

In order to solve the above problems, the invention of claim 1 is a substrate processing apparatus including a processing chamber for performing a specific processing on a substrate, and an i-th support structure which is disposed at a position where the processing chamber processes the substrate The processing position 'supports a specific member constituting the processing chamber; the second branch structure is at a retracted position different from the processing position, and is independent of the first supporting structure and is in the second supporting structure The feature member and the moving mechanism are externally supported to move the specific member between the processing position and the retracted position. The invention of claim 2 is the substrate processing apparatus of claim 1, wherein the processing chamber is separable into a plurality of members, and the moving mechanism is configured to perform at least one of the plurality of members as the specific member. Move between the time position and the back-off position. The invention of Item 3 is in the substrate processing apparatus of the claim item, the above beauty

Li: the apparatus has a plurality of processing chambers, and the first support structure and the second stacking unit respectively support the processing position and the retreat support "the movement" defined by the specific member of the specific member 2 that constitutes each of the processing chambers The position of the above-mentioned material and the position of the material to be evaded as stipulated by the structure of the body (4) ^ components are = 105795.doc 1276157. Further, in the substrate processing apparatus of the request item, the moving mechanism moves the specific member horizontally between the processing position and the retracted position. The invention of claim 5, wherein the substrate processing apparatus includes a processing chamber for processing a substrate, and includes: a first support structure supporting the plurality of separable members of the processing chamber; and moving The mechanism 2 moves the at least one specific member of the plurality of members to the outside of the first holding structure. The invention of claim 6 is directed to the substrate processing apparatus of claim 5, wherein the support structure is independent of the first support structure and supports the specific member outside the H-made structure. The second support structure of the moving mechanism performs the support position of the brother 1 and the member. The invention of the specific request item 7 in the second support position of f is in the substrate processing apparatus of claim 5, wherein the above-mentioned sheet processing apparatus has a plurality of processing chambers, and the upper chamber is formed into a plurality of processing chambers. In each of the specific members, the moving mechanism (4) is (4) the specific member of each of the processing chambers moves outside the first holding structure. The invention of claim 8 is directed to the request item 6 in the above-mentioned p support... In the above, the specific component is horizontally moved.吏 根据 根据 根据 根据 根据 根据 根据 至 nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn nn The material member member can be retracted to the retracted condition according to the request item 2 > | nn avoiding the position, so that the processing device has a specific member of the plurality of processing chambers. The structure does support each of the complex processing rooms

According to the request item 5 to the branch ^ ^ pay the nickname. The Φ of the plurality of members is such that the damming member constituting the processing chamber can be moved outside the first supporting member, so that the structure of the intermediate member 4 surely supports the specific member. The invention of ==6, in the second support position, the support structure is supported by the support structure of the second support structure. Can be simple

According to the invention of claim 7, the substrate processing apparatus has a moon shape of a plurality of processing chambers, and the structure can be surely supported by a simple structure. According to the invention of claim 8, the specific member can be moved with a small force. [Embodiment] > A substrate processing apparatus according to an embodiment of the present invention! The substrate is heated (or cooled). However, this is merely an example, and the substrate processing apparatus 1 is also applicable to the substrate in addition to the heat treatment of the substrate. Also, the substrate processing device! The substrate to be processed is not particularly limited, and examples thereof include a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a PDP (plasma display panel), a glass substrate for a optical disk, and a glass for magnetic disk 105795.doc 1276157 A ceramic substrate for a substrate or a magnetic disk. Hereinafter, the structure of the substrate processing apparatus 1 will be described with reference to FIG. Fig. 1 is a perspective view showing a schematic overall configuration of a substrate processing apparatus according to an embodiment of the present invention. In Fig. i, a χγζ rectangular coordinate system in which the plate surface FL of the substrate processing apparatus is also set to the XY plane is defined, and the direction in which the conveyance path 901 on the floor surface extends is the z-axis direction. Transporting roads, transporting

The substrate processing apparatus 1 serves as a moving path of the transport robot of the substrate w to be processed, and the substrate processing apparatus 1 performs specific processing on the substrate W transported by the transport robot by the upstream side process. In the substrate processing apparatus 1, the multi-layer apparatus for accommodating the plurality of processing chambers 13 is vertically stacked inside the processing apparatus frame 11. Further, the substrate processing apparatus having the three processing chambers 13 is required to have a processing chamber: 3: the number $ may be two or less or four or more. The processing device frame (4) is a frame having a substantially rectangular parallelepiped shape formed by a rod-like member such as a tube or an angle iron, and functions as a support structure for the internal σ support treatment to 13. In the processing device frame 11, the Jindi 柘 播 播 。 , , , 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 需要 。 。 。 。 。 。 。 。 。 The knife can be separated from the upper member of the lower member, the upper body 131, and the upper member, in the substrate processing apparatus 1, and the adjacent frame is 21. The processing is placed on the rotary frame 11 and the maintenance beech 21 is provided. The frame 21 is a rod-shaped structure such as a bone path tube or an angle iron. The frame 11 is similarly shaped. The maintenance frame 21... is formed to have a slightly rectangular wooden body 21, which can be set only during maintenance. When the maintenance frame 21 is placed in the same time, the processing frame 丨丨 and the maintenance frame 21 may be combined into one frame as a single body. The respective processing chambers 13 are configured. When the substrate w is processed, the main body 131 and the upper cover 132 are supported by the processing device frame 11 at the processing position inside the processing device frame u defined by each member, but the maintenance is performed for each member when performing maintenance (maintenance). Internal maintenance of frame 21 Position to repair a

Frame 21 support. Each of the body 131 and the cover 132 is independently movable between a position at the time of processing and a position at the time of maintenance. The processing frame 11 and the maintenance frame 21 are disposed on different areas of the floor surface FL on which the substrate processing apparatus is disposed, and the maintenance frame 21 supports the main body i3i independently of the processing device frame 11 in the processing device frame And the support structure of the cover 132, whereby the processing device frame 丨丨 and the maintenance frame η do not depend on each other on the support body 131 and the cover 132, and the body 131 and the upper cover 132 are supported by the maintenance frame 21 at the time of maintenance. At this time, the maintenance frame does not have a large effect (load) on the processing device frame u. Therefore, when the substrate processing apparatus 1' moves the main body 131 and the cover 132 to the maintenance position outside the processing apparatus frame 11, since the main body (3) and the cover 132 are supported by the maintenance frame 21 independent of the processing of the agricultural frame U, Unlike the case of the previous one-sided support, no large load is applied to the processing device frame 11. Therefore, in the substrate processing apparatus, the body m and the cover 132' can be surely supported at the time of maintenance, and the complicated structure of the member such as the unilateral support is not required. The support body 131 and the upper cover 132 can be constructed in a compact manner. Further, as will be described later, since the substrate processing apparatus can separate the main body 131 and the upper cover 132 from the inside of the processing apparatus frame 11, the required components are pulled out by the processing apparatus frame 105795.doc 1276157, so that it is not necessary for the processing chamber 13 The complicated member that is provided to open the upper cover 132 can also support the body 13 丨 and the upper cover 132 in a compact configuration. Furthermore, in the prior art, in order to prevent bending or sagging caused by the unilateral support, the body 13 1 and the upper cover 132 require considerable rigidity, and the substrate processing apparatus 1' can reduce the rigidity required for the main body 13 and the upper cover 132 by using the maintenance frame 21 that supports the entire body 13 and the upper cover 32. Therefore, in the substrate processing apparatus 1, the main body 13A and the upper cover 132 can be made lighter, and the force required to pull out the position at the time of maintenance is also small. In this case, in the substrate processing apparatus, it is possible to avoid increasing the weight of the main body 131 and the upper cover 132, that is, to increase the weight of the substrate processing apparatus 1, and to increase the size of the substrate w to be processed. Further, in the substrate processing apparatus 1, even if the plural numbers of the main body Π1 and the upper cover 132 are moved inside the processing device frame 11 to the inside of the maintenance frame 2, there is no possibility of tipping over. Therefore, it is not necessary to prevent the plurality of members from being pulled out. The mechanism can make the structure simple. The following is a description of the structure of the processing chamber 13 and the surrounding structure of the substrate processing apparatus 1 and its peripheral structure. Figure. 2 to 5, the front view of the main body ι31 and the upper cover 132 at the respective processing positions PT and PT' is shown in FIG. 2, and FIG. 3 shows the main body 13 1 At the time of the maintenance position PM, the upper cover 132 is in the processing position, the upper position (hereinafter, also referred to as 105795.doc -12- 1276157 is the "open position") P0, the state, FIG. 4 shows the body 131 in the processing In the state of the time position PT and the upper cover 132 at the position M of the maintenance, FIG. 5 shows the position ρτ of the main body 13 1 at the time of processing and the position p 上 of the upper cover 132 at the time of opening. 6 and FIG. 7 are views corresponding to the side view from the +χ direction, and FIG. 6 is a view showing the state of each of the main body 131 and the upper cover 132 at the processing position ρτ & ρτ. FIG. 7 shows the main body 131 during processing. The position ρτ and the upper cover 132 are in the state of the open position Ρ0'. As shown in FIG. 2 to FIG. 7, the bottom surface 131L of the main body 131 is provided with a heating plate for heating the substrate W (or a cooling plate for cooling the substrate w) 15, and is also disposed inside the processing chamber 13. There are a lifting tip for raising and lowering the substrate w, a driving portion for the lifting tip, and the like (hereinafter, these are collectively referred to as "attached objects"). In this embodiment, the attachment moves with the body 13丨. Further, the substrate processing apparatus i is provided with a main body moving mechanism 16 for moving the main body 13 1 between the processing position ρτ and the maintenance time position pM; and the upper cover moving mechanism 17 for processing the upper cover 132 The time position pT, and the position of the maintenance day position ΡΜ move. In the substrate processing apparatus 丨, the main body moving mechanism 16 and the upper cover moving mechanism 使, at least one of the main body 131 and the upper cover 132 (one or both sides) at the processing position ρτ(ρτ,) and the maintenance position ΡΜ(ΡΜ') Moving between them, you can only retract the parts that need to be retracted to the position at the time of maintenance (ΡΜ,). Hereinafter, the main body moving mechanism 16 and the upper cover moving mechanism 17 will be described in order. As shown in FIG. 2 to FIG. 7 , the main body moving mechanism 16 includes: an obstruction 162a, 105795.doc 13 1276157 which is laid on the gantry i6ia protruding from the inner surface of the processing device frame u; The pedestal 161b is laid on the inner surface of the maintenance frame, the movable block 163 is fixed to one end of the bottom surface 131L of the main body 131, and the wheel 164 is attached to the bottom surface of the main body 131. The other end of 1311^. The trajectory 162a, the executor 162b, and the movable block 163 constitute a linear guide (linear motion guiding mechanism). By moving the movable block 163 on the trajectory 162a and the trajectory 162b, the moving direction of the body 131 is restricted to the track 162a. The direction of the long side of 162b. The wheel 164 can rotate the γ-axis direction as an axis, and the force required to move the body 131 is reduced by the rotational movement on the gantry 161a, l61b. In the substrate processing apparatus 1, the processing position of the body 131 is made? 7 The processing device frame u and the maintenance frame 21 are configured in conformity with the height of the position PM at the time of maintenance. Therefore, the 162& trajectory of the movable block 163 is horizontally laid in the direction of the long side, and the upper surface of the gantry l61a, 161b which is the passage of the wheel i64 is also a horizontal plane (χγ plane) Further, the gap between the gantry 16!a, 161b, the rail 162a, and the rail 162b in the vicinity of the boundary between the processing frame 11 and the maintenance frame 21 is sufficiently small so as not to hinder the sliding of the main body 131, and the gantry 161a, 161b and the rail 162& 162b provides a moving path for continuously connecting the processing position ρτ and the position at the time of maintenance. Therefore, in the substrate processing apparatus!, the movement of the body ι 31 of the body moving mechanism 16 is horizontally moved, and the body can be moved with a small force. I3i smoothly moves between the processing position PT and the maintenance position PM. Furthermore, in the above example, it is explained that the end of one side of the body 131 is supported by the wire guide, and the other end of the body 131 is supported by the wheel. The body 105795.doc -14- 1276157 moves the mechanism 16, but does not prevent the ends of both sides from being supported by the wheels, or the ends of both sides are supported via linear guidance. The combination of the linear guide and the wheel described above is easier to maintain the position of the body axis direction than the wheel alone, and the substrate can be correctly introduced into the interior of the processing chamber 13. Further, only linear guidance is used. In the case of high precision and parallel alignment of 5 pairs of tracks, as described above by combining linear guidance with the wheel, there is the dimensional accuracy required when laying the track 162 &

Not too strict. 2 to 7, an example in which two movable blocks 163 and two wheels 164 are provided on the bottom surface 131L of the main body 131, but the number of movable blocks 163 or wheels 164 is considered to be the size of the body 131. And the appropriate changes such as weight. Further, instead of the wheel 164, a pulley that can freely rotate is provided on the bottom surface 131L of the body 131 to reduce the force required to move the body 丨3丨. The upper cover moving mechanism 17 includes a cover sliding mechanism that moves the upper cover 132 between the open position 132 and the maintenance position PM. As shown in FIG. 2 to FIG. 7, the upper cover sliding mechanism includes a pair of rails 171a supported by the inside of the processing device frame strip 11 and a pair of lanes 171b supported by the inside of the maintenance frame 21; And a wheel 173 disposed at an end of the upper cover 132. The obstruction 171a' is a rod-shaped member having a groove-shaped (mouth-shaped) cross-sectional shape. The longitudinal direction is horizontally supported in the ±Χ direction. Further, the track 7} a is such that the opening portion is relatively parallel and supported at the same height, and the width (width of the groove) of the opening portion is larger than the diameter of the wheel. These points, the same as the road 17 1]3. Among the lanes 171a and 17b, one of the inner pair of rails 105795.doc -15-1276157 ma of the processing device frame can be raised and lowered while maintaining parallel and the same height, and one of the pair of rails 171b for maintenance is used for maintenance. The frame 21 is fixed. Then, in the substrate processing apparatus 1, the upper cover 132 is slid between the open position P〇 and the maintenance position 1> in a state in which the track 171a and the track 1711} are in the same height. on

The sliding of the cover 132 is realized by rotating the wheel 173 which can rotate the x-axis direction as a rotating shaft, and the inside of the groove of the rails 111a and 171b is rotated in contact with the lower side of the rails 171 & Further, on the side of the wheel i73, a guide ball 174 having a spherical arc-shaped outer shape is protruded, and the guide ball 174 comes into contact with the side faces of the road 171a, 171b, and the position of the upper cover 132 in the gamma direction is restricted to a specific position. By guiding the ball 174, the deviation of the approach of the upper cover 132 toward the gentry in the direction of the gentry can be prevented. For example, four wheels are provided at the end of the upper cover m. Further, in the case of Figs. 2 to 7, 173, the number of the wheels 173 should be appropriately changed in consideration of the size or weight of the upper cover 132. Further, the sliding of the upper cover 132 may be performed by linear guidance or taxiing without using the wheel 1 73. The lifting and lowering of the road 171 is realized by the main body portion 17 "fixed to the processing device frame 11". Specifically, the piston of the substrate processing device body is fixed to the piston of the cylinder 175 of the processing device frame u. The coffee is connected to the road 171a, and the piston 175b is moved in the vertical direction in accordance with the applied gas signal to raise and lower the rail 171a. The cylinder 175, when the upper cover 在于 is inside the processing device frame 11, can be lifted and lowered together. 〕 It functions with the upper lifting mechanism of the road 171. Of course, it is also possible to use a hydraulic cylinder or an electric cylinder instead of the cylinder 175', and it is also possible to use an auxiliary mechanism such as a wiring mechanism to lift and lower the upper cover 13 2 by the operator's manual operation. .doc -16- 1276157

- When the substrate processing apparatus heat-treats the substrate w, it is preferable to isolate the inside of the processing chamber 13 from the outside air in order to set the temperature distribution inside the processing to 13. Here, in the substrate processing device! When heat-treating the base (4), the upper cover 131 and the rail 171a are lowered from the open position p〇 to the state in which the lining is applied to the upper end of the side surface of the main body 131 to be in contact with the upper cover 132. Then, the step of step 171a causes the wheel m to contact the upper cover 132 to apply a downward load, so that the upper cover 132 is in the state of the pad 1J la, that is, the inside of the processing chamber 13 is maintained airtight. By the κ being in such an airtight state, in the substrate processing apparatus, the body ΐ3ι and the upper cover η] can be easily separated from the work or the close operation without the need of the body 131 and the upper cover 132, etc., and even the body l3i Or the upper cover? Due to the expansion of the heat treatment, the airtight inside the processing chamber 13 can be easily realized in the substrate processing apparatus 1. Since the upper cover 32 is attached to the body 131 during the substrate processing, the cause can be effectively prevented. The upper cover a] is floated by heating. § However, the airtight cushion 13 1 a can be provided on the side of the main body 13 1 , and the same effect can be obtained by providing the upper cover 132 . Further, in the substrate processing apparatus i, when the upper cover 132 is moved from the processing position to the maintenance position PM, the lane 171a is raised to the same height as the lane Hlb, and the body 131 and the upper cover 132 are separated first to cover the upper cover. . When the second position is raised to the open position P0, the upper cover 132 is then slid to the maintenance position pM. At this time, the gap between the processing device frame u and the rails 171a and 171b near the boundary of the maintenance frame is sufficiently small to not hinder the α row ' of the upper cover 132 and the lanes 171a and 171b are continuously connected to the open position p〇. , ",, the position of the repair time position pM, the movement path. Therefore, in the substrate processing apparatus 1, 105795.doc -17-1276157, the main part of the movement of the upper cover 132 using the upper cover moving mechanism 17 is horizontally moved, and The small force smoothly moves the upper cover 132 between the processing position PT1 and the maintenance position PM1. {3·Maintenance}

Hereinafter, the retreat of the main body 131 or the upper cover 132 of the main body 13 1 or the upper cover 132 of the processing chamber 13 will be described with reference to specific examples. In the following, in the front view of the substrate processing apparatus 1 from the -γ direction, the position of the main body 13 1 or the upper cover 133 is shown in a schematic front view, and the foregoing description is omitted. The main body moving mechanism 16 and the upper cover moving mechanism 17. Maintenance of the main body; When the maintenance of the main body is performed, the operator, as shown in FIG. 8, uses the main body moving mechanism 16 to pull the main body 131 of the maintenance object from the processing position (dotted line) to the position at the time of repairing. (solid line) began to repair. In detail, the operator causes the upper cover 13 of the corresponding body 13 1Μ to be moved from the processing position ΡΤ, (dotted line) to the open position ρ〇' (solid line) to separate the body 131Μ from the upper cover, and then the body 131 is processed by the upper body. When the position ρτ slides to the maintenance position? "The maintenance is started inside the maintenance frame 21. The sliding of the main body 13μ is possible, and the driving mechanism using the motor as the power source can be used. It is also possible to perform maintenance on the maintenance frame 21. When the body 13 is in the position of the U-position, the upper part is completely open, and the state of maintenance such as cleaning can be easily performed. Here, as long as the body 1 3 1IV is attached, The maintenance frame 21 is formed in such a manner as to interfere with the part of the person in charge, and the 丨丄 备 容易 容易 换 换 换 换 换 换 换 换 大规模 大规模 大规模 大规模 大规模 大规模 大规模 大规模 大规模 大规模 大规模 大规模 大规模The lifting mechanism of the body 13 1 105795.doc 1276157 can lower the main body 131M to an appropriate height and perform maintenance, thereby improving the workability of the maintenance. Also, in the substrate processing apparatus 1, since even the body 13im is completely open In the above case, there is no need to lift the upper cover 132 upward, so that it is not necessary to secure the space for lifting the upper cover 132 above, and there is no need to lift the upper cover 132. Therefore, the substrate processing apparatus丨The space of the factory to be installed can be effectively utilized. Further, in the substrate processing apparatus, even in the state above the open body Φ i31M, the weight of the cover 132 is not present above the upper surface, so that it can be easily ensured. The safety of the operator during maintenance is completed. The main body 131M that has been repaired is returned to the processing position 1 > 7, and then the upper cover 132 is lowered and placed in close contact with the upper cover 132. Further, in the above description, the main body 131 is shown. ^All of them are pulled out to the maintenance frame 21, but only when the maintenance is performed near the end of the main body 131 and the direction is not pulled out, but only the upper side near the end for maintenance is opened. One part of the main body 131 is pulled out to the maintenance frame 21. The above description shows an example in which the entire body 131M of the maintenance object is pulled out to the maintenance frame 21, but the maintenance object may be as shown in FIG. The body 131JV [remaining inside the processing device frame n, pulling out the remaining body 131 and the upper cover 132 to the maintenance frame 21, and performing maintenance in the inside of the processing device frame as well. When the upper cover is repaired and the upper cover is repaired, the operator, as shown in Fig. 〇, uses the upper cover moving mechanism 17 to make the upper cover 13 of the maintenance target, and is pulled out to the position PM for maintenance, and then starts. operation. In detail, the operator makes the 105795.doc •19-1276157 upper cover 132M rise from the processing position PT to the open position p〇, separates the body U1 from the upper cover 132M, and then makes the upper cover 132]^ from the open position P〇,,, kidney to the maintenance position PM', maintenance within the Wei (4) frame 21. : The sliding of the cover 132M can also be carried out by the human guard, so that the motor can be used as the driving mechanism of the power source. It is no problem that the maintenance frame 21 can be used for maintenance work.

When it is pulled out to the position at the time of maintenance, the upper cover is 2 Μ, and the underside of the dirt is completely opened, and the maintenance state such as cleaning can be easily performed. X. In the maintenance of the frame wood 21 and the lifting mechanism of the cover 132M, the upper cover can be lowered to an appropriate height for maintenance, and the maintenance workability can be improved. The upper cover 132M is completed and returned to the processing position ρτ, and then lowered to be in close contact with the body 131. In the above description, the example in which the entire upper cover 132 is pulled out to the maintenance frame 21 is used. However, when only the vicinity of the end portion of the upper cover 132 is repaired, the whole can be pulled out without being pulled out. The upper part of the vicinity of the end of the repair is pulled out to the maintenance frame 21. In addition, in the above description, it is indicated that the maintenance object is over the cover! Now, all of them are pulled out to the maintenance frame 21, but as shown in Fig. u, the static upper cover 132M is left inside the processing device frame, and the remaining body m and the upper cover 132 are pulled out to the maintenance frame 21'. Maintenance can also be easily performed inside the processing device frame (4). {4 Modifications} It is shown that both the main body 131 and the upper cover 〖32 are retractable, and the member is retracted from the above embodiment, I05795.doc -20·1276157 to the maintenance date ^ position PM(pm,), but the present invention is also Contains only one of the body 131' or the upper cover 132 that can be retracted to the maintenance position PM (PM,). Or adopting 'maintaining the body 131 in combination with the upper cover 132 to retreat to the position at the time of maintenance, or separating the processing chamber 丨3 into three or more members, all or part of which can be independently retracted to the position at the time of maintenance. No problem. Moreover, it is not the entirety of the body 131, but only the bottom surface of the body 131 or the attached object is retracted to the position at the time of maintenance, so that the rest of the body 131 remains in the interior of the processing frame 11, or the body 13 1 It is also possible that the bottom surface or the accompanying material remains inside the processing device frame 11, and the rest of the body 131 is retracted to the position at the time of maintenance. Furthermore, in the above embodiment, both the main body 131 and the upper cover 132 are supported by the maintenance frame 21, but any one of the main body or the upper cover 13 may be supported by the processing device as one of the prior art. The frame 1 is a lifting mechanism; • in the above embodiment, the main body 131 is separated from the upper cover m by raising the upper cover 132. However, the lifting body i3i or the crucible 1318 can be lifted and lowered by the lifting body 131 or The pad 13U separates the body 131 from the upper cover 132. Further, the elevating mechanism is not necessary, and the maintenance frame 2 can be placed in the maintenance device frame 牟n ^ the work clothing frame 11 to move horizontally so that the main body 131 and the upper cover 132 are in close contact with each other. 〇Processing room support; In place of the above-mentioned maintenance frame 2丨, the substrate processing device that can pull the main body or the 105795.doc -21 · 1276157 cover to the maintenance position by the support of the early side will pull It is also possible to support the body or the upper cover by the structure below. For example, as shown in the side view of FIG. 12, the main body 331 is supported by the substrate processing apparatus 3 of the processing apparatus frame=31 via the single-side sliding beam 381, and a part of the main body 331 is pulled out from the processing apparatus frame 31 on the floor surface. It is also possible that the structure that can be moved horizontally is placed on the bottom surface, and the entire body 331 is pulled out of the processing apparatus frame 31. Further, as shown in the side view of FIG. 13, the main body 531 is supported by the substrate processing apparatus 5 of the processing apparatus frame 51 via the one-side sliding beam 581, and the portion of the main body 531 separated by the upper cover 532 is pulled out by the processing apparatus frame 51. The structure 601 which is horizontally movable on the floor surface is placed on the bottom surface thereof, and the entire body 531 is pulled out from the processing apparatus frame 51. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an overall configuration of a substrate processing apparatus according to an embodiment of the present invention. Fig. 2 is an enlarged view showing a processing chamber of the substrate processing apparatus. And the front view of its creation. Fig. 3 is a front elevational view showing the process (four) of the substrate processing apparatus j and its periphery. The configuration of the processing chamber 13 and its periphery in Fig. 4 is an enlarged front view showing the substrate processing apparatus. Fig. 5 is a front elevational view showing the substrate processing of the substrate. Fig. 6 is a side elevational view showing the substrate processing assembly in an enlarged manner. The processing chamber 13 of the processing chamber 13 and its surrounding structure 1 and its surrounding structure are constructed. 105795.doc -22-

Claims (1)

1276157. Patent application scope: A substrate processing apparatus comprising: a processing chamber for processing a substrate; and comprising: a Dingte first support structure for processing the substrate in the processing chamber::: position The processing position position supports a specific configuration second support structure constituting the processing chamber, and is at a retracted position different from the processing position, and is independent of the first support structure and outside the first support 槿1 And a k-moving mechanism that moves the specific member between the processing position and the retracted position. 2. The substrate processing apparatus according to claim 1, wherein the processing chamber is separable into a plurality of members; and the moving mechanism is configured to use at least one of the plurality of members as the characteristic member so as to be at the processing position Move between positions when retracting. 3. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus includes a plurality of processing chambers; and the first support structure and the second support structure respectively form a plurality of processing materials in each of the processing chambers. The processing position position and the retracted position position defined by the crucible member are supported, and the moving mechanism moves the specific member between the processing position and the retracted position defined by each of the specific members. 4. The substrate processing apparatus according to claim 1, wherein the moving mechanism is configured to move the specific member horizontally to the five kinds of substrate processing apparatuses at the time of the retracting position during the processing, and the characteristic processing is performed on the substrate. The processing chamber further includes: a first support structure for supporting the plurality of members U 彳 to form a separable upper chamber; a moving mechanism for moving the plurality of members to the first support structure The outsider. The special component is the substrate processing apparatus of claim 5, wherein the step further comprises: a second support structure, which is externally supported by the above-mentioned first support structure independently of the above-mentioned third support ±7±枯photo& The specific member is configured to move the specific member between the second support positions supported by the first/second support structure supported by the first support structure. The substrate processing apparatus of claim 5, wherein the substrate processing apparatus has a plurality of processing chambers; the first supporting structure supports the specific components constituting each of the plurality of processing chambers; and the moving mechanism is configured to form the plurality of chambers Each of the specific members described above moves to the outside of the first support structure. 8. The substrate processing apparatus according to claim 6, wherein the private movement mechanism moves the specific member horizontally between the second support position and the second support position. 105795.doc