JP4476180B2 - Heat treatment equipment - Google Patents

Description

  The present invention relates to a heat treatment apparatus for heat-treating an object to be heated such as a substrate with hot air.

  Conventionally, a heat treatment apparatus as disclosed in the following Patent Document 1 is a flat panel display (FPD: Flat Display) such as a liquid crystal display (LCD), a plasma display (PDP), and an organic EL display. Panel display). Many of the heat treatment apparatuses have a structure in which a loading apparatus as disclosed in Patent Document 2 below is arranged in a heating chamber. The stacking apparatus has a bowl-like shape in which a plurality of stacking stages each including a plurality of substrate receivers in the vertical direction are provided in the vertical direction. The heat treatment apparatus applies a specific solution to a substrate (object to be heated) such as a glass plate and heats and drys it in advance, puts it in and out of the loading stage using a robot hand, and introduces it into the heating chamber. It is an apparatus for heat treatment (firing) by exposure to hot air at a predetermined temperature.

  The robot hand used for replacing the substrate is bent due to the weight of the substrate. Therefore, most of the conventional heat treatment apparatuses are configured to increase the interval between the stacking stages on which the substrates are placed in anticipation of the bending of the robot hand.

Moreover, some heat treatment apparatuses of the prior art employ a loading apparatus as disclosed in Patent Document 2 below. As shown in FIG. 40, a stacking device disclosed in Patent Document 2 below is a stacking stage for stacking a substrate by arranging a plurality of support members capable of supporting both ends of the substrate on a predetermined plane. This stacking stage is formed in multiple stages at a constant pitch. The robot hand employed in the stacking device disclosed in Patent Document 2 has a main body plate extending in the advancing and retreating direction, and an overhanging portion projecting laterally from the main body plate. For this reason, in the stacking device disclosed in Patent Document 2, the bending of the robot hand and the substrate is relatively small.
Japanese Patent No. 2971771 JP 2004-26426 A

  In recent years, with the increase in the size of flat panel displays, the substrate to be heated tends to be further increased in size. Therefore, for example, even when the configuration disclosed in the above-mentioned Patent Document 2 is used, the bending of the robot hand due to the weight of the substrate tends to increase or the thickness of the robot hand tends to increase. . Therefore, in the heat treatment apparatus of the prior art, there is a problem in that the heat treatment apparatus is increased in size because it is necessary to take a large interval between the loading stages in anticipation of the bending and thickness of the robot hand.

  Usually, flat panel displays and the like are manufactured in a clean room. Therefore, when the heat treatment apparatus is increased in size, it may be necessary to increase the height of the clean room or it may not be installed in an existing clean room. On the other hand, in order to reduce the size of the heat treatment device to such an extent that it can be installed in an existing clean room, etc., the heat treatment efficiency of the heat treatment device is reduced if the number of loading steps is reduced and the interval between the loading steps is increased. There is a problem of end. Further, in order to maintain the heat treatment efficiency while downsizing the heat treatment apparatus in this way, it is necessary to arrange a plurality of heat treatment apparatuses in the clean room, and there is a problem that the installation area of the apparatus increases.

  In view of the above, an object of the present invention is to provide a heat treatment apparatus capable of carrying out heat treatment by loading an object to be heated at a high density with a narrow interval between the loading stages on which the object to be heated is loaded.

The invention according to claim 1, which is provided to solve the above problem, is provided with a heating chamber for heating an object to be heated, temperature adjusting means for adjusting the temperature of the heating chamber, and the heating chamber. a loading stage heated is loaded and configured stacking means stacking a plurality of loading stages at predetermined intervals, can advance and retreat in the spacing of the loading stage between the lifting means and adjacent elevating the stacking means in the heating chamber And a space extending means for expanding a distance between a predetermined stacking stage and a stacking stage adjacent to the stacking stage . In the interval expansion operation in which two or more support pieces that can advance and retreat in the interval between adjacent loading stages are provided, and the interval extending means expands the interval between the predetermined loading stage and the loading stage adjacent to the loading stage by the interval extending means. , the first support piece specific The first interval expansion phase to widen the distance between the specific loading stage and the upper stacking stage by lowering the stacking means on a condition that enters the gap between the upper loading stage of the loading stage and the stacking stage And lowering the loading stage downward by lowering the loading means with the lifting means on condition that the second support piece enters the interval between the specific loading stage and the loading stage below the loading stage. And performing an interval expansion operation for expanding an interval existing above and below the specific loading stage through a second interval expansion stage that varies and expands the interval between the specific loading stage and the lower loading stage. It is the heat processing apparatus to do.

  In the heat treatment apparatus of the present invention, after expanding the interval between the predetermined loading stage and the upper loading stage in the first interval expansion stage, the predetermined loading stage in the second interval expansion stage and below this By expanding the interval with a certain loading stage, the predetermined loading stage becomes independent from the loading stages adjacent upward and downward. Therefore, the heat treatment apparatus of the present invention takes in and out the object to be heated loaded on the specific loading stage between the specific loading stage and the upper and lower adjacent loading stages, and takes in and out the specific loading stage itself. The space necessary for this can be secured sufficiently, and the object to be heated and the specific loading stage loaded with the object to be heated can be smoothly taken in and out.

  Since the heat treatment apparatus of the present invention can widen the upper and lower intervals of a predetermined stacking stage, it is possible to minimize the interval between other stacking stages that are not to be taken in and out of the heat treatment chamber. Therefore, according to the present invention, it is possible to provide a heat treatment apparatus in which the height of the loading means is low and an object to be heated can be stacked at a high density.

  According to such a configuration, the interval extending operation can be performed smoothly, and the stability of a series of operations in the interval extending operation can be ensured.

  Further, since the heat treatment apparatus of the present invention is configured to operate the loading means, the position for taking in and out the object to be heated loaded on the loading stage and the loading stage itself from the heat treatment chamber can be set to a predetermined position. . In such a configuration, it is only necessary to provide a minimum number of replacement ports for taking in and out the object to be heated and the loading stage itself with respect to the heat treatment chamber, and the apparatus configuration can be simplified. In addition, according to the above-described configuration, since the object to be heated and the loading stage itself can be taken in and out of the heat treatment chamber from a certain position, labor and time required for taking in and out the object to be heated and the loading stage can be minimized.

The invention according to claim 2 has a replacement opening for taking in and out the object to be heated or the loading stage in the heating chamber, and in the interval expansion operation, the first support piece is on the side of the loading means, 2. The heat treatment apparatus according to claim 1, wherein the heat treatment apparatus enters a gap formed below the loading stage from a side of the loading stage that exists at a position corresponding to a position above the replacement opening.

In the heat treatment apparatus of the present invention, when the first support piece is inserted into the interval between the loading stages and the positional relationship between the loading means and the supporting means is changed relatively in the loading direction of the loading stage, it is above the replacement port. Is loaded upward. Therefore, according to the present invention, it is possible to widen the interval between the loading stage located above the replacement opening and the loading stage located below and adjacent to the replacement opening. That is, it is possible to provide a heat treatment apparatus that can smoothly put an object to be heated and a loading stage into and out of the heating chamber.

The invention according to claim 3 is characterized in that a plurality of stacking steps are stacked via a gap forming means, and the stacking step is provided with a fitting portion into which a tip portion of the gap forming means is fitted. It is the heat processing apparatus of Claim 1 or 2 .

  According to such a configuration, it is possible to stack a plurality of stacking stages so as to be separated in the vertical direction while maintaining a predetermined interval and positioning accuracy.

According to a fourth aspect of the present invention, there is provided the heat treatment apparatus according to any one of the first to third aspects, wherein guide means for restricting the moving direction of the loading stage to the loading direction of the loading stage is provided. .

  According to such a configuration, it is possible to suppress the positional deviation between the loading stages accompanying the interval expansion operation.

  ADVANTAGE OF THE INVENTION According to this invention, the heat processing apparatus which can fully ensure the space | interval of the stacking stages of the part which should perform exchange operation can be provided, suppressing the space | interval of stacking stages to the minimum.

  Subsequently, a heat treatment apparatus and a loading apparatus according to an embodiment of the present invention will be described in detail with reference to the drawings. FIG. 1 is a front view showing a heat treatment apparatus according to an embodiment of the present invention. FIG. 2 is a cutaway perspective view showing the internal structure of the heat treatment apparatus shown in FIG. FIG. 3 is a plan view schematically showing the internal structure of the heat treatment apparatus shown in FIG. 4 is a perspective view showing a substrate replacement system employed in the heat treatment apparatus shown in FIG. FIG. 5 is a perspective view showing a stacking stage constituting the substrate replacement system shown in FIG. FIG. 6 is a perspective view showing a state in which the stacking stage shown in FIG. 5 is observed from the back side. FIG. 7A is a conceptual diagram schematically showing the positional relationship between the loading stage shown in FIG. 5, the gondola frame, and the guide rail, and FIG. 7B schematically shows the positional relationship between the guide member and the guide rail. It is a conceptual diagram, (c) is a sectional view schematically showing the positional relationship between the guide rail and the exhaust member. FIG. 8 is a perspective view showing a gondola frame constituting the gondola shown in FIG. FIG. 9 is a perspective view schematically showing the operation of the lifting device and the base plate of the gondola frame adopted in the heat treatment apparatus shown in FIG. FIG. 10 is a cross-sectional view showing the internal structure in the vicinity of the replacement opening of the heat treatment apparatus shown in FIG. FIG. 11A is a plan view of the support piece, FIG. 11B is a perspective view of the support piece, and FIG. 11C is a perspective view showing an attachment state and operation of the support piece to the rotating shaft. 12 is a plan view showing a substrate replacement system employed in the heat treatment apparatus shown in FIG. FIGS. 13A to 13D are conceptual diagrams showing the positional relationship between the support piece and the loading stage. FIG. 14 is a conceptual diagram schematically showing the first stage of the substrate replacement operation of the heat treatment apparatus shown in FIG. 1, and FIG. 15 is a conceptual diagram schematically showing the second stage of the substrate replacement operation.

  In FIG. 1, 1 is the heat processing apparatus of this embodiment. The heat treatment apparatus 1 has a configuration in which a device housing portion 3 is provided below a metal box-shaped main body case 2 and a substrate processing portion 5 is provided above the device housing portion 3. The device housing unit 3 includes a power supply device (not shown) that supplies power to the substrate processing unit 5, a control device (not shown) that controls the operation of the substrate processing unit 5, and the like.

  As shown in FIGS. 1 and 2, the substrate processing unit 5 has a replacement port 6 for loading and unloading the substrate W by a transfer device such as a robot hand (not shown) on the front side, and a door used for maintenance on the back side. 7 is provided. A shutter 10 that opens and closes in conjunction with the operation of the air cylinder 8 is attached to the replacement port 6.

  As shown in FIGS. 2 and 3, the substrate processing unit 5 has a heat treatment chamber 12 (heating chamber) in the center, and is surrounded by an air adjusting unit 11. The air adjusting unit 11 is surrounded on four sides by peripheral walls 13a to 13d made of a heat insulating material. The air adjusting unit 11 heats air to a predetermined temperature and blows it into the heat treatment chamber 12 and circulates the air discharged from the heat treatment chamber 12 upstream.

  More specifically, the air adjusting unit 11 is roughly divided into hot air supply means 14, a duct 17, and an equipment room 18, as shown in FIGS. The hot air supply means 14 heats the outside air introduced into the heat treatment apparatus 1, the air exhausted from the downstream end of the heat treatment chamber 12 and returned through the duct 17, and the like, and sends it into the heat treatment chamber 12. It is provided with a blower, a heater, etc. (not shown).

  The duct 17 communicates with the downstream end of the heat treatment chamber 12 and is an air flow path disposed on the outer periphery of the heat treatment chamber 12, and returns air or gas discharged from the heat treatment chamber 12 to the hot air supply unit 14.

  The heat treatment chamber 12 is an area surrounded by the upstream wall 20 and the partition walls 41 and 43, and includes a substrate replacement system 54 including a gondola 55 inside. Both the upstream wall 20 and the partition walls 41 and 43 have a height that reaches the bottom surface 46 from the top surface 45 of the substrate processing unit 5. The heat treatment chamber 12 communicates with the hot air supply means 14 through the opening of the filter 21 that constitutes the upstream wall 20.

  The partition wall 41 has an opening 50 at a position corresponding to the replacement opening 6 provided in the substrate processing unit 5. The opening 50 has a minimum size and shape necessary for the substrate W and the robot hand to enter and exit. The opening 50 is isolated from the duct 17 by the protective wall 51 provided so as to surround the periphery of the opening 50 and communicates with the replacement port 6. Therefore, the gas flowing in the duct 17 does not enter the heat treatment chamber 12 through the opening 50 or leak out to the outside through the replacement port 6. On the other hand, the partition wall 43 is fixed at a position corresponding to the door 7 and is configured to be removable as necessary when performing maintenance or the like.

  As shown in FIG. 3, a substrate replacement system 54 is disposed at a substantially central portion of the heat treatment chamber 12. In addition to the gondola 55 for loading the substrates W, the substrate replacement system 54 includes a guide rail 71 and support means 90 arranged around the gondola 55.

  As shown in FIG. 4, the gondola 55 has a structure in which a large number of stacking stages 56 are vertically stacked and attached to the gondola frame 70. The gondola 55 has a structure in which an elevating device 80 is connected to the lower side of the loading stage 56 constituting the lowermost stage, and the loading stage 56 can be moved in the vertical direction in accordance with the operation of the elevating apparatus 80. Yes.

  More specifically, as shown in FIG. 5, the stacking stage 56 has a configuration in which, for example, four bars 58 are integrated with a metal frame member 57. Spacers 60 are fixed to the four corners of the frame member 57. The spacer 60 is roughly divided into a cylindrical main body portion 61 formed on the lower end side and a conical connection portion 62 formed on the upper end side. In the present embodiment, the spacer 60 is made of metal from the viewpoint of wear resistance and heat resistance, but may be made of a material such as resin. Each spacer 60 protrudes to the surface side of the frame member 57 (upper side in FIG. 5).

  A plurality of metal support protrusions 63 are fixed to the loading stage 56. The support protrusion 63 contacts the back side of the substrate W mounted on the stacking stage 56 and supports the substrate W. All of the support protrusions 63 are fixed so as to protrude in the same direction as the spacer 60 described above, that is, toward the surface side of the stacking stage 56, and are arranged in a line at substantially equal intervals in the extending direction of the crosspiece 58. The support protrusion 63 has the same height (full length) as the height of the main body 61 of the spacer 60. Therefore, in a state of being fixed to the frame member 57, the tip of the support protrusion 63 is at a height about the boundary portion between the main body 61 and the connection portion 62 of the spacer 60 and is lower than the tip of the connection portion 62. In position.

  Two guide members 65 are fixed to both side surfaces 57 a and 57 b in the longitudinal direction of the frame member 57 constituting the stacking stage 56 so as to protrude toward the outside of the frame member 57. The guide member 65 includes a guide pin 66 fixed to the frame member 57 and a guide roller 67 that is rotatably attached to the guide pin 66. The guide member 65 is attached to a guide rail 71 which will be described later, and restricts the moving direction of the stacking stage 56 in the vertical direction, that is, the expansion / contraction direction of the lifting shaft 81 of the lifting device 80.

  As shown in FIG. 6, insertion holes 68 are provided at the four corners on the back side of the frame member 57. The insertion hole 68 is an opening provided at a position corresponding to a position immediately below the spacer 60 fixed to the surface side of the frame member 57, and is a hole into which the connection portion 62 of the spacer 60 is fitted. The insertion hole 68 has an opening diameter smaller than the outer diameter of the main body 61 of the spacer 60. Therefore, when the frame members 57 are stacked up and down as shown in FIG. 14, the spacer 60 attached to the frame member 57 of the lower stacking step 56 is a frame member that constitutes the upper stacking step 56 up to the middle part of the connecting portion 62. It fits in a fitting hole 68 provided on the back side of 57. As a result, as shown in FIG. 14, a space having a height P1 and slightly higher than the height of the support protrusion 63 is formed between the stacking stages 56.

  The frame member 57 is mounted inside a gondola frame 70 disposed inside the heat treatment chamber 12 as shown in FIGS. 2, 3, and 4. As shown in FIG. 8, the gondola frame 70 has four support columns 69 erected in a direction perpendicular to the top surface 45 and the bottom surface 46 of the heat treatment chamber 12. They are connected by beam members 72 and 73 and lower beam members 75 and 76 to form a skeleton structure. The gondola frame 70 is fixed vertically to a pedestal plate 78 whose lower end of the support 69 is disposed horizontally with respect to the bottom surface 46 of the heat treatment chamber 12. That is, the bottom surface of the gondola frame 70 is constituted by the pedestal plate 78. The gondola frame 70 is reinforced and bent by a plurality of reinforcing plates 77 that are fixed to each other between adjacent columns 69 and 69 on the side (the upstream and downstream surfaces of the airflow flowing in the heat treatment chamber 12). Is prevented.

  A pedestal plate 78 constituting the bottom surface of the gondola frame 70 is connected to a lifting shaft 81 of a lifting device 80 as shown in FIGS. The elevating device 80 is disposed in the device housing 3 and has a function of extending and retracting the elevating shaft 81 in the vertical direction through the opening 82 provided in the bottom surface 46 of the heat treatment chamber 12. The base plate 78 moves up and down in a region surrounded by the gondola frame 70 while maintaining a posture parallel to the bottom surface 46 of the heat treatment chamber 12 in conjunction with the vertical movement of the elevating shaft 81. Therefore, the stacking stage 56 of the gondola 55 can be moved in the vertical direction by extending and retracting the lifting shaft 81 of the lifting device 80.

  As shown in FIGS. 3 and 8, a guide rail 71 is disposed outside the gondola frame 70. The guide rail 71 is made of metal, and the opening shape is substantially “C” shape as shown in FIG. 7. The guide rail 71 has a slit-like groove 71 a extending in the vertical direction and an internal space 71 b, and the groove 71 a is arranged so as to face the inside of the gondola frame 70. A guide member 65 protruding from the side surface of the frame member 57 is fitted into the guide rail 71. Thereby, the frame member 57 can freely move in the extending direction of the guide rail 71, that is, in the vertical direction with respect to the heat treatment chamber 12, but cannot move freely in other directions.

  As shown in FIG. 7C and FIG. 10, the upper end side of the guide rail 71 is fixed to the top surface 45 of the substrate processing unit 5, and the lower end side penetrates the bottom surface 46. An exhaust means 74 is connected to the lower end portion of the guide rail 71, and dust generated by the operation of the guide roller 67 in the internal space 71b of the guide rail 71 is collected.

  As shown in FIGS. 8 and 12, support means 90 are disposed at positions adjacent to the four corners of the gondola frame 70 disposed in the heat treatment chamber 12. The support means 90 is located outside the gondola frame 70 disposed in the heat treatment chamber 12 and at a position adjacent to the left and right side surfaces 57a and 57b of the frame member 57 when the frame member 57 is attached to the gondola frame 70. It is arranged. As shown in FIG. 10, the support means 90 is roughly divided into a rotation shaft 91, a rotation mechanism 92 for rotating the rotation shaft 91, and a support piece 93 fixed to the rotation shaft 91. The rotation shaft 91 is a shaft body extending in the vertical direction, passes through the top surface 45 and the bottom surface 46 of the heat treatment chamber 12, and is rotatable through bearings 95 and 96 fixed to the outside of the heat treatment chamber 12. It is supported.

  As shown in FIG. 10, the rotation shaft 91 is connected to a rotation mechanism 92 provided on the back surface side (the device accommodating portion 3 side) of the bottom surface 46. More specifically, the rotation mechanism 92 includes a motor 97 fixed to the back surface side of the bottom surface 46, and a toothed belt 98 suspended between the rotation shaft 91 and the rotation shaft of the motor 97. The rotating shaft 91 rotates in conjunction with the rotation of the rotating shaft of the motor 97.

  Four support pieces 93 (hereinafter referred to as support pieces 93a to 93d as necessary) are fixed at predetermined intervals in the middle part in the longitudinal direction of the rotating shaft 91, that is, in a portion existing in the heat treatment chamber 12. The support piece 93 is formed by molding a metal plate, and is a member that is curved as shown in FIGS. The support piece 93 has a shaft insertion hole 100 on one end side, and is fixed so as not to rotate relative to the rotation shaft 91 in a state where the rotation shaft 91 is inserted into the shaft insertion hole 100.

  The mounting position of the support piece 93 with respect to the rotating shaft 91 is related to the position of the replacement port 6 provided for taking in and out the substrate W. More specifically, as shown in FIG. 10, the support piece 93 has a surface (upper side in FIG. 10) above the horizontal plane S passing through the upper end of the replacement port 6 provided on the front side of the heat treatment apparatus 1. It is fixed to come.

  The support pieces 93a to 93d are each fixed with a position shifted by 90 degrees in the circumferential direction with respect to the rotation shaft 91. The support pieces 93a to 93d are always arranged outside the region of the gondola frame 70 as shown by solid lines in FIG. 12, and the outer edge side 101 having a small curvature faces the gondola frame 70 side and the inner edge side 102 having a large curvature. Is a posture facing the outside of the gondola frame 70. As shown by an arrow N in FIG. 12, the support pieces 93 a to 93 d sequentially enter and leave the gondola frame 70 when the rotary shaft 91 rotates forward.

  More specifically, for example, focusing on the support piece 93a, the first stage of rotation of the rotary shaft 91 exists in the region of the gondola frame 70 as shown in FIG. Therefore, as shown in FIG. 14, if the horizontal position on the back surface side (lower side in the figure) of the predetermined stacking stage 56 substantially matches the horizontal position on the front surface side (upper surface in the figure) of the support piece 93. As shown by hatching in FIG. 12, the surface of the support piece 93 and the back surface of the loading stage 56 are in surface contact.

  When the rotating shaft 91 rotates 90 degrees in the forward direction from the state shown in FIG. 13A, the support piece 93a comes out of the region of the gondola frame 70 as shown in FIG. 13B. On the other hand, the support piece 93b existing below the support piece 93a enters the region of the gondola frame 70 as shown in FIG. When the rotating shaft 91 is further rotated, the support piece 93a changes its posture as shown in FIGS. 13C and 13D every time the rotating shaft 91 rotates 90 degrees. As for the other support pieces 93b to 93d, the posture is sequentially changed as shown in FIG. 13 each time the rotation shaft 91 rotates.

  The heat treatment chamber 12 is provided with a temperature sensor (not shown) for measuring the ambient temperature. The heat treatment apparatus 1 is configured such that a control device (not shown) feedback-controls the operation of the heater 35 in accordance with the temperature detected by the temperature sensor, and the temperature in the heat treatment chamber 12 is a predetermined firing temperature (this embodiment). In this case, the temperature is adjusted to 230 to 250 ° C.

  The heat treatment apparatus 1 bakes the substrate W by exposing the substrate W loaded on the loading stage 56 of the gondola 55 disposed in the heat treatment chamber 12 to hot air introduced into the heat treatment chamber 12. When the predetermined loading stage 56 reaches the height of the replacement port 6, the heat treatment apparatus 1 stops the vertical movement of the gondola 55 for a certain period of time and replaces (loads and unloads) the substrate W, and when the replacement of the substrate W is completed. The gondola 55 employs a tact system that resumes vertical movement. The heat treatment apparatus 1 of the present embodiment is characterized by the operations of the gondola 55 and the support means 90 when the substrate W is replaced. Hereinafter, the operation of the heat treatment apparatus 1 at the time of firing the substrate W will be described focusing on the replacement operation of the substrate W.

  Prior to the start of heat treatment, the heat treatment apparatus 1 activates the hot air supply means 14 by a control device (not shown) to adjust the temperature in the heat treatment chamber 12 to a predetermined firing temperature. When the atmospheric temperature in the heat treatment chamber 12 reaches a predetermined heat treatment temperature (230 ° C. to 250 ° C. in the present embodiment), the heat treatment apparatus 1 is ready to fire the substrate W. When the atmospheric temperature in the heat treatment chamber 12 reaches the heat treatment temperature, an unfired substrate W disposed outside the heat treatment apparatus 1 is mounted on a transfer device such as a robot hand (hereinafter simply referred to as a mounting robot hand). The

  On the other hand, the control device of the heat treatment apparatus 1 moves the elevating shaft 81 of the elevating apparatus 80 arranged in the device accommodating portion 3 up and down, and as shown in FIG. The bottom surface of the stacking stage 56 (hereinafter referred to as the upper stacking stage 56b if necessary) is located above the vertical position of the support piece 93 of the support means 90. Thus, the vertical position of the gondola frame 70 is adjusted. Thereafter, the control device rotates the rotation shaft 91 of the support means 90 in the direction indicated by the arrow N in FIG. Thereby, the support piece 93 existing outside the gondola frame 70 rotates in the direction of arrow N and enters the region of the gondola frame 70. At this time, as shown by hatching in FIG. 12 and FIG. 13A, a part of the support piece 93 enters a state below the bottom surface of the upper loading stage 56b.

  When the support piece 93 enters below the upper loading stage 56b, the control device lowers the gondola frame 70 downward. When the gondola frame 70 is lowered, the target stacking stage 56a existing below the support piece 93 and the lower stacking stage group L composed of the stacking stages 56 existing below the support stack 93 are arranged as shown by arrows in FIG. Move downward with 70. On the other hand, the upper loading stage 56 b existing above the support piece 93 is prevented from moving downward by the support piece 93 contained in the gondola frame 70. As a result, as shown in FIG. 15, the lower stacking stage group L is separated from the upper stacking stage group U including the upper stacking stage 56b and the stacking stage 56 stacked above the upper stacking stage 56b. When the target stacking stage 56a reaches a position where the substrate W can be taken in and out via the replacement port 6 by the robot hand, the control device stops the downward movement of the gondola frame 70. Thereby, a space of height P2 (P2> P1) is formed between the target stacking stage 56a and the upper stacking stage 56b. That is, the distance between the target stacking stage 56a and the upper stacking stage 56b is increased.

  When the distance between the target stacking stage 56a and the upper stacking stage 56b is adjusted to P2, the control device operates the air cylinder 8 and tilts the shutter 10 located on the side of the target stacking stage 56a to open the replacement port 6. open. Here, when the substrate W is previously loaded on the target stacking stage 56a, a robot hand (extraction robot hand) for taking out the substrate W enters from the exchange port 6 and takes out the substrate W. Further, when the substrate W is not mounted on the target stacking stage 56a when the replacement opening 6 is opened, or when the substrate W is removed as described above, the mounting robot hand mounted with the substrate W is replaced. The substrate W is inserted into the heat treatment chamber 12 through the port 6, and the substrate W is transferred onto the support protrusion 63. When the transfer of the substrate W is completed, the robot hand is removed from the replacement opening 6.

  When the transfer of the substrate W to the target stacking stage 56a is completed as described above, the control device raises the shutter 10 and closes the replacement opening 6. When the control device confirms that the replacement port 6 is closed, the control device moves the gondola frame 70 upward. When the gondola frame 70 moves upward, the lower loading stage group L including the target loading stage 56a starts to move upward. When the gondola frame 70 moves further upward and the distance between the top surface side of the target loading stage 56a and the bottom surface side of the upper loading stage 56b returns to P1, the connecting portion of the spacer 60 attached to the target loading stage 56a side 62 is fitted into a fitting hole 68 provided on the bottom side of the upper stacking stage 56b, and the upper stacking stage group U and the lower stacking stage group L are connected. After the upper stacking stage group U and the lower stacking stage group L are connected, the control device rotates the rotation shaft 91 of the support means 90 in the normal rotation direction (the direction of arrow N in FIG. 12), and the support piece 93 is loaded upward. The gondola frame 70 is moved from below the step 56b. Thereby, the heat treatment apparatus 1 completes a series of substrate replacement operations.

  When the substrate replacement operation in the target loading stage 56 a of the gondola 55 is completed, the control device resumes the vertical movement of the gondola 55. The heat treatment apparatus 1 repeats the substrate replacement operation in each stacking stage 56 as described above. The substrate W is exposed to hot air flowing in the heat treatment chamber 12 after being mounted on the target loading stage 56a and taken out, and is subjected to heat treatment (firing).

  In the heat treatment apparatus 1 of the present embodiment, the upper loading stage 56b positioned above the target loading stage 56a to be replaced with the substrate W is supported from below by the support piece 93 and the gondola frame 70 is lowered as described above. Thus, the interval between the target stacking stage 56a and the upper stacking stage 56b can be increased. Therefore, the heat treatment apparatus 1 can minimize the interval between the stacking stages 56 other than the target stacking stage 56a and the upper stacking stage 56b. Therefore, the heat treatment apparatus 1 can suppress the height to a minimum while increasing the width and depth of the heat treatment chamber 12 in order to process a large substrate W.

  If it is set as the above-mentioned structure, the height of the heat processing chamber 12 can be made lower than the heat processing apparatus of a prior art. For this reason, the volume of the heat treatment chamber 12 is smaller than the number and surface area of the substrates W that can be accommodated in the heat treatment chamber 12. Therefore, the heat treatment apparatus 1 can easily stabilize the ambient temperature, and requires only a small amount of thermal energy for adjusting the ambient temperature.

  As described above, in the heat treatment apparatus 1, the support piece 93 has a curved shape having the outer edge side 101 having a smaller curvature and the inner edge side 102 having a larger curvature than the outer edge side 101, and the gondola frame 70 extends from the outer edge side 101. It is configured to enter the internal area. Therefore, in the heat treatment apparatus 1, the contact area between the support piece 93 and the frame member 57 of the stacking stage 56 can be increased as hatched in FIG. Therefore, the heat treatment apparatus 1 can firmly support the frame member 57 without providing a large number of support pieces 93 or enlarging the support pieces 93.

  The heat treatment apparatus 1 has a configuration in which a large number of stacking stages 56 are stacked in a vertical direction at a predetermined interval by fitting a spacer 60 fixed to the frame member 57 into a fitting hole 68. Further, in the heat treatment apparatus 1, guide members 65 are provided on the side surfaces 57 a and 57 b of the frame member 57, and the operation of the guide members 65 is configured to be regulated in the vertical direction by the guide rails 71. For this reason, the heat treatment apparatus 1 has high positioning accuracy between the loading stages 56 even before and after the loading stages 56 are separated into upper and lower parts for the replacement operation of the substrate W, and maintains the loading stages 56 at a predetermined interval. Can do.

  In the above-described embodiment, the example in which the distance between the target stacking stage 56a and the upper stacking stage 56b is widened and the substrate W is put in and out by the robot hand is illustrated, but the present invention is not limited to this. More specifically, in the heat treatment apparatus 1 described above, the guide member 65 provided in the stacking stage 56 is configured to fit into the guide rail 71, and the stacking stage existing in the middle in the vertical direction of the gondola frame 70. 56 cannot be pulled out of the gondola frame 70 horizontally. However, for example, when the heat treatment apparatus 1 is configured such that the loading stage 56 can be pulled out from the gondola frame 70 without providing the guide member 65 or the guide rail 71, the interval between the target loading stage 56a and the upper loading stage 56b is increased. After that, it is also possible to take out the entire target loading stage 56a from the heat treatment chamber 12 by the robot hand and insert another loading stage 56 on which the unfired substrate W is loaded into the portion where the target loading stage 56a existed. Thus, when it is set as the structure replaced with the loading stage 56, it can also be set as the structure which a robot hand supports or hold | grips only the edge part of a loading stage.

  As described above, in the heat treatment apparatus 1 shown in the above embodiment, the distance between the target stacking stage 56a and the upper stacking stage 56b is widened, and the substrate W is transferred to the target stacking stage 56a using a transfer device such as a robot hand. However, the present invention is not limited to this, and for example, a heat treatment apparatus 105 as shown in FIG. 16 may be used instead of the substrate replacement system 54. Hereinafter, the heat treatment apparatus 105 will be described focusing on the configuration of the substrate replacement system 110 with reference to the drawings. In addition, in the following description, the same code | symbol is attached | subjected about the part which is common in the above-mentioned heat processing apparatus 1 and the substrate replacement system 54, and it abbreviate | omits about detailed description.

  FIG. 16 is a front view showing a heat treatment apparatus according to the second embodiment of the present invention. 17 is a cross-sectional view showing the structure in the vicinity of the heat treatment chamber of the heat treatment apparatus shown in FIG. 18 is a perspective view showing a stacking stage employed in the heat treatment apparatus shown in FIG. FIG. 19 is a conceptual diagram schematically showing the positional relationship between the support means and the gondola frame included in the heat treatment apparatus shown in FIG. 20, FIG. 21, and FIG. 23 are conceptual diagrams schematically showing the first stage, the second stage, and the third stage of the replacement operation in the heat treatment apparatus shown in FIG. FIG. 22 is a perspective view showing a part of the supporting means provided in the heat treatment apparatus shown in FIG. In FIGS. 17, 20, 21, and 23, a part or all of the support piece 120 is not shown and omitted for simplification of illustration.

  The heat treatment apparatus 105 has substantially the same appearance as the heat treatment apparatus 1, but has three replacement ports 106 instead of the four replacement ports 6. The replacement port 106 is used to load and unload a loading stage 113 described later using a transfer device such as a robot hand. The replacement port 106 is provided with a shutter 107 that opens and closes as the air cylinder 8 operates. The replacement port 106 is provided at a position corresponding to a position where first to third stacking stage sets 116 to 118 described later are provided.

  The heat treatment apparatus 105 includes a substrate replacement system 110 in the heat treatment chamber 12. As shown in FIG. 17, the substrate replacement system 110 is roughly divided into a gondola 111 for loading a substrate W and a support means 112.

  The gondola 111 is obtained by stacking and mounting a large number of loading stages 113 on the gondola frame 70 employed in the board replacement system 54. The loading stage 113 has substantially the same structure as the above-described loading stage 56 as shown in FIG. More specifically, the stacking stage 113 is different from the stacking stage 56 in that protrusions 115 are provided in place of the guide members 65 attached to the four corners of the frame member 57 in the stacking stage 56. The projecting piece 115 is a flat plate-like portion projecting outward from both side surfaces 57a and 57b of the frame member 57 constituting the stacking stage 113, and the surface of the stacking stage 113, that is, the spacer 60 and the support protrusion 63 project. The same plane as the surface on the other side is formed. The loading stage 113 forms a space 114 under which the robot hand and a support piece 120 described later can enter under the protruding piece 115.

  As with the stacking stage 56, the stacking stage 113 has insertion holes 68 at the four corners on the back side of the frame member 57. A large number (24 in this embodiment) of stacking stages 113 are stacked at intervals P1 through spacers 60 inside the gondola frame 70 disposed inside the heat treatment chamber 12. As shown in FIG. 17, the stacking stages 113 constitute first to third stacking stage sets 116 to 118 every eight stages from the upper side in the stacking direction. The loading stage sets 116 to 118 are obtained by stacking a plurality of loading stages 113 above the loading stage 113 supported by the support means 119 with respect to the gondola frame 70. Spaces S1 to S3 are formed above the stacking stage sets 116 to 118. The height of the spaces S <b> 1 to S <b> 3 is set to a height obtained by stacking two stacking stages 113.

  The support means 112 is obtained by fixing 48 support pieces 120 in a spiral manner on each of the four rotating shafts 91 arranged on the outside of the gondola frame 70. The 48 support pieces 120 attached to each rotating shaft 91 are classified into three support piece groups 121 to 123. Each of the support piece groups 121 to 123 is composed of 16 support pieces 120 (support pieces 120a to 120p). The support piece groups 121 to 123 are provided at positions corresponding to the first to third stacking stage sets 116 to 118, respectively.

  More specifically, the support pieces 120 a to 120 p constituting the support piece group 121 are attached to positions corresponding to the sides of the stacking stage set 116. The 16 support pieces 120a to 120p constituting the support piece group 121 are configured to be mounted so as to protrude radially from the rotation shaft 91 in eight directions as shown in FIG. Each support piece 120a-120p which comprises the support piece group 121 is helically attached with respect to the rotating shaft 91, as shown in FIG.

  Similarly to the support piece group 121 described above, the support piece groups 122 and 123 are each composed of 16 support pieces 120 (support pieces 120a to 120p), and each of the support pieces 120 is a stacking stage set 117 and 118. It is attached at a position corresponding to the side of The support pieces 120 constituting the support piece groups 122 and 123 are also attached so as to protrude radially from the rotary shaft 91 in eight directions as shown in FIGS.

  The support piece groups 121 to 123 have 16 support pieces 120 arranged at equal intervals in the circumferential direction of the rotating shaft 91 as shown in FIG. The support pieces 120 constituting the support piece groups 121 to 123 are classified into eight groups for each protruding direction with respect to the rotation shaft 91. Further, the support pieces 120 constituting the support piece groups 121 to 123 are arranged at a predetermined interval in the extending direction of the rotating shaft 91.

  More specifically, the 16 support pieces 120a to 120p constituting the support piece groups 121 to 123 are classified into eight groups 120A to 120H when classified for each protruding direction with respect to the rotation shaft 91. That is, the support pieces 120 constituting the support piece groups 121 to 123 are group 120A (120a, 120i), group 120B (120b, 120j), group 120C (120c, 120k), group 120D (120d, 120l), group 120E. (120e, 120m), group 120F (120f, 120n), group 120G (120g, 120o), and group 120H (120h, 120p). The support pieces 120 constituting the groups 120 </ b> A to 120 </ b> H protrude from the rotation shaft 91 at equal intervals in the circumferential direction.

  The two support pieces 120 constituting each of the groups 120A to 120H protrude in the same direction with respect to the rotation shaft 91, and are in a parallel relationship with each other. Of the support pieces 120 of the groups 120A to 120H, the support pieces 120 (120a to 120h) positioned above the rotation shaft 91 are arranged at intervals P1 corresponding to the stacking intervals of the stacking stages 113. The interval between the two support pieces 120 constituting each group 120A to 120H is 1.5 times the interval P1 (P3 = 1.5 · P1). That is, the interval between any of the support pieces 120a to 120h constituting the groups 120A to 120H and the corresponding support pieces 120i to 120p of the same group corresponding to this is P3. Therefore, for example, the interval between the support piece 120a and the support piece 120i of the group 120A is P3, and the interval between the support piece 120a and the upper support piece 120b of the group 120B adjacent below is P1.

  The rotating shaft 91 rotates so that the tip end portions of the two support pieces 120 constituting one group among the eight groups 120A to 120H are the outer edge portions of the protruding pieces 115 of the stacking stage 113 (hereinafter, the support piece contact portions 125). It is arranged at a position where it can enter the back side.

  The heat treatment apparatus 105 heats (fires) the substrate W placed on each stacking stage 113 constituting the gondola 111 in the heat treatment chamber 12 in a predetermined temperature atmosphere as in the heat treatment apparatus 1 described above. The heat treatment apparatus 105 of this embodiment is characterized by a substrate replacement operation performed by the substrate replacement system 110 when the substrate W is heated. Hereinafter, the substrate replacement operation performed in the heat treatment apparatus 105 will be described.

  When the internal temperature of the heat treatment chamber 12 reaches a predetermined firing temperature (230 to 250 ° C. in this embodiment), the control device of the heat treatment apparatus 105 expands and contracts the lifting shaft 81 of the lifting apparatus 80 to adjust the position of the gondola frame 70. I do. On the other hand, the control device rotates the rotation shaft 91 of the support means 90. Accordingly, as shown in FIGS. 19 and 20, the two support pieces 120a to 120p constituting any of the groups 120A to 120H are placed in the spaces 114a and 114b existing below the target stacking stage 113a and the upper stacking stage 113b. enter in. That is, among the support pieces 120 a to 120 p constituting the groups 120 </ b> A to 120 </ b> H, those existing at positions adjacent to the gondola frame 70 enter the region of the gondola frame 70. Here, among the two support pieces 120 constituting any one of the groups 120A to 120H entering the region of the gondola frame 70, the upper support pieces 120a to 120h are located above the target loading stage 113a. It enters the space 114 (114b) formed below the protruding piece 115 of the loading stage 113 (hereinafter referred to as the upper loading stage 113b as required). At the same time, the support pieces 120i to 120p existing by a distance P3 below the support pieces 120a to 120h that have entered the space 114b are the target loading stages 113 ( Hereinafter, it enters the space 114 (114a) formed below the projecting piece 115 of the target loading stage 113a) as required. Here, as described above, the interval P3 between the two projecting pieces 120 constituting each of the groups 120A to 120H is 1.5 times the interval P1 between the stacking stages 113. Therefore, as shown in FIG. 20, even if the support pieces 120a to 120h located on the upper side of the groups 120A to 120H are advanced to the position along the lower side of the protruding piece 115 of the upper stacking stage 113b, the support pieces located on the lower side are supported. The pieces 120i to 120p are present at positions away from the protruding piece 115 of the target stacking stage 113a.

  As described above, when the set of support pieces 120a to 120p constituting any one of the predetermined groups 120A to 120H sinks below the upper stacking stage 113b and the target stacking stage 113a, the control device lifts and lowers the lifting device 80. The shaft 81 is lowered. Accordingly, as shown in FIG. 20, the upper stacking stage 113b is supported by any one of the upper support pieces 120a to 120h (the support piece 120a in FIG. 20). In other words, the upper stacking stage 113b can be made independent of the target stacking stage 113a and the stacking stage 113 located below the target stacking stage 113a (hereinafter referred to as the lower stacking stage 113c as necessary). At this time, as shown in FIG. 20, the lower support piece 120i, which is paired with the support piece 120a supporting the upper stacking stage 113b, is located at a position separated below the protrusion 115 of the target stacking stage 113a. is there.

  Thereafter, the control device of the heat treatment apparatus 105 further lowers the elevating shaft 81 of the elevating apparatus 80 to lower the gondola frame 70. As a result, the distance between the upper stacking stage 113b and the target stacking stage 113a is further increased, and the support pieces 120i to 120p existing below the target stacking stage 113a are in contact with the back side of the projecting piece 115 as shown in FIG. . When the gondola frame 70 is further lowered from this state, the target stacking stage 113a is supported by the support pieces 120i to 120p while the upper stacking stage 113b is supported by the support pieces 120a to 120h as shown in FIG. Thus, it becomes independent from the loading stage 113 below the target loading stage 113a. That is, the target loading stage 113a is suspended between the upper loading stage 113b and the lower loading stage 113c existing below the target loading stage 113a.

  As described above, when the target stacking stage 113a becomes independent from the other stacking stages 113 constituting the stacking stage sets 116 to 118, the control unit operates the air cylinder 8 to open the shutter 107, and the replacement port 106. To insert the robot hand. As shown by hatching in FIG. 23, the robot hand enters the space 114 formed below the projecting piece 115 of the target loading stage 113a along the side surfaces 57a and 57b of the frame member 57, and moves the projecting piece 115 from below. To support. When the robot hand is inserted from the exchange port 106 side to the back side (door 7 side) of both side surfaces 57a and 57b of the loading stage 113, the target loading stage 113a is lifted upward by the robot hand and taken out from the exchange port 106.

  When the target stacking stage 113a is taken out as described above, the stacking stage 113 on which the substrate W that has not been previously heat-treated (fired) is mounted outside the heat treatment apparatus 105 (hereinafter referred to as the input stacking stage 113 as necessary). The robot hand is inserted below the projecting piece 115 and the loading stack 113 is lifted. The input loading stage 113 is input into the heat treatment chamber 12 by inserting the robot hand into the position where the previously extracted target loading stage 113a was present. That is, the robot hand inputs the input stacking stage 113 from the changeover port 106 so that the projecting piece 115 of the input stacking stage 113 comes on the support piece 120i supporting the target stacking stage 113a. When the loading of the loading stack 113 is completed, the robot hand is removed from the heat treatment chamber 12 and the shutter 107 is closed.

  When the loading of the loading / unloading stage 113 is completed, the control unit operates the lifting device 80 to raise the gondola frame 70 until the spacer 60 of the loading / stacking stage 113 is fitted into the fitting hole 68 of the upper loading stage 113b. That is, the control means raises the gondola frame 70 and integrates the loading stack 113 and the upper stack 113b. Thereafter, the control means rotates the rotating shaft 91 in the forward direction, and removes the two support pieces 120 constituting any of the groups 120A to 120H used for replacement of the target loading stage 113a from the region of the gondola frame 70. Pull it out. When the pair of support pieces 120 constituting any of the groups 120A to 120H are removed, the replacement operation of the target loading stage 113a is completed. The control means makes the loading stage 113 (lower loading stage 113c) adjacent to the lower side of the loading loading stage 113 suspended in the heat treatment chamber 12 and independent of the other loading stages 113 in the same manner as described above. The lower loading stage 113c and another loading stage 113 prepared outside the heat treatment apparatus 105 are exchanged through a hand.

  As described above, the heat treatment apparatus 105 suspends the target loading stage 113a from the upper loading stage 113b and the lower loading stage 113c existing below the target loading stage 113a out of the stacking stages 113 stacked in large numbers in the vertical direction. In this state, the robot hand is inserted to replace the target loading stage 113a. Therefore, the heat treatment apparatus 105 can suppress the interval between the loading stages 113 other than the target loading stage 113a to be replaced to a minimum, and can suppress the height with respect to the depth and width of the heat treatment chamber 12.

  The heat treatment apparatus 105 inserts the robot hand into the space 114 formed below the projecting pieces 115 protruding from the side surfaces 57a and 57b of the frame member 57 and replaces the loading stage 113. The loading stage 113 can be replaced even if the interval between the loading stages 113 is narrower than when the substrate W placed above the 113 is replaced with a robot hand. Therefore, the heat treatment apparatus 105 can perform the replacement operation of the loading stage 113 without leaving a large gap above and below the target loading stage 113a.

  In the above-described embodiment, the stacking stage 113 adjacent to the upper and lower sides of the target stacking stage 113a is separated from the target stacking stage 113a, and then the other stacking stage on which the unburned substrate W is placed together with the target stacking stage 113a on which the substrate W is placed. However, the present invention is not limited to this, and only the substrate W placed on the target loading stage 113a is taken out by the robot hand while being separated from the target loading stage 113a. It is also possible to replace the substrate W for firing.

  Further, when the stacking stage 113 is inserted and removed as it is as in the heat treatment apparatus 105 described above, the target loading stage 113 for performing insertion and removal and other loads are compared with the case where only the substrate W is inserted and removed as in the heat treatment apparatus 1. The space | interval with the stage 113 can be taken widely. Further, in the heat treatment apparatus 105, it is only necessary to keep the target loading stage 113 to be inserted / removed horizontally, and for example, the robot hand may be configured to support or hold only the end portion of the loading stage 113.

  In the heat treatment apparatuses 1 and 105 of the above-described embodiment, the support pieces 93 and 120 are rotated together with the rotary shaft 91 in the heat treatment chamber 12 to advance and retreat into the region of the gondola frame 70 to move the gondolas 55 and 111 up and down. Thus, an interval expansion operation for expanding the interval between the loading stages 56 and 113 as necessary is performed. That is, the heat treatment apparatuses 1 and 105 move the position of the gondola 55 and 111 relative to the support pieces 93 and 120 of the support means 90 and 112 relative to the loading direction (vertical direction) of the loading stage by the vertical movement of the gondola 55 and 111. And the interval expansion operation is performed. However, the present invention is not limited to this. For example, a substrate mounting shelf 131 that does not move up and down is provided in the heat treatment chamber 12 as in the heat treatment apparatus 130 shown in FIGS. It may move relative to the shelf 131 in the vertical direction. Hereinafter, the heat treatment apparatus 130 will be described in detail with reference to the drawings. In the following description, parts having the same configurations as those of the heat treatment apparatuses 1 and 105 described above are denoted by the same reference numerals, and detailed description thereof is omitted.

  FIG. 24 is a front view showing the heat treatment apparatus 130 of the present embodiment. FIG. 25 is a cross-sectional view taken along the line AA in FIG. 26 and 27 are conceptual diagrams schematically showing a first stage and a second stage of the operation of the heat treatment apparatus 130 shown in FIG. 24, respectively. FIG. 28 is an exploded perspective view showing the support means employed in the heat treatment apparatus shown in FIG. FIG. 29A is a perspective view showing a guide piece adopted in the heat treatment apparatus 130 shown in FIG. 24, and FIG. 29B shows a state where the shutter plate adopted in the heat treatment apparatus 130 is observed from the back side. It is a perspective view.

  The heat treatment apparatus 130 includes a substrate mounting shelf 131 in the heat treatment chamber 12 as shown in FIG. Similar to the gondola frame 70 employed in the above-described embodiment, the substrate mounting shelf 131 has the upper beam members 72 and 73 and the lower beam members with respect to the four columns 69 erected with respect to the base plate 78. A plurality of stacking stages 56 are stacked in a mounting frame 132 to which 75 and 76 are fixed. The pedestal plate 78 of the mounting frame 132 is fixed on the bottom surface 46 of the heat treatment chamber 12. Therefore, the substrate mounting shelf 131 does not move up and down like the above-described gondola frame 70, and is stationary in the heat treatment chamber 12. The mounting stage 56 is not fixed with respect to the mounting frame 132 like the gondola 55 described above, and can freely move up and down in the mounting frame 132.

  Supporting means 135 are arranged at positions adjacent to the four corners of the substrate mounting shelf 131 as shown in FIGS. The support means 135 includes a support mechanism portion 138 in which the support piece 136 is attached to the rotation shaft 137, and an elevating mechanism portion 140 that moves the support piece 136 in the axial direction (vertical direction) of the rotation shaft 137.

  As shown in FIG. 28, the rotating shaft 137 constituting the support mechanism 138 has a prismatic shape and penetrates the top surface 45 and the bottom surface 46 of the heat treatment chamber 12. Both ends of the rotating shaft 137 are cylindrical, and are rotatably supported by bearings 141 and 141. The rotating shaft 137 is connected to a rotating mechanism 92 disposed in the device housing 3. That is, the rotation shaft 137 is connected to the rotation shaft of the motor 97 via the toothed belt 98 and is supported so as to be rotatable by receiving the rotational power of the motor 97.

  The support piece 136 is a member having substantially the same shape as the support piece 93 employed in the above embodiment. The support piece 136 has a curved portion 143a that is curved in the same manner as the support piece 93, except that it has a square hole 143b through which the rotary shaft 137 can be inserted and a grip portion 143c is provided at the end portion. The grip portion 143c is a portion that is accommodated in a grip groove 152 of the lifting mechanism portion 140, which will be described later. The square hole 143b is a hole that is slightly larger than the cross-sectional shape of the rotating shaft 137. For this reason, when the rotation shaft 137 is inserted into the square hole 143b, the support piece 136 cannot rotate relative to the rotation shaft 137, but is slidable in the axial direction of the rotation shaft 137. Therefore, the support piece 136 rotates around the axis of the rotation shaft 137 in conjunction with the rotation of the rotation shaft 137 in the same manner as the support piece 93 described above with an arrow in FIG. 28, and the bending portion 143a is mounted on the mounting frame. Enter and exit the 132 area.

  The elevator lowering unit 140 includes a sliding piece 145 that abuts the support piece 136 downward, a screw shaft 146, and a guide member 144. The screw shaft 146 passes through the top surface 45 and the bottom surface 46 of the heat treatment chamber 12 and is rotatably supported by bearings 147 and 147. The screw shaft 146 is connected to a stepping motor 148 disposed in the device accommodating portion 3 via a toothed belt 149. Therefore, the rotation amount of the screw shaft 146 is adjusted by the rotation amount of the stepping motor 148.

  As shown in FIG. 28, the sliding piece 145 is provided with a screw hole 150, a protrusion 151, and a gripping groove 152 on a substantially rectangular metal plate. The sliding piece 145 is attached to the screw shaft 146 by screwing the screw shaft 146 into the screw hole 150. Further, the protrusion 151 is a portion that protrudes from a position adjacent to the screw hole 150 and is a portion that is fitted into a guide groove 153 of a guide member 144 described later. The grip groove 152 is a groove provided in the middle portion in the thickness direction of the sliding piece 145 as shown in FIGS. 26 and 28, and is a portion that sandwiches the grip portion 143c of the support piece 136.

  The guide member 144 prevents the sliding piece 145 from rotating with respect to the screw shaft 146 and restricts the moving direction of the sliding piece 145 to the extending direction of the screw shaft 146. More specifically, the guide member 144 is fixed to the top surface 45 and the bottom surface 46 of the heat treatment chamber 12 as shown in FIG. 26, and is arranged in parallel to the rotating shaft 137 and the screw shaft 146. It is a long member. The guide member 144 has a guide groove 153 extending in the longitudinal direction. The guide member 144 is in a state where the guide groove 153 faces the screw shaft 146 side of the elevating mechanism 140 and the protrusion 151 of the sliding piece 145 is fitted in the guide groove 153. Therefore, the sliding piece 145 moves in the extending direction of the screw shaft 146, that is, in the vertical direction of the heat treatment chamber 12 when the screw shaft 146 rotates.

  As shown in FIG. 24, the heat treatment apparatus 130 has a replacement port 155 for loading and unloading the substrate W on the front surface 130a side. The replacement port 155 is located at a position facing the substrate mounting shelf 131 disposed in the heat treatment chamber 12 as shown in FIG. The replacement opening 155 is an opening having a height that extends from the upper end portion to the lower end portion of the substrate mounting shelf 131 and has a width that is slightly larger than the width of the substrate W. A shutter having a plurality (five in this embodiment) of shutter plates 156 and cylinders 157 is attached to the replacement port 155.

  The shutter plate 156 is a metal plate having a width larger than the opening width of the replacement port 155 and a height of about 1/5 of the height of the replacement port 155. On the back side of the shutter plate 156, a guide piece 159 is mounted as shown in FIG. The guide piece 159 is a member having a substantially C-shaped cross section and having an engagement groove 161. The guide piece 159 is fixed so that the extending direction of the engaging groove 161 is directed to the height direction of the shutter plate 156.

  On the front surface 130 a side of the heat treatment apparatus 130, rails 162 are arranged on the left and right sides of the replacement port 155. The rail 162 is a rod-shaped member that extends in the height direction (vertical direction) of the heat treatment apparatus 130. The rail 162 restricts the moving direction of the shutter plate 156 to the height direction of the heat treatment chamber 130 by being fitted into the engaging groove 161 of the guide piece 159 mounted on the back side of the shutter plate 156.

  The cylinder 157 is fixed to the front surface 130 a of the heat treatment chamber 130 and is connected to the side of each shutter plate 156. The cylinder 157 is fixed in a state in which the cylinder shaft 158 can be expanded and contracted in the vertical direction of the heat treatment apparatus 130, and can push and move the shutter plate 156 in the vertical direction as needed. More specifically, for example, when it is desired to open a position corresponding to the shutter plate 156a located at the uppermost position of the heat treatment apparatus 130 in the replacement port 155, the cylinder shaft 158 of the cylinder 157 connected to the shutter plate 156a is opened. Stretch upward. Further, for example, when opening the portion closed by the shutter plate 156e existing at the lowermost part of the heat treatment apparatus 130, the cylinder shaft 158 of the cylinder 157 connected to the shutter plates 156a to 156e is extended. That is, the heat treatment apparatus 130 extends a shutter plate 156 that exists in a portion where the replacement port 155 is desired to open and a cylinder 157 that is connected to the shutter plate 156 that exists above the shutter plate 156, thereby extending a desired portion of the replacement port 155. Can be opened.

  The heat treatment apparatus 130 is characterized by a substrate replacement operation for taking in and out the substrate W. Hereinafter, the operation of the heat treatment apparatus 130 during the substrate replacement operation will be described in detail with reference to the drawings. When the substrate W is put in and out, the control device of the heat treatment apparatus 130 supplies power to the stepping motor 148 to rotate the screw shaft 146 of the elevating mechanism unit 140. Thereby, the sliding piece 145 of the raising / lowering mechanism part 140 moves to the extending | stretching direction of the screw shaft 146, ie, an up-down direction. Here, as described above, the grip portion 143 c of the support piece 136 is sandwiched between the grip grooves 152 of the slide piece 145. Therefore, when the slide piece 145 moves up and down, the support piece 136 moves up and down along the rotation shaft 137 in conjunction with this.

  Among the many stacking stages 56 stacked on the inside of the mounting frame 132, the stacking stage 56 (upper stacking stage 56b) positioned above the target stacking stage 56 (target stacking stage 56a) where the substrate W should be taken in and out. ), The control device stops the rotation of the screw shaft 146 and stops the sliding piece 145 from moving up and down.

  When the sliding piece 145 reaches a predetermined height, the control device energizes the motor 97 to rotate the rotating shaft 137 of the support mechanism unit 138. Thereby, the support piece 136 rotates with the rotating shaft 137, and the curved portion 143a enters the back side of the upper stacking stage 56b as shown in FIG. When the curved portion 143a enters the back surface side of the upper stacking stage 56b, the control means energizes the stepping motor 148 to rotate the screw shaft 146 of the elevating mechanism portion 140 and move the support piece 136 upward. As a result, the upper stacking stage 56b is lifted upward, and the distance between the upper stacking stage 56b and the target stacking stage 56a gradually increases as shown in FIG.

  When the distance between the upper stacking stage 56b and the target stacking stage 56a reaches a predetermined distance, the control unit stops energizing the stepping motor 148 and stops the support piece 136. Thereafter, the control means opens the shutter plate 156 present on the front side of the target stacking stage 56a. More specifically, for example, when the shutter plate 156b is present at a position facing the target stacking stage 56a, the control device sets the shutter plate 156b and the cylinders 157a and 157b connected to the shutter plate 156a positioned above the shutter plate 156b. The cylinder shaft 158 is extended. Thereby, the site | part which opposes the target loading stage 56a among the exchange openings 155 will be in the open state. When the replacement port 155 is opened, the robot hand is inserted from the opening, and the substrate W is taken in and out of the target loading stage 56a.

  As described above, in the heat treatment apparatus 130 of this embodiment, the support pieces 136 are moved up and down with respect to the substrate placement shelf 131 that is stationary in the heat treatment chamber 12, and are stacked in the placement frame 132. It is possible to widen the distance between the target stacking stage 56a and the upper stacking stage 56b, which are targets for loading and unloading the substrate W, in the mounting stage 56.

  In the heat treatment apparatus 130 described above, the support means 135 is divided into a support mechanism portion 138 having a rotating shaft 137 and a support piece 136 and a lifting mechanism portion 140 having a sliding piece 145 and a screw shaft 146. However, the present invention is not limited to this, and for example, as shown in FIG. 30, a support means 160 having both a support mechanism and an elevating mechanism may be provided.

  More specifically, in the same manner as in the above-described embodiment, the support means 160 includes four corners of the mounting frame 132 in which the screw shafts 146 connected to the stepping motor 148 via the toothed belt 149 constitute the substrate mounting shelf 131. It is erected at a position adjacent to. Four sliding pieces 161 (161a to 161d) are screwed together at a predetermined interval across the screw shafts 146a and 146b that are erected on the left side (front side in FIG. 30) as viewed from the replacement port 155 side. Has been. Similarly, four sliding pieces 161 (161e to 161h) are screwed into the screw shafts 146c and 146d arranged on the right side (the back side in FIG. 30) with a predetermined interval. The sliding pieces 161a to 161d and the sliding pieces 161e to 161h are in a positional relationship parallel to each other.

  Each sliding piece 161 is provided with two cylinders 163 in which the shaft 162 is advanced and retracted by air pressure and electrical action. The cylinder 163 is arranged so that the shaft 162 faces the inside of the substrate mounting shelf 131.

  The above-described support means 160 is such that the screw shaft 146 rotates with the energization of the stepping motor 148 and the sliding piece 161 moves up and down accordingly. Therefore, when the supporting means 160 is employed, the screw shaft 146 is rotated to slide the sliding piece 161 until the sliding piece 161 comes below the upper loading stage 56b, and then the shaft 162 of the cylinder 163 is projected. After that, the distance between the target stacking stage 56a and the upper stacking stage 56b can be increased by moving the sliding piece 161 upward again.

  Each of the loading steps 56 and 113 employed in the above embodiment has the spacer 60 attached to the front surface side of the frame member 57 and the fitting hole 68 provided on the back surface side of the frame member 57. However, the present invention is not limited to this. For example, as shown in FIG. 31A, a mounting hole 68 is provided on the front surface side of the frame member 57, and a spacer 60 is attached to the rear surface side of the frame member 57. It may be. Further, in the loading stages 56 and 113, instead of providing the spacer 60 and the fitting hole 68, for example, a spacer 166 having a recess 165 is fixed to one of the front surface side and the back surface side of the frame member 57 as shown in FIG. On the other hand, as shown in FIG. 31 (c), a spacer 168 having a convex portion 167 fitted into the concave portion 165 may be fixed. In such a configuration, when the stacking steps 56 and 113 are stacked, the convex portion 167 of the spacer 168 is fitted into the concave portion 165 of the spacer 166 and integrated as shown in FIG. Even in such a configuration, the stacking stages 56 and 113 can be stacked in a state where they can be separated from each other, and the positioning accuracy is high as in the case where the spacer 60 is fitted into the insertion hole 68.

  In the above embodiment, the spacer 60 and the support pieces are arranged in a line in the vertical direction. However, the present invention is not limited to this, and the arrangement position of the spacer 60 may be shifted.

  In the above-described embodiment, an example in which the distance between the target stacking stage 56a and the upper stacking stage 56b is widened and the substrate W is taken in and out by the robot hand has been illustrated, but after the distance between the target stacking stage 56a and the upper stacking stage 56b is widened. The target stacking stage 56a on which the sintered substrate W is mounted is taken out of the heat treatment chamber 12, and another stacking stage 56 on which the unfired substrate W is mounted is inserted into the portion where the target stacking stage 56a was present. Also good.

  In addition, although the above-described heat treatment apparatuses 1, 105, and 130 each insert and remove the single substrate W and the loading stage 113, the present invention is not limited to this. More specifically, when the target stacking stage 113a is made independent of the upper stacking stage 113b and the lower stacking stage 113c as in the heat treatment apparatus 105, for example, both the target stacking stage 113a and the lower stacking stage 113c are extracted at once, It is also possible to extract two substrates W mounted on these stacking stages 113 at a time. Further, it is possible to adopt a configuration in which a larger number of loading stages 113 and substrates W are inserted into and removed from the heat treatment chamber 12. According to such a configuration, it is possible to further improve the throughput of the substrate in and out of the heat treatment apparatus 1.

  In the heat treatment apparatus 130 described above, the five shutter plates 156 slide up and down when the replacement port 155 is opened and closed, but the present invention is not limited to this. For example, the shutter plates provided at various places. 156 may fall down inside or outside the heat treatment chamber 12 to open and close the replacement port 155 like the shutter 10 of the heat treatment apparatus 1 described above. In addition, the heat treatment apparatuses 1 and 105 of the above-described embodiment may also have a configuration in which a replacement port 155 that opens and closes by moving the shutter plate 156 in the vertical direction as in the heat treatment apparatus 130 instead of the replacement port 6 may be provided.

  In the above embodiment, the robot hand is used to insert and remove the substrate W and the loading stages 56 and 113. However, the present invention is not limited to this, and the conveyor or the fork-shaped arm is provided. An apparatus may be employed. Further, a self-propelled mechanism that can insert and remove the substrate W and the loading stages 56 and 113 into and out of the heat treatment chamber 12 may be provided on the loading stages 56 and 113 and the gondola frame 70 side.

  In the above-described embodiment, the board replacement systems 54 and 110 both have support pieces 93 and 120 inserted from below the predetermined stacking stages 56 and 113, and support the stacking stages 56 and 113 from below, so that the adjacent stacking stages 56. , 113 is adjusted, but the present invention is not limited to this. That is, the substrate replacement systems 54 and 110 provided in the heat treatment apparatuses 1 and 105 only have to have the predetermined stacking stages 56 and 113 supported by the support pieces 93 or the like during the substrate replacement operation, and are not necessarily the same as in the above embodiment. Thus, the loading stages 56 and 113 need not be supported from below.

  More specifically, for example, as in a substrate replacement system 171 shown in FIG. 32, the stacking stage 56 is provided with a recess 170 or the like in which the support piece 93 is fitted or engaged, and the support piece is provided in the recess 170. It is good also as a structure which supports the predetermined | prescribed loading stage 56 by fitting 93 or engaging. In such a configuration, after supporting the upper stacking stage 56b by engaging the support piece 93 with the concave portion 170 of the upper stacking stage 56b that exists above the target stacking stage 56a that is the target of loading and unloading of the substrate W, The elevating device 80 of the gondola 55 is lowered, and the target loading stage 56a and the lower loading stage 56 are shifted downward as indicated by arrows in FIG. 32, so that the gap between the target loading stage 56a and the upper loading stage 56b is reached. In addition, a space necessary for taking in and out the substrate W can be secured.

  Further, in the case of the heat treatment apparatus 130 shown in FIG. 24, when the support piece 136 includes the support means 135 that can move up and down, and the support means 160 that combines the support mechanism and the lift mechanism as shown in FIG. 33, using a stacking stage 56 provided with a recess 170 as in the substrate exchange system 172 shown in FIG. 33, and inserting the support piece 136 of the support means 137 and the shaft 162 of the cylinder 163 into the recess 170 to support the stacking stage 56 and the like. Possible configurations are possible. In such a configuration, the recess 170 provided in the upper stacking stage 56b positioned above the target stacking stage 56a on which the substrate W to be taken in and out is placed is aligned with the support piece 136 or the cylinder 163. After engaging both, the support piece 136 or the cylinder 163 is shifted upward, whereby the distance between the target stacking stage 56a and the upper stacking stage 56b can be increased.

  That is, as shown in FIGS. 32, 33, and 34, if the predetermined stacking stage 56 (upper stacking stage 56b) is supported by the support pieces 93 and 136 and the shaft 162 of the cylinder 163, the gondola 55 One or both of the side or the support pieces 93 and 136 and the shaft 162 side of the cylinder 163 are moved up and down to move the upper loading stage 56b and the upper loading stage 56 and the target loading stage 56a relative to each other. Thus, the distance between the target stacking stage 56a and the upper stacking stage 56b can be increased.

  In the heat treatment apparatus 1 or the like of the above embodiment, the members for supporting the stacking stages 56 and the like such as the support pieces 93 are not provided corresponding to all the stacking stages 56 and the like. Therefore, when adopting the above-described configuration, the position of the support piece 93 or the like that supports the loading stage 56 or the like, or the position of the loading stage 56 or the like is moved up and down as necessary, so that the support piece 93 or the like and the loading stage 56 or the like It was a configuration that had to be aligned. However, the present invention is not limited to this, for example, a cylinder 163 that operates independently at a position corresponding to each stacking stage 56 that is stacked, such as a substrate replacement system 173 shown in FIG. It is good also as a structure which provided the support means. In such an example, in the example shown in FIG. 34, for example, the shaft 162 of the cylinder 163 installed at a position corresponding to the upper stacking stage 56b is engaged with the recess 170, and the upper stacking stage 56b and above the upper stacking stage 56b. The position of the loading stage 56 can be fixed, and the gap between the target loading stage 56a and the upper loading stage 56b can be expanded by lowering the gondola 55 or raising the cylinder 163 in this state.

  Further, as the heat treatment apparatus 1 or the like, a substrate provided with support pieces 175 so as to correspond to each of the stacking stages 56 that are stacked may be adopted as in the substrate replacement system 174 shown in FIG. More specifically, in the substrate replacement system 174 shown in FIG. 35, a support shaft 176 is employed instead of the rotation shaft 91 constituting the support means 90. The support shaft 176 is configured by connecting a short cylindrical body 177 as shown in FIG. The cylindrical body 177 has a circular opening 177a on one end side, and a fitting insertion portion 177b whose outer diameter is substantially the same as the inner diameter of the opening 177a is provided on the other end side. The support shaft 176 is connected by inserting the fitting insertion portion 177b of another cylinder 177 into the opening 177a of the cylinder 177.

  A support piece 175 is attached to the cylinder 177 so as to be perpendicular to the outer peripheral surface of the cylinder 177. Further, on the outer peripheral surface of the cylindrical body 177, an engaging portion 179 constituted by a recess or a hole is provided. As shown in FIG. 35, the support shaft 176 is configured by connecting the cylindrical body 177 in the vertical direction so that the support piece 175 faces the loading stage 56 and the engaging portion 179 faces the opposite side. . The support shaft 176 is disposed so as to surround the four sides of the stacking stage 56 in the same manner as the rotary shaft 91 and the like of the above embodiment.

  As shown in FIG. 35, the stacking stage 56 is installed in a state where it is placed on a support piece 175 of a support shaft 176 disposed so as to surround the four sides. A suspension means 178 is disposed at a position adjacent to the support shaft 176. The suspending means 178 is a so-called crane that is movable in the vertical direction with respect to the loading stage 56, and has a hook portion 178a at the tip.

  In the substrate replacement system 174 shown in FIG. 35, each stacking stage 56 is supported by a support piece 175. In the case of the configuration as shown in FIG. 35, the hooking portion 178a of the hanging means 178 is attached to the engaging portion 179 provided on the outer periphery of the cylindrical body 177 to which the support piece 175 supporting the upper stacking stage 56b is fixed. 35, the hanging means 178 is moved upward as indicated by an arrow U in FIG. 35, and the gondola 55 is lowered as indicated by an arrow D while the upper loading stage 56b is supported by the hanging means 178. Thus, a space necessary for taking in and out the substrate W can be formed between the target stacking stage 56a and the upper stacking stage 56b. That is, the substrate replacement system 174 shown in FIG. 35 includes the interval expanding means 180 including the cylindrical body 177 and the suspending means 178 that are detachably connected, thereby increasing the interval between the stacking stages 56. it can.

  In the substrate replacement system 174 shown in FIG. 35 described above, the interval extending means 180 has a configuration including the cylindrical body 177 and the hanging means 178. However, the present invention is not limited to this. A configuration such as a substrate replacement system 181 shown in FIG. More specifically, the interval expanding means 190 employed in the substrate replacement system 181 shown in FIG. 36 includes a connecting means 185 and a releasing means 187 for connecting the stacking stages 56 stacked one above the other. In the configuration shown in FIG. 36, the upper and lower adjacent stacking stages 56 are connected by the connecting means 185, and the uppermost stacking stage 56 (the uppermost stacking stage 56c) is suspended from the top surface of the heat treatment chamber 12. For example, it is fixed at a predetermined position.

  The connecting means 185 includes a lock 186. Further, a release means 187 capable of releasing the lock state of the lock 186 is provided at a position adjacent to the outside of the stacking stage 56. The release means 187 is configured to be freely movable in the stacking direction of the stacking stage 56 like a cylinder 163 shown in FIG. 33, for example, and is configured to be able to release the lock 186 at an arbitrary position.

  The substrate replacement system 181 shown in FIG. 36 moves the release means 187 to a position adjacent to the connecting means 185 that connects the upper stacking stage 56b and the target stacking stage 56a, releases the lock 186, and the arrow in FIG. As shown by D, the target loading stage 56a and the lower loading stage 56 are lowered by the gondola 55, or as shown by the arrow U in FIG. By raising the existing stacking stage 56, the distance between the target stacking stage 56a and the upper stacking stage 56b can be increased.

  Further, the heat treatment apparatus 1 and the like may be configured as a substrate replacement system 182 shown in FIG. More specifically, in the substrate replacement system 182, instead of providing the insertion hole 68 or attaching the spacer 60 to the loading stage 56 or the loading stage 113, spacers 196 and 197 are attached as shown in FIG. Spacers 196 and 197 are connected by a connecting member 198. The spacers 196 and 197 and the connecting member 198 constitute an interval expanding means 195 for expanding the interval between the stacking stages 56 stacked vertically.

  The spacers 196 and 197 have a structure similar to the spacers 166 and 167 shown in FIG. That is, the spacer 196 is a member having a convex portion 196a as in the above-described spacer 167 and having a substantially T-shaped cross section. On the other hand, the spacer 197 is a member having a concave portion 197a like the spacer 166 described above. With the spacers 196 and 197 combined as shown in FIG. 38, the convex portion 196a can slide in the concave portion 197a. The spacer 196 has a fixed surface 196b fixed to either the top surface side or the bottom surface side of the stacking stage 56 and the like, and a spacer 197 paired with the spacer 196 is fixed to the bottom surface side or top surface side of the adjacent stacking stage 56, etc. Is done. 37 and 38, the fixing surface 196b of the spacer 196 is fixed to the bottom surface side of the upper stacking stage 56, and the fixing surface 197b of the spacer 197 is fixed to the top surface side of the stacking stage 56 adjacent below. Has been.

  As shown in FIG. 38, the connecting member 198 constitutes a link mechanism with pins 198a, 198b, 198c and two rods 198d, 198e. The rod 198d is connected to the spacer 196 side via a pin 198a. The rod 198e is fixed to the spacer 197 side via a pin 198c. The connecting member 198 increases the angle formed by the rods 198d and 198e by pressing the position of the pin 198b connecting the rods 198d and 198e in a direction approaching the spacers 196 and 197, so that the fixing surface 196b of the spacer 196 and the spacer 197 The interval x with the fixed surface 197b can be increased. Conversely, the connecting member 198 pulls the position of the pin 198b away from the spacers 196, 197, thereby reducing the angle formed by the rods 198d, 198e and reducing the distance x between the fixed surface 196b and the fixed surface 197b. can do.

  The board changing system 182 includes a power source for pressing and pulling the position of the pin 198b of the connecting member 198. More specifically, the substrate replacement system 182 can be configured such that the cylinder 163 is connected to the position of the pin 198b of each connecting member 198 as shown in FIG. In the example of FIG. 37, the cylinder 163 is slidably attached in the vertical direction along a pole 199 extending in the stacking direction of the stacking stage 56 disposed outside the stacking stage 56.

  When the space extending means 195 is configured as shown in FIG. 37, the shaft 162 of the cylinder 163 connected to the connecting member 198 interposed between the target stacking stage 65a and the upper stacking stage 65b is protruded, and the pin 198b When the position is pressed, the angle formed by the rods 198d and 198e is increased as shown in FIG. 37B, and the distance x between the target stacking stage 65a and the upper stacking stage 65b is increased. On the other hand, when the shaft 162 of the cylinder 163 is contracted, the position of the pin 198b of the connecting member 198 is pulled, and the angle formed by the rods 198d and 198e is reduced as shown in FIG. The interval x with 65b is reduced.

  The interval expanding means 195 described above has a configuration in which the cylinder 163 is provided for each connecting member 198. However, the present invention is not limited to this, and for example, one or a plurality of cylinders 163 are vertically mounted on each pole 199. It is also possible to provide it so as to be movable in the direction. In such a configuration, the connecting member 198 can be operated by moving the cylinder 163 to the position of the connecting member 198 corresponding to the stacking stage 65 whose interval is to be adjusted.

  The examples shown in the above embodiments are merely examples of the present invention. For example, a plurality of stacking stages 56 stacked in a separable state, such as a substrate replacement system 183 shown in FIG. The loading means configured may include a lifting means 200 (interval extending means) for pulling up each loading stage 56 such as a wire or a hook for each loading stage 56. In such a configuration, for example, the lifting means 200 connected to the upper stacking stage 56b above the stacking stage 56 (target stacking stage 56a) on which the substrate W to be put in and out is placed, or in addition to this, the upper stacking stage 56b. The distance between the target stacking stage 56a and the upper stacking stage 56b can be widened by pulling up the lifting means 200 connected to the stacking stage 56 positioned above.

It is a front view which shows the heat processing apparatus which is 1st embodiment of this invention. It is a fracture | rupture perspective view which shows the internal structure of the heat processing apparatus shown in FIG. It is a top view which shows the outline of the internal structure of the heat processing apparatus shown in FIG. It is a perspective view which shows the substrate replacement system employ | adopted in the heat processing apparatus shown in FIG. It is a perspective view which shows the loading stage which comprises the board | substrate replacement | exchange system shown in FIG. It is a perspective view which shows the state which observed the loading stage shown in FIG. 5 from the back surface side. (A) is a conceptual diagram which shows typically the positional relationship of the loading stage shown in FIG. 5, a gondola frame, and a guide rail, (b) is a conceptual diagram which shows typically the positional relationship of a guide member and a guide rail. (C) is a cross-sectional view schematically showing the positional relationship between the guide rail and the exhaust member. It is a perspective view which shows the gondola frame and support means which comprise the gondola shown in FIG. It is a perspective view which shows typically operation | movement of the raising / lowering apparatus employ | adopted in the heat processing apparatus shown in FIG. 1, and the base plate of a gondola frame. It is sectional drawing which shows the internal structure in the replacement | exchange opening vicinity of the heat processing apparatus shown in FIG. (A) is a top view of a support piece, (b) is a perspective view of a support piece, (c) is a perspective view which shows the attachment state and operation | movement of a support piece to a rotating shaft. It is a top view which shows the substrate replacement system employ | adopted in the heat processing apparatus shown in FIG. (A)-(d) is a conceptual diagram which shows the positional relationship of a support piece and a loading stage, respectively. It is a conceptual diagram which shows typically the 1st step of the board | substrate replacement | exchange operation | movement of the heat processing apparatus shown in FIG. It is a conceptual diagram which shows typically the 2nd step of the board | substrate replacement | exchange operation | movement of the heat processing apparatus shown in FIG. It is a front view which shows the heat processing apparatus of 2nd embodiment of this invention. It is sectional drawing which shows the structure of the heat processing chamber vicinity of the heat processing apparatus shown in FIG. It is a perspective view which shows the loading stage employ | adopted in the heat processing apparatus shown in FIG. It is a conceptual diagram which shows typically the positional relationship of the support means and the loading stage which the heat processing apparatus shown in FIG. 16 comprises. It is a conceptual diagram which shows typically the 1st step of the replacement | exchange operation | movement in the heat processing apparatus shown in FIG. It is a conceptual diagram which shows typically the 2nd step of the replacement | exchange operation | movement in the heat processing apparatus shown in FIG. It is a perspective view which shows a part of support means with which the heat processing apparatus shown in FIG. It is a conceptual diagram which shows typically the 3rd step of the replacement | exchange operation | movement in the heat processing apparatus shown in FIG. It is a front view which shows the heat processing apparatus of 3rd embodiment of this invention. It is AA sectional drawing of FIG. It is a conceptual diagram which shows typically the 1st step of operation | movement of the heat processing apparatus shown in FIG. It is a conceptual diagram which shows typically the 2nd step of operation | movement of the heat processing apparatus shown in FIG. It is a disassembled perspective view which shows the support means employ | adopted in the heat processing apparatus shown in FIG. (A) is a perspective view which shows the guide piece employ | adopted as the heat processing apparatus 130 shown in FIG. 24, (b) is a perspective view which shows the state which observed the shutter board employ | adopted for the heat processing apparatus 130 from the back surface side. It is. It is a perspective view which shows the support means and mounting frame which are the modifications of the support means employ | adopted in the heat processing apparatus shown in FIG. (A) is a perspective view showing a modified example of the loading stage, (b) and (c) are modified examples of the spacer, and (d) is a case where the spacers shown in (b) and (c) are adopted. It is sectional drawing which shows the stacking state of loading stages. It is explanatory drawing which shows notionally the modification of a board | substrate replacement | exchange system. It is explanatory drawing which shows notionally the modification of a board | substrate replacement | exchange system. It is explanatory drawing which shows notionally the modification of a board | substrate replacement | exchange system. (A) is explanatory drawing which shows the modification of a board | substrate exchange system notionally, (b) is a disassembled perspective view which shows the support shaft employ | adopted in the board | substrate exchange system shown to (a). It is explanatory drawing which shows the modified example of a board | substrate exchange system notionally, (a) is the 1st step of operation | movement, (b) is explanatory drawing which shows the 2nd step of operation | movement. It is explanatory drawing which shows the modified example of a board | substrate exchange system notionally, (a) is the 1st step of operation | movement, (b) is explanatory drawing which shows the 2nd step of operation | movement. It is explanatory drawing which shows notionally the structure of the principal part of the board | substrate replacement | exchange system shown in FIG. 37, (a) is the 1st step of operation | movement, (b) is explanatory drawing which shows the 2nd step of operation | movement. It is explanatory drawing which shows notionally the modification of a board | substrate replacement | exchange system. (A) is a front view which shows the loading apparatus of a prior art, (b) is a top view of the loading apparatus shown to (a).

1, 105, 130 Heat treatment apparatus 6, 106, 155 Replacement opening 12 Heat treatment chamber 14 Hot air supply means 54, 110, 171-174, 181-183 Substrate replacement system 55, 111 Gondola 56, 113 Loading stage 57 Frame member 60, 166 , 167, 196, 197 Spacer 65 Guide member 68 Insertion hole 71 Guide rail 80 Lifting device 90, 112, 135, 160 Support means 91 Rotating shaft 93, 120, 136, 175 Support piece 101 Outer edge side 102 Inner edge side 114 Space 115 Projection Piece 131 Substrate placement shelf 138 Support mechanism 140 Lifting mechanism 180, 190, 195 Spacing expansion means 200 Lifting means (spacing expansion means)

Claims (4)

A heating chamber for heating an object to be heated, temperature adjusting means for adjusting the temperature in the heating chamber, a stacking stage disposed in the heating chamber for loading the object to be heated, and a plurality of stacking stages at predetermined intervals. on the constructed stacking means stacking, be constituted by a retractable support means spacing the loading stage between the lifting means and adjacent elevating the stacking means in the heating chamber, for a given loading stage and the stacking stage And an interval extending means for expanding the interval between adjacent stacking stages, and the support means of the interval expanding means has two or more support pieces that can advance and retreat in the interval between adjacent stacking stages of the stacking means, During the interval expansion operation for expanding the interval between a predetermined loading stage and a loading stage adjacent to the loading stage by the interval extending means, the first support piece is mounted on the specific loading stage and the loading stage above the loading stage. To enter the space between the steps A first interval expansion phase to widen the distance between the specific loading stage and the upper stacking stage by lowering the stacking means as the matter, the second support piece is below the specific loading stage and the stacking stage The lowering stage is moved downward by lowering the loading means with the elevating means on condition that the distance to the loading stage is entered, and the interval between the specific loading stage and the lower loading stage is widened. A heat treatment apparatus for performing a space expansion operation for expanding a space existing above and below a specific loading stage through a second space expansion stage. Has a replacement port for taking in and out the object to be heated or loading stage in the heating chamber,
In the interval expansion operation, the first support piece is located on the side of the stacking means and in the gap formed below the stacking stage from the side of the stacking stage that is located above the replacement port. The heat treatment apparatus according to claim 1, wherein the heat treatment apparatus enters.   3. The heat treatment according to claim 1, wherein a plurality of stacking steps are stacked via a gap forming unit, and the stacking step is provided with a fitting portion into which a tip portion of the gap forming unit is fitted. apparatus.   The heat treatment apparatus according to any one of claims 1 to 3, further comprising guide means for restricting a moving direction of the loading stage to a loading direction of the loading stage.

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