JP2005114284A - Kiln - Google Patents

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JP2005114284A
JP2005114284A JP2003350755A JP2003350755A JP2005114284A JP 2005114284 A JP2005114284 A JP 2005114284A JP 2003350755 A JP2003350755 A JP 2003350755A JP 2003350755 A JP2003350755 A JP 2003350755A JP 2005114284 A JP2005114284 A JP 2005114284A
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furnace
heating
fired
firing
temperature
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Michiro Aoki
道郎 青木
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Ngk Insulators Ltd
日本碍子株式会社
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<P>PROBLEM TO BE SOLVED: To provide a kiln capable of uniformly baking the whole matter to be baked by making, in the case of baking a flat plate-like matter to be baked such as a PDP glass substrate in a substantially vertically raised state, a temperature difference difficult to occur between the upper part and lower part of the matter to be baked, and solving the temperature unevenness, particularly, in the furnace lateral direction of the lower part. <P>SOLUTION: The kiln for baking the matter 1 to be baked comprises a heating means 3 capable of performing a divisional temperature control in the furnace lateral direction, which is located under the matter 1 to be baked. The baking of the matter 1 to be baked is performed by the combination of radiation heating from the heating means 3 with convection heating by the furnace internal atmosphere heated by the heating means 3. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、プラズマディスプレイパネル用ガラス基板のような平板状の被焼成物の焼成に好適な焼成炉に関する。 The present invention relates to a firing furnace suitable for firing a plate-like object to be fired such as a glass substrate for a plasma display panel.
近年、壁掛けテレビやマルチメディア用ディスプレイとして利用できる大画面フラットパネルディスプレイ(以下、「FPD」と言う。)の実用化が着々と進行しつつある。このような大画面FPDとしては、自発光型で広い視野角を持ち、品質表示が良いという品質面のメリットと、作製プロセスが簡単で大型化が容易という製造面でのメリットを兼ね備えた、プラズマディスプレイパネル(以下、「PDP」と言う。)が最有力候補として挙げられている。 In recent years, a large-screen flat panel display (hereinafter referred to as “FPD”) that can be used as a wall-mounted television or a multimedia display has been steadily being put into practical use. As such a large screen FPD, it is a self-luminous plasma that has a wide viewing angle, a quality advantage of good quality display, and a manufacturing advantage that the production process is simple and easy to enlarge. A display panel (hereinafter referred to as “PDP”) is cited as the most promising candidate.
PDPの製造は、前面ガラス、背面ガラスと称する大型ガラス基板の表面に、印刷、乾燥、焼成の工程を複数回繰り返す厚膜法により、電極、誘導体、蛍光体等の種々の部材を逐次形成して行き、最終的に前面ガラスと背面ガラスとを封着することにより行われる。 In the manufacture of PDPs, various members such as electrodes, derivatives, and phosphors are successively formed on the surface of a large glass substrate called a front glass and a back glass by a thick film method in which printing, drying, and firing steps are repeated multiple times. And finally sealing the front glass and the rear glass.
PDP用ガラス基板(以下、単に「基板」と言う場合がある。)の焼成は、平板状のセッターに基板を水平に載置し、ローラー等の搬送機構により炉内を搬送しながら行うのが一般的であったが、最近では、生産効率の向上や炉長の短縮などを目的として、基板を略垂直に立てた状態で載置し焼成するという方法も実施されている。 Firing of a glass substrate for PDP (hereinafter sometimes simply referred to as “substrate”) is performed by placing the substrate horizontally on a flat setter and transporting the inside of the furnace by a transport mechanism such as a roller. Although it was general, recently, for the purpose of improving the production efficiency and shortening the furnace length, a method of placing and baking the substrate in a state of being substantially vertical is also carried out.
従来、このように基板を略垂直に立てた状態で焼成するための焼成炉としては、炉内の側壁近傍に設けたラジアントチューブ等の加熱手段により周囲の炉内雰囲気を加熱し、その加熱された炉内雰囲気を炉内天井部に設けられたファンにより、耐熱フィルターを介して基板に吹き付けるようにしたのものが知られている(例えば、特許文献1参照)。 Conventionally, as a baking furnace for baking in such a state that the substrate stands substantially vertically, the surrounding furnace atmosphere is heated by a heating means such as a radiant tube provided in the vicinity of the side wall of the furnace, and the heating is performed. It is known that the furnace atmosphere is blown onto a substrate through a heat-resistant filter by a fan provided on the ceiling of the furnace (see, for example, Patent Document 1).
なお、炉内は被焼成物の搬送方向に対して区画された複数の処理室から構成されており、被焼成物である基板を複数枚毎に略垂直に立てて載置した状態でローラー等の搬送機構により前記複数の処理室を順次通過させながら低温加熱、高温加熱及び徐冷といった焼成の工程を順に行う。
特開平11−311484号公報
The furnace is composed of a plurality of processing chambers partitioned with respect to the conveyance direction of the object to be fired. A baking process such as low temperature heating, high temperature heating and slow cooling is sequentially performed while sequentially passing through the plurality of processing chambers by the transfer mechanism.
Japanese Patent Laid-Open No. 11-311484
ところで、PDP用ガラス基板の焼成に際しては、低温加熱、高温加熱及び徐冷といった炉内で行われる焼成の全行程を通じて、基板内の温度分布をできるだけ小さく抑えることが、歪み等の欠陥のない製品を製造する上で重要である。 By the way, when firing a glass substrate for PDP, it is possible to suppress the temperature distribution in the substrate as small as possible through the entire firing process such as low-temperature heating, high-temperature heating and slow cooling, and products free from defects such as distortion Is important in manufacturing.
前記従来の焼成炉においては、加熱した炉内雰囲気を基板の上方から吹き付け、対流加熱によって基板の加熱が行われるが、このような加熱方式では、略垂直に立てられた基板の上部に比べて、基板の下部が加熱されにくく、基板内の温度分布が不均一になりやすい。特に基板の下部における炉巾方向の温度分布の不均一が著しい。 In the conventional firing furnace, the heated atmosphere in the furnace is sprayed from above the substrate, and the substrate is heated by convection heating. In such a heating method, compared to the upper part of the substrate set up substantially vertically. The lower part of the substrate is not easily heated, and the temperature distribution in the substrate tends to be non-uniform. In particular, the temperature distribution in the furnace width direction in the lower part of the substrate is very uneven.
また、ファンによって炉内雰囲気を循環させながら基板への吹き付けを行う場合には、炉内で発生したダストを巻き上げやすいため、ファンと基板との間にフィルターを配置し、当該フィルターにてファンより送られた雰囲気中のダストを除去してから基板に吹き付ける必要がある。例えばPDP用ガラス基板の焼成では、炉内の低温加熱が行われる領域においては安価なフィルターを使用できるが、特にその温度が600℃程度にまで達する高温加熱の工程で使用可能な焼結金属製の耐熱フィルターは、圧力損失が甚大であるとともに高価であり、またメンテナンス費用の問題もあるため、炉内の高温加熱を行う領域にフィルターを設置することは生産コストの観点からは好ましくない。 In addition, when spraying onto the substrate while circulating the furnace atmosphere with a fan, it is easy to wind up the dust generated in the furnace, so a filter is placed between the fan and the substrate, It is necessary to remove dust in the sent atmosphere and spray it onto the substrate. For example, in firing a glass substrate for PDP, an inexpensive filter can be used in a region where low-temperature heating is performed in the furnace, but it is made of a sintered metal that can be used particularly in a high-temperature heating process in which the temperature reaches about 600 ° C. The heat-resistant filter has a large pressure loss and is expensive, and there is also a problem of maintenance costs. Therefore, it is not preferable from the viewpoint of production cost to install a filter in a region where high-temperature heating is performed in the furnace.
本発明は、このような従来の事情に鑑みてなされたものであり、PDP用ガラス基板のような平板状の被焼成物を略垂直に立てた状態で焼成する場合において、被焼成物の上部と下部とで温度差が生じにくくするとともに、特に下部の炉巾方向の温度不均一を解消し、被焼成物全体をムラなく均一に焼成することが可能な焼成炉を提供することを目的とする。また、本発明は、高温加熱を行う領域にフィルターを設置する必要がなく、従来よりも安価に運用することが可能な焼成炉を提供することをもう一つの目的とする。 The present invention has been made in view of such conventional circumstances, and in the case where a flat plate-like material to be baked such as a glass substrate for PDP is baked in a substantially vertical state, the upper portion of the material to be baked. It is intended to provide a firing furnace that makes it difficult to cause a temperature difference between the lower part and the lower part, eliminates temperature non-uniformity in the furnace width direction of the lower part in particular, and can uniformly fire the entire object to be fired evenly. To do. Another object of the present invention is to provide a firing furnace that does not require a filter in a region where high-temperature heating is performed and can be operated at a lower cost than conventional ones.
本発明によれば、被焼成物を焼成するための焼成炉であって、被焼成物の下方に位置するようにして炉幅方向で分割温度制御が可能な加熱手段を設け、当該加熱手段からの輻射加熱と、当該加熱手段にて加熱された炉内雰囲気による対流加熱とを併用することによって前記被焼成物の焼成を行なう焼成炉、が提供される。 According to the present invention, there is provided a heating furnace for firing the object to be fired, the heating means capable of controlling the division temperature in the furnace width direction so as to be positioned below the material to be fired, from the heating means. There is provided a firing furnace for firing the object to be fired by using both radiant heating and convection heating in a furnace atmosphere heated by the heating means.
本発明の焼成炉によれば、例えばPDP用ガラス基板のような平板状の被焼成物を略垂直に立てた状態で焼成するに当たり、被焼成物の下方に位置する加熱手段からの輻射加熱と、当該加熱手段にて加熱された炉内雰囲気による対流加熱とを併用することによって、被焼成物の上部と下部とで温度差が生じにくくなるとともに、前記加熱手段として炉幅方向で分割温度制御が可能な加熱手段を用いることによって、下部の炉巾方向の温度不均一を解消し、被焼成物全体をムラなく均一に焼成することが可能となる。また、炉内の高温加熱を行う領域では、フィルターが不要な構造とすることにより、従来よりも安価に製作及び運用することが可能な焼成炉となる。 According to the firing furnace of the present invention, for example, when firing a flat plate-like object to be baked such as a glass substrate for PDP in a substantially vertical state, radiation heating from a heating means located below the object to be fired is performed. In addition, by using together with convection heating in the furnace atmosphere heated by the heating means, a temperature difference is unlikely to occur between the upper part and the lower part of the object to be fired, and division temperature control is performed in the furnace width direction as the heating means. By using the heating means that can perform the above, it becomes possible to eliminate the temperature non-uniformity in the furnace width direction at the lower part and to uniformly fire the whole object to be fired evenly. Moreover, in the area | region which heats in a furnace at high temperature, it becomes a baking furnace which can be manufactured and operated cheaply than before by making it a structure which does not require a filter.
図1は、本発明に係る焼成炉の実施形態の一例を示す説明図である。本例に示す焼成炉は、連続式の焼成炉であって、その特徴的な構成として、被焼成物1の下方に位置するように加熱手段3を設け、この加熱手段3からの輻射加熱と、加熱手段3にて加熱された炉内雰囲気による対流加熱とを併用することによって被焼成物1の焼成を行うような構造となっている。 FIG. 1 is an explanatory view showing an example of an embodiment of a firing furnace according to the present invention. The firing furnace shown in this example is a continuous firing furnace, and has a characteristic configuration in which a heating means 3 is provided so as to be positioned below the object to be fired 1 and radiation heating from the heating means 3 is performed. The product 1 is fired by using the convection heating in the furnace atmosphere heated by the heating means 3 in combination.
図1の例に基づいて、この炉の構造を具体的に説明する。PDP用ガラス基板のような平板状の被焼成物1は、セッターカセット2によって、複数枚毎に略垂直に立てた状態で載置され、その状態でセッターカセット2とともにローラー4等の搬送機構により炉の出口方向へと搬送される。この搬送機構の下部には、電熱ヒーター等の加熱手段3が設けられ、また、天井部にはファン5等の圧送手段が設けられている。被焼成物1の通過部は上部が開口したフード7によってトンネル状に囲われており、このフード7によって被焼成物1の通過部とその外側の外部空間とが仕切られた状態になっている。フード7上部の開口部には、ファン4の翼部が位置し、その下方にフィルター6が配置されている。 Based on the example of FIG. 1, the structure of this furnace is demonstrated concretely. A flat plate-like object 1 such as a glass substrate for PDP is placed in a state where it is set up substantially vertically by a setter cassette 2 and in that state by a transport mechanism such as a roller 4 together with the setter cassette 2. It is conveyed toward the exit of the furnace. A heating means 3 such as an electric heater is provided at the lower part of the transport mechanism, and a pressure feeding means such as a fan 5 is provided at the ceiling. The passing part of the object to be fired 1 is surrounded in a tunnel shape by a hood 7 whose upper part is open, and the passing part of the object to be fired 1 and the external space outside thereof are partitioned by this hood 7. . The wing part of the fan 4 is located in the opening part in the upper part of the hood 7, and the filter 6 is disposed below the wing part.
このような構造の焼成炉において、被焼成物1は、その下方に位置する加熱手段3により輻射加熱される。更に、この加熱手段3にて加熱された炉内雰囲気が、フード7によって被焼成物1の通過部から仕切られた外部空間を上昇してファン5に取り込まれ、このファン5によりフィルター6を介して下方の被焼成物1に吹き付けられる。被焼成物1に吹き付けられた雰囲気は、被焼成物1との間で熱交換するとともに、被焼成物1から気化したバインダー成分等を伴って下降し、再び加熱手段3により加熱されて、前記と同様に上昇し、循環利用される。 In the firing furnace having such a structure, the object to be fired 1 is radiantly heated by the heating means 3 located below. Furthermore, the atmosphere in the furnace heated by the heating means 3 rises in the external space partitioned from the passing part of the object to be fired 1 by the hood 7 and is taken into the fan 5. And sprayed onto the object 1 to be fired below. The atmosphere sprayed on the object 1 to be fired exchanges heat with the object 1 to be fired, descends with the binder component vaporized from the object 1 to be fired, and is heated again by the heating means 3. As well as rising, it is recycled.
なお、この循環の過程において、一部の雰囲気は、排気口9より炉外に排気され、その一方で、炉の内側壁近傍に設けられた給気口10より炉内にクリーンエアーが供給される。このクリーンエアーは、前記外部空間における雰囲気の上昇流を促進するように、炉の上部に向けて炉内に吹き込まれることが好ましい。 In this circulation process, a part of the atmosphere is exhausted from the exhaust port 9 to the outside of the furnace, while clean air is supplied into the furnace from the air supply port 10 provided in the vicinity of the inner wall of the furnace. The This clean air is preferably blown into the furnace toward the upper part of the furnace so as to promote the upward flow of the atmosphere in the external space.
また、加熱手段3は、炉幅方向で分割温度制御が可能な構造となっており、当該加熱手段3にて炉幅方向の温度分布を適切に制御することができる。具体的には、図1のように複数の加熱手段3を炉幅方向に並設し、各加熱手段3を個別に温度制御することにより、炉幅方向の温度分布を容易に制御することが可能となる。加熱手段3としては、周囲の雰囲気を汚染しにくく、かつ、温度制御が容易に行えるものが望ましく、電熱ヒーターの他、例えばラジアントチューブバーナー等が好適に使用できる。 Moreover, the heating means 3 has a structure capable of dividing temperature control in the furnace width direction, and the heating means 3 can appropriately control the temperature distribution in the furnace width direction. Specifically, the temperature distribution in the furnace width direction can be easily controlled by arranging a plurality of heating means 3 side by side in the furnace width direction as shown in FIG. 1 and controlling the temperature of each heating means 3 individually. It becomes possible. The heating means 3 is preferably one that hardly contaminates the surrounding atmosphere and can easily control the temperature. For example, a radiant tube burner can be suitably used in addition to the electric heater.
本発明の焼成炉は、このように被焼成物1の下方に位置する加熱手段3からの輻射加熱と、この加熱手段3にて加熱された炉内雰囲気による対流加熱とを併用して被焼成物1の焼成を行える構造としたことにより、対流加熱だけでは被焼成物1の上部に比べて温度上昇が遅れがちな被焼成物1の下部の加熱を、被焼成物1下方からの輻射加熱で補うことができ、この結果、被焼成物1の上部と下部とで温度差が生じにくくなる。また、炉幅方向で分割温度制御が可能な加熱手段3にて炉幅方向の温度分布を適切に制御することにより、被焼成物1下部の炉巾方向の温度不均一を解消し、被焼成物全体をムラなく均一に焼成することが可能となる。 Thus, the firing furnace of the present invention uses both radiant heating from the heating means 3 positioned below the object to be fired 1 and convection heating in the furnace atmosphere heated by the heating means 3 to be fired. Due to the structure capable of firing the object 1, the lower part of the object to be fired 1 whose temperature rise tends to be delayed as compared with the upper part of the object to be fired 1 only by convection heating, and the radiant heating from below the object to be fired 1 As a result, a temperature difference is hardly generated between the upper part and the lower part of the object to be fired 1. Further, by appropriately controlling the temperature distribution in the furnace width direction by the heating means 3 capable of controlling the division temperature in the furnace width direction, temperature unevenness in the furnace width direction at the lower part of the object to be fired 1 is eliminated, and the material to be fired is fired. The entire product can be uniformly fired without unevenness.
図2は、本発明に係る焼成炉の実施形態の他の一例を示す説明図である。本例に示す焼成炉は、前記図1に示す焼成炉と同様に、加熱手段3を被焼成物1の下方に位置するよう設けているが、この加熱手段3からの輻射加熱と併せて、この加熱手段3にて加熱された炉内雰囲気を自然対流で上昇させ、被焼成物1間を上方向に通過させながら被焼成物1を加熱するような構造となっており、前記図1に示す焼成炉のようなファン及びフィルターは必要としない。 FIG. 2 is an explanatory view showing another example of the embodiment of the firing furnace according to the present invention. The firing furnace shown in this example is provided so that the heating means 3 is positioned below the object to be fired 1 in the same manner as the firing furnace shown in FIG. 1. In addition to the radiant heating from the heating means 3, The furnace atmosphere heated by the heating means 3 is raised by natural convection, and the object to be fired 1 is heated while passing between the objects to be fired 1 upward, as shown in FIG. Fans and filters such as the firing furnace shown are not required.
この焼成炉の具体的な構造としては、図2に示すように、ローラー4等の搬送機構の下部に、電熱ヒーター等の加熱手段3が設けられ、また、被焼成物1の通過部は上部が開口したフード8によってトンネル状に囲われており、このフード8によって被焼成物1の通過部とその炉幅方向外側の外部空間とが仕切られた状態になっている。 As a specific structure of this baking furnace, as shown in FIG. 2, heating means 3 such as an electric heater is provided at the lower part of a transport mechanism such as a roller 4, and the passing part of the baking object 1 is at the upper part. Is surrounded by a hood 8 that is open, and the hood 8 partitions the passing portion of the object to be fired 1 and the external space outside the furnace width direction.
このような構造の処理室において、セッターカセット2により略垂直に立てた状態で載置された被焼成物1は、その下方に位置する加熱手段3により輻射加熱される。更に、この加熱手段3にて加熱された炉内雰囲気が、自然対流によりローラー4等の搬送機構の間を通り抜けて上昇し、被焼成物1間を上方向に通過する。この被焼成物1間を通過する雰囲気は、被焼成物1との間で熱交換するとともに、被焼成物1から気化したバインダー成分等を伴って上昇し、天井付近で側壁近傍に移動した後、フード8によって被焼成物1の通過部から仕切られた外部空間を下降して、再び加熱手段3により加熱され、前記と同様に上昇し、循環利用される。 In the processing chamber having such a structure, the object to be fired 1 placed in a state of being set substantially vertically by the setter cassette 2 is radiantly heated by the heating means 3 positioned therebelow. Further, the furnace atmosphere heated by the heating means 3 rises through the conveying mechanism such as the roller 4 by natural convection and passes upward between the objects to be fired 1. The atmosphere that passes between the objects to be fired 1 is exchanged with the objects to be fired 1, rises with the binder component vaporized from the objects to be fired 1, and moves to the vicinity of the side wall near the ceiling. The outer space partitioned from the passing part of the object to be fired 1 by the hood 8 is lowered, heated again by the heating means 3, raised in the same manner as described above, and recycled.
なお、この循環の過程において、一部の雰囲気は、排気口11より炉外に排気され、その一方で、炉の内側壁上部近傍に設けられた給気口12より炉内にクリーンエアーが供給される。このクリーンエアーは、前記外部空間における雰囲気の下降流を促進するように、炉の下部に向けて炉内に吹き込まれることが好ましい。 In this circulation process, a part of the atmosphere is exhausted from the exhaust port 11 to the outside of the furnace. On the other hand, clean air is supplied into the furnace from the air supply port 12 provided near the upper part of the inner wall of the furnace. Is done. This clean air is preferably blown into the furnace toward the lower part of the furnace so as to promote the downward flow of the atmosphere in the external space.
このように加熱手段3にて加熱された炉内雰囲気を自然対流で上昇させ、被焼成物1を加熱するようにすれば、ファンは必要なくなり、それに伴ってフィルターを設ける必要もなくなるので、フィルターの設置やメンテナンスに要する費用が不要となり、焼成炉を従来よりも安価に作製し、運用することが可能となる。なお、加熱手段3にて加熱された炉内雰囲気の自然対流による上昇は、ドラフト圧によるアッパーフローなので、被焼成物1の高さが変わったとしても、被焼成物1間の流速の変化は少なく、前記図1に示す焼成炉のようにダウンフローで吹き付ける場合に比べて温度分布が安定する。また、ファンで吹き付ける場合に比べて対流する雰囲気の流速が低いので、炉内で発生したダスト(例えば搬送機構として用いたローラーの摩耗粉)を巻き上げる懸念も無い。 In this way, if the furnace atmosphere heated by the heating means 3 is raised by natural convection and the object to be fired 1 is heated, a fan is not necessary and a filter is not required. The cost required for the installation and maintenance of the furnace becomes unnecessary, and it becomes possible to manufacture and operate the firing furnace at a lower cost than before. In addition, since the rise by the natural convection of the furnace atmosphere heated by the heating means 3 is an upper flow due to the draft pressure, even if the height of the object 1 is changed, the change in the flow rate between the objects 1 is not changed. There are few, and temperature distribution is stabilized compared with the case where it sprays by a down flow like the baking furnace shown in the said FIG. In addition, since the flow velocity of the convection atmosphere is lower than that in the case of blowing with a fan, there is no fear of winding up dust generated in the furnace (for example, roller wear powder used as a transport mechanism).
本発明の焼成炉においては、PDP用ガラス基板のような平板状の被焼成物を、略垂直に立てて載置した状態で焼成を行うことが好ましい。図3は、そのような平板状の被焼成物1を略垂直に立てて載置するためのセッターカセットの構造を示す説明図で、(a)が搬送方向と直交する方向に切断した断面図で、(b)が搬送方向に沿って切断した断面図である。このセッターカセット2は、底板2a、側板2b及び支持板2cとによって構成され、支持板2cには被焼成物1を挿入し支持するためのスリット2dが所定の間隔で平行に設けられている。底板2bは、通気可能な多数の孔(図示せず)を有し、雰囲気の上下方向の流れをできるだけ阻害しないような構造となっていることが好ましい。 In the firing furnace of the present invention, firing is preferably performed in a state in which a flat plate-like object to be fired such as a glass substrate for PDP is placed substantially vertically. FIG. 3 is an explanatory view showing the structure of a setter cassette for placing such a flat plate-like object 1 upright substantially vertically, and (a) is a cross-sectional view cut in a direction perpendicular to the conveying direction. FIG. 5B is a cross-sectional view taken along the conveyance direction. The setter cassette 2 includes a bottom plate 2a, a side plate 2b, and a support plate 2c, and slits 2d for inserting and supporting the object to be fired 1 are provided in parallel at a predetermined interval on the support plate 2c. The bottom plate 2b preferably has a structure that has a large number of holes (not shown) through which air can flow and that does not obstruct the vertical flow of the atmosphere as much as possible.
セッターカセット2の材質としては、被焼成物1との接触部のみセラミック材料で構成し、他の部分は耐熱合金で構成することが好ましい。また、1つのセッターカセット2に搭載する被焼成物1の枚数は10枚程度とし、その保持間隔は80mm程度とすることが好ましい。 As the material of the setter cassette 2, it is preferable that only the contact portion with the object to be fired 1 is made of a ceramic material, and the other portion is made of a heat resistant alloy. Moreover, it is preferable that the number of the objects to be fired 1 mounted on one setter cassette 2 is about 10, and the holding interval is about 80 mm.
本発明の焼成炉は、被焼成物の搬送方向に対して区画された各々独立して温度制御可能な複数の処理室と、隣接する処理室へ被焼成物を搬送するための搬送機構とを備え、前記搬送機構により前記複数の処理室を順次通過させながら前記被焼成物の焼成を行なうものであることが好ましい。 The firing furnace according to the present invention includes a plurality of processing chambers that are individually controlled in temperature and are divided with respect to the transport direction of the object to be fired, and a transport mechanism for transporting the object to be fired to an adjacent process chamber. It is preferable that the object to be fired is fired while being sequentially passed through the plurality of processing chambers by the transport mechanism.
この場合において、被焼成物の搬送方向に対して区画された複数の処理室の全てを同様の構造としてもよいが、内部が350℃以下の温度に制御される処理室と、内部が350℃を超える温度に制御される処理室とで、その構造を変えることが好ましい。 In this case, all of the plurality of processing chambers partitioned in the conveyance direction of the object to be baked may have the same structure, but the processing chamber in which the inside is controlled to a temperature of 350 ° C. or less and the inside is 350 ° C. It is preferable to change the structure of the processing chamber controlled to a temperature exceeding.
図4は、PDP用ガラス基板の焼成に用いる連続式焼成炉の炉長方向における断面概略図を、焼成温度曲線(ヒートパターン)に対応させて示した説明図である。セッターカセット2に搭載されて炉の入口から炉内に搬送された被焼成物1は、ローラー4等の搬送機構に搬送され、出口方向に向かって各処理室20を順次通過しながら、まず350℃程度まで昇温されて、所定時間その温度に保持され、この間にPDP用ガラス基板である被焼成物1の表面に印刷等により形成された電極、誘導体等の部材からバインダー成分が多量に気化して被焼成物1から除去される(低温加熱)。次いで、600℃程度まで昇温されて、所定時間その温度で保持され、前記の電極、誘導体等の部材が均一に焼成される(高温加熱)。その後、被焼成物1は、炉外に取り出し可能な温度になるまで所定の時間をかけて徐々に冷却される(徐冷)。 FIG. 4 is an explanatory diagram showing a schematic cross-sectional view in the furnace length direction of the continuous firing furnace used for firing the glass substrate for PDP in correspondence with the firing temperature curve (heat pattern). The to-be-fired product 1 mounted on the setter cassette 2 and transported into the furnace from the furnace inlet is transported to a transport mechanism such as a roller 4, and first passes through each processing chamber 20 in the direction of the outlet while first 350. The temperature is raised to about 0.degree. C. and held at that temperature for a predetermined time. During this period, a large amount of binder component is removed from the electrode, derivative and other members formed by printing or the like on the surface of the object to be fired 1 which is a glass substrate for PDP. To be removed from the object 1 (low temperature heating). Next, the temperature is raised to about 600 ° C. and held at that temperature for a predetermined time, and the members such as the electrode and the derivative are uniformly fired (high temperature heating). Thereafter, the object to be fired 1 is gradually cooled over a predetermined time until it reaches a temperature at which it can be taken out of the furnace (slow cooling).
本発明の焼成炉では、被焼成物の搬送方向に対して区画された複数の処理室20のうち、内部が350℃以下の温度に制御される処理室、すなわち、主として図4における低温加熱と徐冷の後期工程が行われる処理室においては、図5(a)に示すような構造とすることが好ましい。 In the firing furnace of the present invention, among the plurality of processing chambers 20 partitioned in the conveying direction of the object to be fired, the processing chamber whose inside is controlled to a temperature of 350 ° C. or lower, that is, mainly the low-temperature heating in FIG. In the processing chamber in which the later stage of slow cooling is performed, it is preferable to have a structure as shown in FIG.
この構造は前述の図1に示す実施形態の構造と同様であり、被焼成物1の下方に位置するように設けられた加熱手段3にて被焼成物1を輻射加熱するとともに、加熱手段3にて加熱された炉内雰囲気を、被焼成物1が移動する被焼成物通過部の外側の空間を通じて炉内上部に上昇させ、炉内天井部に設けられたファン5等の圧送手段によりフィルター6を介して被焼成物1に吹き付けることによって被焼成物1を加熱する。各部の詳細については図1の実施形態と同様である。 This structure is the same as the structure of the embodiment shown in FIG. 1 described above. The object to be fired 1 is radiantly heated by the heating means 3 provided so as to be positioned below the object to be fired 1 and the heating means 3. The atmosphere inside the furnace heated in step 1 is raised to the upper part of the furnace through the space outside the part to be fired to which the object to be fired 1 moves, and is filtered by a pressure feeding means such as a fan 5 provided on the ceiling in the furnace. The object to be fired 1 is heated by being sprayed onto the object to be fired 1 through 6. Details of each part are the same as in the embodiment of FIG.
内部が350℃以下の温度に制御される処理室、特に図4の低温加熱が行われる処理室においては、被焼成物1の表面に形成された電極、誘導体等の部材から気化したバインダー成分等のガスが多量に発生するため、加熱手段3にて加熱された炉内雰囲気をファン5等の圧送手段によって被焼成物1に吹き付けるとともに炉内循環させる必要があり、そのファン5の設置に伴って、炉内で発生したダストを除去するためのフィルター6も必要となる。ただし、この処理室はその内部が350℃以下と比較的低く、フィルターにもあまり高い耐熱性は要求されないため、高価でメンテナンスも難しい焼結金属製のフィルターではなく、繊維質フィルター等の比較的安価なフィルターを使用することができる。 In a processing chamber in which the inside is controlled to a temperature of 350 ° C. or less, particularly in a processing chamber in which low-temperature heating is performed in FIG. 4, binder components evaporated from members such as electrodes and derivatives formed on the surface of the object to be fired 1 Since a large amount of gas is generated, it is necessary to blow the furnace atmosphere heated by the heating means 3 to the object to be fired 1 by the pressure feeding means such as the fan 5 and to circulate in the furnace. Thus, a filter 6 for removing dust generated in the furnace is also required. However, the inside of this processing chamber is relatively low at 350 ° C. or less, and the filter does not require very high heat resistance, so it is not a sintered metal filter that is expensive and difficult to maintain, but a relatively fibrous filter or the like. An inexpensive filter can be used.
一方、内部が350℃を超える温度に制御される処理室、すなわち、主として図4における高温加熱と徐冷の前期工程が行われる処理室においては、図5(b)に示すような構造とすることが好ましい。 On the other hand, in a processing chamber in which the inside is controlled to a temperature exceeding 350 ° C., that is, a processing chamber in which the high-temperature heating and slow cooling steps in FIG. 4 are mainly performed, the structure shown in FIG. It is preferable.
この構造は前述の図2に示す実施形態の構造と同様であり、被焼成物1の下方に位置するよう設けられた加熱手段3にて被焼成物1を輻射加熱するとともに、この加熱手段3にて加熱された炉内雰囲気を自然対流で上昇させ、被焼成物1間を上方向に通過させながら被焼成物1を加熱するような構造となっている。各部の詳細については図2の実施形態と同様である。 This structure is the same as the structure of the embodiment shown in FIG. 2 described above, and the object to be fired 1 is radiantly heated by the heating means 3 provided so as to be positioned below the object 1 to be fired. The structure is such that the atmosphere in the furnace heated in step 1 is raised by natural convection and the object to be fired 1 is heated while passing between the objects to be fired 1 upward. Details of each part are the same as in the embodiment of FIG.
このように加熱手段3にて加熱された炉内雰囲気を自然対流で上昇させ、被焼成物1を加熱するようにすれば、ファンは必要なくなり、それに伴ってフィルターを設ける必要もなくなるので、高温環境に耐え得るような高価な焼結金属製のフィルターの設置やそのメンテナンスに要する費用が不要となる。 In this way, if the furnace atmosphere heated by the heating means 3 is raised by natural convection and the object to be fired 1 is heated, a fan is not necessary and a filter is not required to be provided. Expenses required for installation and maintenance of expensive sintered metal filters that can withstand the environment are eliminated.
以上のように、内部が350℃以下の温度に制御される処理室と、内部が350℃を超える温度に制御される処理室とで異なる構造とし、内部が比較的低い前者においては、あまり高い耐熱性が要求されない安価なフィルターを使用できるようにし、一方で、特に内部が高温となる後者においては、フィルター自体を不要とすることによって、従来よりも安価に製作及び運用することが可能な焼成炉となる。 As described above, the processing chamber in which the interior is controlled to a temperature of 350 ° C. or less and the processing chamber in which the interior is controlled to a temperature exceeding 350 ° C. have different structures, and the former is relatively high in the former, which is relatively low. By making it possible to use an inexpensive filter that does not require heat resistance, especially in the latter case where the inside is at a high temperature, by eliminating the need for the filter itself, firing that can be manufactured and operated at a lower cost than before is possible. Become a furnace.
本発明は、PDP用ガラス基板等の平板状の被焼成物を焼成するための連続式焼成炉として好適に利用することができる。 INDUSTRIAL APPLICABILITY The present invention can be suitably used as a continuous firing furnace for firing a flat plate-like product such as a glass substrate for PDP.
本発明に係る焼成炉の実施形態の一例を示す説明図である。It is explanatory drawing which shows an example of embodiment of the baking furnace which concerns on this invention. 本発明に係る焼成炉の実施形態の他の一例を示す説明図である。It is explanatory drawing which shows another example of embodiment of the baking furnace which concerns on this invention. セッターカセットの構造を示す説明図で、(a)が搬送方向と直交する方向に切断した断面図で、(b)が搬送方向に沿って切断した断面図である。It is explanatory drawing which shows the structure of a setter cassette, (a) is sectional drawing cut | disconnected in the direction orthogonal to a conveyance direction, (b) is sectional drawing cut | disconnected along the conveyance direction. PDP用ガラス基板の焼成に用いる連続式焼成炉の炉長方向における断面概略図を、焼成温度曲線(ヒートパターン)に対応させて示した説明図である。It is explanatory drawing which showed the cross-sectional schematic in the furnace length direction of the continuous-type baking furnace used for baking of the glass substrate for PDP corresponding to the baking temperature curve (heat pattern). 本発明に係る焼成炉の実施形態の他の一例を示す説明図で、(a)が内部が350℃以下の温度に制御される処理室で、(b)が内部が350℃を超える温度に制御される処理室である。It is explanatory drawing which shows another example of embodiment of the baking furnace which concerns on this invention, (a) is a process chamber by which the inside is controlled to the temperature of 350 degrees C or less, (b) is the temperature in which an inside exceeds 350 degreeC. The process chamber to be controlled.
符号の説明Explanation of symbols
1…被焼成物、2…セッターカセット、3…加熱手段、4…ローラー、5…ファン、6…フィルター、7…フード、8…フード、9…排気口、10…給気口、11…排気口、12…給気口、20…処理室。 DESCRIPTION OF SYMBOLS 1 ... To-be-baked object, 2 ... Setter cassette, 3 ... Heating means, 4 ... Roller, 5 ... Fan, 6 ... Filter, 7 ... Hood, 8 ... Hood, 9 ... Exhaust port, 10 ... Air supply port, 11 ... Exhaust Mouth, 12 ... Air supply port, 20 ... Processing chamber.

Claims (6)

  1. 被焼成物を焼成するための焼成炉であって、前記被焼成物の下方に位置するようにして炉幅方向で分割温度制御が可能な加熱手段を設け、当該加熱手段からの輻射加熱と、当該加熱手段にて加熱された炉内雰囲気による対流加熱とを併用することによって前記被焼成物の焼成を行なう焼成炉。 A firing furnace for firing the object to be fired, provided with heating means capable of controlling the division temperature in the furnace width direction so as to be positioned below the material to be fired, and radiant heating from the heating means, A firing furnace for firing the object to be fired by using in combination with convection heating in an atmosphere in the furnace heated by the heating means.
  2. 前記加熱手段にて加熱された炉内雰囲気を前記被焼成物が移動する被焼成物通過部の外側の空間を通じて炉内上部に上昇させ、その後、炉内天井部に設けた圧送手段によりフィルターを介して前記被焼成物に吹き付けることによって前記被焼成物を加熱する請求項1に記載の焼成炉。 The furnace atmosphere heated by the heating means is raised to the upper part of the furnace through the space outside the to-be-fired article moving part where the to-be-fired article moves, and then the filter is fed by the pressure feeding means provided on the ceiling inside the furnace. The firing furnace according to claim 1, wherein the firing object is heated by being sprayed on the firing object.
  3. 前記加熱手段にて前記被焼成物を輻射加熱するとともに、前記加熱手段にて加熱された炉内雰囲気を自然対流で上昇させ、前記被焼成物間を上方向に通過させながら前記被焼成物を加熱する請求項1に記載焼成炉。 While heating the to-be-fired object by the heating means, the furnace atmosphere heated by the heating means is raised by natural convection, and the to-be-fired object is passed while passing between the to-be-fired objects upward. The firing furnace according to claim 1 to be heated.
  4. 前記被焼成物の搬送方向に対して区画された各々独立して温度制御可能な複数の処理室と、隣接する処理室へ前記被焼成物を搬送するための搬送機構とを備え、前記搬送機構により前記複数の処理室を順次通過させながら前記被焼成物の焼成を行なう請求項1ないし3の何れか1項に記載の焼成炉。 A plurality of processing chambers, each of which is independently controlled in temperature, divided with respect to the conveying direction of the object to be baked, and a conveying mechanism for conveying the object to be baked to an adjacent processing chamber; The firing furnace according to any one of claims 1 to 3, wherein the firing object is fired while sequentially passing through the plurality of processing chambers.
  5. 前記被焼成物が平板状であり、略垂直に載置された状態で搬送される請求項4に記載の焼成炉。 The firing furnace according to claim 4, wherein the object to be fired is flat and is conveyed in a state of being placed substantially vertically.
  6. 前記被焼成物がプラズマディスプレイ用ガラス基板である請求項5に記載の焼成炉。 The firing furnace according to claim 5, wherein the object to be fired is a glass substrate for plasma display.
JP2003350755A 2003-10-09 2003-10-09 Kiln Pending JP2005114284A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006300435A (en) * 2005-04-22 2006-11-02 Chugai Ro Co Ltd Circulating type kiln
JP2010216056A (en) * 2009-03-19 2010-09-30 Ngk Insulators Ltd Uniform heating method of air permeable board
KR101311606B1 (en) 2006-02-24 2013-09-26 쥬가이로 고교 가부시키가이샤 Heating method for plate materials and retaining device for heating of plate materials
CN103343964A (en) * 2013-07-10 2013-10-09 宋贵中 Combustion method for greatly improving thermal efficiency of industrial furnace by alcohol-based clean fuel
CN104697333A (en) * 2015-02-03 2015-06-10 杭州金舟科技股份有限公司 Bi-functional uniform heating device for implementing thermal convection and secondary radiation
JP2017014057A (en) * 2015-06-30 2017-01-19 AvanStrate株式会社 Production method for glass sheet for display, and production apparatus for glass sheet for display

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006300435A (en) * 2005-04-22 2006-11-02 Chugai Ro Co Ltd Circulating type kiln
KR101311606B1 (en) 2006-02-24 2013-09-26 쥬가이로 고교 가부시키가이샤 Heating method for plate materials and retaining device for heating of plate materials
JP2010216056A (en) * 2009-03-19 2010-09-30 Ngk Insulators Ltd Uniform heating method of air permeable board
CN103343964A (en) * 2013-07-10 2013-10-09 宋贵中 Combustion method for greatly improving thermal efficiency of industrial furnace by alcohol-based clean fuel
CN103343964B (en) * 2013-07-10 2014-01-08 宋贵中 Combustion method for greatly improving thermal efficiency of industrial furnace by alcohol-based clean fuel
CN104697333A (en) * 2015-02-03 2015-06-10 杭州金舟科技股份有限公司 Bi-functional uniform heating device for implementing thermal convection and secondary radiation
JP2017014057A (en) * 2015-06-30 2017-01-19 AvanStrate株式会社 Production method for glass sheet for display, and production apparatus for glass sheet for display

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