JP2001330860A - 半導体装置及びその作製方法 - Google Patents
半導体装置及びその作製方法Info
- Publication number
- JP2001330860A JP2001330860A JP2001053109A JP2001053109A JP2001330860A JP 2001330860 A JP2001330860 A JP 2001330860A JP 2001053109 A JP2001053109 A JP 2001053109A JP 2001053109 A JP2001053109 A JP 2001053109A JP 2001330860 A JP2001330860 A JP 2001330860A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- pixel region
- film transistor
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
- Wire Bonding (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001053109A JP2001330860A (ja) | 2000-02-28 | 2001-02-27 | 半導体装置及びその作製方法 |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000050644 | 2000-02-28 | ||
JP2000-69556 | 2000-03-13 | ||
JP2000-50644 | 2000-03-13 | ||
JP2000069556 | 2000-03-13 | ||
JP2001053109A JP2001330860A (ja) | 2000-02-28 | 2001-02-27 | 半導体装置及びその作製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001330860A true JP2001330860A (ja) | 2001-11-30 |
JP2001330860A5 JP2001330860A5 (ko) | 2008-03-27 |
Family
ID=27342489
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001053109A Withdrawn JP2001330860A (ja) | 2000-02-28 | 2001-02-27 | 半導体装置及びその作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001330860A (ko) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004361937A (ja) * | 2003-05-12 | 2004-12-24 | Semiconductor Energy Lab Co Ltd | 液晶表示装置及びその作製方法 |
US6882012B2 (en) * | 2000-02-28 | 2005-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and a method of manufacturing the same |
JP2006189806A (ja) * | 2004-12-06 | 2006-07-20 | Semiconductor Energy Lab Co Ltd | 表示装置及びその駆動方法 |
CN100454119C (zh) * | 2003-05-12 | 2009-01-21 | 株式会社半导体能源研究所 | 液晶显示器件、包括其的电子器具、以及其制作方法 |
JP2009188424A (ja) * | 2002-01-28 | 2009-08-20 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
JP2010056566A (ja) * | 2005-12-27 | 2010-03-11 | Semiconductor Energy Lab Co Ltd | 半導体装置及び表示機能付きicカード |
US7960916B2 (en) | 2007-05-16 | 2011-06-14 | Advanced Lcd Technologies Development Center Co., Ltd. | Display device and electronic device using thin-film transistors formed on semiconductor thin films which are crystallized on insulating substrates |
JP2012506568A (ja) * | 2008-10-23 | 2012-03-15 | ケンブリッジ ディスプレイ テクノロジー リミテッド | ディスプレイ駆動部 |
US8730419B2 (en) | 2007-08-29 | 2014-05-20 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic appliance including the display device |
JP2020519966A (ja) * | 2017-09-26 | 2020-07-02 | エルジー・ケム・リミテッド | 透明発光素子ディスプレイ用電極基板およびその製造方法 |
JP2022068149A (ja) * | 2008-09-19 | 2022-05-09 | 株式会社半導体エネルギー研究所 | 表示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04155314A (ja) * | 1990-10-18 | 1992-05-28 | Mitsubishi Electric Corp | マトリックス表示装置 |
JPH06138481A (ja) * | 1992-10-23 | 1994-05-20 | Sharp Corp | アクティブマトリクス基板およびその製造方法 |
JPH1056184A (ja) * | 1996-06-04 | 1998-02-24 | Semiconductor Energy Lab Co Ltd | 半導体集積回路およびその作製方法 |
JPH1154761A (ja) * | 1997-08-01 | 1999-02-26 | Semiconductor Energy Lab Co Ltd | 半導体集積回路およびその作製方法 |
JPH11160734A (ja) * | 1997-11-28 | 1999-06-18 | Semiconductor Energy Lab Co Ltd | 液晶電気光学装置 |
-
2001
- 2001-02-27 JP JP2001053109A patent/JP2001330860A/ja not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04155314A (ja) * | 1990-10-18 | 1992-05-28 | Mitsubishi Electric Corp | マトリックス表示装置 |
JPH06138481A (ja) * | 1992-10-23 | 1994-05-20 | Sharp Corp | アクティブマトリクス基板およびその製造方法 |
JPH1056184A (ja) * | 1996-06-04 | 1998-02-24 | Semiconductor Energy Lab Co Ltd | 半導体集積回路およびその作製方法 |
JPH1154761A (ja) * | 1997-08-01 | 1999-02-26 | Semiconductor Energy Lab Co Ltd | 半導体集積回路およびその作製方法 |
JPH11160734A (ja) * | 1997-11-28 | 1999-06-18 | Semiconductor Energy Lab Co Ltd | 液晶電気光学装置 |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6882012B2 (en) * | 2000-02-28 | 2005-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and a method of manufacturing the same |
US7579214B2 (en) | 2000-02-28 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and a method of manufacturing the same |
JP2009188424A (ja) * | 2002-01-28 | 2009-08-20 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
CN100454119C (zh) * | 2003-05-12 | 2009-01-21 | 株式会社半导体能源研究所 | 液晶显示器件、包括其的电子器具、以及其制作方法 |
US7843521B2 (en) | 2003-05-12 | 2010-11-30 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, electronic device, and manufacturing method of the liquid crystal display device |
JP2004361937A (ja) * | 2003-05-12 | 2004-12-24 | Semiconductor Energy Lab Co Ltd | 液晶表示装置及びその作製方法 |
US8305509B2 (en) | 2003-05-12 | 2012-11-06 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, electronic device having the same, and manufacturing method of the same |
JP2006189806A (ja) * | 2004-12-06 | 2006-07-20 | Semiconductor Energy Lab Co Ltd | 表示装置及びその駆動方法 |
US8476632B2 (en) | 2005-12-27 | 2013-07-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
JP2010056566A (ja) * | 2005-12-27 | 2010-03-11 | Semiconductor Energy Lab Co Ltd | 半導体装置及び表示機能付きicカード |
US9177242B2 (en) | 2005-12-27 | 2015-11-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
US7960916B2 (en) | 2007-05-16 | 2011-06-14 | Advanced Lcd Technologies Development Center Co., Ltd. | Display device and electronic device using thin-film transistors formed on semiconductor thin films which are crystallized on insulating substrates |
US8730419B2 (en) | 2007-08-29 | 2014-05-20 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic appliance including the display device |
JP2022068149A (ja) * | 2008-09-19 | 2022-05-09 | 株式会社半導体エネルギー研究所 | 表示装置 |
JP7362798B2 (ja) | 2008-09-19 | 2023-10-17 | 株式会社半導体エネルギー研究所 | 表示装置 |
JP2012506568A (ja) * | 2008-10-23 | 2012-03-15 | ケンブリッジ ディスプレイ テクノロジー リミテッド | ディスプレイ駆動部 |
JP2020519966A (ja) * | 2017-09-26 | 2020-07-02 | エルジー・ケム・リミテッド | 透明発光素子ディスプレイ用電極基板およびその製造方法 |
US11171259B2 (en) | 2017-09-26 | 2021-11-09 | Lg Chem, Ltd. | Electrode substrate for transparent light-emitting diode display and method for manufacturing same |
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