JP2001323376A5 - - Google Patents

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Publication number
JP2001323376A5
JP2001323376A5 JP2001053364A JP2001053364A JP2001323376A5 JP 2001323376 A5 JP2001323376 A5 JP 2001323376A5 JP 2001053364 A JP2001053364 A JP 2001053364A JP 2001053364 A JP2001053364 A JP 2001053364A JP 2001323376 A5 JP2001323376 A5 JP 2001323376A5
Authority
JP
Japan
Prior art keywords
deposited film
source gas
parallel plate
forming apparatus
discharge vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001053364A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001323376A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001053364A priority Critical patent/JP2001323376A/ja
Priority claimed from JP2001053364A external-priority patent/JP2001323376A/ja
Priority to US09/797,566 priority patent/US6877458B2/en
Publication of JP2001323376A publication Critical patent/JP2001323376A/ja
Publication of JP2001323376A5 publication Critical patent/JP2001323376A5/ja
Pending legal-status Critical Current

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JP2001053364A 2000-03-06 2001-02-28 堆積膜の形成装置 Pending JP2001323376A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001053364A JP2001323376A (ja) 2000-03-06 2001-02-28 堆積膜の形成装置
US09/797,566 US6877458B2 (en) 2000-03-06 2001-03-05 Apparatus for forming deposited film

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-60717 2000-03-06
JP2000060717 2000-03-06
JP2001053364A JP2001323376A (ja) 2000-03-06 2001-02-28 堆積膜の形成装置

Publications (2)

Publication Number Publication Date
JP2001323376A JP2001323376A (ja) 2001-11-22
JP2001323376A5 true JP2001323376A5 (https=) 2008-04-03

Family

ID=26586855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001053364A Pending JP2001323376A (ja) 2000-03-06 2001-02-28 堆積膜の形成装置

Country Status (2)

Country Link
US (1) US6877458B2 (https=)
JP (1) JP2001323376A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4296743B2 (ja) * 2002-02-08 2009-07-15 コニカミノルタホールディングス株式会社 製膜装置
US20070154650A1 (en) * 2005-12-30 2007-07-05 Atomic Energy Council - Institute Of Nuclear Energy Research Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure
US7501305B2 (en) * 2006-10-23 2009-03-10 Canon Kabushiki Kaisha Method for forming deposited film and photovoltaic element
JP4999737B2 (ja) * 2008-03-14 2012-08-15 富士フイルム株式会社 成膜装置
JP5463167B2 (ja) * 2010-03-04 2014-04-09 富士フイルム株式会社 成膜方法および成膜装置
US20200098595A1 (en) * 2018-09-20 2020-03-26 Nanya Technology Corporation Semiconductor manufacturing apparatus and method for operating the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
US4479369A (en) * 1983-04-04 1984-10-30 Sando Iron Works Co., Ltd. Apparatus for treating a textile product with the use of low-temperature plasma
JPS60155676A (ja) * 1984-01-24 1985-08-15 Canon Inc プラズマｃｖｄ装置
US4841908A (en) * 1986-06-23 1989-06-27 Minnesota Mining And Manufacturing Company Multi-chamber deposition system
US4969416A (en) * 1986-07-03 1990-11-13 Emcore, Inc. Gas treatment apparatus and method
US4772356A (en) * 1986-07-03 1988-09-20 Emcore, Inc. Gas treatment apparatus and method
JPH0610356B2 (ja) * 1988-02-18 1994-02-09 松下電器産業株式会社 プラズマ処理装置およびプラズマ温度測定方法
JP2975151B2 (ja) * 1991-03-28 1999-11-10 キヤノン株式会社 半導体素子の連続的製造装置
JP3118037B2 (ja) * 1991-10-28 2000-12-18 キヤノン株式会社 堆積膜形成方法および堆積膜形成装置
JP3367981B2 (ja) * 1992-12-28 2003-01-20 キヤノン株式会社 堆積膜形成方法および堆積膜形成装置
TW283250B (en) * 1995-07-10 1996-08-11 Watkins Johnson Co Plasma enhanced chemical processing reactor and method
US5948704A (en) * 1996-06-05 1999-09-07 Lam Research Corporation High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
JPH11251612A (ja) * 1998-03-03 1999-09-17 Canon Inc 光起電力素子の製造方法
JP2001035839A (ja) * 1999-05-18 2001-02-09 Hitachi Kokusai Electric Inc プラズマ生成装置および半導体製造方法

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