JP2001271868A - 除振装置 - Google Patents

除振装置

Info

Publication number
JP2001271868A
JP2001271868A JP2000084188A JP2000084188A JP2001271868A JP 2001271868 A JP2001271868 A JP 2001271868A JP 2000084188 A JP2000084188 A JP 2000084188A JP 2000084188 A JP2000084188 A JP 2000084188A JP 2001271868 A JP2001271868 A JP 2001271868A
Authority
JP
Japan
Prior art keywords
vibration
displacement
vibration isolation
compensation
adjusting mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000084188A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001271868A5 (enExample
Inventor
Takehiko Mayama
武彦 間山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000084188A priority Critical patent/JP2001271868A/ja
Priority to US09/797,884 priority patent/US6518721B2/en
Publication of JP2001271868A publication Critical patent/JP2001271868A/ja
Publication of JP2001271868A5 publication Critical patent/JP2001271868A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Vibration Prevention Devices (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
JP2000084188A 2000-03-24 2000-03-24 除振装置 Withdrawn JP2001271868A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000084188A JP2001271868A (ja) 2000-03-24 2000-03-24 除振装置
US09/797,884 US6518721B2 (en) 2000-03-24 2001-03-05 Oscillation isolator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000084188A JP2001271868A (ja) 2000-03-24 2000-03-24 除振装置

Publications (2)

Publication Number Publication Date
JP2001271868A true JP2001271868A (ja) 2001-10-05
JP2001271868A5 JP2001271868A5 (enExample) 2007-05-17

Family

ID=18600697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000084188A Withdrawn JP2001271868A (ja) 2000-03-24 2000-03-24 除振装置

Country Status (2)

Country Link
US (1) US6518721B2 (enExample)
JP (1) JP2001271868A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003322203A (ja) * 2002-04-30 2003-11-14 隆夫 ▲高▼松 遊隙充填引張型制震構造
JP2004299541A (ja) * 2003-03-31 2004-10-28 Japan Space Forum 宇宙機搭載ペイロードの振動・姿勢制御装置
JP2010190424A (ja) * 2009-02-19 2010-09-02 Integrated Dynamics Engineering Gmbh 振動分離のためのフィードバック制御システムで使用するためのコンビネーション形運動センサ
JP2014214867A (ja) * 2013-04-30 2014-11-17 清水建設株式会社 免震装置、免震構造物、免震構造物における免震性能の調整方法
KR101759178B1 (ko) 2016-05-27 2017-07-20 한국생산기술연구원 반력보상모듈을 갖는 생산 장비 및 이를 이용한 진동 제어방법
WO2019009440A1 (ko) * 2017-07-04 2019-01-10 한국생산기술연구원 반력보상모듈을 갖는 생산 장비 및 이를 이용한 진동 제어방법
CN112053740A (zh) * 2020-09-12 2020-12-08 河南大学 一种多用途自动水平调节装置及调平方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408526B1 (en) * 1999-04-12 2002-06-25 The Regents Of The University Of California Ultra-precision positioning assembly
GB0202348D0 (en) * 2002-02-01 2002-03-20 Bae Systems Plc Damping of vibrations
DE10344538A1 (de) * 2003-09-25 2005-05-12 Integrated Dynamics Eng Gmbh Verfahren und Vorrichtung zur Schwingungsisolation, insbesondere für Elektronenstrahl-Meßwerkzeuge
WO2005038895A1 (ja) * 2003-10-21 2005-04-28 Dainippon Ink And Chemicals, Inc. 液供給方法および装置
US20060054432A1 (en) * 2004-09-16 2006-03-16 Yu-Yen Chiu Anti-shock system
JP4071227B2 (ja) * 2004-09-28 2008-04-02 株式会社新川 ボンディング装置
CN101535864A (zh) * 2006-08-04 2009-09-16 伊康尼西斯公司 Z向运动的显微镜载片支架
EP1921502B1 (de) * 2006-11-08 2011-02-02 Integrated Dynamics Engineering GmbH Kombiniertes Motion-Control-System
EP2075484A1 (en) * 2007-12-31 2009-07-01 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO An active vibration isolation system having an inertial reference mass
JP5064316B2 (ja) * 2008-07-01 2012-10-31 特許機器株式会社 除振装置
EP2261530A1 (en) * 2009-06-12 2010-12-15 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO An active vibration isolation and damping system
CN109537521B (zh) * 2018-11-25 2023-11-24 中国船舶重工集团公司第七一九研究所 一种可实现大范围位移补偿的可拆式过道
EP3964893A1 (de) * 2020-06-29 2022-03-09 Carl Zeiss SMT GmbH Kompensation von kriecheffekten in einer abbildungseinrichtung
CN114458727A (zh) * 2022-01-25 2022-05-10 中国船舶重工集团公司第七一九研究所 一种水箱的隔振装置
CN114542291A (zh) * 2022-02-22 2022-05-27 中国联合重型燃气轮机技术有限公司 一种气缸的支撑装置、支撑系统及支撑系统的控制方法
CN120622132B (zh) * 2025-08-14 2025-10-31 沈阳德氏冷饮食品有限公司 一种物料输送振荡装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509002A (en) * 1983-12-20 1985-04-02 International Business Machines Corporation Precision X-Y positioner
US4643385A (en) * 1984-11-15 1987-02-17 Rca Corporation Anti-vibration system
IL77057A (en) * 1985-03-26 1990-03-19 Wright Barry Corp Active vibration isolation system
US5012174A (en) * 1988-06-20 1991-04-30 Sperry Marine Inc. Method and apparatus for countering vibrations of a platform
US5442960A (en) * 1993-07-28 1995-08-22 Southwest Research Institute Measurement of mass using angular simple harmonic motion
JP3372635B2 (ja) * 1994-03-14 2003-02-04 キヤノン株式会社 制御装置
JPH09236149A (ja) * 1996-02-29 1997-09-09 Nikon Corp 防振装置の制御方法及び該方法を使用する防振装置
JPH09236150A (ja) * 1996-02-29 1997-09-09 Nikon Corp 防振装置
JPH1089403A (ja) * 1996-09-10 1998-04-07 Nikon Corp 防振装置
US6128552A (en) 1996-11-08 2000-10-03 Canon Kabushiki Kaisha Anti-vibration apparatus and method
JP3825869B2 (ja) 1997-03-19 2006-09-27 キヤノン株式会社 能動除振装置
US6107770A (en) * 1998-01-27 2000-08-22 Lockheed Martin Corporation Control system for counter-oscillating masses
JP3661424B2 (ja) * 1998-07-28 2005-06-15 松下電工株式会社 リニア振動モータの駆動制御方法
JP2000136844A (ja) 1998-10-30 2000-05-16 Canon Inc 変位発生形アクチュエータ能動振動絶縁装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003322203A (ja) * 2002-04-30 2003-11-14 隆夫 ▲高▼松 遊隙充填引張型制震構造
JP2004299541A (ja) * 2003-03-31 2004-10-28 Japan Space Forum 宇宙機搭載ペイロードの振動・姿勢制御装置
JP2010190424A (ja) * 2009-02-19 2010-09-02 Integrated Dynamics Engineering Gmbh 振動分離のためのフィードバック制御システムで使用するためのコンビネーション形運動センサ
JP2014214867A (ja) * 2013-04-30 2014-11-17 清水建設株式会社 免震装置、免震構造物、免震構造物における免震性能の調整方法
KR101759178B1 (ko) 2016-05-27 2017-07-20 한국생산기술연구원 반력보상모듈을 갖는 생산 장비 및 이를 이용한 진동 제어방법
WO2019009440A1 (ko) * 2017-07-04 2019-01-10 한국생산기술연구원 반력보상모듈을 갖는 생산 장비 및 이를 이용한 진동 제어방법
CN112053740A (zh) * 2020-09-12 2020-12-08 河南大学 一种多用途自动水平调节装置及调平方法

Also Published As

Publication number Publication date
US20010024403A1 (en) 2001-09-27
US6518721B2 (en) 2003-02-11

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