JP2001222751A - 自動販売機温度制御装置 - Google Patents
自動販売機温度制御装置Info
- Publication number
- JP2001222751A JP2001222751A JP2000034850A JP2000034850A JP2001222751A JP 2001222751 A JP2001222751 A JP 2001222751A JP 2000034850 A JP2000034850 A JP 2000034850A JP 2000034850 A JP2000034850 A JP 2000034850A JP 2001222751 A JP2001222751 A JP 2001222751A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- operation mode
- sales
- cooling
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3171—Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
- H01L2224/274—Manufacturing methods by blanket deposition of the material of the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
- H01L2924/3511—Warping
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Wire Bonding (AREA)
- Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
- Devices That Are Associated With Refrigeration Equipment (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000034850A JP2001222751A (ja) | 2000-02-14 | 2000-02-14 | 自動販売機温度制御装置 |
DE10106492A DE10106492B4 (de) | 2000-02-14 | 2001-02-13 | Verbiegefähige Halbleitervorrichtung und Verfahren zu deren Herstellung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000034850A JP2001222751A (ja) | 2000-02-14 | 2000-02-14 | 自動販売機温度制御装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001222751A true JP2001222751A (ja) | 2001-08-17 |
Family
ID=18559123
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000034850A Pending JP2001222751A (ja) | 2000-02-14 | 2000-02-14 | 自動販売機温度制御装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2001222751A (de) |
DE (1) | DE10106492B4 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005539313A (ja) * | 2002-09-16 | 2005-12-22 | ザ・コカ−コーラ・カンパニー | 冷却システム及び加熱システムの温度制御のためのシステムと方法 |
JP2009067448A (ja) * | 2007-09-14 | 2009-04-02 | Hoshizaki Electric Co Ltd | 飲料注出装置 |
CN109075159A (zh) * | 2016-04-21 | 2018-12-21 | 三菱电机株式会社 | 半导体装置及其制造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10156386B4 (de) | 2001-11-16 | 2007-08-09 | Infineon Technologies Ag | Verfahren zum Herstellen eines Halbleiterchips |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5155068A (en) * | 1989-08-31 | 1992-10-13 | Sharp Kabushiki Kaisha | Method for manufacturing an IC module for an IC card whereby an IC device and surrounding encapsulant are thinned by material removal |
US5390082A (en) * | 1992-07-06 | 1995-02-14 | International Business Machines, Corp. | Chip carrier with protective coating for circuitized surface |
US5689136A (en) * | 1993-08-04 | 1997-11-18 | Hitachi, Ltd. | Semiconductor device and fabrication method |
DE4435120C2 (de) * | 1994-09-30 | 2000-08-03 | Siemens Ag | Schutzschicht für Wafer und Verfahren zu deren Herstellung |
US5733814A (en) * | 1995-04-03 | 1998-03-31 | Aptek Industries, Inc. | Flexible electronic card and method |
DE19740055A1 (de) * | 1997-09-12 | 1999-03-18 | Daimler Benz Ag | Anordnung und Verfahren zur Herstellung von CSP-Gehäusen für elektrische Bauteile |
JPH11102985A (ja) * | 1997-09-26 | 1999-04-13 | Mitsubishi Electric Corp | 半導体集積回路装置 |
DE19750316A1 (de) * | 1997-11-13 | 1999-05-27 | Siemens Ag | Siliziumfolie als Träger von Halbleiterschaltungen als Teil von Karten |
DE19931240C2 (de) * | 1999-07-07 | 2001-08-02 | Infineon Technologies Ag | Chipkarte |
-
2000
- 2000-02-14 JP JP2000034850A patent/JP2001222751A/ja active Pending
-
2001
- 2001-02-13 DE DE10106492A patent/DE10106492B4/de not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005539313A (ja) * | 2002-09-16 | 2005-12-22 | ザ・コカ−コーラ・カンパニー | 冷却システム及び加熱システムの温度制御のためのシステムと方法 |
JP2009067448A (ja) * | 2007-09-14 | 2009-04-02 | Hoshizaki Electric Co Ltd | 飲料注出装置 |
CN109075159A (zh) * | 2016-04-21 | 2018-12-21 | 三菱电机株式会社 | 半导体装置及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE10106492B4 (de) | 2007-06-14 |
DE10106492A1 (de) | 2001-08-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060607 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080509 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080516 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080926 |