JP2001221696A - 感温感歪複合センサ - Google Patents
感温感歪複合センサInfo
- Publication number
- JP2001221696A JP2001221696A JP2000074937A JP2000074937A JP2001221696A JP 2001221696 A JP2001221696 A JP 2001221696A JP 2000074937 A JP2000074937 A JP 2000074937A JP 2000074937 A JP2000074937 A JP 2000074937A JP 2001221696 A JP2001221696 A JP 2001221696A
- Authority
- JP
- Japan
- Prior art keywords
- strain
- temperature
- sensor
- sensitivity
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 27
- 230000035945 sensitivity Effects 0.000 claims abstract description 116
- 239000000463 material Substances 0.000 claims description 53
- 238000005259 measurement Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 20
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 229910052763 palladium Inorganic materials 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 6
- 230000001133 acceleration Effects 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 5
- 238000006073 displacement reaction Methods 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 239000010409 thin film Substances 0.000 abstract description 74
- 238000001514 detection method Methods 0.000 description 19
- 239000000203 mixture Substances 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 238000009529 body temperature measurement Methods 0.000 description 10
- 239000010408 film Substances 0.000 description 10
- 238000012937 correction Methods 0.000 description 9
- 229910001252 Pd alloy Inorganic materials 0.000 description 8
- 229910019590 Cr-N Inorganic materials 0.000 description 7
- 229910019588 Cr—N Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910001199 N alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- HLXRWTJXGMHOFN-XJSNKYLASA-N Verbenalin Chemical compound O([C@@H]1OC=C([C@H]2C(=O)C[C@H](C)[C@H]21)C(=O)OC)[C@@H]1O[C@H](CO)[C@@H](O)[C@H](O)[C@H]1O HLXRWTJXGMHOFN-XJSNKYLASA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910003336 CuNi Inorganic materials 0.000 description 1
- 229910002482 Cu–Ni Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- HLXRWTJXGMHOFN-UHFFFAOYSA-N Verbenalin Natural products C12C(C)CC(=O)C2C(C(=O)OC)=COC1OC1OC(CO)C(O)C(O)C1O HLXRWTJXGMHOFN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000010259 detection of temperature stimulus Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Measuring Fluid Pressure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000074937A JP2001221696A (ja) | 2000-02-10 | 2000-02-10 | 感温感歪複合センサ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000074937A JP2001221696A (ja) | 2000-02-10 | 2000-02-10 | 感温感歪複合センサ |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011024384A Division JP4988938B2 (ja) | 2011-02-07 | 2011-02-07 | 感温感歪複合センサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001221696A true JP2001221696A (ja) | 2001-08-17 |
| JP2001221696A5 JP2001221696A5 (enExample) | 2007-04-05 |
Family
ID=18592899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000074937A Withdrawn JP2001221696A (ja) | 2000-02-10 | 2000-02-10 | 感温感歪複合センサ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001221696A (enExample) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002048607A (ja) * | 2000-08-02 | 2002-02-15 | Res Inst Electric Magnetic Alloys | 薄膜触覚センサ |
| JP2003139504A (ja) * | 2001-10-30 | 2003-05-14 | Japan Science & Technology Corp | 変位センサとその製造方法および位置決めステージ |
| JP2006349535A (ja) * | 2005-06-16 | 2006-12-28 | Taiheiyo Cement Corp | 複合センサモジュールおよびセンサデバイス |
| JP2011179817A (ja) * | 2010-02-26 | 2011-09-15 | Taiheiyo Cement Corp | ひずみ計測装置及びひずみ計測システム |
| JP2012008101A (ja) * | 2010-06-28 | 2012-01-12 | Sinfonia Technology Co Ltd | 複合センサ、センサユニット |
| JP2013011567A (ja) * | 2011-06-30 | 2013-01-17 | Toyota Motor Corp | トルク計測装置 |
| JP2014035239A (ja) * | 2012-08-08 | 2014-02-24 | Research Institute For Electromagnetic Materials | 歪センサ |
| WO2018207580A1 (ja) * | 2017-05-09 | 2018-11-15 | 株式会社デンソー | 熱流式センサモジュール |
| KR101921379B1 (ko) * | 2016-09-26 | 2018-11-22 | 제주대학교 산학협력단 | 밴딩 측정이 가능한 온도센서 |
| JP2020085490A (ja) * | 2018-11-16 | 2020-06-04 | Tdk株式会社 | 歪検出素子および力学量センサ |
| JP2021139891A (ja) * | 2020-02-28 | 2021-09-16 | 日本電産シンポ株式会社 | センサシステムおよび動力伝達装置 |
| WO2022153974A1 (ja) * | 2021-01-12 | 2022-07-21 | ミネベアミツミ株式会社 | ドライブプレート型トルク変換器 |
| WO2022259701A1 (ja) | 2021-06-09 | 2022-12-15 | ミネベアミツミ株式会社 | ひずみゲージ、ロードセル |
| EP4428498A4 (en) * | 2021-12-13 | 2025-02-19 | Huawei Technologies Co., Ltd. | MULTIFUNCTIONAL SENSOR AND DEVICE |
| US12411000B2 (en) | 2020-03-30 | 2025-09-09 | Minebea Mitsumi Inc. | Strain gauge |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0510826A (ja) * | 1991-07-02 | 1993-01-19 | Matsushita Electric Ind Co Ltd | アレイセンサ |
| JPH0534182A (ja) * | 1991-07-31 | 1993-02-09 | Anritsu Corp | 歪・温度複合センサ |
| JPH06300649A (ja) * | 1993-04-12 | 1994-10-28 | Sumitomo Electric Ind Ltd | 薄膜歪抵抗材料とその製造方法及び薄膜歪みセンサ |
| JPH09280911A (ja) * | 1996-04-16 | 1997-10-31 | Toyota Motor Corp | 圧力、歪、温度の同時計測方法 |
| JPH11195504A (ja) * | 1997-12-26 | 1999-07-21 | Res Inst Electric Magnetic Alloys | 電気抵抗薄膜及びその製造法並びにセンサデ バイス |
| JP2000111368A (ja) * | 1998-10-08 | 2000-04-18 | Nippon Soken Inc | 圧力、歪み及び温度の同時測定装置、同時測定方法及び薄膜センサ |
-
2000
- 2000-02-10 JP JP2000074937A patent/JP2001221696A/ja not_active Withdrawn
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0510826A (ja) * | 1991-07-02 | 1993-01-19 | Matsushita Electric Ind Co Ltd | アレイセンサ |
| JPH0534182A (ja) * | 1991-07-31 | 1993-02-09 | Anritsu Corp | 歪・温度複合センサ |
| JPH06300649A (ja) * | 1993-04-12 | 1994-10-28 | Sumitomo Electric Ind Ltd | 薄膜歪抵抗材料とその製造方法及び薄膜歪みセンサ |
| JPH09280911A (ja) * | 1996-04-16 | 1997-10-31 | Toyota Motor Corp | 圧力、歪、温度の同時計測方法 |
| JPH11195504A (ja) * | 1997-12-26 | 1999-07-21 | Res Inst Electric Magnetic Alloys | 電気抵抗薄膜及びその製造法並びにセンサデ バイス |
| JP2000111368A (ja) * | 1998-10-08 | 2000-04-18 | Nippon Soken Inc | 圧力、歪み及び温度の同時測定装置、同時測定方法及び薄膜センサ |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002048607A (ja) * | 2000-08-02 | 2002-02-15 | Res Inst Electric Magnetic Alloys | 薄膜触覚センサ |
| JP2003139504A (ja) * | 2001-10-30 | 2003-05-14 | Japan Science & Technology Corp | 変位センサとその製造方法および位置決めステージ |
| JP2006349535A (ja) * | 2005-06-16 | 2006-12-28 | Taiheiyo Cement Corp | 複合センサモジュールおよびセンサデバイス |
| JP2011179817A (ja) * | 2010-02-26 | 2011-09-15 | Taiheiyo Cement Corp | ひずみ計測装置及びひずみ計測システム |
| JP2012008101A (ja) * | 2010-06-28 | 2012-01-12 | Sinfonia Technology Co Ltd | 複合センサ、センサユニット |
| JP2013011567A (ja) * | 2011-06-30 | 2013-01-17 | Toyota Motor Corp | トルク計測装置 |
| JP2014035239A (ja) * | 2012-08-08 | 2014-02-24 | Research Institute For Electromagnetic Materials | 歪センサ |
| KR101921379B1 (ko) * | 2016-09-26 | 2018-11-22 | 제주대학교 산학협력단 | 밴딩 측정이 가능한 온도센서 |
| WO2018207580A1 (ja) * | 2017-05-09 | 2018-11-15 | 株式会社デンソー | 熱流式センサモジュール |
| JP2020085490A (ja) * | 2018-11-16 | 2020-06-04 | Tdk株式会社 | 歪検出素子および力学量センサ |
| JP7268333B2 (ja) | 2018-11-16 | 2023-05-08 | Tdk株式会社 | 歪検出素子および力学量センサ |
| JP2021139891A (ja) * | 2020-02-28 | 2021-09-16 | 日本電産シンポ株式会社 | センサシステムおよび動力伝達装置 |
| JP7707491B2 (ja) | 2020-02-28 | 2025-07-15 | ニデックドライブテクノロジー株式会社 | センサシステムおよび動力伝達装置 |
| US12411000B2 (en) | 2020-03-30 | 2025-09-09 | Minebea Mitsumi Inc. | Strain gauge |
| WO2022153974A1 (ja) * | 2021-01-12 | 2022-07-21 | ミネベアミツミ株式会社 | ドライブプレート型トルク変換器 |
| JP2022108071A (ja) * | 2021-01-12 | 2022-07-25 | ミネベアミツミ株式会社 | ドライブプレート型トルク変換器 |
| JP7586716B2 (ja) | 2021-01-12 | 2024-11-19 | ミネベアミツミ株式会社 | ドライブプレート型トルク変換器 |
| WO2022259701A1 (ja) | 2021-06-09 | 2022-12-15 | ミネベアミツミ株式会社 | ひずみゲージ、ロードセル |
| EP4428498A4 (en) * | 2021-12-13 | 2025-02-19 | Huawei Technologies Co., Ltd. | MULTIFUNCTIONAL SENSOR AND DEVICE |
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