JP2001201682A - 光学投影システム - Google Patents

光学投影システム

Info

Publication number
JP2001201682A
JP2001201682A JP2000384773A JP2000384773A JP2001201682A JP 2001201682 A JP2001201682 A JP 2001201682A JP 2000384773 A JP2000384773 A JP 2000384773A JP 2000384773 A JP2000384773 A JP 2000384773A JP 2001201682 A JP2001201682 A JP 2001201682A
Authority
JP
Japan
Prior art keywords
bulge
lens
optical projection
lens group
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000384773A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001201682A5 (enExample
Inventor
David R Shafer
デイビッド・アール・シェイファー
Wilhelm Ulrich
ヴィルヘルム・ウルリッヒ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of JP2001201682A publication Critical patent/JP2001201682A/ja
Publication of JP2001201682A5 publication Critical patent/JP2001201682A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000384773A 1999-12-21 2000-12-19 光学投影システム Pending JP2001201682A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17182799P 1999-12-21 1999-12-21
US60/171827 1999-12-21

Publications (2)

Publication Number Publication Date
JP2001201682A true JP2001201682A (ja) 2001-07-27
JP2001201682A5 JP2001201682A5 (enExample) 2008-02-07

Family

ID=22625292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000384773A Pending JP2001201682A (ja) 1999-12-21 2000-12-19 光学投影システム

Country Status (4)

Country Link
US (1) US20020001141A1 (enExample)
EP (1) EP1111425A3 (enExample)
JP (1) JP2001201682A (enExample)
TW (1) TW448307B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2012072004A1 (zh) * 2010-12-01 2012-06-07 上海微电子装备有限公司 一种投影物镜系统及使用该投影物镜系统的微光刻系统

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
US7154676B2 (en) 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
DE10224361A1 (de) * 2002-05-03 2003-11-13 Zeiss Carl Smt Ag Projektionsobjektiv höchster Apertur
EP1481286A2 (de) * 2002-03-01 2004-12-01 Carl Zeiss SMT AG Refraktives projektionsobjektiv mit einer taille
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
JP2005524866A (ja) * 2002-05-03 2005-08-18 カール・ツァイス・エスエムティー・アーゲー 超高開口度の投影対物レンズ
JP2007512658A (ja) * 2003-08-08 2007-05-17 ゼネラル・エレクトリック・カンパニイ 導電性組成物及びその製造方法
JP2011237588A (ja) * 2010-05-10 2011-11-24 Sony Corp ズームレンズ及び撮像装置
CN101975983B (zh) * 2010-09-13 2012-05-30 北京理工大学 高分辨率非球面光刻物镜

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05173065A (ja) * 1991-10-24 1993-07-13 Olympus Optical Co Ltd 縮小投影レンズ
JPH07113955A (ja) * 1993-10-18 1995-05-02 Minolta Co Ltd ズームレンズ
JPH08190050A (ja) * 1994-11-11 1996-07-23 Olympus Optical Co Ltd ズームレンズ
JPH1054936A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
JPH10293251A (ja) * 1998-05-11 1998-11-04 Nikon Corp 投影系及び投影露光法
JPH116957A (ja) * 1997-04-25 1999-01-12 Nikon Corp 投影光学系および投影露光装置並びに投影露光方法
JPH1197347A (ja) * 1997-07-16 1999-04-09 Nikon Corp 投影露光装置、及び該装置を用いたパターン転写方法
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0817719A (ja) * 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05173065A (ja) * 1991-10-24 1993-07-13 Olympus Optical Co Ltd 縮小投影レンズ
JPH07113955A (ja) * 1993-10-18 1995-05-02 Minolta Co Ltd ズームレンズ
JPH08190050A (ja) * 1994-11-11 1996-07-23 Olympus Optical Co Ltd ズームレンズ
JPH1054936A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
JPH116957A (ja) * 1997-04-25 1999-01-12 Nikon Corp 投影光学系および投影露光装置並びに投影露光方法
JPH1197347A (ja) * 1997-07-16 1999-04-09 Nikon Corp 投影露光装置、及び該装置を用いたパターン転写方法
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
JPH10293251A (ja) * 1998-05-11 1998-11-04 Nikon Corp 投影系及び投影露光法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2012072004A1 (zh) * 2010-12-01 2012-06-07 上海微电子装备有限公司 一种投影物镜系统及使用该投影物镜系统的微光刻系统
US8970964B2 (en) 2010-12-01 2015-03-03 Shanghai Micro Electronics Equipment Co., Ltd. Projection objective lens system

Also Published As

Publication number Publication date
EP1111425A2 (en) 2001-06-27
EP1111425A3 (en) 2003-10-01
TW448307B (en) 2001-08-01
US20020001141A1 (en) 2002-01-03

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