JP2001027804A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001027804A5 JP2001027804A5 JP1999199095A JP19909599A JP2001027804A5 JP 2001027804 A5 JP2001027804 A5 JP 2001027804A5 JP 1999199095 A JP1999199095 A JP 1999199095A JP 19909599 A JP19909599 A JP 19909599A JP 2001027804 A5 JP2001027804 A5 JP 2001027804A5
- Authority
- JP
- Japan
- Prior art keywords
- resist
- chemically amplified
- resist composition
- irradiation
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229920001228 polyisocyanate Polymers 0.000 description 3
- 239000005056 polyisocyanate Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 239000002981 blocking agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 235000014121 butter Nutrition 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- -1 isocyanate compound Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19909599A JP4424630B2 (ja) | 1999-07-13 | 1999-07-13 | 化学増幅型レジスト組成物およびレジストパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19909599A JP4424630B2 (ja) | 1999-07-13 | 1999-07-13 | 化学増幅型レジスト組成物およびレジストパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001027804A JP2001027804A (ja) | 2001-01-30 |
| JP2001027804A5 true JP2001027804A5 (https=) | 2006-08-31 |
| JP4424630B2 JP4424630B2 (ja) | 2010-03-03 |
Family
ID=16402046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19909599A Expired - Fee Related JP4424630B2 (ja) | 1999-07-13 | 1999-07-13 | 化学増幅型レジスト組成物およびレジストパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4424630B2 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4765184B2 (ja) * | 2001-03-19 | 2011-09-07 | 住友ベークライト株式会社 | 複合シート。 |
| TWI400570B (zh) | 2005-07-25 | 2013-07-01 | Nissan Chemical Ind Ltd | 正型感光性樹脂組成物及由其所得之硬化膜 |
| US8828651B2 (en) | 2005-07-25 | 2014-09-09 | Nissan Chemical Industries, Ltd. | Positive-type photosensitive resin composition and cured film manufactured therefrom |
| WO2007086249A1 (ja) * | 2006-01-25 | 2007-08-02 | Nissan Chemical Industries, Ltd. | ポジ型感光性樹脂組成物及びそれから得られる硬化膜 |
| TWI408496B (zh) * | 2006-03-01 | 2013-09-11 | Zeon Corp | A radiation linear resin composition, a laminate, and a method for producing the same |
| JP4771086B2 (ja) * | 2006-03-01 | 2011-09-14 | 日本ゼオン株式会社 | 感放射線性樹脂組成物、積層体及びその製造方法 |
| WO2007132892A1 (ja) * | 2006-05-16 | 2007-11-22 | Nissan Chemical Industries, Ltd. | シロキサン化合物を含有するポジ型感光性樹脂組成物 |
| KR101388998B1 (ko) | 2006-06-15 | 2014-04-24 | 닛산 가가쿠 고교 가부시키 가이샤 | 환구조를 갖는 고분자 화합물을 함유하는 포지티브형 감광성 수지조성물 |
| JP5077526B2 (ja) * | 2006-09-21 | 2012-11-21 | 日産化学工業株式会社 | 末端に不飽和基を有する化合物を含有するポジ型感光性樹脂組成物 |
| US8168371B2 (en) | 2007-01-22 | 2012-05-01 | Nissan Chemical Industries, Ltd. | Positive photosensitive resin composition |
| JP2008286924A (ja) * | 2007-05-16 | 2008-11-27 | Panasonic Corp | 化学増幅型レジスト材料、トップコート膜形成用材料及びそれらを用いたパターン形成方法 |
| KR101754676B1 (ko) | 2010-02-02 | 2017-07-06 | 닛산 가가쿠 고교 가부시키 가이샤 | 포지티브형 감광성 수지 조성물 및 발액성 피막 |
| JP5291744B2 (ja) * | 2010-11-02 | 2013-09-18 | 富士フイルム株式会社 | エッチングレジスト用感光性樹脂組成物、パターン作製方法、ｍｅｍｓ構造体及びその作製方法、ドライエッチング方法、ウェットエッチング方法、ｍｅｍｓシャッターデバイス、並びに、画像表示装置 |
| JP5585796B2 (ja) * | 2012-07-06 | 2014-09-10 | 日産化学工業株式会社 | 末端に不飽和基を有する化合物を含有するポジ型感光性樹脂組成物 |
-
1999
- 1999-07-13 JP JP19909599A patent/JP4424630B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2001027804A5 (https=) | ||
| US5366851A (en) | Device fabrication process | |
| US6379869B1 (en) | Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning | |
| KR102062966B1 (ko) | 레지스트패턴 형성방법, 레지스트잠상 형성장치, 레지스트패턴 형성장치 및 레지스트재료 | |
| EP3382452B1 (en) | Resist-pattern formation method and resist material | |
| EP0164472B1 (en) | An encapsulated hypochlorite deactivator | |
| Khan et al. | R ecent Advances in Decontamination of Chemical Warfare Agents | |
| JP2003536095A5 (https=) | ||
| JPH03159114A (ja) | 微細パターンの形成方法 | |
| JP2000035672A (ja) | 半導体装置の製造方法及び半導体装置 | |
| JPH08138993A (ja) | 電子部品のパターン形成方法 | |
| JP2001027805A5 (https=) | ||
| JPH06118630A (ja) | 化学増幅型レジスト用塗布液組成物 | |
| Mumper et al. | Biodegradable radiotherapeutic polyester microspheres: optimization and in-vitro/in-vivo evaluation | |
| JPH0550118A (ja) | 圧延ロールの表面加工方法 | |
| JPH1145843A (ja) | レジストパターンの形成方法 | |
| US5663038A (en) | Process for the preparation of partially protected phenolic resins | |
| JP2961975B2 (ja) | 微細パターンの形成方法 | |
| Chapman et al. | The time-scale of radioprotection in mammalian cells | |
| US20050191576A1 (en) | Water-soluble material, chemically amplified resist and pattern formation method using the same | |
| JP2597981B2 (ja) | レジスト膜の硬化処理方法 | |
| JP3502327B2 (ja) | パターン形成材料及びパターン形成方法 | |
| JPH0354335B2 (https=) | ||
| JPH0553331A (ja) | 微細パターンの形成方法 | |
| JP2745443B2 (ja) | レジストパターン形成方法 |