JP2001012856A5 - - Google Patents
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- Publication number
- JP2001012856A5 JP2001012856A5 JP1999182470A JP18247099A JP2001012856A5 JP 2001012856 A5 JP2001012856 A5 JP 2001012856A5 JP 1999182470 A JP1999182470 A JP 1999182470A JP 18247099 A JP18247099 A JP 18247099A JP 2001012856 A5 JP2001012856 A5 JP 2001012856A5
- Authority
- JP
- Japan
- Prior art keywords
- heat
- work
- heat treatment
- substrate
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 description 36
- 239000000758 substrate Substances 0.000 description 14
- 239000012530 fluid Substances 0.000 description 11
- 230000005855 radiation Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- -1 moisture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11182470A JP2001012856A (ja) | 1999-06-28 | 1999-06-28 | 熱処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11182470A JP2001012856A (ja) | 1999-06-28 | 1999-06-28 | 熱処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001012856A JP2001012856A (ja) | 2001-01-19 |
| JP2001012856A5 true JP2001012856A5 (enExample) | 2005-09-08 |
Family
ID=16118836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11182470A Pending JP2001012856A (ja) | 1999-06-28 | 1999-06-28 | 熱処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001012856A (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4570257B2 (ja) * | 2001-01-25 | 2010-10-27 | パナック工業株式会社 | 加圧式洗浄装置 |
| JP2002221394A (ja) * | 2001-01-24 | 2002-08-09 | Showa Mfg Co Ltd | 電子部品の加熱装置 |
| JP2006208005A (ja) * | 2001-12-03 | 2006-08-10 | Tokyo Ohka Kogyo Co Ltd | 乾燥装置 |
| JP2003303666A (ja) * | 2002-04-10 | 2003-10-24 | Koyo Thermo System Kk | 加熱装置 |
| JP4071594B2 (ja) * | 2002-10-22 | 2008-04-02 | 昭和鉄工株式会社 | ガラス基板用熱処理装置 |
| TWI311634B (en) * | 2003-03-19 | 2009-07-01 | Hirata Corporatio | Multi stage type heating apparatus for large size substrates |
| TWI312855B (en) * | 2003-03-19 | 2009-08-01 | Hirata Corporatio | Multi stage type heating apparatus for large size substrates |
| TWI312856B (en) * | 2003-03-24 | 2009-08-01 | Hirata Corporatio | Multi stage type heating apparatus for large size substrates |
| JP3917994B2 (ja) * | 2004-08-24 | 2007-05-23 | 株式会社石井表記 | 塗布膜用乾燥炉 |
| JP2006292328A (ja) * | 2005-04-14 | 2006-10-26 | Matsushita Electric Ind Co Ltd | 乾燥装置 |
| TWI436789B (zh) | 2008-01-21 | 2014-05-11 | Intervet Int Bv | 含有藥學化合物的顆粒之冷凍乾燥方法及含有此顆粒的藥學包 |
| CN102863147B (zh) * | 2012-09-26 | 2014-10-29 | 深圳市华星光电技术有限公司 | 对基板进行烤焙处理的装置及方法 |
| CN102992602A (zh) * | 2012-11-28 | 2013-03-27 | 江苏宜达光电科技有限公司 | 微晶玻璃热处理炉 |
| KR101662302B1 (ko) * | 2014-12-31 | 2016-10-06 | 주식회사 비아트론 | 히팅 모듈 및 이를 갖는 열처리 장치 |
| JP5956635B1 (ja) * | 2015-03-19 | 2016-07-27 | 株式会社ワイエイシイデンコー | 加熱装置 |
| JP6409665B2 (ja) * | 2015-04-14 | 2018-10-24 | 株式会社デンソー | 加熱装置 |
| JP7538071B2 (ja) * | 2021-03-15 | 2024-08-21 | 株式会社カネカ | 光散乱膜付き透光性基板の製造方法、及び有機ｅｌパネルの製造方法 |
-
1999
- 1999-06-28 JP JP11182470A patent/JP2001012856A/ja active Pending
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