JP2000345392A5 - - Google Patents

Download PDF

Info

Publication number
JP2000345392A5
JP2000345392A5 JP2000016089A JP2000016089A JP2000345392A5 JP 2000345392 A5 JP2000345392 A5 JP 2000345392A5 JP 2000016089 A JP2000016089 A JP 2000016089A JP 2000016089 A JP2000016089 A JP 2000016089A JP 2000345392 A5 JP2000345392 A5 JP 2000345392A5
Authority
JP
Japan
Prior art keywords
substrate
plating
solution
contact
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000016089A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000345392A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000016089A priority Critical patent/JP2000345392A/ja
Priority claimed from JP2000016089A external-priority patent/JP2000345392A/ja
Publication of JP2000345392A publication Critical patent/JP2000345392A/ja
Publication of JP2000345392A5 publication Critical patent/JP2000345392A5/ja
Pending legal-status Critical Current

Links

JP2000016089A 1999-01-26 2000-01-25 銅めっき方法およびその装置 Pending JP2000345392A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000016089A JP2000345392A (ja) 1999-01-26 2000-01-25 銅めっき方法およびその装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP11-17208 1999-01-26
JP1720899 1999-01-26
JP11-94943 1999-04-01
JP9494399 1999-04-01
JP2000016089A JP2000345392A (ja) 1999-01-26 2000-01-25 銅めっき方法およびその装置

Publications (2)

Publication Number Publication Date
JP2000345392A JP2000345392A (ja) 2000-12-12
JP2000345392A5 true JP2000345392A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2004-12-09

Family

ID=27281722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000016089A Pending JP2000345392A (ja) 1999-01-26 2000-01-25 銅めっき方法およびその装置

Country Status (1)

Country Link
JP (1) JP2000345392A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001316866A (ja) * 2000-05-08 2001-11-16 Tokyo Electron Ltd 半導体装置の製造方法および製造装置
JP4762423B2 (ja) * 2001-03-05 2011-08-31 石原薬品株式会社 ボイドフリー銅メッキ方法
JP2009030167A (ja) * 2007-07-02 2009-02-12 Ebara Corp 基板処理方法及び基板処理装置
JP6948053B2 (ja) * 2017-01-12 2021-10-13 上村工業株式会社 フィリングめっきシステム及びフィリングめっき方法

Similar Documents

Publication Publication Date Title
KR100824759B1 (ko) 기판처리장치 및 기판도금장치
US6210781B1 (en) Method for photoselective seeding and metallization of three-dimensional materials
JP2005512271A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH05506125A (ja) 新規なスルーホールめっき印刷回路基板およびその製造方法
RU2556162C2 (ru) Способ защиты серебра и поверхностей сплавов серебра от потускнения
JPH06322547A (ja) 有機重合体物質の結合方法
TWI732045B (zh) 印刷配線基板之製造方法
JP4834731B2 (ja) 改良マイクロエッチング液
CN114351145B (zh) 一种挂具退锡铜剥除液添加剂及其制备方法与应用
BRPI0810798B1 (pt) Processo para aplicação de revestimento metálico em um substrato não-condutor.
JP2000345392A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TWI576465B (zh) 供銅及銅合金微蝕刻之組合物及方法
TW201131622A (en) Wafer cleaning water and method of cleaning wafer
JP3804981B2 (ja) 直通接続プリント回路板または多層プリント回路板の製造方法
CN114806747A (zh) 一种晶片清洗水和清洗晶片的方法
GB2254806A (en) A method for coating batteries with a bitter tasting substance.
JP2005194585A (ja) 基板の湿式処理方法及び基板処理装置
JP2002231685A (ja) ウェーハ洗浄及び乾燥装置
JPH0593157A (ja) 樹脂塗装剥離除去方法および後処理方法
KR100564799B1 (ko) 구리 전해도금 장치 및 그 방법
JPS61291963A (ja) 金属パタ−ンを無機の非導電性表面上に得る方法
JP2000160349A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2005109362A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP3661426B2 (ja) バレルめっき方法およびバレルめっき装置
JPS5823479B2 (ja) 被メッキ物の付着メッキ液除去・回収方法