JP2000332162A - Resin-sealed semiconductor device - Google Patents

Resin-sealed semiconductor device

Info

Publication number
JP2000332162A
JP2000332162A JP13670499A JP13670499A JP2000332162A JP 2000332162 A JP2000332162 A JP 2000332162A JP 13670499 A JP13670499 A JP 13670499A JP 13670499 A JP13670499 A JP 13670499A JP 2000332162 A JP2000332162 A JP 2000332162A
Authority
JP
Japan
Prior art keywords
terminal
semiconductor device
die pad
resin
back surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13670499A
Other languages
Japanese (ja)
Inventor
Yuji Yamaguchi
雄二 山口
Masahito Sasaki
将人 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP13670499A priority Critical patent/JP2000332162A/en
Publication of JP2000332162A publication Critical patent/JP2000332162A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To enhance occupancy ratio of semiconductor elements, downsize and improve packing density on a circuit board by electrically independently placing a die pad at the center of a terminal laying surface and making the die pad back surface recessed to expose it to the outside. SOLUTION: A resin-sealed semiconductor device 1 comprises a semiconductor element 8 mounted via an electric insulative adhesive layer 7 on the front surface of a die pad 2 with the opposite surface adhered to its terminal laying surface. The die pad 2 is disposed electrically independently of a terminal part 4 at approximately the center of a plane, on which the terminal part 4 is arranged two-dimensionally. The terminal part 4 has an inner terminal 4A on the front surface and an outer terminal 4B on the back surface in one body with both surfaces. The back surface 2b of the pad 2 is formed with a recess formed into the outer terminal 4B surface and hence exposed to the outside, resulting in the back surface 2b of the pad 2 being located farther inside the semiconductor device than the back surface of the resin-sealed semiconductor device 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体素子を搭載し
た樹脂封止型の半導体装置に係り、特にパッケージサイ
ズの小型化に対応し、かつ、実装性に優れる樹脂封止型
半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin-encapsulated semiconductor device having a semiconductor element mounted thereon, and more particularly to a resin-encapsulated semiconductor device capable of reducing the size of a package and having excellent mountability.

【0002】[0002]

【従来の技術】近年、半導体装置は、高集積化や小型化
技術の進歩、電気機器の高性能化と軽薄短小化の傾向
(時流)から、LSIのASICに代表されるように、
ますます高集積化、高機能化が進んできている。リード
フレームを用いた封止型の半導体装置では、上記の小型
化・薄型化の要請から、その開発のトレンドが、QFP
(Quad Flat Package)やSOJ(S
mall OutlineJ−Leaded Pack
age)のような表面実装型のパッケージを経て、TS
OP(Thin Small Outline Pac
kage)の開発による薄型化を主軸としたパッケージ
の小型化へ、さらにはパッケージ内部の3次元化による
チップ収納効率向上を目的としたLOC(Lead O
n Chip)の構造へと進展してきた。
2. Description of the Related Art In recent years, semiconductor devices have been typified by LSI ASICs due to advances in high integration and miniaturization technologies, and the trend toward higher performance and lighter, thinner and smaller electric appliances (current trend).
Higher integration and higher functionality are being increasingly achieved. Due to the demand for miniaturization and thinning described above, the trend of development of sealed semiconductor devices using lead frames
(Quad Flat Package) and SOJ (S
mall OutlineJ-Leaded Pack
age) through a surface mount type package
OP (Thin Small Outline Pac
LOC (Lead O) for the purpose of reducing the size of the package with the main axis of thinning due to the development of Kage) and improving the chip storage efficiency by making the package three-dimensional.
n Chip) structure.

【0003】また、このように高集積化、高機能化され
た半導体装置においては、信号の高速処理を行うことに
よるチップの発熱が無視できない状況になってきてい
る。このため、半導体装置に内在されるダイパッドを裏
面から露出させて放熱性を高めた封止型の半導体装置が
開発されている。
Further, in such a highly integrated and sophisticated semiconductor device, heat generation of a chip due to high-speed processing of signals has become a situation that cannot be ignored. For this reason, a sealed semiconductor device has been developed in which a die pad included in the semiconductor device is exposed from the back surface to enhance heat dissipation.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記従来のパ
ッケージにおいても半導体素子外周部分のリードの引き
回しがあるため、パッケージの小型化に限界が見えてき
た。また、TSOP等の小型パッケージにおいては、リ
ードの引き回し、ピンピッチの点で、多ピン化に対して
も限界が見えてきた。
However, even in the above-mentioned conventional package, there is a limit to miniaturization of the package due to the routing of leads on the outer peripheral portion of the semiconductor element. Further, in a small package such as TSOP, there is a limit to the number of pins in terms of lead routing and pin pitch.

【0005】また、裏面からダイパッドを露出させた半
導体装置は、半田ボールを使用しないで回路基板に実装
(LGA:LAND GRID ALLAY)した場
合、露出したダイパッドが回路基板等と接触するおそれ
がある。このため、LGAにおいて半導体装置の実装高
さの高度な制御が要求されるという問題があった。
When a semiconductor device having a die pad exposed from the rear surface is mounted on a circuit board without using solder balls (LGA: LAND GRID ALLAY), the exposed die pad may come into contact with the circuit board or the like. For this reason, there has been a problem that an advanced control of the mounting height of the semiconductor device is required in the LGA.

【0006】本発明は、上記のような事情に鑑みてなさ
れたものであり、半導体素子の占有率が高く小型化が可
能で、回路基板への実装密度を向上させることができ、
さらに、実装性も良好な樹脂封止型半導体装置を提供す
ることを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has a high occupancy rate of a semiconductor element, can be reduced in size, and can improve a mounting density on a circuit board.
It is another object of the present invention to provide a resin-encapsulated semiconductor device having good mountability.

【0007】[0007]

【課題を解決するための手段】このような目的を達成す
るために、本発明の樹脂封止型半導体装置は、表面側に
内部端子を裏面側に外部端子を表裏一体的に有する複数
の端子部を略一平面内に二次元的に互いに電気的に独立
して配置し、端子部の内部端子と半導体素子の端子とを
ワイヤにて電気的に接続し、各端子部の外部端子の一部
を外部に露出させるように全体を樹脂封止した樹脂封止
型半導体装置であって、複数個の前記端子部を二次元的
に配置する平面の略中央部にダイパッドが電気的に独立
して配置され、該ダイパッドの表面に前記半導体素子が
搭載され、前記ダイパッドの裏面は前記外部端子の表面
に対して凹部を形成するようにして外部に露出している
ような構成とした。
In order to achieve the above object, a resin-encapsulated semiconductor device according to the present invention comprises a plurality of terminals having an internal terminal on the front side and an external terminal on the back side integrally formed front and back. Parts are arranged two-dimensionally and electrically independent of each other in a substantially plane, and the internal terminals of the terminal parts and the terminals of the semiconductor element are electrically connected by wires. A resin-sealed semiconductor device in which the entire portion is resin-sealed so as to expose the portion to the outside, wherein a die pad is electrically independent at a substantially central portion of a plane on which the plurality of terminal portions are two-dimensionally arranged. The semiconductor element is mounted on the surface of the die pad, and the rear surface of the die pad is exposed to the outside so as to form a recess with respect to the surface of the external terminal.

【0008】また、本発明の樹脂封止型半導体装置は、
前記ダイパッドが前記端子部に比べて薄肉であり、か
つ、表面が前記端子部の内部端子の表面と略一平面をな
すような構成とした。
Further, the resin-encapsulated semiconductor device of the present invention comprises:
The die pad is thinner than the terminal portion, and the surface is substantially flush with the surface of the internal terminal of the terminal portion.

【0009】さらに、本発明の樹脂封止型半導体装置
は、外部に露出している前記外部端子の表面に半田から
なる外部電極を備えるような構成とした。
Further, the resin-encapsulated semiconductor device of the present invention is configured such that an external electrode made of solder is provided on the surface of the external terminal exposed to the outside.

【0010】このような本発明では、半導体素子の占有
率が向上するとともに、ダイパッドの裏面が外部端子の
表面に対して凹部形状をなすので、半田ボールを使わな
いLGA(Land Grid Array)のような
回路基板への樹脂封止型半導体装置の実装において、ダ
イパッドが回路基板等に接触することが防止され、ま
た、ダイパッドは、その裏面から半導体装置内の熱を外
部に逃がす作用をなす。
According to the present invention, the occupancy of the semiconductor element is improved, and the back surface of the die pad has a concave shape with respect to the surface of the external terminal. Therefore, an LGA (Land Grid Array) that does not use solder balls is used. In mounting a resin-encapsulated semiconductor device on a circuit board, the die pad is prevented from coming into contact with the circuit board and the like, and the die pad has a function of radiating heat inside the semiconductor device from the back surface to the outside.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施の形態につい
て図面を参照して説明する。図1は本発明の樹脂封止型
半導体装置の一実施形態を示す平面図であり、図2は図
1に示される樹脂封止型半導体装置のA−A線矢視にお
ける縦断面図である。尚、半導体装置の構成を理解しや
すくするために、図1では後述する封止部材10を省略
し、図2では封止部材10を仮想線(2点鎖線)で示し
ている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view showing one embodiment of the resin-sealed semiconductor device of the present invention, and FIG. 2 is a longitudinal sectional view of the resin-sealed semiconductor device shown in FIG. . Note that, for easy understanding of the configuration of the semiconductor device, a sealing member 10 described later is omitted in FIG. 1 and the sealing member 10 is indicated by a virtual line (two-dot chain line) in FIG.

【0012】図1および図2において、本発明の樹脂封
止型半導体装置1は、ダイパッド2の表面2a側に電気
絶縁性の接着剤層7を介して半導体素子8がその端子面
と反対の面を固着され搭載されている。搭載されている
半導体素子8の端子8aは、半導体素子8の各辺に沿っ
て配置されている。
1 and 2, in a resin-encapsulated semiconductor device 1 of the present invention, a semiconductor element 8 is provided on an upper surface 2a side of a die pad 2 with an electrically insulating adhesive layer 7 opposite to a terminal surface thereof. The surface is fixed and mounted. The terminals 8 a of the mounted semiconductor element 8 are arranged along each side of the semiconductor element 8.

【0013】ダイパッド2は、端子部4が二次元的に配
置されている平面の略中央に端子部4から電気的に独立
して配置されている。このダイパッド2は端子部4に比
べて肉薄であり、通常、30〜125μm程度の範囲と
することができる。また、ダイパッド2の表面2aは、
後述する端子部4の内部端子4Aの表面と略一平面をな
している。尚、図示例では、ダイパッド2の四隅から吊
りリード5が、端子部4が二次元的に配置されている平
面内に電気的に独立して延びている。
The die pad 2 is arranged at substantially the center of the plane on which the terminal portions 4 are two-dimensionally arranged, independently of the terminal portions 4. The die pad 2 is thinner than the terminal portion 4 and can usually have a thickness of about 30 to 125 μm. The surface 2a of the die pad 2
It is substantially flush with the surface of an internal terminal 4A of the terminal portion 4 described later. In the illustrated example, the suspension leads 5 extend electrically independently from the four corners of the die pad 2 within a plane where the terminal portions 4 are two-dimensionally arranged.

【0014】また、端子部4は、表面側に内部端子4A
を裏面側に外部端子4Bを表裏一対的に有しており、各
端子部4は略一平面内に二次元的に互いに電気的に独立
して配置されている。端子部4の厚みは、通常、80〜
250μm程度の範囲とすることができる。尚、図示例
では、各端子部4の内部端子4A上に銀めっき層6が設
けられ、また、各端子部4には、接続リード3が半導体
装置の外側に向かって延びている。
The terminal section 4 has an internal terminal 4A on the front side.
The external terminals 4B are paired on the back side, and the terminal portions 4 are two-dimensionally and electrically independent of each other in a substantially one plane. The thickness of the terminal portion 4 is usually 80 to
It can be in the range of about 250 μm. In the illustrated example, a silver plating layer 6 is provided on the internal terminal 4A of each terminal portion 4, and a connection lead 3 extends toward the outside of the semiconductor device at each terminal portion 4.

【0015】上記のダイパッド2の裏面2bは、外部端
子4Bの表面に対して凹部を形成するようにして外部に
露出している。したがって、ダイパッド2の裏面2b
は、樹脂封止型半導体装置1の裏面よりも半導体装置内
部側に位置することになる。このようなダイパッド2の
裏面2bの凹部の程度(ダイパッド2の裏面2bと外部
端子4Bの表面との段差)は、25〜220μm程度の
範囲で設定することができる。
The back surface 2b of the die pad 2 is exposed to the outside so as to form a recess with respect to the surface of the external terminal 4B. Therefore, the back surface 2b of the die pad 2
Are located inside the semiconductor device with respect to the back surface of the resin-sealed semiconductor device 1. The degree of the recess on the back surface 2b of the die pad 2 (the step between the back surface 2b of the die pad 2 and the surface of the external terminal 4B) can be set in a range of about 25 to 220 μm.

【0016】上述のようなダイパッド2、端子部4の材
質は、42合金(Ni41%のFe合金)、銅、銅合金
等とすることができる。また、ダイパッド2や端子部4
の封止部材10との接触部位の少なくとも一部にパラジ
ウムめっき層を介在させてもよい。また、材質が銅、銅
合金である場合、ニッケルめっき層を介してパラジウム
めっき層を設けてもよい。このようにパラジウムめっき
層を設けることにより、封止部材10の密着性が大幅に
向上する。
The material of the die pad 2 and the terminal portion 4 as described above can be 42 alloy (Ni 41% Fe alloy), copper, copper alloy or the like. Also, the die pad 2 and the terminal 4
A palladium plating layer may be interposed in at least a part of the contact portion with the sealing member 10. When the material is copper or a copper alloy, a palladium plating layer may be provided via a nickel plating layer. By providing the palladium plating layer in this manner, the adhesion of the sealing member 10 is greatly improved.

【0017】ダイパッド2に搭載されている半導体素子
8の各端子8aは、端子部4の内部端子4A(銀めっき
層6)にボンディングワイヤ9によって接続されてい
る。そして、ダイパッド2の裏面2bおよび外部端子4
Bの一部を外部に露出させるようにダイパッド2、接続
リード3、端子部4、吊りリード5、半導体素子8およ
びボンディングワイヤ9が封止部材10により封止され
ている。封止部材10は、樹脂封止型半導体装置に使用
されている公知の樹脂材料、例えば、ビフェニル系エポ
キシ樹脂等を用いて形成することができる。
Each terminal 8a of the semiconductor element 8 mounted on the die pad 2 is connected to an internal terminal 4A (silver plating layer 6) of the terminal portion 4 by a bonding wire 9. Then, the back surface 2b of the die pad 2 and the external terminals 4
The die pad 2, the connection leads 3, the terminal portions 4, the suspension leads 5, the semiconductor element 8, and the bonding wires 9 are sealed by a sealing member 10 so that part of B is exposed to the outside. The sealing member 10 can be formed using a known resin material used for a resin-sealed semiconductor device, for example, a biphenyl-based epoxy resin or the like.

【0018】このような樹脂封止型半導体装置1では、
ダイパッド2の裏面2bが樹脂封止型半導体装置1の裏
面よりも半導体装置内部側に位置するので、半田ボール
を使用しないLGA(Land Grid Arra
y)のような回路基板への樹脂封止型半導体装置の実装
において、ダイパッド2が回路基板等に接触することが
防止される。このため、実装高さを高度に制御する必要
がなくなり実装性が大幅に向上する。
In such a resin-sealed semiconductor device 1,
Since the back surface 2b of the die pad 2 is located closer to the inside of the semiconductor device than the back surface of the resin-sealed semiconductor device 1, an LGA (land grid array) that does not use solder balls is used.
In mounting the resin-encapsulated semiconductor device on the circuit board as in y), the die pad 2 is prevented from contacting the circuit board or the like. For this reason, it is not necessary to control the mounting height at a high level, and the mountability is greatly improved.

【0019】また、本発明の樹脂封止型半導体装置1
は、図3に示すように、外部に露出している外部端子4
Bに半田からなる外部電極11を設けることができる。
これにより、BGA(Ball Grid Arra
y)タイプの半導体装置となる。
Further, the resin-sealed semiconductor device 1 of the present invention
Is an external terminal 4 exposed to the outside as shown in FIG.
An external electrode 11 made of solder can be provided on B.
Thereby, BGA (Ball Grid Arra)
It becomes a y) type semiconductor device.

【0020】さらに、本発明の樹脂封止型半導体装置
は、パッケージの下面から端子をとるというエリアアレ
ータイプであるため、パッケージサイズと回路基板への
実装に必要な面積が同一であり、高密度の基板実装が可
能である。尚、上述の樹脂封止型半導体装置1における
端子数、端子配列等は例示であり、本発明の樹脂封止型
半導体装置がこれに限定されないことは勿論である。
Furthermore, since the resin-sealed semiconductor device of the present invention is an area array type in which terminals are taken from the lower surface of the package, the package size and the area required for mounting on a circuit board are the same, Can be mounted on a substrate. The number of terminals, the terminal arrangement, and the like in the above-described resin-sealed semiconductor device 1 are merely examples, and the resin-sealed semiconductor device of the present invention is not limited thereto.

【0021】次に、本発明の樹脂封止型半導体装置の製
造方法について説明する。図4と図5は、図1および図
2に示される本発明の樹脂封止型半導体装置1の製造の
一例を示す工程図である。各工程は、上記の図2に対応
する縦断面図で示してある。
Next, a method for manufacturing the resin-sealed semiconductor device of the present invention will be described. 4 and 5 are process diagrams showing an example of manufacturing the resin-sealed semiconductor device 1 of the present invention shown in FIGS. 1 and 2. Each step is shown in a longitudinal sectional view corresponding to FIG. 2 described above.

【0022】まず、導電性基板20の表裏に感光性レジ
ストを塗布、乾燥し、これを所望のフォトマスクを介し
て露光した後、現像してレジストパターン31A,31
Bを形成する(図4(A))。導電性基板20として
は、上述のように42合金(Ni41%のFe合金)、
銅、銅合金等の金属基板(厚み100〜250μm)を
使用することができ、この導電性基板20は、両面を脱
脂等を行い洗浄処理を施したものを使用することが好ま
しい。また、感光性レジストとしては、従来公知のもの
を使用することができる。
First, a photosensitive resist is applied to the front and back surfaces of the conductive substrate 20, dried, exposed through a desired photomask, and then developed to form resist patterns 31A and 31A.
B is formed (FIG. 4A). As the conductive substrate 20, as described above, 42 alloy (Fe alloy of 41% Ni),
A metal substrate (thickness: 100 to 250 μm) of copper, a copper alloy, or the like can be used. It is preferable to use a conductive substrate 20 that has been subjected to a degreasing process and a cleaning process on both surfaces. Further, as the photosensitive resist, conventionally known ones can be used.

【0023】次に、レジストパターン31A,31Bを
耐腐蝕膜として導電性基板20に腐蝕液でエッチングを
行う(図4(B))。腐蝕液は、使用する導電性基板2
0の材質に応じて適宜選択することができ、例えば、導
電性基板20として42合金を用いる場合、通常、塩化
第二鉄水溶液を使用し、導電性基板20の両面からスプ
レーエッチングにて行う。このエッチング工程における
エッチング量は、導電性基板の両面からエッチングされ
る部位では厚み方向で貫通し、導電性基板の一方の面か
らのみエッチングされる部位では厚み方向の約半分が残
るような程度とする。
Next, the conductive substrate 20 is etched with a corrosion liquid using the resist patterns 31A and 31B as a corrosion-resistant film (FIG. 4B). The corrosion liquid is used for the conductive substrate 2
For example, when a 42 alloy is used as the conductive substrate 20, it is usually spray-etched from both surfaces of the conductive substrate 20 using an aqueous ferric chloride solution. The amount of etching in this etching step is such that the portion penetrated in the thickness direction at the portion etched from both surfaces of the conductive substrate, and about half of the thickness direction remains at the portion etched only from one surface of the conductive substrate. I do.

【0024】次いで、レジストパターン31A,31B
を剥離して除去することにより、端子部24が接続リー
ド23により外枠部材21に一体的に連結され、外枠部
材21の所定位置から吊りリード(図示せず)により支
持されたダイパッド22を備えたリードフレーム20′
が得られる(図4(C))。このリードフレーム20′
では、ダイパッド22は端子部24に比べて薄肉(接続
リード23と同じ厚み)である。また、端子部24は表
面側に内部端子24Aを裏面側に外部端子24Bを表裏
一対的に有しており、ダイパッド22の表面22aは、
端子部24の内部端子24Aの表面と略一平面をなして
いる。
Next, the resist patterns 31A, 31B
The terminal portion 24 is integrally connected to the outer frame member 21 by the connection lead 23, and the die pad 22 supported by the suspension lead (not shown) from a predetermined position of the outer frame member 21 is removed. Lead frame 20 'provided
Is obtained (FIG. 4C). This lead frame 20 '
In this case, the die pad 22 is thinner (same thickness as the connection lead 23) than the terminal portion 24. Further, the terminal portion 24 has a pair of internal terminals 24A on the front side and external terminals 24B on the back side in a pair, and the front surface 22a of the die pad 22 has
It is substantially flush with the surface of the internal terminal 24A of the terminal portion 24.

【0025】尚、上記のリードフレーム20′は、後述
する半導体装置製造の封止工程で封止部材10により封
止される領域の少なくとも一部にパラジウムめっき層を
備えるものでもよい。この場合、リードフレームの表面
に粗面化処理を施し、その上にパラジウムめっき層を形
成することが好ましい。上記の粗面化処理は、リードフ
レームの表面を有機酸系等のエッチング液で腐食して微
細凹凸を形成する化学研磨処理が挙げられるが、これに
限定されるものではない。また、リードフレームの材質
が銅、銅合金である場合、ニッケルめっき層を介してパ
ラジウムめっき層を形成してもよい。
The lead frame 20 'may be provided with a palladium plating layer on at least a part of a region sealed by the sealing member 10 in a sealing step of manufacturing a semiconductor device described later. In this case, it is preferable to perform a surface roughening treatment on the surface of the lead frame and form a palladium plating layer thereon. The above-mentioned roughening treatment includes, but is not limited to, chemical polishing treatment in which the surface of the lead frame is corroded with an etching solution such as an organic acid to form fine irregularities. When the material of the lead frame is copper or a copper alloy, a palladium plating layer may be formed via a nickel plating layer.

【0026】次に、端子部24の内部端子24Aの位置
に銀めっき層6を形成し、ダイパッド22の表面側22
aに電気絶縁性の接着剤層7を形成し、この接着剤層7
を介して半導体素子8の回路形成面の裏面側を固着する
ことにより、半導体素子8を搭載する(図5(A))。
Next, a silver plating layer 6 is formed at the position of the internal terminal 24 A of the terminal portion 24,
a, an electrically insulating adhesive layer 7 is formed on the adhesive layer 7;
The semiconductor element 8 is mounted by fixing the back surface side of the circuit forming surface of the semiconductor element 8 through the substrate (FIG. 5A).

【0027】次いで、搭載した半導体素子8の端子8a
と、リードフレーム20′の内部端子24A上の銀めっ
き層6とを、ボンディングワイヤ9で電気的に接続し、
ダイパッド22の裏面22bと外部端子24Bの一部と
を外部に露出させるようにして、ダイパッド22、端子
部24、接続リード23、吊りリード(図示せず)、半
導体素子8およびボンディングワイヤ9を封止部材10
で封止する(図5(B))。この封止工程では、例え
ば、モールド金型に凸部を設け、この凸部をダイパッド
裏面に当接させてダイパッド裏面が封止部材10により
封止されることを防止することができる。
Next, the terminal 8a of the mounted semiconductor element 8
And the silver plating layer 6 on the internal terminals 24A of the lead frame 20 'are electrically connected by bonding wires 9,
The back surface 22b of the die pad 22 and a part of the external terminal 24B are exposed to the outside so that the die pad 22, the terminal portion 24, the connection lead 23, the suspension lead (not shown), the semiconductor element 8 and the bonding wire 9 are sealed. Stop member 10
(FIG. 5B). In the sealing step, for example, a convex portion is provided on the mold, and the convex portion is brought into contact with the rear surface of the die pad to prevent the rear surface of the die pad from being sealed by the sealing member 10.

【0028】次に、封止部材10から露出しているリー
ドフレーム20′の各接続リード23と各吊りリードを
切断し外枠部材21を除去して、本発明の半導体装置1
とする(図5(C))。
Next, each connection lead 23 and each suspension lead of the lead frame 20 ′ exposed from the sealing member 10 are cut, and the outer frame member 21 is removed.
(FIG. 5C).

【0029】[0029]

【実施例】次に、具体的な実施例を挙げて本発明を更に
詳細に説明する。
Next, the present invention will be described in more detail with reference to specific examples.

【0030】(実施例)まず、導電性基板として厚み
0.15mmの銅合金板(古河電気工業(株)製EFT
EC64T−1/2H)を準備し、脱脂処理、洗浄処理
を行った後、この銅合金板の両面に耐エッチング性の紫
外線硬化型レジスト(東京応化工業(株)製 PME
R)を塗布して乾燥した。次いで、表面側および裏面側
のレジスト層をそれぞれ所定のフォトマスクを介して露
光した後、現像してレジストパターンを形成した。その
後、銅合金板の両面から塩化第二鉄水溶液を使用してス
プレーエッチングを行った。このエッチングは、ダイパ
ッド部位の厚みが50μmとなる程度とした。次いで、
洗浄後、有機アルカリ溶液を用いてレジストパターンを
剥離除去した。これにより、外枠部材と、外枠部材の所
定位置から吊りリードにより支持されたダイパッドと、
外枠部材に接続リードにより一体的に連結された複数の
端子部とを備えたリードフレームが得られた。
EXAMPLE First, a copper alloy plate having a thickness of 0.15 mm (EFT manufactured by Furukawa Electric Co., Ltd.) was used as a conductive substrate.
EC64T-1 / 2H), and after performing degreasing and cleaning treatments, an etching-resistant UV-curable resist (PME manufactured by Tokyo Ohka Kogyo Co., Ltd.) is provided on both surfaces of the copper alloy plate.
R) was applied and dried. Next, the resist layers on the front side and the back side were respectively exposed through a predetermined photomask, and then developed to form a resist pattern. Thereafter, spray etching was performed from both sides of the copper alloy plate using an aqueous ferric chloride solution. This etching was performed so that the thickness of the die pad portion became 50 μm. Then
After the washing, the resist pattern was peeled off using an organic alkali solution. Thereby, the outer frame member, the die pad supported by the suspension lead from a predetermined position of the outer frame member,
A lead frame including a plurality of terminals integrally connected to the outer frame member by connection leads was obtained.

【0031】次に、上記のリードフレームの全面にニッ
ケルめっき層(厚み5μm)を形成し、この上からパラ
ジウムめっき層(厚み1μm)を形成した。
Next, a nickel plating layer (thickness: 5 μm) was formed on the entire surface of the lead frame, and a palladium plating layer (thickness: 1 μm) was formed thereon.

【0032】次いで、上述のように作製したリードフレ
ームのダイパッド上に、ダイボンド剤(エイブルスティ
ック(株)製 エイブルボンド84−1LMI)を用い
て半導体素子の回路形成面の反対側を圧着して搭載し
た。その後、リードフレームの内部端子と、搭載した半
導体素子の端子とを金ワイヤー(田中電子工業(株)製
FA−30)により結線した。
Next, the opposite side of the circuit forming surface of the semiconductor element is crimped and mounted on the die pad of the lead frame manufactured as described above using a die bonding agent (Able Bond 84-1 LMI manufactured by Able Stick Co., Ltd.). did. Thereafter, the internal terminal of the lead frame and the terminal of the mounted semiconductor element were connected by a gold wire (FA-30 manufactured by Tanaka Electronics Industry Co., Ltd.).

【0033】次に、ダイパッドの裏面と端子部の外部端
子面を外部に露出させるようにして、ダイパッド、端子
部、半導体素子および金ワイヤーを樹脂材料(日東電工
(株)製MP−7400)で封止した。この封止工程で
は、モールド金型に凸部を設け、この凸部をダイパッド
裏面に当接させることにより、ダイパッド裏面に樹脂材
料が流れ込まないようにした。
Next, the back surface of the die pad and the external terminal surface of the terminal portion are exposed to the outside, and the die pad, the terminal portion, the semiconductor element and the gold wire are made of a resin material (MP-7400 manufactured by Nitto Denko Corporation). Sealed. In this sealing step, a convex portion was provided on the mold and the convex portion was brought into contact with the rear surface of the die pad to prevent the resin material from flowing into the rear surface of the die pad.

【0034】次に、リードフレームの外枠部材をプレス
により除去して、樹脂封止型半導体装置を得た。この樹
脂封止型半導体装置は、外部端子数が72ピンであり、
その外形寸法は10mm四方、厚みが0.8mmであ
り、非常に小型で薄いものであった。また、ダイパッド
の裏面は、樹脂封止型半導体装置の裏面よりも約100
μm凹んだものであった。
Next, the outer frame member of the lead frame was removed by pressing to obtain a resin-sealed semiconductor device. This resin-encapsulated semiconductor device has 72 external terminals,
Its external dimensions were 10 mm square and 0.8 mm thick, and it was very small and thin. Also, the back surface of the die pad is approximately 100 times smaller than the back surface of the resin-encapsulated semiconductor device.
It was recessed by μm.

【0035】上述のように作製した樹脂封止型半導体装
置を、半田ボールを使用しないで回路基板に実装(LG
A:Land Grid Array)し、温度サイク
ル試験(−45℃から+125℃までの温度変化を60
分サイクルで繰り返す)を実施した結果、500サイク
ル経過しても何ら問題がなかった。
The resin-encapsulated semiconductor device manufactured as described above is mounted on a circuit board without using solder balls (LG
A: Land Grid Array, and a temperature cycle test (temperature change from -45 ° C to + 125 ° C
(Repeated every minute cycle), there was no problem even after 500 cycles.

【0036】(比較例1)実施例と同じリードフレーム
を使用し、ダイパッド裏面への樹脂材料の流れ込みを防
止せずに樹脂封止型半導体装置を作製した。このように
作製した樹脂封止型半導体装置のダイパッド裏面は、樹
脂部材に覆われた状態であった。
COMPARATIVE EXAMPLE 1 A resin-encapsulated semiconductor device was manufactured using the same lead frame as in the example, without preventing the resin material from flowing into the back surface of the die pad. The back surface of the die pad of the resin-encapsulated semiconductor device thus manufactured was in a state of being covered with the resin member.

【0037】この樹脂封止型半導体装置を、実施例と同
様に半田ボールを使用しないで回路基板に実装しようと
したところ、半田リフロー工程中にパッケージクラック
が発生した。
When this resin-encapsulated semiconductor device was mounted on a circuit board without using solder balls as in the embodiment, a package crack occurred during the solder reflow process.

【0038】(比較例2)ダイパッドの厚みが端子部と
同じ150μmである他は、実施例と同様のリードフレ
ームを作製し、このリードフレームを使用して樹脂封止
型半導体装置を作製した。このように作製した樹脂封止
型半導体装置のダイパッド裏面は、外部に露出し、か
つ、外部端子面と同一平面をなすものであった。この樹
脂封止型半導体装置を、実施例と同様に半田ボールを使
用しないで回路基板に実装(LGA:Land Gri
d Array)した。しかし、回路基板側のクリーム
半田の塗布量を、厚さが150μmとなるようにしたと
ころ、外部端子とタ゛イパッド裏面との間に半田のブリッ
ジが発生した。
Comparative Example 2 A lead frame similar to that of the example was prepared except that the thickness of the die pad was 150 μm, which was the same as that of the terminal portion, and a resin-sealed semiconductor device was prepared using this lead frame. The back surface of the die pad of the resin-encapsulated semiconductor device manufactured in this manner was exposed to the outside and was flush with the external terminal surface. This resin-encapsulated semiconductor device is mounted on a circuit board without using solder balls as in the embodiment (LGA: Land Gri)
d Array). However, when the application amount of the cream solder on the circuit board side was set to be 150 μm, a solder bridge occurred between the external terminal and the rear surface of the die pad.

【0039】[0039]

【発明の効果】以上詳述したように、本発明によれば半
導体素子の占有率が高くなり小型化が可能となって回路
基板への実装密度を向上させることができ、また、ダイ
パッドの裏面が外部端子の表面に対して凹部形状をなす
ので、半田ボールを使わないLGA(Land Gri
d Array)のような回路基板への樹脂封止型半導
体装置の実装において、ダイパッドが回路基板等に接触
することが防止され、実装高さを高度に制御する必要が
なくなり実装性が大幅に向上する。また、半導体装置内
の熱がダイパッドの裏面から有効に放出されるので、半
導体装置の高集積化、高機能化による多端子(ピン)化
においても信頼性の高いものとなる。
As described above in detail, according to the present invention, the occupancy of the semiconductor element is increased, the size of the semiconductor element can be reduced, and the mounting density on the circuit board can be improved. Has a concave shape with respect to the surface of the external terminal, so that an LGA (Land Gri)
d Array), when mounting a resin-sealed semiconductor device on a circuit board, the die pad is prevented from coming into contact with the circuit board, etc., and it is not necessary to control the mounting height to a high degree, and the mountability is greatly improved. I do. Further, since the heat in the semiconductor device is effectively released from the back surface of the die pad, the semiconductor device has high reliability even in the case where the number of terminals (pins) is increased due to high integration and high functionality of the semiconductor device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のリードフレームの一実施形態を示す平
面図である。
FIG. 1 is a plan view showing one embodiment of a lead frame of the present invention.

【図2】図1に示されるリードフレームのA−A線にお
ける縦断面図である。
FIG. 2 is a longitudinal sectional view taken along line AA of the lead frame shown in FIG.

【図3】本発明のリードフレームの他の実施形態を示す
縦断面図である。
FIG. 3 is a longitudinal sectional view showing another embodiment of the lead frame of the present invention.

【図4】本発明の樹脂封止型半導体装置の製造の一例を
示す工程図である。
FIG. 4 is a process chart showing an example of the production of the resin-sealed semiconductor device of the present invention.

【図5】本発明の樹脂封止型半導体装置の製造の一例を
示す工程図である。
FIG. 5 is a process chart showing an example of manufacturing the resin-sealed semiconductor device of the present invention.

【符号の説明】[Explanation of symbols]

1…樹脂封止型半導体装置 2…ダイパッド 2b…ダイパッド裏面 4…端子部 4A…内部端子 4B…外部端子 8…半導体素子 8a…端子 9…ワイヤ 10…封止部材 11…外部電極 DESCRIPTION OF SYMBOLS 1 ... Resin sealing type semiconductor device 2 ... Die pad 2b ... Die pad back surface 4 ... Terminal part 4A ... Internal terminal 4B ... External terminal 8 ... Semiconductor element 8a ... Terminal 9 ... Wire 10 ... Sealing member 11 ... External electrode

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // H01L 23/12 H01L 23/12 L Fターム(参考) 4M109 AA01 BA01 CA21 DA04 DA09 DA10 DB03 FA04 5F061 AA01 BA01 CA21 DA06 DD12 5F067 AA01 AA13 AB04 BB01 BC07 BC12 BD05 BE00 DA16 DF03 EA04 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // H01L 23/12 H01L 23/12 L F term (Reference) 4M109 AA01 BA01 CA21 DA04 DA09 DA10 DB03 FA04 5F061 AA01 BA01 CA21 DA06 DD12 5F067 AA01 AA13 AB04 BB01 BC07 BC12 BD05 BE00 DA16 DF03 EA04

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 表面側に内部端子を裏面側に外部端子を
表裏一体的に有する複数の端子部を略一平面内に二次元
的に互いに電気的に独立して配置し、端子部の内部端子
と半導体素子の端子とをワイヤにて電気的に接続し、各
端子部の外部端子の一部を外部に露出させるように全体
を樹脂封止した樹脂封止型半導体装置において、 複数個の前記端子部を二次元的に配置する平面の略中央
部にダイパッドが電気的に独立して配置され、該ダイパ
ッドの表面に前記半導体素子が搭載され、前記ダイパッ
ドの裏面は前記外部端子の表面に対して凹部を形成する
ようにして外部に露出していることを特徴とする樹脂封
止型半導体装置。
A plurality of terminal portions having an internal terminal on a front surface side and an external terminal on a back surface integrated front and back are two-dimensionally and electrically independent from each other in a substantially one plane. In the resin-encapsulated semiconductor device in which the terminals and the terminals of the semiconductor element are electrically connected by wires, and the entirety of the external terminals of each terminal portion is resin-encapsulated so as to expose a part of the external terminals, A die pad is electrically independently arranged at a substantially central portion of a plane in which the terminal portions are two-dimensionally arranged, the semiconductor element is mounted on a surface of the die pad, and a back surface of the die pad is formed on a surface of the external terminal. A resin-sealed semiconductor device, which is exposed to the outside so as to form a recess.
【請求項2】 前記ダイパッドは前記端子部に比べて薄
肉であり、かつ、表面が前記端子部の内部端子の表面と
略一平面をなすことを特徴とする請求項1に記載の樹脂
封止型半導体装置。
2. The resin encapsulation according to claim 1, wherein the die pad is thinner than the terminal portion, and has a surface substantially flush with a surface of an internal terminal of the terminal portion. Type semiconductor device.
【請求項3】 外部に露出している前記外部端子の表面
に半田からなる外部電極を備えることを特徴とする請求
項1または請求項2に記載の樹脂封止型半導体装置。
3. The resin-encapsulated semiconductor device according to claim 1, further comprising an external electrode made of solder on a surface of the external terminal exposed to the outside.
JP13670499A 1999-05-18 1999-05-18 Resin-sealed semiconductor device Pending JP2000332162A (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13670499A JP2000332162A (en) 1999-05-18 1999-05-18 Resin-sealed semiconductor device

Publications (1)

Publication Number Publication Date
JP2000332162A true JP2000332162A (en) 2000-11-30

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Country Status (1)

Country Link
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