JP2000252244A - 金属用研磨液及びそれを用いた研磨方法 - Google Patents
金属用研磨液及びそれを用いた研磨方法Info
- Publication number
- JP2000252244A JP2000252244A JP36884899A JP36884899A JP2000252244A JP 2000252244 A JP2000252244 A JP 2000252244A JP 36884899 A JP36884899 A JP 36884899A JP 36884899 A JP36884899 A JP 36884899A JP 2000252244 A JP2000252244 A JP 2000252244A
- Authority
- JP
- Japan
- Prior art keywords
- water
- metal
- polishing
- weight
- solubility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36884899A JP2000252244A (ja) | 1998-12-28 | 1999-12-27 | 金属用研磨液及びそれを用いた研磨方法 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP10-372606 | 1998-12-28 | ||
| JP37260698 | 1998-12-28 | ||
| JP36884899A JP2000252244A (ja) | 1998-12-28 | 1999-12-27 | 金属用研磨液及びそれを用いた研磨方法 |
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| JP2000252244A true JP2000252244A (ja) | 2000-09-14 |
| JP2000252244A5 JP2000252244A5 (enExample) | 2007-02-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP36884899A Pending JP2000252244A (ja) | 1998-12-28 | 1999-12-27 | 金属用研磨液及びそれを用いた研磨方法 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001048114A1 (en) * | 1999-12-27 | 2001-07-05 | Showa Denko K.K. | Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby |
| JP2006203188A (ja) * | 2004-12-22 | 2006-08-03 | Showa Denko Kk | 研磨組成物及び研磨方法 |
| US7250369B1 (en) * | 1998-12-28 | 2007-07-31 | Hitachi, Ltd. | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
-
1999
- 1999-12-27 JP JP36884899A patent/JP2000252244A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7250369B1 (en) * | 1998-12-28 | 2007-07-31 | Hitachi, Ltd. | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| US7799686B2 (en) | 1998-12-28 | 2010-09-21 | Hitachi, Ltd. | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| US8226849B2 (en) | 1998-12-28 | 2012-07-24 | Hitachi, Ltd. | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| WO2001048114A1 (en) * | 1999-12-27 | 2001-07-05 | Showa Denko K.K. | Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby |
| JP2006203188A (ja) * | 2004-12-22 | 2006-08-03 | Showa Denko Kk | 研磨組成物及び研磨方法 |
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