JP2000251222A - 複合型薄膜磁気ヘッドの製造方法およびそれに用いるウエファ - Google Patents
複合型薄膜磁気ヘッドの製造方法およびそれに用いるウエファInfo
- Publication number
- JP2000251222A JP2000251222A JP11051072A JP5107299A JP2000251222A JP 2000251222 A JP2000251222 A JP 2000251222A JP 11051072 A JP11051072 A JP 11051072A JP 5107299 A JP5107299 A JP 5107299A JP 2000251222 A JP2000251222 A JP 2000251222A
- Authority
- JP
- Japan
- Prior art keywords
- film magnetic
- thin film
- magnetic head
- polishing amount
- amount monitoring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49037—Using reference point/surface to facilitate measuring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49041—Fabricating head structure or component thereof including measuring or testing with significant slider/housing shaping or treating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49044—Plural magnetic deposition layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/4906—Providing winding
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Magnetic Heads (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11051072A JP2000251222A (ja) | 1999-02-26 | 1999-02-26 | 複合型薄膜磁気ヘッドの製造方法およびそれに用いるウエファ |
| US09/511,713 US6557241B1 (en) | 1999-02-26 | 2000-02-23 | Method of manufacturing combination type thin film magnetic head and wafer for use therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11051072A JP2000251222A (ja) | 1999-02-26 | 1999-02-26 | 複合型薄膜磁気ヘッドの製造方法およびそれに用いるウエファ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000251222A true JP2000251222A (ja) | 2000-09-14 |
| JP2000251222A5 JP2000251222A5 (enExample) | 2005-07-21 |
Family
ID=12876619
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11051072A Pending JP2000251222A (ja) | 1999-02-26 | 1999-02-26 | 複合型薄膜磁気ヘッドの製造方法およびそれに用いるウエファ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6557241B1 (enExample) |
| JP (1) | JP2000251222A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7854060B2 (en) | 2007-12-06 | 2010-12-21 | Tdk Corporation | Magnetic head substructure for use for manufacturing a magnetic head |
| US8213117B2 (en) | 2010-06-04 | 2012-07-03 | Tdk Corporation | Magnetic head with protective layer and a protective film removal method for the magnetic head |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6591480B1 (en) * | 2000-05-12 | 2003-07-15 | Headway Technologies, Inc. | Process for fabricating a flux concentrating stitched head |
| US6694201B1 (en) * | 2000-08-17 | 2004-02-17 | Industrial Technology Research Institute | Supervisory parallel switching device for computer integrated manufacturing system with secs-compliant serial communication links |
| JP3847068B2 (ja) * | 2000-09-11 | 2006-11-15 | アルプス電気株式会社 | 薄膜磁気ヘッド及びその製造方法 |
| US7588884B2 (en) * | 2004-05-28 | 2009-09-15 | Hitachi Global Storage Technologies Netherlands B.V. | Method for enhancing wafer alignment marks |
| US7433151B2 (en) * | 2004-12-28 | 2008-10-07 | Headway Technologies, Inc. | Method of manufacturing magnetic head using magnetic head sub-structure with indicators for indicating the location of the ABS |
| JP2006209905A (ja) * | 2005-01-31 | 2006-08-10 | Toshiba Corp | 垂直磁気ヘッドが形成されたローバーのラッピング方法およびラッピング装置 |
| US7369361B2 (en) * | 2005-02-07 | 2008-05-06 | Headway Technologies, Inc. | Magnetic head and magnetic head substructure including resistor element whose resistance corresponds to the length of the track width defining portion of the pole layer |
| US9287344B2 (en) * | 2010-08-23 | 2016-03-15 | The Hong Kong University Of Science And Technology | Monolithic magnetic induction device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5229607B2 (enExample) * | 1972-01-01 | 1977-08-03 | ||
| US4689877A (en) | 1985-08-29 | 1987-09-01 | International Business Machines Corp. | Method and apparatus for controlling the throat height of batch fabricated thin film magnetic transducers |
| US5065483A (en) | 1991-02-19 | 1991-11-19 | International Business Machines Corporation | Method of lapping magnetic recording heads |
-
1999
- 1999-02-26 JP JP11051072A patent/JP2000251222A/ja active Pending
-
2000
- 2000-02-23 US US09/511,713 patent/US6557241B1/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7854060B2 (en) | 2007-12-06 | 2010-12-21 | Tdk Corporation | Magnetic head substructure for use for manufacturing a magnetic head |
| US8213117B2 (en) | 2010-06-04 | 2012-07-03 | Tdk Corporation | Magnetic head with protective layer and a protective film removal method for the magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| US6557241B1 (en) | 2003-05-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7287316B2 (en) | Lapping monitor device, system and method | |
| JP2006048806A (ja) | 磁気ヘッドとその製造方法 | |
| JPH11195207A (ja) | 複合型薄膜磁気ヘッドおよびその製造方法 | |
| US20040184192A1 (en) | Head slider, head gimbal assembly, and hard disk drive | |
| JP3782228B2 (ja) | 複合型薄膜磁気ヘッドおよびその製造方法 | |
| JP3421983B2 (ja) | 複合型薄膜磁気ヘッドの製造方法 | |
| JP3576783B2 (ja) | 薄膜磁気ヘッドの製造方法 | |
| JP2000311311A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| JP3333816B2 (ja) | 複合型薄膜磁気ヘッドおよびその製造方法 | |
| JP2001060307A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| US6330743B1 (en) | Thin film magnetic head and method of manufacturing the same | |
| JPH11288503A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| JP2000187819A (ja) | 磁気ヘッド素子の製造方法 | |
| US6557241B1 (en) | Method of manufacturing combination type thin film magnetic head and wafer for use therefor | |
| JP2000293815A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| US6233813B1 (en) | Method of manufacturing thin film head | |
| JP2000030219A (ja) | 薄膜磁気ヘッドおよびその製造方法ならびに薄膜磁気ヘッド用素材およびその製造方法 | |
| JP2001034911A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| JP2000285421A (ja) | 薄膜磁気ヘッドおよびその製造方法ならびに薄膜磁気ヘッド用素材およびその製造方法 | |
| JP3553393B2 (ja) | 薄膜磁気ヘッドの製造方法 | |
| JP2001110009A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| JP2001052311A (ja) | 薄膜磁気ヘッドおよびその製造方法 | |
| US7854060B2 (en) | Magnetic head substructure for use for manufacturing a magnetic head | |
| US8117736B2 (en) | Method of lapping a magnetic head slider | |
| JPH11185217A (ja) | 複合型薄膜磁気ヘッドの製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041129 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041129 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060123 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060131 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060403 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20060808 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20061205 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20070119 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070329 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20070329 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20070828 |