JP2000208589A - 処理装置 - Google Patents

処理装置

Info

Publication number
JP2000208589A
JP2000208589A JP31233699A JP31233699A JP2000208589A JP 2000208589 A JP2000208589 A JP 2000208589A JP 31233699 A JP31233699 A JP 31233699A JP 31233699 A JP31233699 A JP 31233699A JP 2000208589 A JP2000208589 A JP 2000208589A
Authority
JP
Japan
Prior art keywords
cassette
transfer
chamber
load lock
load
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31233699A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000208589A5 (enExample
Inventor
Hiroaki Saeki
弘明 佐伯
Keiichi Matsushima
圭一 松島
Teruo Asakawa
輝雄 浅川
Masaki Narishima
正樹 成島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP31233699A priority Critical patent/JP2000208589A/ja
Publication of JP2000208589A publication Critical patent/JP2000208589A/ja
Publication of JP2000208589A5 publication Critical patent/JP2000208589A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP31233699A 1998-11-09 1999-11-02 処理装置 Pending JP2000208589A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31233699A JP2000208589A (ja) 1998-11-09 1999-11-02 処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33497498 1998-11-09
JP10-334974 1998-11-09
JP31233699A JP2000208589A (ja) 1998-11-09 1999-11-02 処理装置

Publications (2)

Publication Number Publication Date
JP2000208589A true JP2000208589A (ja) 2000-07-28
JP2000208589A5 JP2000208589A5 (enExample) 2006-12-14

Family

ID=26567119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31233699A Pending JP2000208589A (ja) 1998-11-09 1999-11-02 処理装置

Country Status (1)

Country Link
JP (1) JP2000208589A (enExample)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324829A (ja) * 2001-07-13 2002-11-08 Tokyo Electron Ltd 処理システム
US7090741B2 (en) 2001-08-31 2006-08-15 Tokyo Electron Limited Semiconductor processing system
CN1310301C (zh) * 2002-02-22 2007-04-11 东京毅力科创株式会社 半导体处理系统中的端口机构
KR100749546B1 (ko) 2006-07-04 2007-08-14 세메스 주식회사 반도체 기판의 이송 장치, 기판 처리 장치, 그리고 이를이용한 기판의 온도 제어 방법
KR100749755B1 (ko) 2006-02-10 2007-08-16 주식회사 싸이맥스 웨이퍼 처리장치
CN100336634C (zh) * 2002-11-27 2007-09-12 东京毅力科创株式会社 输送系统的输送位置对准方法
JP2007533167A (ja) * 2004-04-16 2007-11-15 アクセリス テクノロジーズ インコーポレーテッド ワークピース処理システム
US7351291B2 (en) 2002-02-20 2008-04-01 Tokyo Electron Limited Semiconductor processing system
JP2009076705A (ja) * 2007-09-21 2009-04-09 Tokyo Electron Ltd ロードロック装置および真空処理システム
JP2010087177A (ja) * 2008-09-30 2010-04-15 Tokyo Electron Ltd 搬送機構の制御方法、基板処理装置、及び記憶媒体
US7857569B2 (en) 2002-02-25 2010-12-28 Tokyo Electron Limited Semiconductor processing system
JP2011009342A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd 基板処理装置の制御方法及び記憶媒体
KR101184596B1 (ko) 2010-12-22 2012-09-21 주식회사 원익아이피에스 기판 이송 장치 및 그 동작 방법
KR20140000265A (ko) 2010-12-09 2014-01-02 도쿄엘렉트론가부시키가이샤 로드록 장치
JP2014236193A (ja) * 2013-06-05 2014-12-15 Ｓｐｐテクノロジーズ株式会社 基板搬送装置、及びこれを用いた基板搬送方法
JP2016225625A (ja) * 2015-05-29 2016-12-28 ピーエスケー インコーポレイテッド 基板処理装置及び方法
US9541920B2 (en) 2012-10-15 2017-01-10 Tokyo Electron Limited Method for positioning a transfer unit, method for calculating positional deviation amount of an object to be processed, and method for correcting teaching data of the transfer unit
KR20170048200A (ko) 2015-10-26 2017-05-08 도쿄엘렉트론가부시키가이샤 로드록 장치에 있어서의 기판 냉각 방법, 기판 반송 방법, 및 로드록 장치
JPWO2016038656A1 (ja) * 2014-09-08 2017-06-01 株式会社安川電機 ロボットシステムおよび搬送方法
US20200388515A1 (en) * 2018-03-01 2020-12-10 Kokusai Electric Corporation Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
JP2023165990A (ja) * 2018-12-12 2023-11-17 東京エレクトロン株式会社 基板処理システム、搬送方法、搬送プログラムおよび保持具

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324829A (ja) * 2001-07-13 2002-11-08 Tokyo Electron Ltd 処理システム
US7090741B2 (en) 2001-08-31 2006-08-15 Tokyo Electron Limited Semiconductor processing system
US7351291B2 (en) 2002-02-20 2008-04-01 Tokyo Electron Limited Semiconductor processing system
CN1310301C (zh) * 2002-02-22 2007-04-11 东京毅力科创株式会社 半导体处理系统中的端口机构
US7857569B2 (en) 2002-02-25 2010-12-28 Tokyo Electron Limited Semiconductor processing system
CN100336634C (zh) * 2002-11-27 2007-09-12 东京毅力科创株式会社 输送系统的输送位置对准方法
JP2007533167A (ja) * 2004-04-16 2007-11-15 アクセリス テクノロジーズ インコーポレーテッド ワークピース処理システム
KR100749755B1 (ko) 2006-02-10 2007-08-16 주식회사 싸이맥스 웨이퍼 처리장치
KR100749546B1 (ko) 2006-07-04 2007-08-14 세메스 주식회사 반도체 기판의 이송 장치, 기판 처리 장치, 그리고 이를이용한 기판의 온도 제어 방법
JP2009076705A (ja) * 2007-09-21 2009-04-09 Tokyo Electron Ltd ロードロック装置および真空処理システム
JP2010087177A (ja) * 2008-09-30 2010-04-15 Tokyo Electron Ltd 搬送機構の制御方法、基板処理装置、及び記憶媒体
JP2011009342A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd 基板処理装置の制御方法及び記憶媒体
US9228685B2 (en) 2010-12-09 2016-01-05 Tokyo Electron Limited Load lock device
KR20140000265A (ko) 2010-12-09 2014-01-02 도쿄엘렉트론가부시키가이샤 로드록 장치
KR101184596B1 (ko) 2010-12-22 2012-09-21 주식회사 원익아이피에스 기판 이송 장치 및 그 동작 방법
US9541920B2 (en) 2012-10-15 2017-01-10 Tokyo Electron Limited Method for positioning a transfer unit, method for calculating positional deviation amount of an object to be processed, and method for correcting teaching data of the transfer unit
JP2014236193A (ja) * 2013-06-05 2014-12-15 Ｓｐｐテクノロジーズ株式会社 基板搬送装置、及びこれを用いた基板搬送方法
JPWO2016038656A1 (ja) * 2014-09-08 2017-06-01 株式会社安川電機 ロボットシステムおよび搬送方法
US10580676B2 (en) 2014-09-08 2020-03-03 Kabushiki Kaisha Yaskawa Denki Robot system and carrying method
JP2016225625A (ja) * 2015-05-29 2016-12-28 ピーエスケー インコーポレイテッド 基板処理装置及び方法
KR20170048200A (ko) 2015-10-26 2017-05-08 도쿄엘렉트론가부시키가이샤 로드록 장치에 있어서의 기판 냉각 방법, 기판 반송 방법, 및 로드록 장치
US10115611B2 (en) 2015-10-26 2018-10-30 Tokyo Electron Limited Substrate cooling method, substrate transfer method, and load-lock mechanism
US20200388515A1 (en) * 2018-03-01 2020-12-10 Kokusai Electric Corporation Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
JP2023165990A (ja) * 2018-12-12 2023-11-17 東京エレクトロン株式会社 基板処理システム、搬送方法、搬送プログラムおよび保持具
JP7520203B2 (ja) 2018-12-12 2024-07-22 東京エレクトロン株式会社 システム
TWI885951B (zh) * 2018-12-12 2025-06-01 日商東京威力科創股份有限公司 基板處理系統

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