JP2000171984A5 - - Google Patents
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- Publication number
- JP2000171984A5 JP2000171984A5 JP1999345425A JP34542599A JP2000171984A5 JP 2000171984 A5 JP2000171984 A5 JP 2000171984A5 JP 1999345425 A JP1999345425 A JP 1999345425A JP 34542599 A JP34542599 A JP 34542599A JP 2000171984 A5 JP2000171984 A5 JP 2000171984A5
- Authority
- JP
- Japan
- Prior art keywords
- ester
- alkyl
- formula
- alkyl group
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9826457.5 | 1998-12-03 | ||
| GBGB9826457.5A GB9826457D0 (en) | 1998-12-03 | 1998-12-03 | Development of radiation sensitive compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000171984A JP2000171984A (ja) | 2000-06-23 |
| JP2000171984A5 true JP2000171984A5 (https=) | 2007-01-25 |
Family
ID=10843498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11345425A Withdrawn JP2000171984A (ja) | 1998-12-03 | 1999-12-03 | 放射線感受性組成物の現像 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6146816A (https=) |
| EP (1) | EP1006412B1 (https=) |
| JP (1) | JP2000171984A (https=) |
| DE (1) | DE69909219T2 (https=) |
| GB (2) | GB9826457D0 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1854627A1 (en) * | 2006-05-12 | 2007-11-14 | Agfa Graphics N.V. | Method for making a lithographic printing plate |
| JP5405141B2 (ja) * | 2008-08-22 | 2014-02-05 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5171483B2 (ja) * | 2008-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5364513B2 (ja) * | 2008-09-12 | 2013-12-11 | 富士フイルム株式会社 | 平版印刷版原版用現像液及び平版印刷版の製造方法 |
| JP5358630B2 (ja) * | 2011-08-17 | 2013-12-04 | 富士フイルム株式会社 | レジストパターン形成方法、ナノインプリント用モールドの製造方法、及びフォトマスクの製造方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3707373A (en) * | 1969-03-17 | 1972-12-26 | Eastman Kodak Co | Lithographic plate developers |
| JPS62127737A (ja) * | 1985-11-28 | 1987-06-10 | Japan Synthetic Rubber Co Ltd | 現像液 |
| CA2019632A1 (en) * | 1989-06-29 | 1990-12-29 | Kazuhiro Shimura | Method of processing presensitized lithographic printing plate |
| JPH03174538A (ja) * | 1989-12-04 | 1991-07-29 | Konica Corp | 湿し水不要感光性平版印刷版及び該印刷版の製造方法 |
| DE4020372A1 (de) * | 1990-06-27 | 1992-01-02 | Basf Ag | Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten |
| DE4020373A1 (de) * | 1990-06-27 | 1992-01-02 | Basf Ag | Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten |
| EP0602736B1 (en) * | 1992-12-17 | 1997-11-05 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which exhibits reduced sludge formation |
| JP3358280B2 (ja) * | 1994-03-30 | 2002-12-16 | 東レ株式会社 | 感光性ポリイミド前駆体用現像液 |
| KR0178680B1 (ko) * | 1996-07-13 | 1999-04-01 | 윤종용 | 반도체장치 제조용의 포토레지스트 박리조성물 및 그를 이용한 반도체장치의 제조방법 |
-
1998
- 1998-12-03 GB GBGB9826457.5A patent/GB9826457D0/en not_active Ceased
-
1999
- 1999-11-18 GB GB9927188A patent/GB2347229A/en not_active Withdrawn
- 1999-12-02 EP EP99204085A patent/EP1006412B1/en not_active Expired - Lifetime
- 1999-12-02 DE DE69909219T patent/DE69909219T2/de not_active Expired - Lifetime
- 1999-12-03 JP JP11345425A patent/JP2000171984A/ja not_active Withdrawn
- 1999-12-03 US US09/453,723 patent/US6146816A/en not_active Expired - Lifetime
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