JP2000171984A - 放射線感受性組成物の現像 - Google Patents

放射線感受性組成物の現像

Info

Publication number
JP2000171984A
JP2000171984A JP11345425A JP34542599A JP2000171984A JP 2000171984 A JP2000171984 A JP 2000171984A JP 11345425 A JP11345425 A JP 11345425A JP 34542599 A JP34542599 A JP 34542599A JP 2000171984 A JP2000171984 A JP 2000171984A
Authority
JP
Japan
Prior art keywords
developer
negative
environment
acid
vol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11345425A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000171984A5 (https=
Inventor
Stephen David Rigby
スチーブン・デイビツド・リグビイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Publication of JP2000171984A publication Critical patent/JP2000171984A/ja
Publication of JP2000171984A5 publication Critical patent/JP2000171984A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11345425A 1998-12-03 1999-12-03 放射線感受性組成物の現像 Withdrawn JP2000171984A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9826457.5 1998-12-03
GBGB9826457.5A GB9826457D0 (en) 1998-12-03 1998-12-03 Development of radiation sensitive compositions

Publications (2)

Publication Number Publication Date
JP2000171984A true JP2000171984A (ja) 2000-06-23
JP2000171984A5 JP2000171984A5 (https=) 2007-01-25

Family

ID=10843498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11345425A Withdrawn JP2000171984A (ja) 1998-12-03 1999-12-03 放射線感受性組成物の現像

Country Status (5)

Country Link
US (1) US6146816A (https=)
EP (1) EP1006412B1 (https=)
JP (1) JP2000171984A (https=)
DE (1) DE69909219T2 (https=)
GB (2) GB9826457D0 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010054959A (ja) * 2008-08-29 2010-03-11 Fujifilm Corp 平版印刷版の作製方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1854627A1 (en) * 2006-05-12 2007-11-14 Agfa Graphics N.V. Method for making a lithographic printing plate
JP5405141B2 (ja) * 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
JP5364513B2 (ja) * 2008-09-12 2013-12-11 富士フイルム株式会社 平版印刷版原版用現像液及び平版印刷版の製造方法
JP5358630B2 (ja) * 2011-08-17 2013-12-04 富士フイルム株式会社 レジストパターン形成方法、ナノインプリント用モールドの製造方法、及びフォトマスクの製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
JPS62127737A (ja) * 1985-11-28 1987-06-10 Japan Synthetic Rubber Co Ltd 現像液
CA2019632A1 (en) * 1989-06-29 1990-12-29 Kazuhiro Shimura Method of processing presensitized lithographic printing plate
JPH03174538A (ja) * 1989-12-04 1991-07-29 Konica Corp 湿し水不要感光性平版印刷版及び該印刷版の製造方法
DE4020372A1 (de) * 1990-06-27 1992-01-02 Basf Ag Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten
DE4020373A1 (de) * 1990-06-27 1992-01-02 Basf Ag Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten
EP0602736B1 (en) * 1992-12-17 1997-11-05 Eastman Kodak Company Aqueous developer for lithographic printing plates which exhibits reduced sludge formation
JP3358280B2 (ja) * 1994-03-30 2002-12-16 東レ株式会社 感光性ポリイミド前駆体用現像液
KR0178680B1 (ko) * 1996-07-13 1999-04-01 윤종용 반도체장치 제조용의 포토레지스트 박리조성물 및 그를 이용한 반도체장치의 제조방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010054959A (ja) * 2008-08-29 2010-03-11 Fujifilm Corp 平版印刷版の作製方法

Also Published As

Publication number Publication date
DE69909219T2 (de) 2004-05-27
DE69909219D1 (de) 2003-08-07
GB9927188D0 (en) 2000-01-12
EP1006412B1 (en) 2003-07-02
GB9826457D0 (en) 1999-01-27
US6146816A (en) 2000-11-14
EP1006412A1 (en) 2000-06-07
GB2347229A (en) 2000-08-30

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