JP2000133194A5 - - Google Patents

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Publication number
JP2000133194A5
JP2000133194A5 JP1998308055A JP30805598A JP2000133194A5 JP 2000133194 A5 JP2000133194 A5 JP 2000133194A5 JP 1998308055 A JP1998308055 A JP 1998308055A JP 30805598 A JP30805598 A JP 30805598A JP 2000133194 A5 JP2000133194 A5 JP 2000133194A5
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JP
Japan
Prior art keywords
electron microscope
scanning electron
objective lens
voltage
negative voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP1998308055A
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English (en)
Japanese (ja)
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JP4236742B2 (ja
JP2000133194A (ja
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Publication date
Application filed filed Critical
Priority to JP30805598A priority Critical patent/JP4236742B2/ja
Priority claimed from JP30805598A external-priority patent/JP4236742B2/ja
Priority to US09/427,000 priority patent/US6444981B1/en
Publication of JP2000133194A publication Critical patent/JP2000133194A/ja
Priority to US10/174,053 priority patent/US6512228B2/en
Publication of JP2000133194A5 publication Critical patent/JP2000133194A5/ja
Application granted granted Critical
Publication of JP4236742B2 publication Critical patent/JP4236742B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP30805598A 1998-10-29 1998-10-29 走査形電子顕微鏡 Expired - Lifetime JP4236742B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP30805598A JP4236742B2 (ja) 1998-10-29 1998-10-29 走査形電子顕微鏡
US09/427,000 US6444981B1 (en) 1998-10-29 1999-10-26 Scanning electron microscope
US10/174,053 US6512228B2 (en) 1998-10-29 2002-06-19 Scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30805598A JP4236742B2 (ja) 1998-10-29 1998-10-29 走査形電子顕微鏡

Publications (3)

Publication Number Publication Date
JP2000133194A JP2000133194A (ja) 2000-05-12
JP2000133194A5 true JP2000133194A5 (enExample) 2005-01-06
JP4236742B2 JP4236742B2 (ja) 2009-03-11

Family

ID=17976350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30805598A Expired - Lifetime JP4236742B2 (ja) 1998-10-29 1998-10-29 走査形電子顕微鏡

Country Status (2)

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US (2) US6444981B1 (enExample)
JP (1) JP4236742B2 (enExample)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
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JP4236742B2 (ja) * 1998-10-29 2009-03-11 株式会社日立製作所 走査形電子顕微鏡
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JP2002056794A (ja) * 2000-08-08 2002-02-22 National Institute For Materials Science 電子顕微鏡用対物レンズ
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JP2003068241A (ja) * 2000-11-08 2003-03-07 Seiko Instruments Inc 走査型電子線装置
JP2003100246A (ja) * 2001-09-25 2003-04-04 Toshiba Corp 荷電ビーム装置並びにパターン測定方法およびパターン描画方法
JP3953309B2 (ja) * 2001-12-04 2007-08-08 株式会社トプコン 走査電子顕微鏡装置
JP2003297272A (ja) * 2002-04-04 2003-10-17 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
US7161149B2 (en) * 2002-06-28 2007-01-09 Jeol Ltd. Scanning electron microscope and method of controlling same
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JP4316394B2 (ja) * 2004-01-21 2009-08-19 株式会社東芝 荷電ビーム装置
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JP4262158B2 (ja) * 2004-07-13 2009-05-13 株式会社日立ハイテクサイエンスシステムズ 低真空走査電子顕微鏡
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JP4500646B2 (ja) * 2004-10-18 2010-07-14 株式会社日立ハイテクノロジーズ 試料観察方法及び電子顕微鏡
EP1657736B1 (en) * 2004-11-15 2016-12-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High current density particle beam system
JP2006004953A (ja) * 2005-08-24 2006-01-05 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
JP4616180B2 (ja) * 2006-01-20 2011-01-19 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP4686385B2 (ja) * 2006-03-14 2011-05-25 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5271491B2 (ja) * 2006-10-26 2013-08-21 株式会社日立ハイテクノロジーズ 電子線応用装置および試料検査方法
GB0700754D0 (en) * 2007-01-15 2007-02-21 Oxford Instr Analytical Ltd Charged particle analyser and method
JP4977509B2 (ja) * 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
GB0713276D0 (en) * 2007-07-09 2007-08-15 Medical Res Council Transmission electron microscope
JP2009128007A (ja) * 2007-11-19 2009-06-11 Tokyo Electron Ltd 検査装置、検査方法及び記憶媒体
JP5324270B2 (ja) * 2009-03-16 2013-10-23 日本電子株式会社 電子線装置
EP2365514B1 (en) * 2010-03-10 2015-08-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Twin beam charged particle column and method of operating thereof
KR101842101B1 (ko) * 2010-08-03 2018-03-26 가부시키가이샤 에바라 세이사꾸쇼 이물질 부착 방지 기능을 구비한 전자선 검사 장치 및 방법
JP5275396B2 (ja) * 2011-03-17 2013-08-28 株式会社東芝 電子ビーム照射装置
JP5663412B2 (ja) * 2011-06-16 2015-02-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5814741B2 (ja) * 2011-10-20 2015-11-17 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP6295027B2 (ja) * 2013-04-03 2018-03-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびそれを用いた計測方法
US10734191B2 (en) 2015-07-06 2020-08-04 Hitachi High-Tech Corporation Charged particle beam device
JP6865835B2 (ja) * 2017-08-24 2021-04-28 株式会社日立ハイテク 荷電粒子線装置およびそれを用いた観察方法、元素分析方法
CN111108579B (zh) * 2017-09-29 2022-10-04 株式会社日立高新技术 扫描电子显微镜
JP6950088B2 (ja) * 2018-05-22 2021-10-13 株式会社日立ハイテク 荷電粒子線装置及び荷電粒子線装置の検出器位置調整方法
US10770262B1 (en) * 2018-05-30 2020-09-08 National Technology & Engineering Solutions Of Sandia, Llc Apparatus, method and system for imaging and utilization of SEM charged particles
KR102385025B1 (ko) * 2020-03-18 2022-04-11 주식회사 모듈싸이 전자현미경의 이차전자와 후방산란전자 분리검출 시스템
US11183361B1 (en) * 2020-05-19 2021-11-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device and method for inspecting and/or imaging a sample
DE102020124307B4 (de) 2020-09-17 2026-01-29 Carl Zeiss Smt Gmbh Vorrichtung zum Analysieren und/oder Bearbeiten einer Probe mit einem Teilchenstrahl und Verfahren
CN114256043B (zh) * 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
SE544610C2 (en) * 2021-01-29 2022-09-20 Scienta Omicron Ab Angle-resolving photoelectron spectrometer and method
CN114284124A (zh) * 2021-02-02 2022-04-05 湖州超群电子科技有限公司 一种电子束辐照增强装置及其使用方法
JP2022170466A (ja) 2021-04-28 2022-11-10 株式会社日立ハイテク 荷電粒子ビームシステム
CN120660166A (zh) * 2023-04-20 2025-09-16 株式会社日立高新技术 带电粒子束装置
KR20250166833A (ko) * 2024-04-23 2025-11-28 씨아이큐텍 컴퍼니 리미티드 전자 검출장치 및 주사전자현미경
CN118098914B (zh) * 2024-04-23 2024-08-27 国仪量子技术(合肥)股份有限公司 电子探测装置和扫描电镜

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JPH03105837A (ja) * 1989-09-20 1991-05-02 Hitachi Ltd 走査電子顕微鏡及びその類似装置
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JP2927627B2 (ja) 1992-10-20 1999-07-28 株式会社日立製作所 走査電子顕微鏡
JPH0868772A (ja) * 1994-06-02 1996-03-12 Kla Instr Corp 電子ビーム・マイクロスコピーを用いた自動マスク検査装置及び方法
US5614833A (en) * 1994-10-25 1997-03-25 International Business Machines Corporation Objective lens with large field deflection system and homogeneous large area secondary electron extraction field
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JP3774953B2 (ja) * 1995-10-19 2006-05-17 株式会社日立製作所 走査形電子顕微鏡
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US5780859A (en) * 1996-02-16 1998-07-14 Act Advanced Circuit Testing Gesellschaft Electrostatic-magnetic lens arrangement
JPH09320505A (ja) * 1996-03-29 1997-12-12 Hitachi Ltd 電子線式検査方法及びその装置並びに半導体の製造方法及びその製造ライン
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JP3434165B2 (ja) * 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
US5789748A (en) * 1997-05-29 1998-08-04 Stanford University Low voltage electron beam system
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JP4236742B2 (ja) * 1998-10-29 2009-03-11 株式会社日立製作所 走査形電子顕微鏡

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