JP2000114536A - Soi半導体デバイス - Google Patents
Soi半導体デバイスInfo
- Publication number
- JP2000114536A JP2000114536A JP10283968A JP28396898A JP2000114536A JP 2000114536 A JP2000114536 A JP 2000114536A JP 10283968 A JP10283968 A JP 10283968A JP 28396898 A JP28396898 A JP 28396898A JP 2000114536 A JP2000114536 A JP 2000114536A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- gate electrode
- soi semiconductor
- transistor
- field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Semiconductor Memories (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10283968A JP2000114536A (ja) | 1998-10-06 | 1998-10-06 | Soi半導体デバイス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10283968A JP2000114536A (ja) | 1998-10-06 | 1998-10-06 | Soi半導体デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000114536A true JP2000114536A (ja) | 2000-04-21 |
| JP2000114536A5 JP2000114536A5 (enExample) | 2005-11-24 |
Family
ID=17672574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10283968A Pending JP2000114536A (ja) | 1998-10-06 | 1998-10-06 | Soi半導体デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000114536A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020096684A (ko) * | 2001-06-21 | 2002-12-31 | 주식회사 하이닉스반도체 | 트랜지스터의 게이트 라인 구조 |
| JP2005317851A (ja) * | 2004-04-30 | 2005-11-10 | Toshiba Matsushita Display Technology Co Ltd | 薄膜トランジスタおよびその製造方法 |
| US7279749B2 (en) | 2003-09-01 | 2007-10-09 | Seiko Epson Corporation | Semiconductor device and semiconductor memory using the same |
| JP2011134784A (ja) * | 2009-12-22 | 2011-07-07 | Brookman Technology Inc | 絶縁ゲート型半導体素子及び絶縁ゲート型半導体集積回路 |
-
1998
- 1998-10-06 JP JP10283968A patent/JP2000114536A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020096684A (ko) * | 2001-06-21 | 2002-12-31 | 주식회사 하이닉스반도체 | 트랜지스터의 게이트 라인 구조 |
| US7279749B2 (en) | 2003-09-01 | 2007-10-09 | Seiko Epson Corporation | Semiconductor device and semiconductor memory using the same |
| JP2005317851A (ja) * | 2004-04-30 | 2005-11-10 | Toshiba Matsushita Display Technology Co Ltd | 薄膜トランジスタおよびその製造方法 |
| JP2011134784A (ja) * | 2009-12-22 | 2011-07-07 | Brookman Technology Inc | 絶縁ゲート型半導体素子及び絶縁ゲート型半導体集積回路 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051005 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20051005 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070919 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070925 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080205 |