JP2000021714A5 - - Google Patents

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Publication number
JP2000021714A5
JP2000021714A5 JP1998184044A JP18404498A JP2000021714A5 JP 2000021714 A5 JP2000021714 A5 JP 2000021714A5 JP 1998184044 A JP1998184044 A JP 1998184044A JP 18404498 A JP18404498 A JP 18404498A JP 2000021714 A5 JP2000021714 A5 JP 2000021714A5
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JP
Japan
Prior art keywords
exposure
mask
wafer
stage
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998184044A
Other languages
English (en)
Japanese (ja)
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JP2000021714A (ja
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Publication date
Application filed filed Critical
Priority to JP10184044A priority Critical patent/JP2000021714A/ja
Priority claimed from JP10184044A external-priority patent/JP2000021714A/ja
Priority to US09/330,157 priority patent/US6714302B2/en
Publication of JP2000021714A publication Critical patent/JP2000021714A/ja
Publication of JP2000021714A5 publication Critical patent/JP2000021714A5/ja
Pending legal-status Critical Current

Links

JP10184044A 1998-06-30 1998-06-30 露光方法および装置、ならびにデバイス製造方法 Pending JP2000021714A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10184044A JP2000021714A (ja) 1998-06-30 1998-06-30 露光方法および装置、ならびにデバイス製造方法
US09/330,157 US6714302B2 (en) 1998-06-30 1999-06-11 Aligning method, aligner, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10184044A JP2000021714A (ja) 1998-06-30 1998-06-30 露光方法および装置、ならびにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2000021714A JP2000021714A (ja) 2000-01-21
JP2000021714A5 true JP2000021714A5 (https=) 2005-10-20

Family

ID=16146390

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10184044A Pending JP2000021714A (ja) 1998-06-30 1998-06-30 露光方法および装置、ならびにデバイス製造方法

Country Status (2)

Country Link
US (1) US6714302B2 (https=)
JP (1) JP2000021714A (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002246281A (ja) * 2001-02-13 2002-08-30 Mitsubishi Electric Corp 半導体装置の製造方法およびそれに用いられるレチクル並びにウェハ
US7030984B2 (en) * 2002-05-23 2006-04-18 Therma-Wave, Inc. Fast wafer positioning method for optical metrology
US8264667B2 (en) * 2006-05-04 2012-09-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and other exposure
JP4522422B2 (ja) * 2007-02-21 2010-08-11 キヤノン株式会社 露光装置
CN102626829A (zh) * 2011-08-16 2012-08-08 北京京东方光电科技有限公司 基板的激光修复装置以及激光修复方法
JP2013145863A (ja) 2011-11-29 2013-07-25 Gigaphoton Inc ２光束干渉装置および２光束干渉露光システム
CN110966937B (zh) * 2019-12-18 2021-03-09 哈尔滨工业大学 一种基于激光视觉传感的大型构件三维构形拼接方法
JP7759368B2 (ja) * 2023-10-27 2025-10-23 キヤノン株式会社 情報処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4881100A (en) * 1985-12-10 1989-11-14 Canon Kabushiki Kaisha Alignment method
US4708466A (en) * 1986-02-07 1987-11-24 Canon Kabushiki Kaisha Exposure apparatus
JPH03155112A (ja) * 1989-11-13 1991-07-03 Nikon Corp 露光条件測定方法
JP3173025B2 (ja) 1991-02-22 2001-06-04 キヤノン株式会社 露光方法及び半導体素子の製造方法
JPH10209039A (ja) 1997-01-27 1998-08-07 Nikon Corp 投影露光方法及び投影露光装置

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