JP1563649S - - Google Patents

Info

Publication number
JP1563649S
JP1563649S JPD2016-3052F JP2016003052F JP1563649S JP 1563649 S JP1563649 S JP 1563649S JP 2016003052 F JP2016003052 F JP 2016003052F JP 1563649 S JP1563649 S JP 1563649S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2016-3052F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2016-3052F priority Critical patent/JP1563649S/ja
Priority to TW105304454F priority patent/TWD183010S/zh
Priority to US29/573,943 priority patent/USD839219S1/en
Application granted granted Critical
Publication of JP1563649S publication Critical patent/JP1563649S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2016-3052F 2016-02-12 2016-02-12 Active JP1563649S (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2016-3052F JP1563649S (ko) 2016-02-12 2016-02-12
TW105304454F TWD183010S (zh) 2016-02-12 2016-08-03 基板處理裝置用晶舟
US29/573,943 USD839219S1 (en) 2016-02-12 2016-08-10 Boat for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2016-3052F JP1563649S (ko) 2016-02-12 2016-02-12

Publications (1)

Publication Number Publication Date
JP1563649S true JP1563649S (ko) 2016-11-21

Family

ID=57321979

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2016-3052F Active JP1563649S (ko) 2016-02-12 2016-02-12

Country Status (3)

Country Link
US (1) USD839219S1 (ko)
JP (1) JP1563649S (ko)
TW (1) TWD183010S (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD846514S1 (en) 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN206961808U (zh) * 2017-07-14 2018-02-02 君泰创新（北京）科技有限公司 硅片清洗工装
JP1597807S (ko) * 2017-08-21 2018-02-19
JP1638282S (ko) * 2018-09-20 2019-08-05
USD908102S1 (en) * 2019-02-20 2021-01-19 Veeco Instruments Inc. Transportable semiconductor wafer rack
USD908103S1 (en) * 2019-02-20 2021-01-19 Veeco Instruments Inc. Transportable semiconductor wafer rack
KR102552458B1 (ko) * 2019-07-31 2023-07-06 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 기판 지지구 및 반도체 장치의 제조 방법
JP1658652S (ko) * 2019-08-07 2020-04-27
JP1678278S (ja) * 2020-03-19 2021-02-01 基板処理装置用ボート
JP1731675S (ko) * 2022-05-30 2022-12-08
JP1731674S (ko) * 2022-05-30 2022-12-08
JP1731673S (ko) * 2022-05-30 2022-12-08

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD361752S (en) * 1993-09-17 1995-08-29 Tokyo Electron Kasbushiki Kaisha Wafer boat or rack for holding semiconductor wafers
USD366868S (en) * 1993-09-29 1996-02-06 Tokyo Electron Kabushiki Kaisha Wafer boat or rack
USD380454S (en) * 1995-05-30 1997-07-01 Tokyo Electron Limited Wafer boat
USD378675S (en) * 1995-05-30 1997-04-01 Tokyo Electron Limited Wafer boat
USD378823S (en) * 1995-05-30 1997-04-15 Tokyo Electron Limited Wafer boat
JP3122364B2 (ja) * 1996-02-06 2001-01-09 東京エレクトロン株式会社 ウエハボート
TW325588B (en) * 1996-02-28 1998-01-21 Asahi Glass Co Ltd Vertical wafer boat
KR19990077350A (ko) * 1996-02-29 1999-10-25 히가시 데쓰로 반도체웨이퍼의 열처리용 보트
USD404015S (en) * 1997-01-31 1999-01-12 Tokyo Electron Ltd. Wafer boat for use in a semiconductor wafer heat processing apparatus
USD409158S (en) * 1997-08-20 1999-05-04 Tokyo Electron Limited Wafer boat for use in a semiconductor wafer heat processing apparatus
USD411176S (en) * 1997-08-20 1999-06-22 Tokyo Electron Limited Wafer boat for use in a semiconductor wafer heat processing apparatus
USD404371S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Wafer boat for use in a semiconductor wafer heat processing apparatus
US6056123A (en) * 1997-12-10 2000-05-02 Novus Corporation Semiconductor wafer carrier having the same composition as the wafers
KR20000002833A (ko) * 1998-06-23 2000-01-15 윤종용 반도체 웨이퍼 보트
US6171400B1 (en) * 1998-10-02 2001-01-09 Union Oil Company Of California Vertical semiconductor wafer carrier
US6225594B1 (en) * 1999-04-15 2001-05-01 Integrated Materials, Inc. Method and apparatus for securing components of wafer processing fixtures
US6099645A (en) * 1999-07-09 2000-08-08 Union Oil Company Of California Vertical semiconductor wafer carrier with slats
US6287112B1 (en) * 2000-03-30 2001-09-11 Asm International, N.V. Wafer boat
US6341935B1 (en) * 2000-06-14 2002-01-29 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer boat having improved wafer holding capability
US20020130061A1 (en) * 2000-11-02 2002-09-19 Hengst Richard R. Apparatus and method of making a slip free wafer boat
KR100410982B1 (ko) * 2001-01-18 2003-12-18 삼성전자주식회사 반도체 제조장치용 보트
JP2002324830A (ja) * 2001-02-20 2002-11-08 Mitsubishi Electric Corp 基板熱処理用保持具、基板熱処理装置、半導体装置の製造方法、基板熱処理用保持具の製造方法及び基板熱処理用保持具の構造決定方法
JP4467028B2 (ja) * 2001-05-11 2010-05-26 信越石英株式会社 縦型ウェーハ支持治具
US6488497B1 (en) * 2001-07-12 2002-12-03 Saint-Gobain Ceramics & Plastics, Inc. Wafer boat with arcuate wafer support arms
US6811040B2 (en) * 2001-07-16 2004-11-02 Rohm And Haas Company Wafer holding apparatus
JP4506125B2 (ja) * 2003-07-16 2010-07-21 信越半導体株式会社 熱処理用縦型ボート及びその製造方法
US20050145584A1 (en) * 2004-01-06 2005-07-07 Buckley Richard F. Wafer boat with interference fit wafer supports
USD551634S1 (en) * 2005-02-28 2007-09-25 Tokyo Electron Limited Wafer-boat for heat-processing of semiconductor wafers
USD570308S1 (en) * 2006-05-01 2008-06-03 Tokyo Electron Limited Wafer boat
USD580894S1 (en) * 2006-05-01 2008-11-18 Tokyo Electron Limited Wafer boat
USD570309S1 (en) * 2006-10-25 2008-06-03 Tokyo Electron Limited Wafer boat
USD600221S1 (en) * 2008-03-28 2009-09-15 Tokyo Electron Limited Wafer boat
USD600222S1 (en) * 2008-03-28 2009-09-15 Tokyo Electron Limited Wafer boat
USD616394S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Support of wafer boat for manufacturing semiconductor wafers
USD616395S1 (en) * 2009-03-11 2010-05-25 Tokyo Electron Limited Support of wafer boat for manufacturing semiconductor wafers
USD616396S1 (en) * 2009-03-12 2010-05-25 Tokyo Electron Limited Pedestal of heat insulating cylinder for manufacturing semiconductor wafers
TWD161688S (zh) * 2012-12-27 2014-07-11 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD163542S (zh) * 2013-03-22 2014-10-11 日立國際電氣股份有限公司 基板處理裝置用晶舟
TWD166332S (zh) * 2013-03-22 2015-03-01 日立國際電氣股份有限公司 基板處理裝置用晶舟之部分
TWD168827S (zh) * 2013-07-29 2015-07-01 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD165429S (zh) * 2013-07-29 2015-01-11 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD167988S (zh) * 2013-07-29 2015-05-21 日立國際電氣股份有限公司 半導體製造裝置用晶舟
JP1537312S (ko) * 2014-11-20 2015-11-09
JP1537629S (ko) * 2014-11-20 2015-11-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD846514S1 (en) 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus

Also Published As

Publication number Publication date
USD839219S1 (en) 2019-01-29
TWD183010S (zh) 2017-05-11

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